FI843594L - Trihalogenmetylgrupper innehaollande karbonylmetylenheterocykler, foerfarande foer deras framstaellning och ljuskaenslig blandning vilken innehaoller dessa foereningar. - Google Patents
Trihalogenmetylgrupper innehaollande karbonylmetylenheterocykler, foerfarande foer deras framstaellning och ljuskaenslig blandning vilken innehaoller dessa foereningar.Info
- Publication number
- FI843594L FI843594L FI843594A FI843594A FI843594L FI 843594 L FI843594 L FI 843594L FI 843594 A FI843594 A FI 843594A FI 843594 A FI843594 A FI 843594A FI 843594 L FI843594 L FI 843594L
- Authority
- FI
- Finland
- Prior art keywords
- trihalogenmetylgrupper
- ljuskaenslig
- carbonylmethylenheterocykler
- blandning
- vilken
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/04—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to the ring carbon atoms
- C07D215/10—Quaternary compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/12—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/12—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
- C07D277/08—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D277/12—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/62—Benzothiazoles
- C07D277/64—Benzothiazoles with only hydrocarbon or substituted hydrocarbon radicals attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/84—Naphthothiazoles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D293/00—Heterocyclic compounds containing rings having nitrogen and selenium or nitrogen and tellurium, with or without oxygen or sulfur atoms, as the ring hetero atoms
- C07D293/10—Heterocyclic compounds containing rings having nitrogen and selenium or nitrogen and tellurium, with or without oxygen or sulfur atoms, as the ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D293/12—Selenazoles; Hydrogenated selenazoles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plural Heterocyclic Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Quinoline Compounds (AREA)
- Thiazole And Isothizaole Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833333450 DE3333450A1 (de) | 1983-09-16 | 1983-09-16 | Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt |
| DE3333450 | 1983-09-16 |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| FI843594A0 FI843594A0 (fi) | 1984-09-13 |
| FI843594L true FI843594L (fi) | 1985-03-17 |
| FI81786B FI81786B (fi) | 1990-08-31 |
| FI81786C FI81786C (fi) | 1990-12-10 |
Family
ID=6209233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI843594A FI81786C (fi) | 1983-09-16 | 1984-09-13 | Trihalogenmetylgrupper innehaollande karbonylmetylenheterocykler, foerfarande foer deras framstaellning och ljuskaenslig blandning vilken innehaoller dessa foereningar. |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4966828A (fi) |
| EP (1) | EP0135863A3 (fi) |
| JP (1) | JPS6089473A (fi) |
| KR (1) | KR910007214B1 (fi) |
| AU (1) | AU3306784A (fi) |
| CS (1) | CS253715B2 (fi) |
| DE (1) | DE3333450A1 (fi) |
| ES (1) | ES8602715A1 (fi) |
| FI (1) | FI81786C (fi) |
| HU (1) | HU193590B (fi) |
| IL (1) | IL72945A (fi) |
| ZA (1) | ZA847165B (fi) |
Families Citing this family (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8321813D0 (en) * | 1983-08-12 | 1983-09-14 | Vickers Plc | Radiation sensitive compounds |
| DE3613632A1 (de) * | 1986-04-23 | 1987-10-29 | Hoechst Ag | Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial |
| DE3717933A1 (de) * | 1987-05-27 | 1988-12-08 | Hoechst Ag | Photopolymerisierbares gemisch, dieses enthaltendes aufzeichnungsmaterial und verfahren zur herstellung von hochwaermebestaendigen reliefstrukturen |
