FR2274952B1 - - Google Patents
Info
- Publication number
- FR2274952B1 FR2274952B1 FR7517755A FR7517755A FR2274952B1 FR 2274952 B1 FR2274952 B1 FR 2274952B1 FR 7517755 A FR7517755 A FR 7517755A FR 7517755 A FR7517755 A FR 7517755A FR 2274952 B1 FR2274952 B1 FR 2274952B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH795774A CH604208A5 (es) | 1974-06-11 | 1974-06-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2274952A1 FR2274952A1 (fr) | 1976-01-09 |
| FR2274952B1 true FR2274952B1 (es) | 1977-07-08 |
Family
ID=4332963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7517755A Granted FR2274952A1 (fr) | 1974-06-11 | 1975-06-06 | Procede pour obtenir des images polymeres stables par photopolymerisation dans une matrice |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS599895B2 (es) |
| BE (1) | BE830050A (es) |
| CA (1) | CA1062529A (es) |
| CH (1) | CH604208A5 (es) |
| DE (1) | DE2525673A1 (es) |
| FR (1) | FR2274952A1 (es) |
| GB (1) | GB1504616A (es) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5119718B2 (es) * | 1973-09-22 | 1976-06-19 | ||
| SE405404B (sv) * | 1975-12-29 | 1978-12-04 | Volvo Flygmotor Ab | Saett och anlaeggning foer samtidig foerbraenning av flytande och gasformiga avfallsprodukter |
| US4422972A (en) | 1980-08-21 | 1983-12-27 | Eastman Kodak Company | Novel light-sensitive compounds and photoreactable compositions comprising same |
| US4302527A (en) | 1980-08-21 | 1981-11-24 | Eastman Kodak Company | Photoreactive compositions comprising a light sensitive compound and another compound with reactive site |
| US4542088A (en) * | 1982-03-18 | 1985-09-17 | Konishiroku Photo Industry Co., Ltd. | Photopolymerizable compositions and image-forming materials using said compositions |
| EP0105382B1 (en) * | 1982-04-07 | 1987-01-07 | Sony Corporation | Image-forming photo-sensitive material |
| JPS5965840A (ja) * | 1982-10-07 | 1984-04-14 | Sanyo Kokusaku Pulp Co Ltd | 着色画像の形成方法およびこれに使用するための着色画像形成用感光材料 |
| JPH0697339B2 (ja) * | 1984-02-02 | 1994-11-30 | 富士写真フイルム株式会社 | 光重合性組成物 |
| GB8718528D0 (en) * | 1987-08-05 | 1987-09-09 | Ciba Geigy Ag | Photopolymerisable composition |
| DE19519740B4 (de) * | 1995-06-02 | 2005-04-21 | Mann + Hummel Gmbh | Wärmetauscher |
| GB2476275A (en) * | 2009-12-17 | 2011-06-22 | Dublin Inst Of Technology | Photosensitive holographic recording medium comprising glycerol |
| JP7354529B2 (ja) | 2018-08-30 | 2023-10-03 | 株式会社リコー | 活性エネルギー線硬化型液体、活性エネルギー線硬化型液体セット、造形物の製造方法、及び造形物製造装置 |
-
1974
- 1974-06-11 CH CH795774A patent/CH604208A5/xx not_active IP Right Cessation
-
1975
- 1975-06-06 FR FR7517755A patent/FR2274952A1/fr active Granted
- 1975-06-09 CA CA228,846A patent/CA1062529A/en not_active Expired
- 1975-06-09 DE DE19752525673 patent/DE2525673A1/de not_active Ceased
- 1975-06-10 BE BE157172A patent/BE830050A/xx unknown
- 1975-06-11 GB GB2503775A patent/GB1504616A/en not_active Expired
- 1975-06-11 JP JP7138675A patent/JPS599895B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2274952A1 (fr) | 1976-01-09 |
| CH604208A5 (es) | 1978-08-31 |
| CA1062529A (en) | 1979-09-18 |
| JPS5111433A (ja) | 1976-01-29 |
| GB1504616A (en) | 1978-03-22 |
| JPS599895B2 (ja) | 1984-03-06 |
| BE830050A (fr) | 1975-12-10 |
| DE2525673A1 (de) | 1976-01-02 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |