FI792465A - FOERFARANDE FOER FRAMSTAELLNING AV EXPONERADE LJUSKAENSLIGA TRYCKPLATTOR PAO BASIS AV O-NAFTOKINONDIAZIDER - Google Patents

FOERFARANDE FOER FRAMSTAELLNING AV EXPONERADE LJUSKAENSLIGA TRYCKPLATTOR PAO BASIS AV O-NAFTOKINONDIAZIDER

Info

Publication number
FI792465A
FI792465A FI792465A FI792465A FI792465A FI 792465 A FI792465 A FI 792465A FI 792465 A FI792465 A FI 792465A FI 792465 A FI792465 A FI 792465A FI 792465 A FI792465 A FI 792465A
Authority
FI
Finland
Prior art keywords
tryckplattor
naftokinondiazider
ljuskaensliga
exponerade
foerfarande foer
Prior art date
Application number
FI792465A
Other languages
Finnish (fi)
Other versions
FI69716C (en
FI69716B (en
Inventor
Gunter Berghaeuser
Ernst-August Hackmann
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI792465A publication Critical patent/FI792465A/en
Application granted granted Critical
Publication of FI69716B publication Critical patent/FI69716B/en
Publication of FI69716C publication Critical patent/FI69716C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Eye Examination Apparatus (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)

Abstract

1. Process for the development of exposed light-sensitive printing plates having a support of anodically oxidized aluminum and a light-sensitive coating which contains an o-naphthoquinone-diazide and an alkali-soluble resin, the exposed areas of the coating being washed off with an aqueous-alkaline developer solution, characterized in that, the development is effected in the presence of an ionizable compound of an element of the groups IIa, IIIa or IIIb of the Periodic Table, which is added to the developer solution, and wherein the developer solution used contains 0.001 to 0.5 % by weight of the ionizable compound.
FI792465A 1978-08-10 1979-08-08 FOERFARANDE FOER FRAMKALLNING AV EXPONERADE LJUSKAENSLIGA POSITIVTRYCKPLATTOR PAO BASIS AV O-NAFTOKINONDIAZIDER FI69716C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19782834958 DE2834958A1 (en) 1978-08-10 1978-08-10 METHOD FOR DEVELOPING EXPOSED LIGHT-SENSITIVE PRINTING PLATES
DE2834958 1978-08-10

Publications (3)

Publication Number Publication Date
FI792465A true FI792465A (en) 1980-02-11
FI69716B FI69716B (en) 1985-11-29
FI69716C FI69716C (en) 1986-03-10

Family

ID=6046629

Family Applications (1)

Application Number Title Priority Date Filing Date
FI792465A FI69716C (en) 1978-08-10 1979-08-08 FOERFARANDE FOER FRAMKALLNING AV EXPONERADE LJUSKAENSLIGA POSITIVTRYCKPLATTOR PAO BASIS AV O-NAFTOKINONDIAZIDER

Country Status (10)

Country Link
EP (1) EP0008394B1 (en)
JP (1) JPS5525100A (en)
AT (1) ATE2637T1 (en)
AU (1) AU531673B2 (en)
BR (2) BR7905131A (en)
CA (1) CA1145190A (en)
DE (2) DE2834958A1 (en)
ES (1) ES483328A1 (en)
FI (1) FI69716C (en)
ZA (1) ZA794131B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752053A (en) * 1980-09-12 1982-03-27 Asahi Chem Ind Co Ltd Manufacture of photosensitive resin plate
US4330614A (en) * 1980-10-14 1982-05-18 International Business Machines Corporation Process for forming a patterned resist mask
DE3126636A1 (en) 1981-07-06 1983-01-27 Hoechst Ag, 6000 Frankfurt HYDROPHILIZED CARRIER MATERIALS FOR OFFSET PRINTING PLATES, A METHOD FOR THEIR PRODUCTION AND THEIR USE
DE3126626A1 (en) 1981-07-06 1983-01-20 Hoechst Ag, 6000 Frankfurt HYDROPHILIZED CARRIER MATERIALS FOR OFFSET PRINTING PLATES, A METHOD FOR THEIR PRODUCTION AND THEIR USE
JPS5854341A (en) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd Developing method and developing solution
JPS58190952A (en) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd Developing solution of photosensitive printing plate
DE3230171A1 (en) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt AQUEOUS ALKALINE SOLUTION AND METHOD FOR DEVELOPING POSITIVE WORKING REPRODUCTION LAYERS
JPS5955438A (en) * 1982-09-24 1984-03-30 Konishiroku Photo Ind Co Ltd Photoengraving method
JPS5984241A (en) * 1982-11-05 1984-05-15 Fuji Photo Film Co Ltd Developer for photosensitive lithographic printing plate
JPS59121336A (en) * 1982-12-28 1984-07-13 Fuji Photo Film Co Ltd Developing solution for photosensitive lithographic printing plate
JPS6088945A (en) * 1983-10-20 1985-05-18 Toyobo Co Ltd Aqueous processing solution for image copying material
JPS61203456A (en) * 1985-03-06 1986-09-09 Fuotopori Ouka Kk Formation of pattern
US4931103A (en) * 1988-08-11 1990-06-05 E. I. Du Pont De Nemours And Company Tricholine phosphate surface treating agent
EP0732628A1 (en) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB772112A (en) * 1955-07-04 1957-04-10 Warren S D Co Coated paper product for planographic printing masters
BE581434A (en) * 1958-08-08
BE606642A (en) * 1960-07-29
ZA6807938B (en) * 1967-12-04
CA1001473A (en) * 1972-12-22 1976-12-14 Eastman Kodak Company Lithographic printing plate
JPS50108005A (en) * 1974-01-31 1975-08-26
CA1035189A (en) * 1974-02-26 1978-07-25 Richard R. Wells Developer for photosensitive coatings

Also Published As

Publication number Publication date
AU531673B2 (en) 1983-09-01
ATE2637T1 (en) 1983-03-15
BR7905131A (en) 1980-05-06
FI69716C (en) 1986-03-10
ES483328A1 (en) 1980-04-16
DE2964899D1 (en) 1983-03-31
CA1145190A (en) 1983-04-26
BR7905153A (en) 1980-05-06
FI69716B (en) 1985-11-29
JPH0258618B2 (en) 1990-12-10
AU4975779A (en) 1980-02-14
EP0008394A1 (en) 1980-03-05
EP0008394B1 (en) 1983-02-23
JPS5525100A (en) 1980-02-22
ZA794131B (en) 1980-08-27
DE2834958A1 (en) 1980-02-21

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Legal Events

Date Code Title Description
MM Patent lapsed
MM Patent lapsed

Owner name: HOECHST AKTIENGESELLSCHAFT