BE830049A - Procede de preparation d'images polymeres stables par photopolymerisation dans une matrice - Google Patents
Procede de preparation d'images polymeres stables par photopolymerisation dans une matriceInfo
- Publication number
- BE830049A BE830049A BE157171A BE157171A BE830049A BE 830049 A BE830049 A BE 830049A BE 157171 A BE157171 A BE 157171A BE 157171 A BE157171 A BE 157171A BE 830049 A BE830049 A BE 830049A
- Authority
- BE
- Belgium
- Prior art keywords
- photopolymerization
- matrix
- stable polymer
- preparing stable
- polymer images
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH795674A CH594704A5 (en) | 1974-06-11 | 1974-06-11 | Stable polymer image prepn. |
Publications (1)
Publication Number | Publication Date |
---|---|
BE830049A true BE830049A (fr) | 1975-12-10 |
Family
ID=4332946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE157171A BE830049A (fr) | 1974-06-11 | 1975-06-10 | Procede de preparation d'images polymeres stables par photopolymerisation dans une matrice |
Country Status (2)
Country | Link |
---|---|
BE (1) | BE830049A (fr) |
CH (1) | CH594704A5 (fr) |
-
1974
- 1974-06-11 CH CH795674A patent/CH594704A5/de not_active IP Right Cessation
-
1975
- 1975-06-10 BE BE157171A patent/BE830049A/fr unknown
Also Published As
Publication number | Publication date |
---|---|
CH594704A5 (en) | 1978-01-31 |
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