IT997722B - Composizione e procedimento per lo sviluppo di lastre fotosensibili diazotipiche - Google Patents

Composizione e procedimento per lo sviluppo di lastre fotosensibili diazotipiche

Info

Publication number
IT997722B
IT997722B IT5346773A IT5346773A IT997722B IT 997722 B IT997722 B IT 997722B IT 5346773 A IT5346773 A IT 5346773A IT 5346773 A IT5346773 A IT 5346773A IT 997722 B IT997722 B IT 997722B
Authority
IT
Italy
Prior art keywords
procedure
development
composition
photosensitive plates
diazotype
Prior art date
Application number
IT5346773A
Other languages
English (en)
Italian (it)
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US303072A external-priority patent/US3891438A/en
Priority claimed from US05/302,994 external-priority patent/US4147545A/en
Priority claimed from US303071A external-priority patent/US3891439A/en
Application filed by Polychrome Corp filed Critical Polychrome Corp
Application granted granted Critical
Publication of IT997722B publication Critical patent/IT997722B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
IT5346773A 1972-11-02 1973-10-31 Composizione e procedimento per lo sviluppo di lastre fotosensibili diazotipiche IT997722B (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US303072A US3891438A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates
US05/302,994 US4147545A (en) 1972-11-02 1972-11-02 Photolithographic developing composition with organic lithium compound
US303071A US3891439A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates

Publications (1)

Publication Number Publication Date
IT997722B true IT997722B (it) 1975-12-30

Family

ID=27404911

Family Applications (1)

Application Number Title Priority Date Filing Date
IT5346773A IT997722B (it) 1972-11-02 1973-10-31 Composizione e procedimento per lo sviluppo di lastre fotosensibili diazotipiche

Country Status (6)

Country Link
JP (1) JPS5034442B2 (enExample)
AU (1) AU462966B2 (enExample)
DE (1) DE2353992C2 (enExample)
FR (1) FR2205684A1 (enExample)
IT (1) IT997722B (enExample)
NL (1) NL173564C (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5146205A (en) * 1974-10-17 1976-04-20 Unitika Ltd Kankosono genzohoho
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
JPH0820738B2 (ja) * 1986-11-21 1996-03-04 オーシージー マイクロエレクトロニック マテリアルズ インコーポレイテッド ポジ型フオトレジスト組成物の改良現像方法および現像液
JPS63170646A (ja) * 1987-01-08 1988-07-14 Konica Corp 現像性等が改良される感光性平版印刷版から印刷版の作製方法
JPS63271256A (ja) * 1987-04-28 1988-11-09 Konica Corp 感光材料の現像液組成物
JP2591643B2 (ja) * 1988-03-03 1997-03-19 コニカ株式会社 ０−キノンジアジド化合物を含有する感光材料の現像液

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL267572A (enExample) * 1960-07-29
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof

Also Published As

Publication number Publication date
FR2205684A1 (en) 1974-05-31
NL173564B (nl) 1983-09-01
JPS5034442B2 (enExample) 1975-11-08
JPS4994402A (enExample) 1974-09-07
AU462966B2 (en) 1975-07-10
NL7315060A (enExample) 1974-05-06
FR2205684B1 (enExample) 1976-06-18
DE2353992C2 (de) 1982-12-02
AU6203273A (en) 1975-05-01
DE2353992A1 (de) 1974-05-16
NL173564C (nl) 1984-02-01

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