FR2221536A1 - Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers - Google Patents

Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers

Info

Publication number
FR2221536A1
FR2221536A1 FR7230979A FR7230979A FR2221536A1 FR 2221536 A1 FR2221536 A1 FR 2221536A1 FR 7230979 A FR7230979 A FR 7230979A FR 7230979 A FR7230979 A FR 7230979A FR 2221536 A1 FR2221536 A1 FR 2221536A1
Authority
FR
France
Prior art keywords
appts
layers
depositing thin
vacuum depositing
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7230979A
Other languages
English (en)
French (fr)
Other versions
FR2221536B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Nokia Inc
Original Assignee
Alcatel CIT SA
Nokia Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel CIT SA, Nokia Inc filed Critical Alcatel CIT SA
Priority to FR7230979A priority Critical patent/FR2221536A1/fr
Publication of FR2221536A1 publication Critical patent/FR2221536A1/fr
Application granted granted Critical
Publication of FR2221536B1 publication Critical patent/FR2221536B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
FR7230979A 1972-08-31 1972-08-31 Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers Granted FR2221536A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7230979A FR2221536A1 (en) 1972-08-31 1972-08-31 Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7230979A FR2221536A1 (en) 1972-08-31 1972-08-31 Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers

Publications (2)

Publication Number Publication Date
FR2221536A1 true FR2221536A1 (en) 1974-10-11
FR2221536B1 FR2221536B1 (enExample) 1975-06-13

Family

ID=9103750

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7230979A Granted FR2221536A1 (en) 1972-08-31 1972-08-31 Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers

Country Status (1)

Country Link
FR (1) FR2221536A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2421957A1 (fr) * 1978-01-04 1979-11-02 Kovalsky Georgy Dispositif pour l'application a l'aide d'ions-plasma, de revetements sur des articles

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2421957A1 (fr) * 1978-01-04 1979-11-02 Kovalsky Georgy Dispositif pour l'application a l'aide d'ions-plasma, de revetements sur des articles

Also Published As

Publication number Publication date
FR2221536B1 (enExample) 1975-06-13

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Legal Events

Date Code Title Description
ST Notification of lapse