FR2075943A1 - Electrolytic polishing of metal articles - Google Patents
Electrolytic polishing of metal articlesInfo
- Publication number
- FR2075943A1 FR2075943A1 FR7100156A FR7100156A FR2075943A1 FR 2075943 A1 FR2075943 A1 FR 2075943A1 FR 7100156 A FR7100156 A FR 7100156A FR 7100156 A FR7100156 A FR 7100156A FR 2075943 A1 FR2075943 A1 FR 2075943A1
- Authority
- FR
- France
- Prior art keywords
- pref
- h3po4
- electrolyte
- aqs
- partic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title abstract 3
- 239000002184 metal Substances 0.000 title abstract 3
- 238000005498 polishing Methods 0.000 title abstract 3
- 239000003792 electrolyte Substances 0.000 abstract 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 abstract 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 235000011007 phosphoric acid Nutrition 0.000 abstract 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 abstract 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 2
- 229910017604 nitric acid Inorganic materials 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 230000003628 erosive effect Effects 0.000 abstract 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 abstract 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 abstract 1
- 239000010935 stainless steel Substances 0.000 abstract 1
- 229910001220 stainless steel Inorganic materials 0.000 abstract 1
- 235000011149 sulphuric acid Nutrition 0.000 abstract 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 abstract 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 abstract 1
- 235000019801 trisodium phosphate Nutrition 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL33668A IL33668A0 (en) | 1970-01-06 | 1970-01-06 | Polishing of metals |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2075943A1 true FR2075943A1 (en) | 1971-10-15 |
FR2075943B1 FR2075943B1 (enrdf_load_stackoverflow) | 1974-05-31 |
Family
ID=11045226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7100156A Granted FR2075943A1 (en) | 1970-01-06 | 1971-01-05 | Electrolytic polishing of metal articles |
Country Status (6)
Country | Link |
---|---|
AT (1) | AT300491B (enrdf_load_stackoverflow) |
BE (1) | BE761177A (enrdf_load_stackoverflow) |
CH (1) | CH534028A (enrdf_load_stackoverflow) |
DE (1) | DE2100178A1 (enrdf_load_stackoverflow) |
FR (1) | FR2075943A1 (enrdf_load_stackoverflow) |
IL (1) | IL33668A0 (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0046913B1 (de) * | 1980-08-29 | 1984-12-05 | Siemens Aktiengesellschaft | Verfahren zum chemischen Polieren von Niob-Teilen, insbesondere eines Hohlraumresonators |
DE3210315A1 (de) * | 1982-03-20 | 1983-09-22 | Fried. Krupp Gmbh, 4300 Essen | Verfahren und vorrichtung zur elektrolytischen glaenzbehandlung von legierungen |
-
1970
- 1970-01-06 IL IL33668A patent/IL33668A0/xx unknown
- 1970-12-29 AT AT1170270A patent/AT300491B/de not_active IP Right Cessation
- 1970-12-30 CH CH1933270A patent/CH534028A/de not_active IP Right Cessation
-
1971
- 1971-01-04 BE BE761177A patent/BE761177A/xx unknown
- 1971-01-04 DE DE19712100178 patent/DE2100178A1/de active Pending
- 1971-01-05 FR FR7100156A patent/FR2075943A1/fr active Granted
Non-Patent Citations (1)
Title |
---|
NEANT * |
Also Published As
Publication number | Publication date |
---|---|
AT300491B (de) | 1972-07-25 |
CH534028A (de) | 1973-02-28 |
DE2100178A1 (de) | 1971-07-15 |
BE761177A (fr) | 1971-06-16 |
FR2075943B1 (enrdf_load_stackoverflow) | 1974-05-31 |
IL33668A0 (en) | 1970-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |