FR2320584A1 - PROCESS FOR THE REALIZATION, ON A SUPPORT, OF STRUCTURES WITH POSITIVE PHOTOSENSITIVE VARNISH LAYERS - Google Patents

PROCESS FOR THE REALIZATION, ON A SUPPORT, OF STRUCTURES WITH POSITIVE PHOTOSENSITIVE VARNISH LAYERS

Info

Publication number
FR2320584A1
FR2320584A1 FR7622726A FR7622726A FR2320584A1 FR 2320584 A1 FR2320584 A1 FR 2320584A1 FR 7622726 A FR7622726 A FR 7622726A FR 7622726 A FR7622726 A FR 7622726A FR 2320584 A1 FR2320584 A1 FR 2320584A1
Authority
FR
France
Prior art keywords
realization
structures
support
positive photosensitive
varnish layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7622726A
Other languages
French (fr)
Other versions
FR2320584B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2320584A1 publication Critical patent/FR2320584A1/en
Application granted granted Critical
Publication of FR2320584B1 publication Critical patent/FR2320584B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
FR7622726A 1975-08-04 1976-07-26 PROCESS FOR THE REALIZATION, ON A SUPPORT, OF STRUCTURES WITH POSITIVE PHOTOSENSITIVE VARNISH LAYERS Granted FR2320584A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2534795A DE2534795C3 (en) 1975-08-04 1975-08-04 Process for the production of structures from positive photoresist layers

Publications (2)

Publication Number Publication Date
FR2320584A1 true FR2320584A1 (en) 1977-03-04
FR2320584B1 FR2320584B1 (en) 1979-09-28

Family

ID=5953192

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7622726A Granted FR2320584A1 (en) 1975-08-04 1976-07-26 PROCESS FOR THE REALIZATION, ON A SUPPORT, OF STRUCTURES WITH POSITIVE PHOTOSENSITIVE VARNISH LAYERS

Country Status (7)

Country Link
JP (1) JPS5219531A (en)
BE (1) BE844743A (en)
DE (1) DE2534795C3 (en)
FR (1) FR2320584A1 (en)
GB (1) GB1548017A (en)
IT (1) IT1067163B (en)
NL (1) NL7608635A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2487534A1 (en) * 1980-07-28 1982-01-29 Polychrome Corp PERFECTED LITHOGRAPHIC PLATE AND ITS PREPARATION
FR2618230A1 (en) * 1987-07-17 1989-01-20 Thomson Semiconducteurs Photolithograpy process

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329135B2 (en) * 1973-12-12 1978-08-18
DE3216268A1 (en) * 1982-04-30 1983-11-03 Siemens AG, 1000 Berlin und 8000 München Method of reducing line width variations in the production of patterns composed of photoresist layers on substrates provided for integrated semiconductor circuits by optical projection exposure
DE3310962A1 (en) * 1983-03-25 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Method of reducing line-width variations in the production of photoresist patterns
JPS6155649A (en) * 1984-08-27 1986-03-20 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
KR930008139B1 (en) * 1990-08-30 1993-08-26 Samsung Electronics Co Ltd Method for preparation of pattern
KR950008384B1 (en) * 1992-12-10 1995-07-28 삼성전자주식회사 Method of forming pattern

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2487534A1 (en) * 1980-07-28 1982-01-29 Polychrome Corp PERFECTED LITHOGRAPHIC PLATE AND ITS PREPARATION
FR2618230A1 (en) * 1987-07-17 1989-01-20 Thomson Semiconducteurs Photolithograpy process

Also Published As

Publication number Publication date
BE844743A (en) 1976-11-16
JPS5219531A (en) 1977-02-14
DE2534795A1 (en) 1977-02-10
NL7608635A (en) 1977-02-08
IT1067163B (en) 1985-03-12
FR2320584B1 (en) 1979-09-28
GB1548017A (en) 1979-07-04
DE2534795C3 (en) 1978-05-24
DE2534795B2 (en) 1977-09-29

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Legal Events

Date Code Title Description
ST Notification of lapse