FR2296215B1 - - Google Patents

Info

Publication number
FR2296215B1
FR2296215B1 FR7536048A FR7536048A FR2296215B1 FR 2296215 B1 FR2296215 B1 FR 2296215B1 FR 7536048 A FR7536048 A FR 7536048A FR 7536048 A FR7536048 A FR 7536048A FR 2296215 B1 FR2296215 B1 FR 2296215B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7536048A
Other languages
French (fr)
Other versions
FR2296215A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2296215A1 publication Critical patent/FR2296215A1/fr
Application granted granted Critical
Publication of FR2296215B1 publication Critical patent/FR2296215B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7536048A 1974-12-23 1975-11-17 Procede permettant de positionner des objets Granted FR2296215A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/535,905 US4052603A (en) 1974-12-23 1974-12-23 Object positioning process and apparatus

Publications (2)

Publication Number Publication Date
FR2296215A1 FR2296215A1 (fr) 1976-07-23
FR2296215B1 true FR2296215B1 (en:Method) 1978-05-12

Family

ID=24136285

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7536048A Granted FR2296215A1 (fr) 1974-12-23 1975-11-17 Procede permettant de positionner des objets

Country Status (4)

Country Link
US (1) US4052603A (en:Method)
DE (1) DE2557675C2 (en:Method)
FR (1) FR2296215A1 (en:Method)
GB (1) GB1502478A (en:Method)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
FR2388249A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif de positionnement d'un objet dans un systeme optique de projection et systeme optique de projection comportant un tel dispositif
US4247203A (en) * 1978-04-03 1981-01-27 Kla Instrument Corporation Automatic photomask inspection system and apparatus
US4347001A (en) * 1978-04-03 1982-08-31 Kla Instruments Corporation Automatic photomask inspection system and apparatus
US4687980A (en) * 1980-10-20 1987-08-18 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
US4977361A (en) * 1978-06-26 1990-12-11 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
US4422763A (en) * 1978-12-08 1983-12-27 Rca Corporation Automatic photomask alignment system for projection printing
DE2905635C2 (de) * 1979-02-14 1987-01-22 Perkin-Elmer Censor Anstalt, Vaduz Einrichtung zum Positionieren eines Werkstückes in Z-Richtung beim Projektionskopieren
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
US4521114A (en) * 1979-05-11 1985-06-04 Tre Semiconductor Equipment Corporation Single lens repeater
JPS55162227A (en) * 1979-06-04 1980-12-17 Hitachi Ltd Microprojection exposure device
US4309813A (en) * 1979-12-26 1982-01-12 Harris Corporation Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits
US4379308A (en) * 1980-02-25 1983-04-05 Cooper Industries, Inc. Apparatus for determining the parameters of figures on a surface
EP0036026B1 (de) * 1980-03-10 1986-11-12 Eaton-Optimetrix Inc. Adressierbare Positioniervorrichtung
JPS56128946A (en) * 1980-03-14 1981-10-08 Fujitsu Ltd Photomask correcting method
US4560639A (en) * 1980-05-08 1985-12-24 Sullivan Donald F Reusable phototransparency image forming tools for direct contact printing
JPS57117238A (en) * 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
US4657839A (en) * 1981-10-21 1987-04-14 Sullivan Donald F Photoprinting process and apparatus for exposing paste-consistency photopolymers
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
US4550374A (en) * 1982-11-15 1985-10-29 Tre Semiconductor Equipment Corporation High speed alignment method for wafer stepper
US4655599A (en) * 1982-11-15 1987-04-07 Canon Kabushiki Kaisha Mask aligner having a photo-mask setting device
JPS5994419A (ja) * 1982-11-19 1984-05-31 Canon Inc 分割焼付け装置におけるアライメント方法
JPS5998525A (ja) * 1982-11-26 1984-06-06 Canon Inc 分割焼付け装置のアライメント方法
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
US4564585A (en) * 1983-11-28 1986-01-14 Magnetic Peripherals, Inc. Process for fabricating negative pressure sliders
GB2150317A (en) * 1983-11-28 1985-06-26 Magnetic Peripherals Inc Process for producing negative pressure sliders using a photoresist
DE3377934D1 (en) * 1983-12-28 1988-10-13 Ibm Process and equipment for the automatic alignment of an object in respect of a reference
JPS60163110A (ja) * 1984-02-06 1985-08-26 Canon Inc 位置合わせ装置
EP0177566B1 (en) * 1984-03-20 1991-12-27 Bio-Rad Micromeasurements (Canada) Inc. Method for precision sem measurements
JPS60196944A (ja) * 1984-07-30 1985-10-05 Hitachi Ltd アライメント方法
US4803524A (en) * 1985-08-03 1989-02-07 Nikon Corporation Method of and apparatus for detecting the accuracy of superposition exposure in an exposure apparatus
US4750141A (en) * 1985-11-26 1988-06-07 Ade Corporation Method and apparatus for separating fixture-induced error from measured object characteristics and for compensating the measured object characteristic with the error, and a bow/warp station implementing same
