FR1135760A - Transistor à surface - Google Patents

Transistor à surface

Info

Publication number
FR1135760A
FR1135760A FR1135760DA FR1135760A FR 1135760 A FR1135760 A FR 1135760A FR 1135760D A FR1135760D A FR 1135760DA FR 1135760 A FR1135760 A FR 1135760A
Authority
FR
France
Prior art keywords
surface transistor
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Schuckertwerke AG
Siemens AG
Original Assignee
Siemens Schuckertwerke AG
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Schuckertwerke AG, Siemens AG filed Critical Siemens Schuckertwerke AG
Application granted granted Critical
Publication of FR1135760A publication Critical patent/FR1135760A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/36—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
FR1135760D 1954-12-02 1955-04-06 Transistor à surface Expired FR1135760A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2929006X 1954-12-02
DES0041859 1954-12-08

Publications (1)

Publication Number Publication Date
FR1135760A true FR1135760A (fr) 1957-05-03

Family

ID=32394888

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1135760D Expired FR1135760A (fr) 1954-12-02 1955-04-06 Transistor à surface

Country Status (3)

Country Link
US (2) US2929006A (fr)
DE (1) DE1073111B (fr)
FR (1) FR1135760A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1080696B (de) * 1956-12-10 1960-04-28 Stanislas Teszner Transistor, insbesondere Unipolartransistor, mit einem ebenen Halbleiterkoerper und halbleitenden, zylindrischen Zaehnen auf dessen Oberflaeche und Verfahren zu seiner Herstellung
DE1117222B (de) * 1958-10-23 1961-11-16 Shockley Transistor Corp Verfahren zur Herstellung eines Unipolartransistors
DE1144403B (de) * 1959-05-13 1963-02-28 Ass Elect Ind Leistungstransistor

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3062690A (en) * 1955-08-05 1962-11-06 Hoffman Electronics Corp Semi-conductor device and method of making the same
BE562491A (fr) * 1956-03-05 1900-01-01
US2980830A (en) * 1956-08-22 1961-04-18 Shockley William Junction transistor
US2985550A (en) * 1957-01-04 1961-05-23 Texas Instruments Inc Production of high temperature alloyed semiconductors
US3187241A (en) * 1957-03-27 1965-06-01 Rca Corp Transistor with emitter at bottom of groove extending crosswise the base
US2967985A (en) * 1957-04-11 1961-01-10 Shockley Transistor structure
NL121250C (fr) * 1958-01-16
US2967344A (en) * 1958-02-14 1961-01-10 Rca Corp Semiconductor devices
US2985805A (en) * 1958-03-05 1961-05-23 Rca Corp Semiconductor devices
US3111590A (en) * 1958-06-05 1963-11-19 Clevite Corp Transistor structure controlled by an avalanche barrier
US3083441A (en) * 1959-04-13 1963-04-02 Texas Instruments Inc Method for fabricating transistors
DE1133038B (de) * 1960-05-10 1962-07-12 Siemens Ag Halbleiterbauelement mit einem im wesentlichen einkristallinen Halbleiterkoerper undvier Zonen abwechselnden Leitfaehigkeitstyps
DE1141723B (de) * 1960-06-10 1962-12-27 Siemens Ag Verfahren zur Herstellung einer Halbleiteranordnung mit einem n-leitenden Siliziumkristall, insbesondere eines Flaechentransistors vom pnp-Typ
BE624904A (fr) * 1961-11-17
GB1050417A (fr) * 1963-07-09
US3283223A (en) * 1963-12-27 1966-11-01 Ibm Transistor and method of fabrication to minimize surface recombination effects
US3420719A (en) * 1965-05-27 1969-01-07 Ibm Method of making semiconductors by laser induced diffusion
US3514346A (en) * 1965-08-02 1970-05-26 Gen Electric Semiconductive devices having asymmetrically conductive junction
DE1514562B2 (de) * 1965-09-07 1972-12-07 Semikron Gesellschaft fur Gleich richterbau und Elektronik mbH, 8500 Nurn berg Anordnung zur herstellung eines halbleiter-bauelementes
GB1110654A (en) * 1965-12-24 1968-04-24 Standard Telephones Cables Ltd Semiconductor devices
US3432732A (en) * 1966-03-31 1969-03-11 Tokyo Shibaura Electric Co Semiconductive electromechanical transducers
US3479234A (en) * 1967-05-01 1969-11-18 Gen Electric Method of producing field effect transistors
DE1803883A1 (de) * 1968-10-18 1970-05-27 Siemens Ag Durch mindestens zwei abstimmbare Kapazitaetsdioden gesteuerte elektrische Anordnung
US3571674A (en) * 1969-01-10 1971-03-23 Fairchild Camera Instr Co Fast switching pnp transistor
US3936319A (en) * 1973-10-30 1976-02-03 General Electric Company Solar cell
JPS5176081A (ja) * 1974-12-26 1976-07-01 Sanyo Electric Co Yokogatatoranjisutanoseizohoho
JPS5914899B2 (ja) * 1975-09-09 1984-04-06 三菱電機株式会社 半導体装置及びその製造方法
US4125855A (en) * 1977-03-28 1978-11-14 Bell Telephone Laboratories, Incorporated Integrated semiconductor crosspoint arrangement
DE2926785C2 (de) * 1979-07-03 1985-12-12 HIGRATHERM electric GmbH, 7100 Heilbronn Bipolarer Transistor und Verfahren zu seiner Herstellung
JPS59210668A (ja) * 1983-05-16 1984-11-29 Fujitsu Ltd 半導体装置
JPS60110158A (ja) * 1983-11-21 1985-06-15 Nec Corp 半導体装置
EP0365166B1 (fr) * 1988-10-02 1994-02-23 Canon Kabushiki Kaisha Objet en cristal et procédé pour sa fabrication
US7071784B2 (en) * 2002-11-29 2006-07-04 Linear Technology Corporation High linearity digital variable gain amplifier

