FR2002902A1 - - Google Patents

Info

Publication number
FR2002902A1
FR2002902A1 FR6905207A FR6905207A FR2002902A1 FR 2002902 A1 FR2002902 A1 FR 2002902A1 FR 6905207 A FR6905207 A FR 6905207A FR 6905207 A FR6905207 A FR 6905207A FR 2002902 A1 FR2002902 A1 FR 2002902A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6905207A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Libbey Owens Ford Glass Co
Original Assignee
Libbey Owens Ford Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Glass Co filed Critical Libbey Owens Ford Glass Co
Publication of FR2002902A1 publication Critical patent/FR2002902A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR6905207A 1968-02-29 1969-02-27 Withdrawn FR2002902A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70937668A 1968-02-29 1968-02-29

Publications (1)

Publication Number Publication Date
FR2002902A1 true FR2002902A1 (enrdf_load_stackoverflow) 1969-10-31

Family

ID=24849612

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6905207A Withdrawn FR2002902A1 (enrdf_load_stackoverflow) 1968-02-29 1969-02-27

Country Status (13)

Country Link
US (1) US3524426A (enrdf_load_stackoverflow)
JP (1) JPS494156B1 (enrdf_load_stackoverflow)
AT (1) AT286738B (enrdf_load_stackoverflow)
BE (1) BE729026A (enrdf_load_stackoverflow)
CH (1) CH501064A (enrdf_load_stackoverflow)
DE (1) DE1911198A1 (enrdf_load_stackoverflow)
FR (1) FR2002902A1 (enrdf_load_stackoverflow)
GB (1) GB1250544A (enrdf_load_stackoverflow)
IE (1) IE33433B1 (enrdf_load_stackoverflow)
LU (1) LU58110A1 (enrdf_load_stackoverflow)
NL (1) NL6903181A (enrdf_load_stackoverflow)
NO (1) NO123939B (enrdf_load_stackoverflow)
SE (1) SE347024B (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008807A1 (de) * 1978-09-13 1980-03-19 Elektroschmelzwerk Kempten GmbH Vorrichtung und Verfahren zum diskontinuierlichen oder kontinuierlichen thermischen Bedampfen von Formteilen oder Bandmaterial
FR2466513A1 (fr) * 1979-10-03 1981-04-10 Leybold Heraeus Gmbh & Co Kg Installation de depot de materiaux vaporises sous vide, possedant une chambre a soupape et des chambres de depot et d'evaporation

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3648654A (en) * 1970-03-16 1972-03-14 Bell Telephone Labor Inc Vertical liquid phase crystal growth apparatus
US3641973A (en) * 1970-11-25 1972-02-15 Air Reduction Vacuum coating apparatus
US3915118A (en) * 1973-09-17 1975-10-28 Etec Corp Specimen coating device for an SEM
US3921572A (en) * 1974-02-25 1975-11-25 Ibm Vacuum coating apparatus
JPS5130965A (ja) * 1974-09-09 1976-03-16 Matsushita Electric Ind Co Ltd Atsumakushusekikairo no seizohoho
US4173944A (en) * 1977-05-20 1979-11-13 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Silverplated vapor deposition chamber
US4179530A (en) * 1977-05-20 1979-12-18 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for the deposition of pure semiconductor material
JPS5769797A (en) * 1980-10-17 1982-04-28 Matsushita Electric Ind Co Ltd Method of producing hybrid thick film integrated circuit
JPS57193249U (enrdf_load_stackoverflow) * 1981-06-03 1982-12-07
JPS5851594A (ja) * 1981-09-22 1983-03-26 日本電気株式会社 厚膜混成ｉｃ基板
JPS5885378U (ja) * 1981-12-04 1983-06-09 ソニー株式会社 プリント配線基板
US4478174A (en) * 1983-02-25 1984-10-23 Canadian Patents & Development Limited Vacuum coating vessel with movable shutter plate
JPS61164076U (enrdf_load_stackoverflow) * 1986-03-20 1986-10-11
DE112007002116T5 (de) * 2006-09-11 2009-09-10 ULVAC, Inc., Chigasaki Unterdruck-Dampf-Bearbeitungs-Vorrichtung
KR101066033B1 (ko) * 2009-07-28 2011-09-20 엘아이지에이디피 주식회사 화학기상 증착장치 및 기판 처리장치
CN106947944A (zh) * 2017-05-23 2017-07-14 京东方科技集团股份有限公司 一种蒸镀坩埚、蒸镀源、蒸镀装置及蒸镀方法
EP4111060B1 (en) * 2020-02-28 2025-06-04 Illinois Tool Works Inc. Piston monitoring assembly

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008807A1 (de) * 1978-09-13 1980-03-19 Elektroschmelzwerk Kempten GmbH Vorrichtung und Verfahren zum diskontinuierlichen oder kontinuierlichen thermischen Bedampfen von Formteilen oder Bandmaterial
FR2466513A1 (fr) * 1979-10-03 1981-04-10 Leybold Heraeus Gmbh & Co Kg Installation de depot de materiaux vaporises sous vide, possedant une chambre a soupape et des chambres de depot et d'evaporation

Also Published As

Publication number Publication date
US3524426A (en) 1970-08-18
GB1250544A (enrdf_load_stackoverflow) 1971-10-20
JPS494156B1 (enrdf_load_stackoverflow) 1974-01-30
LU58110A1 (enrdf_load_stackoverflow) 1969-06-03
CH501064A (de) 1970-12-31
AT286738B (de) 1970-12-28
IE33433B1 (en) 1974-06-26
IE33433L (en) 1969-08-29
BE729026A (enrdf_load_stackoverflow) 1969-08-01
NO123939B (enrdf_load_stackoverflow) 1972-02-07
NL6903181A (enrdf_load_stackoverflow) 1969-09-02
SE347024B (enrdf_load_stackoverflow) 1972-07-24
DE1911198A1 (de) 1969-09-18

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Legal Events

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