FR2074487A5 - - Google Patents
Info
- Publication number
- FR2074487A5 FR2074487A5 FR7047382A FR7047382A FR2074487A5 FR 2074487 A5 FR2074487 A5 FR 2074487A5 FR 7047382 A FR7047382 A FR 7047382A FR 7047382 A FR7047382 A FR 7047382A FR 2074487 A5 FR2074487 A5 FR 2074487A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/113—Binder containing with plasticizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US88974269A | 1969-12-31 | 1969-12-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2074487A5 true FR2074487A5 (fr) | 1971-10-01 |
Family
ID=25395712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7047382A Expired FR2074487A5 (fr) | 1969-12-31 | 1970-12-30 |
Country Status (9)
Country | Link |
---|---|
US (1) | US3622334A (fr) |
JP (1) | JPS509177B1 (fr) |
BE (1) | BE761035A (fr) |
CA (2) | CA941666A (fr) |
DE (1) | DE2063571C3 (fr) |
FR (1) | FR2074487A5 (fr) |
GB (1) | GB1311130A (fr) |
NL (1) | NL166552C (fr) |
SE (1) | SE369630B (fr) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2468933A1 (fr) * | 1979-11-05 | 1981-05-08 | Hercules Inc | Compositions photopolymerisables pour photoresists et leurs applications |
FR2501388A1 (fr) * | 1981-03-04 | 1982-09-10 | Hitachi Chemical Co Ltd | Composition de resine photosensible et element photosensible utilisant ladite resine |
EP0089041A1 (fr) * | 1982-03-16 | 1983-09-21 | E.I. Du Pont De Nemours And Company | Utilisation d'un élément photopolymérisable travaillant en négatif comme masque pour soudage |
EP0131824A2 (fr) * | 1983-07-01 | 1985-01-23 | Fuji Photo Film Co., Ltd. | Composition photopolymérisable |
EP0669793A2 (fr) * | 1994-02-25 | 1995-08-30 | Hitachi, Ltd. | Procédé de fabrication d'un panneau à circuit imprimé |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228370B2 (fr) * | 1972-03-06 | 1977-07-26 | ||
JPS5522481B2 (fr) * | 1972-12-27 | 1980-06-17 | ||
US3981856A (en) * | 1974-03-07 | 1976-09-21 | Princeton Polymer Laboratories, Incorporated | Degradable hydrocarbon polymers containing a metal compound and a benzotriazole |
US3970535A (en) * | 1974-06-12 | 1976-07-20 | Scm Corporation | Photopolymerization process utilizing a 2-methyl-substituted benzimidazole as a photosensitizer |
US3962055A (en) * | 1974-11-21 | 1976-06-08 | Eastman Kodak Company | Photosensitive compositions containing benzothiazole sensitizers |
US3912606A (en) * | 1974-11-21 | 1975-10-14 | Eastman Kodak Co | Photosensitive compositions containing benzoxazole sensitizers |
US3962056A (en) * | 1974-11-21 | 1976-06-08 | Eastman Kodak Company | Photosensitive compositions containing benzimidazole sensitizers |
US4045231A (en) * | 1975-03-15 | 1977-08-30 | Tokyo Ohka Kogyo Kabushiki Kaisha | Photosensitive resin composition for flexographic printing plates |
US4040922A (en) * | 1975-10-06 | 1977-08-09 | Eastman Kodak Company | Photopolymerizable polymeric compositions containing halogen containing heterocyclic compound |
DK151680A (da) * | 1979-04-10 | 1980-10-11 | Akzo Nv | Uv-haerdbart overtraeksmateriale |
JPS5651735A (en) * | 1979-10-03 | 1981-05-09 | Asahi Chem Ind Co Ltd | Photoreactive composition |
US4539286A (en) * | 1983-06-06 | 1985-09-03 | Dynachem Corporation | Flexible, fast processing, photopolymerizable composition |
JPS61166541A (ja) * | 1985-01-19 | 1986-07-28 | Fuotopori Ouka Kk | 光重合性組成物 |
US4629679A (en) * | 1985-02-12 | 1986-12-16 | Mitsubishi Rayon Company Ltd. | Tetrazole compound-containing photopolymerizable resin composition |
CA1282272C (fr) * | 1985-06-07 | 1991-04-02 | Shigeru Danjo | Composition photodurcissable |
JPH0689293B2 (ja) * | 1986-05-27 | 1994-11-09 | 日本油脂株式会社 | 紫外線硬化型塗料 |
US5015555A (en) * | 1986-05-28 | 1991-05-14 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition containing heterocyclic triazole |
US4680249A (en) * | 1986-05-28 | 1987-07-14 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition containing carboxy benzotriazole |