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2666814A (en) * 1949-04-27 1954-01-19 Bell Telephone Labor Inc Semiconductor translating device
NL82014C (fr) * 1949-11-30
US2728034A (en) * 1950-09-08 1955-12-20 Rca Corp Semi-conductor devices with opposite conductivity zones
BE506280A (fr) * 1950-10-10
NL179061C (nl) * 1952-06-13 Dow Chemical Co Werkwijze ter bereiding van een schuimmassa uit copolymeren van een aromatisch monovinylideen-monomeer en een ethenisch onverzadigd carbonzuuranhydride, alsmede de hieruit vervaardigde schuimvormige voorwerpen.
US2764642A (en) * 1952-10-31 1956-09-25 Bell Telephone Labor Inc Semiconductor signal translating devices
US2705767A (en) * 1952-11-18 1955-04-05 Gen Electric P-n junction transistor
BE525387A (fr) * 1952-12-29 1900-01-01
BE525386A (fr) * 1952-12-29
NL85504C (fr) * 1953-05-01
US2792539A (en) * 1953-07-07 1957-05-14 Sprague Electric Co Transistor construction
US2820154A (en) * 1954-11-15 1958-01-14 Rca Corp Semiconductor devices

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1080696B (de) * 1956-12-10 1960-04-28 Stanislas Teszner Transistor, insbesondere Unipolartransistor, mit einem ebenen Halbleiterkoerper und halbleitenden, zylindrischen Zaehnen auf dessen Oberflaeche und Verfahren zu seiner Herstellung
DE1117222B (de) * 1958-10-23 1961-11-16 Shockley Transistor Corp Verfahren zur Herstellung eines Unipolartransistors
DE1144403B (de) * 1959-05-13 1963-02-28 Ass Elect Ind Leistungstransistor

Also Published As

Publication number Publication date
US2929006A (en) 1960-03-15
US2837704A (en) 1958-06-03
DE1073111B (de) 1960-01-14

Similar Documents

Publication Publication Date Title
FR1135760A (fr) Transistor à surface
FR1128423A (fr) Transisteur
BE604920Q (fr) Verftoestel
FR1130175A (fr) Semi-conducteur
FR1129770A (fr) Transistor perfectionné
FR1136292A (fr) Multivibrateurs à transistrons
BE760648Q (fr) Benzothiazoleazodiphenyl-amines
CH339292A (fr) Transistor
FR1131775A (fr) Oscillateur à transistron
CH318854A (fr) Stylographe
FR1138908A (fr) Stylographe à réservoir
AT188907B (de) Fußbodenbelag
BE760647Q (fr) Benzothiazoleazopyrazolones
FR1118283A (fr) Amplificateur à transisteur
FR1127863A (fr) Amplificateur à transisteur
FR1152538A (fr) Calculatrice à transistors
FR1098319A (fr) Table à calculer
FR1128811A (fr) Amplificateur à transisteur
FR1128842A (fr) Amplificateur à transisteurs
AT187008B (de) Malschloß
ES39916Y (es) Lápiz-pincel
AT195966B (de) Transistor
FR1144663A (fr) Amplificateur à transistor
FR1102044A (fr) Clé à écrous
FR1121363A (fr) Machine à décatir