FR2173949A1 - - Google Patents

Info

Publication number
FR2173949A1
FR2173949A1 FR7301693A FR7301693A FR2173949A1 FR 2173949 A1 FR2173949 A1 FR 2173949A1 FR 7301693 A FR7301693 A FR 7301693A FR 7301693 A FR7301693 A FR 7301693A FR 2173949 A1 FR2173949 A1 FR 2173949A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7301693A
Other versions
FR2173949B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB235072A external-priority patent/GB1414481A/en
Priority claimed from GB2076072A external-priority patent/GB1427733A/en
Priority claimed from GB2075972A external-priority patent/GB1418666A/en
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2173949A1 publication Critical patent/FR2173949A1/fr
Application granted granted Critical
Publication of FR2173949B1 publication Critical patent/FR2173949B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Silicon Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Surface Treatment Of Glass (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
FR7301693A 1972-01-18 1973-01-18 Expired FR2173949B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB235072A GB1414481A (en) 1972-01-18 1972-01-18 Methods of producing phosphosilicate glass patterns
GB2076072A GB1427733A (en) 1972-05-04 1972-05-04 Apertured phosphosilicate glass coatings
GB2075972A GB1418666A (en) 1972-05-04 1972-05-04 Methods of producing phosphosilicate glass patterns

Publications (2)

Publication Number Publication Date
FR2173949A1 true FR2173949A1 (fr) 1973-10-12
FR2173949B1 FR2173949B1 (fr) 1976-05-14

Family

ID=27254064

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7301693A Expired FR2173949B1 (fr) 1972-01-18 1973-01-18

Country Status (5)

Country Link
US (1) US3877980A (fr)
JP (1) JPS5718340B2 (fr)
DE (1) DE2302148C2 (fr)
FR (1) FR2173949B1 (fr)
IT (1) IT977622B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4041190A (en) * 1971-06-29 1977-08-09 Thomson-Csf Method for producing a silica mask on a semiconductor substrate
GB1451623A (en) * 1973-10-01 1976-10-06 Mullard Ltd Method of prov8ding a patterned layer of silicon-containing oxide on a substrate
US4237208A (en) * 1979-02-15 1980-12-02 Rca Corporation Silane electron beam resists
DE2943153A1 (de) * 1979-10-25 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von halbleiterbauelementen mit einer aus phosphorhaltigem siliziumdioxid bestehenden passivierungsschicht
JPS60100435A (ja) * 1983-11-05 1985-06-04 Mitsubishi Electric Corp 半導体基板の塗布液状絶縁物質の選択硬化方法
JP2639526B2 (ja) * 1987-05-07 1997-08-13 東京応化工業株式会社 シリカ系被膜の形成方法
JP2752968B2 (ja) * 1987-05-07 1998-05-18 東京応化工業株式会社 シリカ系被膜の形成法
DE3833931A1 (de) * 1988-10-05 1990-04-12 Texas Instruments Deutschland Verfahren zum herstellen einer dotierten isolierschicht
US5198298A (en) * 1989-10-24 1993-03-30 Advanced Micro Devices, Inc. Etch stop layer using polymers
US6652922B1 (en) * 1995-06-15 2003-11-25 Alliedsignal Inc. Electron-beam processed films for microelectronics structures
US5609925A (en) * 1995-12-04 1997-03-11 Dow Corning Corporation Curing hydrogen silsesquioxane resin with an electron beam
KR19990030660A (ko) * 1997-10-02 1999-05-06 윤종용 전자빔을 이용한 반도체장치의 층간 절연막 형성방법
JP5846335B1 (ja) * 2014-03-26 2016-01-20 東レ株式会社 半導体装置の製造方法及び半導体装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2123652A5 (fr) * 1970-02-19 1972-09-15 Ibm

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3055776A (en) * 1960-12-12 1962-09-25 Pacific Semiconductors Inc Masking technique
US3760242A (en) * 1972-03-06 1973-09-18 Ibm Coated semiconductor structures and methods of forming protective coverings on such structures

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2123652A5 (fr) * 1970-02-19 1972-09-15 Ibm

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
NOVEMBRE 1971, 'PAINT-ON DIFFUSION SOURCE FOR SEMICONDUCTORS', M. BERKENBLITT ET AL, PAGE 1715) *
PATTERNS ', K.D. BEYER ET AL, PAGES 1705, *
REVUE US IBM TECHNICAL DISCLOSURE BULLETIN, VOL. 14, *
REVUE US IBM TECHNICAL DISCLOSURE BULLETIN, VOL. 14, NOVEMBRE 1971, 'FORMING DELINEATED OXIDE *

Also Published As

Publication number Publication date
JPS4883110A (fr) 1973-11-06
DE2302148A1 (de) 1973-07-19
DE2302148C2 (de) 1983-02-10
US3877980A (en) 1975-04-15
JPS5718340B2 (fr) 1982-04-16
IT977622B (it) 1974-09-20
FR2173949B1 (fr) 1976-05-14

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Legal Events

Date Code Title Description
ST Notification of lapse