FR2205684A1 - Developer compsn for exposed diazo-sensitised coatings - aqueous solution of water soluble lithium salt of organic acid, and/or an amphoteric surfactant - Google Patents
Developer compsn for exposed diazo-sensitised coatings - aqueous solution of water soluble lithium salt of organic acid, and/or an amphoteric surfactantInfo
- Publication number
- FR2205684A1 FR2205684A1 FR7338972A FR7338972A FR2205684A1 FR 2205684 A1 FR2205684 A1 FR 2205684A1 FR 7338972 A FR7338972 A FR 7338972A FR 7338972 A FR7338972 A FR 7338972A FR 2205684 A1 FR2205684 A1 FR 2205684A1
- Authority
- FR
- France
- Prior art keywords
- lithium salt
- amphoteric surfactant
- compsn
- sensitised
- coatings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002280 amphoteric surfactant Substances 0.000 title abstract 2
- 229910003002 lithium salt Inorganic materials 0.000 title abstract 2
- 159000000002 lithium salts Chemical class 0.000 title abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title abstract 2
- 239000007864 aqueous solution Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 150000007524 organic acids Chemical class 0.000 title 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 abstract 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 abstract 2
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 abstract 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 abstract 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 abstract 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 abstract 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 abstract 1
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 239000003945 anionic surfactant Substances 0.000 abstract 1
- 125000004429 atom Chemical group 0.000 abstract 1
- 229940050390 benzoate Drugs 0.000 abstract 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 abstract 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-N butane-1-sulfonic acid Chemical compound CCCCS(O)(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-N 0.000 abstract 1
- 125000002091 cationic group Chemical group 0.000 abstract 1
- 239000003093 cationic surfactant Substances 0.000 abstract 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-M chloroacetate Chemical compound [O-]C(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-M 0.000 abstract 1
- 229940089960 chloroacetate Drugs 0.000 abstract 1
- 229960001760 dimethyl sulfoxide Drugs 0.000 abstract 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 abstract 1
- 229940044170 formate Drugs 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 239000002736 nonionic surfactant Substances 0.000 abstract 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 abstract 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 abstract 1
- 229940049964 oleate Drugs 0.000 abstract 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 abstract 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical group O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 abstract 1
- 229940075930 picrate Drugs 0.000 abstract 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-M picrate anion Chemical compound [O-]C1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-M 0.000 abstract 1
- WBHHMMIMDMUBKC-QJWNTBNXSA-M ricinoleate Chemical compound CCCCCC[C@@H](O)C\C=C/CCCCCCCC([O-])=O WBHHMMIMDMUBKC-QJWNTBNXSA-M 0.000 abstract 1
- 229940066675 ricinoleate Drugs 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 159000000000 sodium salts Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US303072A US3891438A (en) | 1972-11-02 | 1972-11-02 | Aqueous developing composition for lithographic diazo printing plates |
| US05/302,994 US4147545A (en) | 1972-11-02 | 1972-11-02 | Photolithographic developing composition with organic lithium compound |
| US303071A US3891439A (en) | 1972-11-02 | 1972-11-02 | Aqueous developing composition for lithographic diazo printing plates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2205684A1 true FR2205684A1 (en) | 1974-05-31 |
| FR2205684B1 FR2205684B1 (enExample) | 1976-06-18 |
Family
ID=27404911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7338972A Granted FR2205684A1 (en) | 1972-11-02 | 1973-10-31 | Developer compsn for exposed diazo-sensitised coatings - aqueous solution of water soluble lithium salt of organic acid, and/or an amphoteric surfactant |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5034442B2 (enExample) |
| AU (1) | AU462966B2 (enExample) |
| DE (1) | DE2353992C2 (enExample) |
| FR (1) | FR2205684A1 (enExample) |
| IT (1) | IT997722B (enExample) |
| NL (1) | NL173564C (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5146205A (en) * | 1974-10-17 | 1976-04-20 | Unitika Ltd | Kankosono genzohoho |
| DE3100259A1 (de) * | 1981-01-08 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten |
| US4980271A (en) * | 1985-08-05 | 1990-12-25 | Hoechst Celanese Corporation | Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate |
| JPH0820738B2 (ja) * | 1986-11-21 | 1996-03-04 | オーシージー マイクロエレクトロニック マテリアルズ インコーポレイテッド | ポジ型フオトレジスト組成物の改良現像方法および現像液 |
| JPS63170646A (ja) * | 1987-01-08 | 1988-07-14 | Konica Corp | 現像性等が改良される感光性平版印刷版から印刷版の作製方法 |
| JPS63271256A (ja) * | 1987-04-28 | 1988-11-09 | Konica Corp | 感光材料の現像液組成物 |
| JP2591643B2 (ja) * | 1988-03-03 | 1997-03-19 | コニカ株式会社 | ０−キノンジアジド化合物を含有する感光材料の現像液 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL267572A (enExample) * | 1960-07-29 | |||
| US3669660A (en) * | 1970-05-21 | 1972-06-13 | Polychrome Corp | Lithographic plate developing composition and process of use thereof |
-
1973
- 1973-10-27 DE DE19732353992 patent/DE2353992C2/de not_active Expired
- 1973-10-31 AU AU62032/73A patent/AU462966B2/en not_active Expired
- 1973-10-31 IT IT5346773A patent/IT997722B/it active
- 1973-10-31 FR FR7338972A patent/FR2205684A1/fr active Granted
- 1973-11-02 JP JP12298973A patent/JPS5034442B2/ja not_active Expired
- 1973-11-02 NL NL7315060A patent/NL173564C/xx not_active IP Right Cessation
Non-Patent Citations (1)
| Title |
|---|
| NEANT * |
Also Published As
| Publication number | Publication date |
|---|---|
| NL173564B (nl) | 1983-09-01 |
| JPS5034442B2 (enExample) | 1975-11-08 |
| JPS4994402A (enExample) | 1974-09-07 |
| AU462966B2 (en) | 1975-07-10 |
| NL7315060A (enExample) | 1974-05-06 |
| FR2205684B1 (enExample) | 1976-06-18 |
| DE2353992C2 (de) | 1982-12-02 |
| IT997722B (it) | 1975-12-30 |
| AU6203273A (en) | 1975-05-01 |
| DE2353992A1 (de) | 1974-05-16 |
| NL173564C (nl) | 1984-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |