FR2252652A1 - - Google Patents

Info

Publication number
FR2252652A1
FR2252652A1 FR7342381A FR7342381A FR2252652A1 FR 2252652 A1 FR2252652 A1 FR 2252652A1 FR 7342381 A FR7342381 A FR 7342381A FR 7342381 A FR7342381 A FR 7342381A FR 2252652 A1 FR2252652 A1 FR 2252652A1
Authority
FR
France
Prior art keywords
wafers
layer
semi
molybdenum
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7342381A
Other languages
English (en)
French (fr)
Other versions
FR2252652B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Silec Semi Conducteurs SA
Original Assignee
Silec Semi Conducteurs SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silec Semi Conducteurs SA filed Critical Silec Semi Conducteurs SA
Priority to FR7342381A priority Critical patent/FR2252652B1/fr
Priority to BE150231A priority patent/BE821877A/xx
Priority to IT29453/74A priority patent/IT1025714B/it
Priority to DE19742456129 priority patent/DE2456129A1/de
Priority to GB51683/74A priority patent/GB1494905A/en
Publication of FR2252652A1 publication Critical patent/FR2252652A1/fr
Application granted granted Critical
Publication of FR2252652B1 publication Critical patent/FR2252652B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/22—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using physical deposition, e.g. vacuum deposition or sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2902—Materials being Group IVA materials
    • H10P14/2905—Silicon, silicon germanium or germanium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
    • H10P14/3411—Silicon, silicon germanium or germanium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/36—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by treatments done before the formation of the materials
    • H10P14/3602—In-situ cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
FR7342381A 1973-11-28 1973-11-28 Expired FR2252652B1 (enExample)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7342381A FR2252652B1 (enExample) 1973-11-28 1973-11-28
BE150231A BE821877A (fr) 1973-11-28 1974-11-05 Nouvelles diodes zener a tension de seuil amelioree et a bruitselectriques reduits et procede de fabrication
IT29453/74A IT1025714B (it) 1973-11-28 1974-11-14 Diodo zener con tensione di soglia migliorata e con rumori elettrici ridotti eiprocedimento per la sua fabericazion
DE19742456129 DE2456129A1 (de) 1973-11-28 1974-11-27 Zener-diode und verfahren zu ihrer herstellung
GB51683/74A GB1494905A (en) 1973-11-28 1974-11-28 Zener diodes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7342381A FR2252652B1 (enExample) 1973-11-28 1973-11-28

Publications (2)

Publication Number Publication Date
FR2252652A1 true FR2252652A1 (enExample) 1975-06-20
FR2252652B1 FR2252652B1 (enExample) 1977-06-10

Family

ID=9128391

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7342381A Expired FR2252652B1 (enExample) 1973-11-28 1973-11-28

Country Status (5)

Country Link
BE (1) BE821877A (enExample)
DE (1) DE2456129A1 (enExample)
FR (1) FR2252652B1 (enExample)
GB (1) GB1494905A (enExample)
IT (1) IT1025714B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3310044A1 (de) * 1983-03-19 1984-09-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren und anordnung zur beschichtung eines substrates
JP4129106B2 (ja) * 1999-10-27 2008-08-06 三菱電機株式会社 半導体装置

Also Published As

Publication number Publication date
BE821877A (fr) 1975-05-05
IT1025714B (it) 1978-08-30
DE2456129A1 (de) 1975-06-05
GB1494905A (en) 1977-12-14
FR2252652B1 (enExample) 1977-06-10

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Legal Events

Date Code Title Description
ST Notification of lapse