| DE3743454A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE3743455A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE3807381A1 (de) * | 1988-03-07 | 1989-09-21 | Hoechst Ag | 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende heterocyclische verbindungen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindung enthaelt |
| US5216158A (en) * | 1988-03-07 | 1993-06-01 | Hoechst Aktiengesellschaft | Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation |
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| DE4006190A1 (de) * | 1990-02-28 | 1991-08-29 | Hoechst Ag | Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| IL98392A (en) * | 1990-06-07 | 1996-01-19 | Wellcome Found | History of indole, their preparation and the pharmaceutical preparations containing them |
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| US4040922A (en) * | 1975-10-06 | 1977-08-09 | Eastman Kodak Company | Photopolymerizable polymeric compositions containing halogen containing heterocyclic compound |
| US4062686A (en) * | 1976-04-21 | 1977-12-13 | Eastman Kodak Company | Sensitizers for photocrosslinkable polymers |
| US4111692A (en) * | 1976-06-04 | 1978-09-05 | Toyo Boseki Kabushiki Kaisha | Electrostatic printing plate |
| US4033952A (en) * | 1976-07-19 | 1977-07-05 | Shell Oil Company | 1,1,1-Trichloro-3-nitro-3-(tetrahydro-2H-1,3-thiazin-2-ylidene)-2-propanone |
| US4189323A (en) * | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
| JPS5474728A (en) * | 1977-11-28 | 1979-06-15 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS5928328B2 (ja) * | 1977-11-29 | 1984-07-12 | 富士写真フイルム株式会社 | 光重合性組成物 |
| DE3021590A1 (de) * | 1980-06-09 | 1981-12-17 | Hoechst Ag, 6000 Frankfurt | 4-halogen-5-(halogenmethyl-phenyl)-oxazol-derivate, ein verfahren zu ihrer herstellung und sie enthaltenden strahlungsempfindliche massen |
| DE3021599A1 (de) * | 1980-06-09 | 1981-12-24 | Hoechst Ag, 6000 Frankfurt | 2-(halogenmethyl-phenyl)-4-halogenoxazol-derivate, ein verfahren zu ihrer herstellung und sie enthaltende strahlungsempfindliche massen |
| GB8321813D0 (en) * | 1983-08-12 | 1983-09-14 | Vickers Plc | Radiation sensitive compounds |
-
1983
- 1983-09-16 DE DE19833333450 patent/DE3333450A1/de not_active Withdrawn
-
1984
- 1984-09-05 EP EP84110533A patent/EP0135863A3/de not_active Withdrawn
- 1984-09-12 ZA ZA847165A patent/ZA847165B/xx unknown
- 1984-09-13 US US06/651,116 patent/US4966828A/en not_active Expired - Fee Related
- 1984-09-13 FI FI843594A patent/FI81786C/fi not_active IP Right Cessation
- 1984-09-14 CS CS846926A patent/CS253715B2/cs unknown
- 1984-09-14 ES ES535956A patent/ES8602715A1/es not_active Expired
- 1984-09-14 AU AU33067/84A patent/AU3306784A/en not_active Abandoned
- 1984-09-14 IL IL72945A patent/IL72945A/xx not_active IP Right Cessation
- 1984-09-14 HU HU843474A patent/HU193590B/hu not_active IP Right Cessation
- 1984-09-15 KR KR1019840005638A patent/KR910007214B1/ko not_active IP Right Cessation
- 1984-09-17 JP JP59192770A patent/JPS6089473A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FI843594A0 (fi) | 1984-09-13 |
| EP0135863A3 (de) | 1985-05-15 |
| HU193590B (en) | 1987-10-28 |
| FI81786B (fi) | 1990-08-31 |
| ES535956A0 (es) | 1985-12-01 |
| IL72945A (en) | 1989-05-15 |
| ES8602715A1 (es) | 1985-12-01 |
| KR910007214B1 (ko) | 1991-09-20 |
| JPS6089473A (ja) | 1985-05-20 |
| CS253715B2 (en) | 1987-12-17 |
| US4966828A (en) | 1990-10-30 |
| EP0135863A2 (de) | 1985-04-03 |
| AU3306784A (en) | 1985-03-21 |
| IL72945A0 (en) | 1984-12-31 |
| KR850002123A (ko) | 1985-05-06 |
| ZA847165B (en) | 1985-04-24 |
| FI81786C (fi) | 1990-12-10 |
| DE3333450A1 (de) | 1985-04-11 |
| HUT37134A (en) | 1985-11-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM | Patent lapsed | ||
| MM | Patent lapsed |
Owner name: HOECHST AKTIENGESELLSCHAFT |