FR2027452A1 - - Google Patents

Info

Publication number
FR2027452A1
FR2027452A1 FR6945393A FR6945393A FR2027452A1 FR 2027452 A1 FR2027452 A1 FR 2027452A1 FR 6945393 A FR6945393 A FR 6945393A FR 6945393 A FR6945393 A FR 6945393A FR 2027452 A1 FR2027452 A1 FR 2027452A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR6945393A
Other versions
FR2027452B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2027452A1 publication Critical patent/FR2027452A1/fr
Application granted granted Critical
Publication of FR2027452B1 publication Critical patent/FR2027452B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7831Field effect transistors with field effect produced by an insulated gate with multiple gate structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/942Masking
    • Y10S438/945Special, e.g. metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Bipolar Transistors (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Element Separation (AREA)
FR6945393A 1968-12-31 1969-12-30 Expired FR2027452B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB61953/68A GB1244225A (en) 1968-12-31 1968-12-31 Improvements in and relating to methods of manufacturing semiconductor devices

Publications (2)

Publication Number Publication Date
FR2027452A1 true FR2027452A1 (fr) 1970-09-25
FR2027452B1 FR2027452B1 (fr) 1974-02-01

Family

ID=10487686

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6945393A Expired FR2027452B1 (fr) 1968-12-31 1969-12-30

Country Status (14)

Country Link
US (1) US3650019A (fr)
JP (1) JPS4816034B1 (fr)
AT (1) AT311420B (fr)
BE (1) BE743829A (fr)
BR (1) BR6915650D0 (fr)
CH (1) CH514935A (fr)
DE (1) DE1965799C3 (fr)
DK (1) DK125220B (fr)
ES (1) ES374906A1 (fr)
FR (1) FR2027452B1 (fr)
GB (1) GB1244225A (fr)
NL (1) NL6919463A (fr)
SE (1) SE347392B (fr)
ZA (1) ZA698728B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2067382A1 (fr) * 1969-11-19 1971-08-20 Philips Nv
FR2073494A1 (fr) * 1969-12-24 1971-10-01 Philips Nv
FR2129992A1 (fr) * 1971-03-25 1972-11-03 Lecrosnier Daniel
FR2400259A1 (fr) * 1977-04-15 1979-03-09 Hitachi Ltd Dispositif semi-conducteur a effet de champ du type a grille isolee, montage utilisant ce dispositif et procede de fabrication de ce dernier
FR2406302A1 (fr) * 1977-10-11 1979-05-11 Fujitsu Ltd Procede d'implantation d'ions

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3874937A (en) * 1973-10-31 1975-04-01 Gen Instrument Corp Method for manufacturing metal oxide semiconductor integrated circuit of reduced size
FR2289051A1 (fr) * 1974-10-22 1976-05-21 Ibm Dispositifs a semi-conducteur du genre transistors a effet de champ et a porte isolee et circuits de protection cotre les surtensions
US3912546A (en) * 1974-12-06 1975-10-14 Hughes Aircraft Co Enhancement mode, Schottky-barrier gate gallium arsenide field effect transistor
US3930893A (en) * 1975-03-03 1976-01-06 Honeywell Information Systems, Inc. Conductivity connected charge-coupled device fabrication process
US4061506A (en) * 1975-05-01 1977-12-06 Texas Instruments Incorporated Correcting doping defects
US4011105A (en) * 1975-09-15 1977-03-08 Mos Technology, Inc. Field inversion control for n-channel device integrated circuits
US4142199A (en) * 1977-06-24 1979-02-27 International Business Machines Corporation Bucket brigade device and process
US4171229A (en) * 1977-06-24 1979-10-16 International Business Machines Corporation Improved process to form bucket brigade device
US5191396B1 (en) * 1978-10-13 1995-12-26 Int Rectifier Corp High power mosfet with low on-resistance and high breakdown voltage
JPS5553462A (en) * 1978-10-13 1980-04-18 Int Rectifier Corp Mosfet element
US4280271A (en) * 1979-10-11 1981-07-28 Texas Instruments Incorporated Three level interconnect process for manufacture of integrated circuit devices
JPH0834297B2 (ja) * 1988-12-28 1996-03-29 三菱電機株式会社 半導体装置
AU657930B2 (en) * 1991-01-30 1995-03-30 Canon Kabushiki Kaisha Nozzle structures for bubblejet print devices
US5869371A (en) * 1995-06-07 1999-02-09 Stmicroelectronics, Inc. Structure and process for reducing the on-resistance of mos-gated power devices
JP6356516B2 (ja) * 2014-07-22 2018-07-11 東芝メモリ株式会社 プラズマ処理装置およびプラズマ処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1577669A (fr) * 1967-08-18 1969-08-08

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3328210A (en) * 1964-10-26 1967-06-27 North American Aviation Inc Method of treating semiconductor device by ionic bombardment
NL6604962A (fr) * 1966-04-14 1967-10-16
US3470609A (en) * 1967-08-18 1969-10-07 Conductron Corp Method of producing a control system
US3558366A (en) * 1968-09-17 1971-01-26 Bell Telephone Labor Inc Metal shielding for ion implanted semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1577669A (fr) * 1967-08-18 1969-08-08

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
*REVUE AMERICAINE "ELECTRONICS" VOLUME41, NO. 23, NOVEMBRE 1968: "ION IMPLANT SERENDIPITY" PAGES 55-56 *
REVUE AMERICAINE "SOLID STATE ELECTRONICS" VOLUME 7, NO 6,JUIN 1964, "MOLYTDENUM MASHING OF ION BOMBARDMENT DOPING OF SILICON" I.AMADEI ET AL, PAGE 487. *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2067382A1 (fr) * 1969-11-19 1971-08-20 Philips Nv
FR2067383A1 (fr) * 1969-11-19 1971-08-20 Philips Nv
FR2073494A1 (fr) * 1969-12-24 1971-10-01 Philips Nv
FR2129992A1 (fr) * 1971-03-25 1972-11-03 Lecrosnier Daniel
FR2400259A1 (fr) * 1977-04-15 1979-03-09 Hitachi Ltd Dispositif semi-conducteur a effet de champ du type a grille isolee, montage utilisant ce dispositif et procede de fabrication de ce dernier
US4599576A (en) * 1977-04-15 1986-07-08 Hitachi, Ltd. Insulated gate type field effect semiconductor device and a circuit employing the device
FR2406302A1 (fr) * 1977-10-11 1979-05-11 Fujitsu Ltd Procede d'implantation d'ions

Also Published As

Publication number Publication date
DE1965799A1 (de) 1970-07-23
JPS4816034B1 (fr) 1973-05-18
ZA698728B (en) 1971-07-28
AT311420B (de) 1973-11-12
SE347392B (fr) 1972-07-31
DE1965799C3 (de) 1978-06-01
DE1965799B2 (de) 1977-09-29
BE743829A (fr) 1970-06-29
US3650019A (en) 1972-03-21
BR6915650D0 (pt) 1973-01-02
GB1244225A (en) 1971-08-25
NL6919463A (fr) 1970-07-02
CH514935A (de) 1971-10-31
FR2027452B1 (fr) 1974-02-01
ES374906A1 (es) 1972-03-16
DK125220B (da) 1973-01-15

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Legal Events

Date Code Title Description
ST Notification of lapse