FR2226480A2 - Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma - Google Patents

Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma

Info

Publication number
FR2226480A2
FR2226480A2 FR7319769A FR7319769A FR2226480A2 FR 2226480 A2 FR2226480 A2 FR 2226480A2 FR 7319769 A FR7319769 A FR 7319769A FR 7319769 A FR7319769 A FR 7319769A FR 2226480 A2 FR2226480 A2 FR 2226480A2
Authority
FR
France
Prior art keywords
plasma
vacuum chamber
cavity
high speed
metal layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7319769A
Other languages
English (en)
French (fr)
Other versions
FR2226480B2 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Nokia Inc
Original Assignee
Alcatel CIT SA
Nokia Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel CIT SA, Nokia Inc filed Critical Alcatel CIT SA
Priority to FR7319769A priority Critical patent/FR2226480A2/fr
Publication of FR2226480A2 publication Critical patent/FR2226480A2/fr
Application granted granted Critical
Publication of FR2226480B2 publication Critical patent/FR2226480B2/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228Gas flow assisted PVD deposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3471Introduction of auxiliary energy into the plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
FR7319769A 1971-04-27 1973-05-30 Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma Granted FR2226480A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7319769A FR2226480A2 (en) 1971-04-27 1973-05-30 Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE102716 1971-04-27
FR7319769A FR2226480A2 (en) 1971-04-27 1973-05-30 Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma

Publications (2)

Publication Number Publication Date
FR2226480A2 true FR2226480A2 (en) 1974-11-15
FR2226480B2 FR2226480B2 (enrdf_load_stackoverflow) 1976-09-17

Family

ID=32231632

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7319769A Granted FR2226480A2 (en) 1971-04-27 1973-05-30 Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma

Country Status (1)

Country Link
FR (1) FR2226480A2 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0158972A3 (en) * 1984-04-12 1987-03-25 Horst Dr. Ehrich Method and apparatus for the vaporisation of a material in a vacuum chamber by an arc discharge
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0158972A3 (en) * 1984-04-12 1987-03-25 Horst Dr. Ehrich Method and apparatus for the vaporisation of a material in a vacuum chamber by an arc discharge
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum

Also Published As

Publication number Publication date
FR2226480B2 (enrdf_load_stackoverflow) 1976-09-17

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