JPH0685387B2 (ja) * 1986-02-14 1994-10-26 株式会社東芝 位置合わせ方法
JP2661015B2 (ja) * 1986-06-11 1997-10-08 株式会社ニコン 位置合わせ方法
JPH038319A (ja) * 1990-02-14 1991-01-16 Nikon Corp 露光装置の位置合わせ装置及び方法
JPH03123016A (ja) * 1990-08-15 1991-05-24 Hitachi Ltd 露光方法
SE502087C2 (sv) * 1991-05-28 1995-08-07 Misomex Ab Förfarande och anordning för laserkopiering med höj- och sänkbar laserenhet
US6278957B1 (en) 1993-01-21 2001-08-21 Nikon Corporation Alignment method and apparatus therefor
US20010049589A1 (en) * 1993-01-21 2001-12-06 Nikon Corporation Alignment method and apparatus therefor
US5497060A (en) * 1993-06-21 1996-03-05 Juergens, Iii; Albert M. Positioning stage
JP2546537B2 (ja) * 1994-06-20 1996-10-23 株式会社ニコン 投影露光装置及び方法
JP3324403B2 (ja) * 1996-08-01 2002-09-17 ウシオ電機株式会社 マスクとワークの位置合わせ方法および装置
US6129259A (en) * 1997-03-31 2000-10-10 Micron Technology, Inc. Bonding and inspection system
WO1998057363A1 (en) 1997-06-09 1998-12-17 Nikon Corporation Exposure system, process for manufacturing the exposure system, and process for fabricating devices
US6327513B1 (en) 1998-04-16 2001-12-04 Vlsi Technology, Inc. Methods and apparatus for calculating alignment of layers during semiconductor processing
US6336052B1 (en) * 1998-07-08 2002-01-01 Forensic Technology Wai Inc. Data acquistion image analysis image manipulation interface
US6335208B1 (en) 1999-05-10 2002-01-01 Intersil Americas Inc. Laser decapsulation method
US6859677B2 (en) * 2001-10-25 2005-02-22 International Truck Intellectual Property Company, Llc Assembly verification method and inspection system
US8064730B2 (en) * 2003-09-22 2011-11-22 Asml Netherlands B.V. Device manufacturing method, orientation determination method and lithographic apparatus
US7835011B2 (en) * 2006-01-20 2010-11-16 General Electric Company Systems and methods for determining a position of a support
US20070193012A1 (en) * 2006-02-22 2007-08-23 Robert Bergman Metal forming process
US7955946B2 (en) * 2006-05-22 2011-06-07 Micron Technology, Inc. Methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices
JP4908304B2 (ja) * 2007-04-27 2012-04-04 東京エレクトロン株式会社 基板の処理方法、基板の処理システム及びコンピュータ読み取り可能な記憶媒体
NL2004401A (en) * 2009-04-15 2010-10-18 Asml Netherlands Bv Lithographic apparatus, positioning system, and positioning method.
US8514374B2 (en) * 2009-11-04 2013-08-20 International Business Machines Corporation Alignment method for semiconductor processing
DE102011076178B4 (de) * 2011-05-20 2022-03-31 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
GB2498994B (en) * 2012-02-02 2014-03-19 Trackwise Designs Ltd Method of making a flexible circuit
NL2018856B1 (en) * 2017-05-05 2018-11-14 Suss Microtec Lithography Gmbh Method and device for aligning a first substrate with a second substrate
CN109870885A (zh) * 2017-12-05 2019-06-11 山东华光光电子股份有限公司 一种手动光刻机的预对准方法及预对准装置
CN112945092B (zh) * 2021-01-27 2023-03-28 深圳市卓兴半导体科技有限公司 一种多工位设备的模板定位方法及系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3476476A (en) * 1967-03-28 1969-11-04 Optomechanisms Inc Alignment means for photo repeat machine
US3490846A (en) * 1967-06-01 1970-01-20 Kasper Instruments Optical alignment and exposure apparatus
US3563648A (en) * 1967-10-18 1971-02-16 Texas Instruments Inc Step and repeat camera with computer controlled film table
GB1255502A (en) * 1967-12-28 1971-12-01 Tokyo Shibaura Electric Co Position and orientation detecting system using patterns
DE1772016A1 (de) * 1968-03-21 1971-01-07 Ibm Deutschland Anordnung zur Masken-Justierung mit dem Lichtmikroskop beim Herstellen integrierter Halbleiterschaltungen,insbesondere integrierter Transistoren
US3598978A (en) * 1968-08-21 1971-08-10 Rca Corp Object-positioning system and method
US3544801A (en) * 1969-05-01 1970-12-01 Fairchild Camera Instr Co Mask design for optical alignment systems
US3955072A (en) * 1971-03-22 1976-05-04 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask
US3752589A (en) * 1971-10-26 1973-08-14 M Kobayashi Method and apparatus for positioning patterns of a photographic mask on the surface of a wafer on the basis of backside patterns of the wafer
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
US3718396A (en) * 1971-12-28 1973-02-27 Licentia Gmbh System for photographic production of semiconductor micro structures
US3844655A (en) * 1973-07-27 1974-10-29 Kasper Instruments Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask

Also Published As

Publication number Publication date
DE2557675A1 (de) 1976-07-01
DE2557675C2 (de) 1985-04-18
US4052603A (en) 1977-10-04
FR2296215A1 (fr) 1976-07-23
GB1502478A (en) 1978-03-01

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Legal Events

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