FR2176999A1 - - Google Patents
Info
- Publication number
- FR2176999A1 FR2176999A1 FR7310134A FR7310134A FR2176999A1 FR 2176999 A1 FR2176999 A1 FR 2176999A1 FR 7310134 A FR7310134 A FR 7310134A FR 7310134 A FR7310134 A FR 7310134A FR 2176999 A1 FR2176999 A1 FR 2176999A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30612—Etching of AIIIBV compounds
- H01L21/30621—Vapour phase etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02395—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02455—Group 13/15 materials
- H01L21/02463—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02576—N-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00237060A US3808072A (en) | 1972-03-22 | 1972-03-22 | In situ etching of gallium arsenide during vapor phase growth of epitaxial gallium arsenide |
US24931172A | 1972-05-01 | 1972-05-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2176999A1 true FR2176999A1 (de) | 1973-11-02 |
FR2176999B1 FR2176999B1 (de) | 1978-03-03 |
Family
ID=26930348
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7310133A Expired FR2176998B1 (de) | 1972-03-22 | 1973-03-21 | |
FR7310134A Expired FR2176999B1 (de) | 1972-03-22 | 1973-03-21 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7310133A Expired FR2176998B1 (de) | 1972-03-22 | 1973-03-21 |
Country Status (6)
Country | Link |
---|---|
JP (2) | JPS5232831B2 (de) |
FR (2) | FR2176998B1 (de) |
GB (2) | GB1425101A (de) |
IT (2) | IT979892B (de) |
NL (2) | NL160989C (de) |
SE (2) | SE375557B (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5244582A (en) * | 1975-10-06 | 1977-04-07 | New Japan Radio Co Ltd | Semiconductor device and process for production of the same |
JPS55114620A (en) * | 1979-02-22 | 1980-09-04 | Yoshio Kaneda | Driver's cab on tractor or the like |
JPS56169331A (en) * | 1980-05-30 | 1981-12-26 | Nec Corp | Vapor phase etching method for compound semiconductor |
JPS5770810A (en) * | 1980-10-17 | 1982-05-01 | Lion Corp | Cosmetic for hair |
JPS60222410A (ja) * | 1984-04-20 | 1985-11-07 | Asahi Denka Kogyo Kk | シヤンプ−組成物 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4916231A (de) * | 1972-06-06 | 1974-02-13 |
-
1973
- 1973-03-09 SE SE7303347A patent/SE375557B/xx unknown
- 1973-03-09 SE SE7303348A patent/SE388972B/xx unknown
- 1973-03-16 IT IT4887073A patent/IT979892B/it active
- 1973-03-16 IT IT4886973A patent/IT982897B/it active
- 1973-03-21 FR FR7310133A patent/FR2176998B1/fr not_active Expired
- 1973-03-21 FR FR7310134A patent/FR2176999B1/fr not_active Expired
- 1973-03-21 NL NL7303958A patent/NL160989C/xx not_active IP Right Cessation
- 1973-03-21 NL NL7303954A patent/NL162313C/xx not_active IP Right Cessation
- 1973-03-22 GB GB1383973A patent/GB1425101A/en not_active Expired
- 1973-03-22 JP JP3193373A patent/JPS5232831B2/ja not_active Expired
- 1973-03-22 GB GB1384073A patent/GB1425102A/en not_active Expired
- 1973-05-10 JP JP5125473A patent/JPS5433711B2/ja not_active Expired
Non-Patent Citations (11)
Title |
---|
10 N 8, JANVIER 1968 'VAPOR ETCHING OF GALLIUM ARSENIDE' A.E.BLAKESLEE ET AL, PAGE 1326 * |
LE 3-7 OCTOBRE 1971 * |
MILLIMETER WAVE GEAR', PAGES 8E-9E * |
PAGES 541-544. * |
R.D.FAIRMAN ET AL, COMMUNICATION N 193RNP PRESENTEE AU 'MEETING OF THE ELECTROCHEMICAL SOCIETY' * |
REVUE AMERICAINE 'ELECTRONICS', VOLUME 45, N 2, JANVIER 1972 'PLANAR SCHOTTKY DIODES FOR QUASI * |
REVUE AMERICAINE 'IBM TECHNICAL DISCLOSURE BULLETIN', VOL. * |
REVUE AMERICAINE 'JOURNAL OF THE ELECTROCHEMICAL SOCIETY' * |
REVUE AMERICAINE 'PROCEEDINGS OF THE IEEE', VOLUME 59, N 7, JUILLET 1971 'GAAS SCHOTTKY DIODES * |
VOLUME 120, N 4, AVRIL 1973 'SUBMICRON EPITAXIAL FILMS FOR GA AS FIELD EFFECT TRANSISTORS', * |
WITH NEAR-IDEAL CHARACTERISTICS', D.J.COLEMAN, JR ET AL, PAGES 1121-1122) * |
Also Published As
Publication number | Publication date |
---|---|
NL160989C (nl) | 1979-12-17 |
NL7303958A (de) | 1973-09-25 |
FR2176998B1 (de) | 1976-11-05 |
JPS5433711B2 (de) | 1979-10-22 |
FR2176998A1 (de) | 1973-11-02 |
FR2176999B1 (de) | 1978-03-03 |
DE2313768A1 (de) | 1973-10-04 |
IT982897B (it) | 1974-10-21 |
SE375557B (de) | 1975-04-21 |
JPS5019367A (de) | 1975-02-28 |
DE2313768B2 (de) | 1975-11-20 |
JPS5232831B2 (de) | 1977-08-24 |
NL7303954A (de) | 1973-09-25 |
NL162313B (nl) | 1979-12-17 |
JPS4948281A (de) | 1974-05-10 |
GB1425101A (en) | 1976-02-18 |
NL160989B (nl) | 1979-07-16 |
SE388972B (sv) | 1976-10-18 |
IT979892B (it) | 1974-09-30 |
GB1425102A (en) | 1976-02-18 |
NL162313C (nl) | 1980-05-16 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |