FR2344643B1 - - Google Patents

Info

Publication number
FR2344643B1
FR2344643B1 FR7708132A FR7708132A FR2344643B1 FR 2344643 B1 FR2344643 B1 FR 2344643B1 FR 7708132 A FR7708132 A FR 7708132A FR 7708132 A FR7708132 A FR 7708132A FR 2344643 B1 FR2344643 B1 FR 2344643B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7708132A
Other languages
French (fr)
Other versions
FR2344643A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of FR2344643A1 publication Critical patent/FR2344643A1/fr
Application granted granted Critical
Publication of FR2344643B1 publication Critical patent/FR2344643B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7708132A 1976-03-19 1977-03-18 Appareil de depot sous vide Granted FR2344643A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2923476A JPS52113379A (en) 1976-03-19 1976-03-19 Vacuum evaporation

Publications (2)

Publication Number Publication Date
FR2344643A1 FR2344643A1 (fr) 1977-10-14
FR2344643B1 true FR2344643B1 (en17) 1980-11-21

Family

ID=12270529

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7708132A Granted FR2344643A1 (fr) 1976-03-19 1977-03-18 Appareil de depot sous vide

Country Status (6)

Country Link
US (1) US4121537A (en17)
JP (1) JPS52113379A (en17)
DE (1) DE2711714B2 (en17)
FR (1) FR2344643A1 (en17)
GB (1) GB1532183A (en17)
NL (1) NL173542C (en17)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5399762A (en) * 1977-02-12 1978-08-31 Futaba Denshi Kogyo Kk Device for producing compound semiconductor film
GB2000882B (en) * 1977-07-01 1982-04-07 Hitachi Ltd Vacuum vapour-deposition apparatus
DE3028123A1 (de) * 1980-07-24 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur herstellung von schichtkondensatoren
US4348886A (en) * 1980-11-19 1982-09-14 Rca Corporation Monitor for oxygen concentration in aluminum-based films
US4681773A (en) * 1981-03-27 1987-07-21 American Telephone And Telegraph Company At&T Bell Laboratories Apparatus for simultaneous molecular beam deposition on a plurality of substrates
US4386578A (en) * 1981-05-26 1983-06-07 The Boeing Company High velocity metallic mass increment vacuum deposit gun
JPS58217673A (ja) * 1982-06-11 1983-12-17 Anelva Corp 膜厚制御方法
US4459823A (en) * 1983-03-30 1984-07-17 Sperry Corporation Rotating liquid nitrogen cooled substrate holder
DE3315666A1 (de) * 1983-04-29 1984-10-31 Siemens AG, 1000 Berlin und 8000 München Verfahren zur messung des auftrages und abtrages von duennen schichten
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5018048A (en) * 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US5097800A (en) * 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US5125138A (en) * 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
JPS6261315A (ja) * 1985-09-11 1987-03-18 Sharp Corp 分子線エピタキシ−装置
US4954371A (en) * 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
US4858556A (en) * 1986-09-15 1989-08-22 Siebert Jerome F Method and apparatus for physical vapor deposition of thin films
US5025664A (en) * 1989-11-02 1991-06-25 Leybold Inficon, Inc. Multiple crystal head for deposition thickness monitor
JP3292925B2 (ja) * 1991-03-01 2002-06-17 株式会社昭和真空 連続式スパッタ装置に於ける膜厚確認方法
SE468372B (sv) * 1991-04-24 1992-12-21 Stiftelsen Im Inst Foer Mikroe Foerfarande foer tillverkning av tunnfilmssolceller varvid deponering av skikt paa substrat sker i roterbar (cylindrisk) baeranordning
US5412180A (en) * 1993-12-02 1995-05-02 The Regents Of The University Of California Ultra high vacuum heating and rotating specimen stage
FR2719900B1 (fr) * 1994-05-11 1996-09-20 Essilor Int Procédé et dispositif pour la mesure in situ des contraintes se développant au sein d'une couche mince lors de son dépôt sur un substrat.
US5948983A (en) * 1997-07-25 1999-09-07 Leybold Inficon, Inc. Wall deposition monitoring system
US6364956B1 (en) 1999-01-26 2002-04-02 Symyx Technologies, Inc. Programmable flux gradient apparatus for co-deposition of materials onto a substrate
US6830663B2 (en) * 1999-01-26 2004-12-14 Symyx Technologies, Inc. Method for creating radial profiles on a substrate
US6090444A (en) * 1999-02-08 2000-07-18 Saunders & Associates, Inc. Base plater or vacuum deposition apparatus with individually and selectively controlled work holders and capacitively coupled crystal monitor
CN1251809C (zh) * 2000-10-17 2006-04-19 尼奥弗托尼克斯公司 通过反应沉积形成涂覆的装置及方法
US7828929B2 (en) * 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
EP2113584A1 (en) * 2008-04-28 2009-11-04 LightLab Sweden AB Evaporation system
JP5513529B2 (ja) * 2010-01-26 2014-06-04 キヤノンアネルバ株式会社 成膜方法、成膜装置、および該成膜装置の制御装置
EP2418545B1 (en) 2010-08-12 2018-10-10 Applied Materials, Inc. Mask handling module
KR102002849B1 (ko) * 2012-09-17 2019-07-24 삼성디스플레이 주식회사 증착 장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1073293A (en) * 1963-10-16 1967-06-21 Edwards High Vacuum Int Ltd Apparatus for controlling vapour deposition in a vacuum
GB1003378A (en) * 1964-03-23 1965-09-02 Standard Telephones Cables Ltd Monitoring the thickness of films being vacuum deposited
DE2122997A1 (de) * 1970-05-06 1971-11-25 Metal Lux Spa Gerät zum Färben von Gegenständen wie beispielsweise Brillengläsern
US3732846A (en) * 1972-01-07 1973-05-15 Us Army Crystal plating monitoring system
JPS5331829B2 (en17) * 1972-04-14 1978-09-05
JPS495834A (en17) * 1972-04-15 1974-01-19
US4059067A (en) * 1974-10-09 1977-11-22 Balzers Patent-Und Beteiligungs-Aktiengesellschaft Apparatus for determining the rate of flow of particles in a vacuum deposition device
US3939798A (en) * 1974-12-19 1976-02-24 Texas Instruments Incorporated Optical thin film coater
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition

Also Published As

Publication number Publication date
JPS5527624B2 (en17) 1980-07-22
US4121537A (en) 1978-10-24
JPS52113379A (en) 1977-09-22
NL173542C (nl) 1984-02-01
DE2711714B2 (de) 1980-01-31
NL7702869A (nl) 1977-09-21
GB1532183A (en) 1978-11-15
FR2344643A1 (fr) 1977-10-14
NL173542B (nl) 1983-09-01
DE2711714A1 (de) 1977-09-22

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