JPH0783168B2 (ja) * | 1988-04-13 | 1995-09-06 | 株式会社日立製作所 | プリント板の製造方法 |
US4976817A (en) * | 1988-12-09 | 1990-12-11 | Morton International, Inc. | Wet lamination process and apparatus |
DE3926708A1 (de) * | 1989-08-12 | 1991-02-14 | Basf Ag | Photopolymerisierbares schichtuebertragungsmaterial |
JP3024695B2 (ja) * | 1994-06-08 | 2000-03-21 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
JPH08328252A (ja) * | 1995-03-31 | 1996-12-13 | W R Grace & Co | 水性感光性樹脂組成物 |
JPH08328251A (ja) * | 1995-03-31 | 1996-12-13 | W R Grace & Co | 水性感光性樹脂組成物 |
US6297294B1 (en) | 1999-10-07 | 2001-10-02 | E. I. Du Pont De Nemours And Company | Method for improving the adhesion of a photopolymerizable composition to copper |
US20060154180A1 (en) | 2005-01-07 | 2006-07-13 | Kannurpatti Anandkumar R | Imaging element for use as a recording element and process of using the imaging element |
US7579134B2 (en) * | 2005-03-15 | 2009-08-25 | E. I. Dupont De Nemours And Company | Polyimide composite coverlays and methods and compositions relating thereto |
US7618766B2 (en) * | 2005-12-21 | 2009-11-17 | E. I. Du Pont De Nemours And Company | Flame retardant photoimagable coverlay compositions and methods relating thereto |
US7527915B2 (en) * | 2006-07-19 | 2009-05-05 | E. I. Du Pont De Nemours And Company | Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto |
JP5351155B2 (ja) * | 2008-06-09 | 2013-11-27 | 旭化成イーマテリアルズ株式会社 | ポリアミド樹脂、感光性樹脂組成物、硬化レリーフパターンの形成方法及び半導体装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1152368A (en) * | 1965-05-25 | 1969-05-14 | Konishiroku Photo Ind | Reprographic Process |
US3479185A (en) * | 1965-06-03 | 1969-11-18 | Du Pont | Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers |
-
1969
- 1969-12-31 US US889742A patent/US3622334A/en not_active Expired - Lifetime
-
1970
- 1970-12-10 CA CA100,324A patent/CA941666A/en not_active Expired
- 1970-12-23 DE DE2063571A patent/DE2063571C3/de not_active Expired
- 1970-12-28 JP JP45120576A patent/JPS509177B1/ja active Pending
- 1970-12-29 GB GB6163170A patent/GB1311130A/en not_active Expired
- 1970-12-30 BE BE761035A patent/BE761035A/fr not_active IP Right Cessation
- 1970-12-30 FR FR7047382A patent/FR2074487A5/fr not_active Expired
- 1970-12-30 NL NL7019000.A patent/NL166552C/xx not_active IP Right Cessation
- 1970-12-30 SE SE17764/70A patent/SE369630B/xx unknown
-
1974
- 1974-05-17 CA CA200,188A patent/CA955451A/en not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2468933A1 (fr) * | 1979-11-05 | 1981-05-08 | Hercules Inc | Compositions photopolymerisables pour photoresists et leurs applications |
FR2501388A1 (fr) * | 1981-03-04 | 1982-09-10 | Hitachi Chemical Co Ltd | Composition de resine photosensible et element photosensible utilisant ladite resine |
EP0089041A1 (fr) * | 1982-03-16 | 1983-09-21 | E.I. Du Pont De Nemours And Company | Utilisation d'un élément photopolymérisable travaillant en négatif comme masque pour soudage |
EP0131824A2 (fr) * | 1983-07-01 | 1985-01-23 | Fuji Photo Film Co., Ltd. | Composition photopolymérisable |
EP0131824A3 (en) * | 1983-07-01 | 1987-04-29 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
EP0669793A2 (fr) * | 1994-02-25 | 1995-08-30 | Hitachi, Ltd. | Procédé de fabrication d'un panneau à circuit imprimé |
EP0669793A3 (fr) * | 1994-02-25 | 1996-08-14 | Hitachi Ltd | Procédé de fabrication d'un panneau à circuit imprimé. |
US5712080A (en) * | 1994-02-25 | 1998-01-27 | Hitachi, Ltd. | Method for manufacturing printed circuit board |
Also Published As
Publication number | Publication date |
---|---|
US3622334A (en) | 1971-11-23 |
SE369630B (fr) | 1974-09-09 |
NL166552B (nl) | 1981-03-16 |
JPS509177B1 (fr) | 1975-04-10 |
CA955451A (en) | 1974-10-01 |
DE2063571C3 (de) | 1980-09-04 |
CA941666A (en) | 1974-02-12 |
GB1311130A (en) | 1973-03-21 |
NL166552C (nl) | 1981-08-17 |
DE2063571B2 (de) | 1980-01-03 |
BE761035A (fr) | 1971-06-30 |
NL7019000A (fr) | 1971-07-02 |
DE2063571A1 (de) | 1971-07-08 |