FR2246891A1 - - Google Patents
Info
- Publication number
- FR2246891A1 FR2246891A1 FR7434001A FR7434001A FR2246891A1 FR 2246891 A1 FR2246891 A1 FR 2246891A1 FR 7434001 A FR7434001 A FR 7434001A FR 7434001 A FR7434001 A FR 7434001A FR 2246891 A1 FR2246891 A1 FR 2246891A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11363173A JPS5230848B2 (fr) | 1973-10-09 | 1973-10-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2246891A1 true FR2246891A1 (fr) | 1975-05-02 |
Family
ID=14617113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7434001A Withdrawn FR2246891A1 (fr) | 1973-10-09 | 1974-10-09 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3960560A (fr) |
JP (1) | JPS5230848B2 (fr) |
DE (1) | DE2448171A1 (fr) |
FR (1) | FR2246891A1 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2620961A1 (de) * | 1975-05-12 | 1976-11-25 | Fuji Photo Film Co Ltd | Metallbild-erzeugendes material |
EP0277828A2 (fr) * | 1987-02-04 | 1988-08-10 | CPFilms, Inc. | Composé formant un film mince pour masque |
US5011569A (en) * | 1987-02-04 | 1991-04-30 | Andus Corporation | Thin film artwork compounds |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5177404A (fr) * | 1974-12-26 | 1976-07-05 | Fuji Photo Film Co Ltd | |
JPS51105821A (en) * | 1975-03-14 | 1976-09-20 | Fuji Photo Film Co Ltd | Masukugazono keiseihoho |
US4101440A (en) * | 1975-07-23 | 1978-07-18 | Hitachi, Ltd. | Chemically digestive agents |
JPS6015055B2 (ja) * | 1976-09-06 | 1985-04-17 | 富士写真フイルム株式会社 | マスク画像の形成方法 |
JPS5428136A (en) * | 1977-08-03 | 1979-03-02 | Fuji Photo Film Co Ltd | Manufacture of durable photomask |
USRE31220E (en) * | 1977-11-30 | 1983-04-26 | Ppg Industries, Inc. | Electromigration method for making stained glass photomasks |
US4155735A (en) * | 1977-11-30 | 1979-05-22 | Ppg Industries, Inc. | Electromigration method for making stained glass photomasks |
US4309495A (en) * | 1978-08-02 | 1982-01-05 | Ppg Industries, Inc. | Method for making stained glass photomasks from photographic emulsion |
US4425423A (en) | 1980-07-23 | 1984-01-10 | Wang Chia Gee | Auger microlithography with regard to Auger window |
US4350755A (en) * | 1980-07-23 | 1982-09-21 | Wang Chia Gee | Auger microlithography |
JPS5858546A (ja) * | 1981-10-02 | 1983-04-07 | Kimoto & Co Ltd | 製版用感光性マスク材料 |
JPH0695202B2 (ja) * | 1986-05-07 | 1994-11-24 | コニカ株式会社 | パタ−ン転写方法及び該方法に使用するハロゲン化銀写真乾板 |
US5278008A (en) * | 1990-10-31 | 1994-01-11 | Hughes Aircraft Company | Diffraction efficiency control in holographic elements |
US5955244A (en) * | 1996-08-20 | 1999-09-21 | Quantum Corporation | Method for forming photoresist features having reentrant profiles using a basic agent |
US5932024A (en) * | 1997-07-01 | 1999-08-03 | Moore; Jesse C. | Decoating titanium and other metallized glass surfaces |
US6303262B1 (en) | 1998-06-18 | 2001-10-16 | Mitsubishi Paper Mills Ltd. | Photomask material, photomask and methods for the production thereof |
US6977515B2 (en) * | 2001-09-20 | 2005-12-20 | Wentworth Laboratories, Inc. | Method for forming photo-defined micro electrical contacts |
US6906540B2 (en) * | 2001-09-20 | 2005-06-14 | Wentworth Laboratories, Inc. | Method for chemically etching photo-defined micro electrical contacts |
US7282936B2 (en) | 2003-11-14 | 2007-10-16 | Wentworth Laboratories, Inc. | Die design with integrated assembly aid |
SG187274A1 (en) | 2011-07-14 | 2013-02-28 | 3M Innovative Properties Co | Etching method and devices produced using the etching method |
US11143953B2 (en) | 2019-03-21 | 2021-10-12 | International Business Machines Corporation | Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 |
CN113906161A (zh) * | 2019-06-11 | 2022-01-07 | 三菱瓦斯化学株式会社 | 水性组合物、使用了其的不锈钢表面的粗糙化处理方法、以及经过粗糙化处理的不锈钢及其制造方法 |
ES2938578T3 (es) * | 2021-01-18 | 2023-04-12 | Longserving Tech Co Ltd | Procedimiento de fabricación de un patrón de circuito a escala picoscópica/nanoscópica |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3567446A (en) * | 1967-05-01 | 1971-03-02 | Eastman Kodak Co | Photographic etch-bleach baths |
NL162215C (fr) * | 1967-07-03 | Ibm | ||
US3561963A (en) * | 1967-09-11 | 1971-02-09 | Signetics Corp | Transparent mask and method for making the same |
GB1335964A (en) * | 1970-02-17 | 1973-10-31 | Agfa Gevaert | Spectral sensitization of light-sensitive silver halide emulsions |
US3744904A (en) * | 1970-06-11 | 1973-07-10 | Gaf Corp | Transparent photographic masks |
US3674492A (en) * | 1970-12-09 | 1972-07-04 | Bell Telephone Labor Inc | Laminar photomask |
US3669665A (en) * | 1971-02-18 | 1972-06-13 | Ibm | Process for making resist stencils from photographic stripping films and for using same |
-
1973
- 1973-10-09 JP JP11363173A patent/JPS5230848B2/ja not_active Expired
-
1974
- 1974-10-09 US US05/513,434 patent/US3960560A/en not_active Expired - Lifetime
- 1974-10-09 FR FR7434001A patent/FR2246891A1/fr not_active Withdrawn
- 1974-10-09 DE DE19742448171 patent/DE2448171A1/de active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2620961A1 (de) * | 1975-05-12 | 1976-11-25 | Fuji Photo Film Co Ltd | Metallbild-erzeugendes material |
EP0277828A2 (fr) * | 1987-02-04 | 1988-08-10 | CPFilms, Inc. | Composé formant un film mince pour masque |
EP0277828A3 (en) * | 1987-02-04 | 1988-09-14 | Andus Corporation | Thin film artwork compounds |
US5011569A (en) * | 1987-02-04 | 1991-04-30 | Andus Corporation | Thin film artwork compounds |
Also Published As
Publication number | Publication date |
---|---|
DE2448171A1 (de) | 1975-08-21 |
JPS5065233A (fr) | 1975-06-02 |
US3960560A (en) | 1976-06-01 |
JPS5230848B2 (fr) | 1977-08-11 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |