BE830050A - Procede pour obtenir des images polymeres stables par photopolymerisation dans une matrice - Google Patents

Procede pour obtenir des images polymeres stables par photopolymerisation dans une matrice

Info

Publication number
BE830050A
BE830050A BE157172A BE157172A BE830050A BE 830050 A BE830050 A BE 830050A BE 157172 A BE157172 A BE 157172A BE 157172 A BE157172 A BE 157172A BE 830050 A BE830050 A BE 830050A
Authority
BE
Belgium
Prior art keywords
photopolymerization
matrix
obtaining stable
stable polymeric
polymeric images
Prior art date
Application number
BE157172A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE830050A publication Critical patent/BE830050A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BE157172A 1974-06-11 1975-06-10 Procede pour obtenir des images polymeres stables par photopolymerisation dans une matrice BE830050A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH795774A CH604208A5 (fr) 1974-06-11 1974-06-11

Publications (1)

Publication Number Publication Date
BE830050A true BE830050A (fr) 1975-12-10

Family

ID=4332963

Family Applications (1)

Application Number Title Priority Date Filing Date
BE157172A BE830050A (fr) 1974-06-11 1975-06-10 Procede pour obtenir des images polymeres stables par photopolymerisation dans une matrice

Country Status (7)

Country Link
JP (1) JPS599895B2 (fr)
BE (1) BE830050A (fr)
CA (1) CA1062529A (fr)
CH (1) CH604208A5 (fr)
DE (1) DE2525673A1 (fr)
FR (1) FR2274952A1 (fr)
GB (1) GB1504616A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5119718B2 (fr) * 1973-09-22 1976-06-19
SE405404B (sv) * 1975-12-29 1978-12-04 Volvo Flygmotor Ab Saett och anlaeggning foer samtidig foerbraenning av flytande och gasformiga avfallsprodukter
US4302527A (en) 1980-08-21 1981-11-24 Eastman Kodak Company Photoreactive compositions comprising a light sensitive compound and another compound with reactive site
US4422972A (en) 1980-08-21 1983-12-27 Eastman Kodak Company Novel light-sensitive compounds and photoreactable compositions comprising same
US4542088A (en) * 1982-03-18 1985-09-17 Konishiroku Photo Industry Co., Ltd. Photopolymerizable compositions and image-forming materials using said compositions
GB2129953B (en) * 1982-04-07 1985-08-07 Sony Corp Image-forming photo-sensitive material
JPS5965840A (ja) * 1982-10-07 1984-04-14 Sanyo Kokusaku Pulp Co Ltd 着色画像の形成方法およびこれに使用するための着色画像形成用感光材料
JPH0697339B2 (ja) * 1984-02-02 1994-11-30 富士写真フイルム株式会社 光重合性組成物
GB8718528D0 (en) * 1987-08-05 1987-09-09 Ciba Geigy Ag Photopolymerisable composition
DE19519740B4 (de) * 1995-06-02 2005-04-21 Mann + Hummel Gmbh Wärmetauscher
GB2476275A (en) * 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol
JP7354529B2 (ja) * 2018-08-30 2023-10-03 株式会社リコー 活性エネルギー線硬化型液体、活性エネルギー線硬化型液体セット、造形物の製造方法、及び造形物製造装置

Also Published As

Publication number Publication date
JPS5111433A (ja) 1976-01-29
GB1504616A (en) 1978-03-22
CA1062529A (fr) 1979-09-18
DE2525673A1 (de) 1976-01-02
FR2274952B1 (fr) 1977-07-08
CH604208A5 (fr) 1978-08-31
JPS599895B2 (ja) 1984-03-06
FR2274952A1 (fr) 1976-01-09

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