FR2274951B1 - - Google Patents

Info

Publication number
FR2274951B1
FR2274951B1 FR7517754A FR7517754A FR2274951B1 FR 2274951 B1 FR2274951 B1 FR 2274951B1 FR 7517754 A FR7517754 A FR 7517754A FR 7517754 A FR7517754 A FR 7517754A FR 2274951 B1 FR2274951 B1 FR 2274951B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7517754A
Other languages
French (fr)
Other versions
FR2274951A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH795774A external-priority patent/CH604208A5/xx
Priority claimed from CH795674A external-priority patent/CH594704A5/de
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of FR2274951A1 publication Critical patent/FR2274951A1/fr
Application granted granted Critical
Publication of FR2274951B1 publication Critical patent/FR2274951B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR7517754A 1974-06-11 1975-06-06 Procede de preparation d'images polymeres stables par photopolymerisation dans une matrice Granted FR2274951A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH795774A CH604208A5 (es) 1974-06-11 1974-06-11
CH795674A CH594704A5 (en) 1974-06-11 1974-06-11 Stable polymer image prepn.

Publications (2)

Publication Number Publication Date
FR2274951A1 FR2274951A1 (fr) 1976-01-09
FR2274951B1 true FR2274951B1 (es) 1983-10-28

Family

ID=25702506

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7517754A Granted FR2274951A1 (fr) 1974-06-11 1975-06-06 Procede de preparation d'images polymeres stables par photopolymerisation dans une matrice

Country Status (5)

Country Link
JP (1) JPS5130286A (es)
CA (1) CA1077760A (es)
DE (1) DE2525674A1 (es)
FR (1) FR2274951A1 (es)
GB (1) GB1516894A (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5343504U (es) * 1976-09-20 1978-04-14
JPS5651735A (en) * 1979-10-03 1981-05-09 Asahi Chem Ind Co Ltd Photoreactive composition
JP5495668B2 (ja) * 2009-08-12 2014-05-21 日本エンバイロケミカルズ株式会社 キノキサリン系化合物またはその塩、および工業用殺菌組成物
CN110573154A (zh) * 2017-02-06 2019-12-13 卡斯西部储备大学 调节短链脱氢酶活性的组合物和方法

Also Published As

Publication number Publication date
CA1077760A (en) 1980-05-20
FR2274951A1 (fr) 1976-01-09
DE2525674A1 (de) 1976-01-02
JPS5130286A (ja) 1976-03-15
GB1516894A (en) 1978-07-05

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Legal Events

Date Code Title Description
ST Notification of lapse