GB1425101A - Schottky barrier diode devices and methods of fabricating the same - Google Patents

Schottky barrier diode devices and methods of fabricating the same

Info

Publication number
GB1425101A
GB1425101A GB1383973A GB1383973A GB1425101A GB 1425101 A GB1425101 A GB 1425101A GB 1383973 A GB1383973 A GB 1383973A GB 1383973 A GB1383973 A GB 1383973A GB 1425101 A GB1425101 A GB 1425101A
Authority
GB
United Kingdom
Prior art keywords
schottky barrier
gaas
substrate
fabricating
methods
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1383973A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00237060A external-priority patent/US3808072A/en
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1425101A publication Critical patent/GB1425101A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30612—Etching of AIIIBV compounds
    • H01L21/30621—Vapour phase etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02387—Group 13/15 materials
    • H01L21/02395—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02455—Group 13/15 materials
    • H01L21/02463—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/02546—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H01L21/02576—N-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)

Abstract

1425101 Semiconductor devices WESTERN ELECTRIC CO Inc 22 March 1973 [22 March 1972 and 1 May 1972] 13839/73 Heading H1K A GaAs substrate 25 doped with O or Cr and a source of Ga 24 are inserted in quartz reaction chamber 23 (Fig. 1) contained in the muffle 22 of an oven 21 and heated. Hydrogen from source 15 is pumped through Pd-Ag membranes 17 and bubbles through AsCl 3 reservoir 12; the resultant gas admixed with dopant from inlet 18 e.g. S,Se passing to the reaction chamber 23. Epitaxial GaAs layer 31 (Fig. 4) is deposited on the substrate, and is then etched by adding He to the carrier gas in excess of its H 2 content. Then the He flow is terminated and a further GaAs epitaxial film 32 is deposited on 31 without interfacial layers. Growth is terminated by removal of the coated substrate, and an ohmic contact 33 of Au, Sn is applied to the lower epitaxial layer 31 and a Schottky barrier contact 34 of Ti, Pt, Au to the upper layer 32 (Fig. 5). Specification 1,425,102 is referred to.
GB1383973A 1972-03-22 1973-03-22 Schottky barrier diode devices and methods of fabricating the same Expired GB1425101A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US00237060A US3808072A (en) 1972-03-22 1972-03-22 In situ etching of gallium arsenide during vapor phase growth of epitaxial gallium arsenide
US24931172A 1972-05-01 1972-05-01

Publications (1)

Publication Number Publication Date
GB1425101A true GB1425101A (en) 1976-02-18

Family

ID=26930348

Family Applications (2)

Application Number Title Priority Date Filing Date
GB1383973A Expired GB1425101A (en) 1972-03-22 1973-03-22 Schottky barrier diode devices and methods of fabricating the same
GB1384073A Expired GB1425102A (en) 1972-03-22 1973-03-22 Methods of etching gallium arsenide substrates and epitaxially depositing gallium arsenide thereon

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB1384073A Expired GB1425102A (en) 1972-03-22 1973-03-22 Methods of etching gallium arsenide substrates and epitaxially depositing gallium arsenide thereon

Country Status (6)

Country Link
JP (2) JPS5232831B2 (en)
FR (2) FR2176998B1 (en)
GB (2) GB1425101A (en)
IT (2) IT982897B (en)
NL (2) NL160989C (en)
SE (2) SE375557B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244582A (en) * 1975-10-06 1977-04-07 New Japan Radio Co Ltd Semiconductor device and process for production of the same
JPS55114620A (en) * 1979-02-22 1980-09-04 Yoshio Kaneda Driver's cab on tractor or the like
JPS56169331A (en) * 1980-05-30 1981-12-26 Nec Corp Vapor phase etching method for compound semiconductor
JPS5770810A (en) * 1980-10-17 1982-05-01 Lion Corp Cosmetic for hair
JPS60222410A (en) * 1984-04-20 1985-11-07 Asahi Denka Kogyo Kk Shampoo composition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4916231A (en) * 1972-06-06 1974-02-13

Also Published As

Publication number Publication date
JPS5019367A (en) 1975-02-28
NL160989C (en) 1979-12-17
FR2176999A1 (en) 1973-11-02
NL7303954A (en) 1973-09-25
IT982897B (en) 1974-10-21
NL160989B (en) 1979-07-16
DE2313768B2 (en) 1975-11-20
FR2176999B1 (en) 1978-03-03
JPS5433711B2 (en) 1979-10-22
DE2313768A1 (en) 1973-10-04
JPS5232831B2 (en) 1977-08-24
SE375557B (en) 1975-04-21
NL7303958A (en) 1973-09-25
IT979892B (en) 1974-09-30
FR2176998A1 (en) 1973-11-02
GB1425102A (en) 1976-02-18
NL162313B (en) 1979-12-17
NL162313C (en) 1980-05-16
SE388972B (en) 1976-10-18
FR2176998B1 (en) 1976-11-05
JPS4948281A (en) 1974-05-10

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee