FR2226480A2 - Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma - Google Patents
Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasmaInfo
- Publication number
- FR2226480A2 FR2226480A2 FR7319769A FR7319769A FR2226480A2 FR 2226480 A2 FR2226480 A2 FR 2226480A2 FR 7319769 A FR7319769 A FR 7319769A FR 7319769 A FR7319769 A FR 7319769A FR 2226480 A2 FR2226480 A2 FR 2226480A2
- Authority
- FR
- France
- Prior art keywords
- plasma
- vacuum chamber
- cavity
- high speed
- metal layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7319769A FR2226480A2 (en) | 1971-04-27 | 1973-05-30 | Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE102716 | 1971-04-27 | ||
| FR7319769A FR2226480A2 (en) | 1971-04-27 | 1973-05-30 | Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2226480A2 true FR2226480A2 (en) | 1974-11-15 |
| FR2226480B2 FR2226480B2 (enrdf_load_stackoverflow) | 1976-09-17 |
Family
ID=32231632
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7319769A Granted FR2226480A2 (en) | 1971-04-27 | 1973-05-30 | Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2226480A2 (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0158972A3 (en) * | 1984-04-12 | 1987-03-25 | Horst Dr. Ehrich | Method and apparatus for the vaporisation of a material in a vacuum chamber by an arc discharge |
| US5096558A (en) * | 1984-04-12 | 1992-03-17 | Plasco Dr. Ehrich Plasma - Coating Gmbh | Method and apparatus for evaporating material in vacuum |
-
1973
- 1973-05-30 FR FR7319769A patent/FR2226480A2/fr active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0158972A3 (en) * | 1984-04-12 | 1987-03-25 | Horst Dr. Ehrich | Method and apparatus for the vaporisation of a material in a vacuum chamber by an arc discharge |
| US5096558A (en) * | 1984-04-12 | 1992-03-17 | Plasco Dr. Ehrich Plasma - Coating Gmbh | Method and apparatus for evaporating material in vacuum |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2226480B2 (enrdf_load_stackoverflow) | 1976-09-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4039416A (en) | Gasless ion plating | |
| CA2107242A1 (en) | An Evaporation System for Gas Jet Deposition on Thin Film Materials | |
| US5215638A (en) | Rotating magnetron cathode and method for the use thereof | |
| FR2412619B1 (enrdf_load_stackoverflow) | ||
| ES454329A1 (es) | Perfeccionamientos en aparatos de tratamiento al vacio. | |
| GB1483966A (en) | Vapourized-metal cluster ion source and ionized-cluster beam deposition | |
| IE41938L (en) | Depositing by reactive sputtering | |
| WO2001037310A3 (en) | Method and apparatus for ionized physical vapor deposition | |
| GB1133936A (en) | Method and apparatus for forming tenacious deposits on a surface | |
| GB1356769A (en) | Apparatus and method for depositing thin layers on a substrate | |
| GB1242492A (en) | Improvements relating to the coating of a substrate by r.f. sputtering | |
| GB1132867A (en) | Improvements in or relating to apparatus for depositing thin films | |
| FR2226480A2 (en) | Forming thin e.g. metal layers on mineral substrates - in high speed vacuum chamber from plasma | |
| GB1428340A (en) | Process for the surfacl oxidisation of aluminium | |
| JPS5457477A (en) | Throw away tip of coated tool steel | |
| JPS5435178A (en) | Ultrafine particle depositing apparatus | |
| GB1324292A (en) | Methods and devices for effecting surface deposits | |
| FR2446327A1 (fr) | Procede de traitement thermochimique de la paroi interne de corps ouverts a deux bouts par bombardement ionique, et dispositif pour la mise en oeuvre | |
| GB1201743A (en) | Improvements in or relating to the deposition of a layer of solid material on a substrate by cathode sputtering | |
| JPH03215664A (ja) | 薄膜形成装置 | |
| GB1263582A (en) | Improvements in or relating to thin film deposition | |
| FR2208708A1 (en) | Vacuum deposition of catalyst - from atomic dispersion produced by bombarding target with accelerated ions | |
| ES380347A1 (es) | Metodo para limpiar por lo menos una parte de un articulo ydepositar un recubrimiento. | |
| GB1102175A (en) | Sputtering processes for the production of thin layers | |
| JPS648261A (en) | Formation of thin organic film |