FR2327641B1 - - Google Patents

Info

Publication number
FR2327641B1
FR2327641B1 FR7630037A FR7630037A FR2327641B1 FR 2327641 B1 FR2327641 B1 FR 2327641B1 FR 7630037 A FR7630037 A FR 7630037A FR 7630037 A FR7630037 A FR 7630037A FR 2327641 B1 FR2327641 B1 FR 2327641B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7630037A
Other languages
French (fr)
Other versions
FR2327641A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2327641A1 publication Critical patent/FR2327641A1/fr
Application granted granted Critical
Publication of FR2327641B1 publication Critical patent/FR2327641B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H10W46/00—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H10P14/24—
    • H10P14/271—
    • H10P14/2905—
    • H10P14/3411—
    • H10P34/40—
    • H10P50/642—
    • H10P76/2045—
    • H10W46/101—
    • H10W46/501—
    • H10W46/507—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/102—Mask alignment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/975—Substrate or mask aligning feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Bipolar Transistors (AREA)
  • Electron Beam Exposure (AREA)
  • Recrystallisation Techniques (AREA)
FR7630037A 1975-10-06 1976-10-06 Fabrication de dispositifs semi-conducteurs a l'aide d'un marqueur de reference Granted FR2327641A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB40776/75A GB1520925A (en) 1975-10-06 1975-10-06 Semiconductor device manufacture

Publications (2)

Publication Number Publication Date
FR2327641A1 FR2327641A1 (fr) 1977-05-06
FR2327641B1 true FR2327641B1 (enExample) 1982-10-15

Family

ID=10416557

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7630037A Granted FR2327641A1 (fr) 1975-10-06 1976-10-06 Fabrication de dispositifs semi-conducteurs a l'aide d'un marqueur de reference

Country Status (7)

Country Link
US (1) US4125418A (enExample)
JP (1) JPS5259583A (enExample)
CA (1) CA1066431A (enExample)
DE (1) DE2642770A1 (enExample)
FR (1) FR2327641A1 (enExample)
GB (1) GB1520925A (enExample)
NL (1) NL7610947A (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
JPS5534442A (en) * 1978-08-31 1980-03-11 Fujitsu Ltd Preparation of semiconductor device
JPS5827663B2 (ja) * 1979-06-04 1983-06-10 富士通株式会社 半導体装置の製造方法
GB2066487B (en) * 1979-12-18 1983-11-23 Philips Electronic Associated Alignment of exposure masks
US4327292A (en) * 1980-05-13 1982-04-27 Hughes Aircraft Company Alignment process using serial detection of repetitively patterned alignment marks
US4431923A (en) * 1980-05-13 1984-02-14 Hughes Aircraft Company Alignment process using serial detection of repetitively patterned alignment marks
DE3123031A1 (de) * 1981-06-10 1983-01-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zur kennzeichnung von halbleiterchips und kennzeichenbarer halbleiterchip
JPS5960306A (ja) * 1982-09-30 1984-04-06 Fujitsu Ltd 位置決定用チップを備えた試料
JPS59107511A (ja) * 1982-12-13 1984-06-21 Hitachi Ltd パタ−ン形成方法
DE3336901A1 (de) * 1983-10-11 1985-04-18 Deutsche Itt Industries Gmbh, 7800 Freiburg Maskenmarkierung und substratmarkierung fuer ein verfahren zum justieren einer eine maskenmarkierung enthaltenden photomaske auf einer substratmarkierung
US4487653A (en) * 1984-03-19 1984-12-11 Advanced Micro Devices, Inc. Process for forming and locating buried layers
US4702995A (en) * 1984-08-24 1987-10-27 Nec Corporation Method of X-ray lithography
JPS61222137A (ja) * 1985-03-06 1986-10-02 Sharp Corp チップ識別用凹凸パターン形成方法
US4632724A (en) * 1985-08-19 1986-12-30 International Business Machines Corporation Visibility enhancement of first order alignment marks
US4936930A (en) * 1988-01-06 1990-06-26 Siliconix Incorporated Method for improved alignment for semiconductor devices with buried layers
US5385850A (en) * 1991-02-07 1995-01-31 International Business Machines Corporation Method of forming a doped region in a semiconductor substrate utilizing a sacrificial epitaxial silicon layer
US5451261A (en) * 1992-09-11 1995-09-19 Matsushita Electric Industrial Co., Ltd. Metal film deposition apparatus and metal film deposition method
US5401691A (en) * 1994-07-01 1995-03-28 Cypress Semiconductor Corporation Method of fabrication an inverse open frame alignment mark
JPH0927529A (ja) * 1995-07-12 1997-01-28 Sony Corp 位置合わせ検出用半導体装置
JP3528350B2 (ja) * 1995-08-25 2004-05-17 ソニー株式会社 半導体装置の製造方法
US5738961A (en) * 1997-03-03 1998-04-14 Taiwan Semiconductor Manufacturing Company, Ltd. Two-step photolithography method for aligning and patterning non-transparent layers

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1066911A (en) * 1965-01-01 1967-04-26 Standard Telephones Cables Ltd Semiconductor devices
FR1064185A (fr) * 1967-05-23 1954-05-11 Philips Nv Procédé de fabrication d'un système d'électrodes
FR1593881A (enExample) * 1967-12-12 1970-06-01
JPS4924553B1 (enExample) * 1968-12-09 1974-06-24
US3679497A (en) * 1969-10-24 1972-07-25 Westinghouse Electric Corp Electron beam fabrication system and process for use thereof
GB1328803A (en) * 1969-12-17 1973-09-05 Mullard Ltd Methods of manufacturing semiconductor devices
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams
US3879613A (en) * 1971-12-13 1975-04-22 Philips Corp Methods of manufacturing semiconductor devices
US3895234A (en) * 1973-06-15 1975-07-15 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member
US3832561A (en) * 1973-10-01 1974-08-27 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Also Published As

Publication number Publication date
US4125418A (en) 1978-11-14
DE2642770A1 (de) 1977-04-14
JPS5259583A (en) 1977-05-17
FR2327641A1 (fr) 1977-05-06
CA1066431A (en) 1979-11-13
NL7610947A (nl) 1977-04-12
GB1520925A (en) 1978-08-09

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Legal Events

Date Code Title Description
ST Notification of lapse