GB1548017A - Productions of structures consisting of positive photolacquer layers on a carrier - Google Patents

Productions of structures consisting of positive photolacquer layers on a carrier

Info

Publication number
GB1548017A
GB1548017A GB27153/76A GB2715376A GB1548017A GB 1548017 A GB1548017 A GB 1548017A GB 27153/76 A GB27153/76 A GB 27153/76A GB 2715376 A GB2715376 A GB 2715376A GB 1548017 A GB1548017 A GB 1548017A
Authority
GB
United Kingdom
Prior art keywords
productions
carrier
structures consisting
layers
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB27153/76A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of GB1548017A publication Critical patent/GB1548017A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
GB27153/76A 1975-08-04 1976-06-30 Productions of structures consisting of positive photolacquer layers on a carrier Expired GB1548017A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2534795A DE2534795C3 (en) 1975-08-04 1975-08-04 Process for the production of structures from positive photoresist layers

Publications (1)

Publication Number Publication Date
GB1548017A true GB1548017A (en) 1979-07-04

Family

ID=5953192

Family Applications (1)

Application Number Title Priority Date Filing Date
GB27153/76A Expired GB1548017A (en) 1975-08-04 1976-06-30 Productions of structures consisting of positive photolacquer layers on a carrier

Country Status (7)

Country Link
JP (1) JPS5219531A (en)
BE (1) BE844743A (en)
DE (1) DE2534795C3 (en)
FR (1) FR2320584A1 (en)
GB (1) GB1548017A (en)
IT (1) IT1067163B (en)
NL (1) NL7608635A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0601887A1 (en) * 1992-12-10 1994-06-15 Samsung Electronics Co., Ltd. Method for forming pattern

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329135B2 (en) * 1973-12-12 1978-08-18
AU544060B2 (en) * 1980-07-28 1985-05-16 Polychrome Corp. Accelerated diazo sensitised
DE3216268A1 (en) * 1982-04-30 1983-11-03 Siemens AG, 1000 Berlin und 8000 München Method of reducing line width variations in the production of patterns composed of photoresist layers on substrates provided for integrated semiconductor circuits by optical projection exposure
DE3310962A1 (en) * 1983-03-25 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Method of reducing line-width variations in the production of photoresist patterns
JPS6155649A (en) * 1984-08-27 1986-03-20 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
FR2618230A1 (en) * 1987-07-17 1989-01-20 Thomson Semiconducteurs Photolithograpy process
KR930008139B1 (en) * 1990-08-30 1993-08-26 Samsung Electronics Co Ltd Method for preparation of pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0601887A1 (en) * 1992-12-10 1994-06-15 Samsung Electronics Co., Ltd. Method for forming pattern

Also Published As

Publication number Publication date
IT1067163B (en) 1985-03-12
DE2534795A1 (en) 1977-02-10
FR2320584A1 (en) 1977-03-04
DE2534795B2 (en) 1977-09-29
DE2534795C3 (en) 1978-05-24
FR2320584B1 (en) 1979-09-28
NL7608635A (en) 1977-02-08
BE844743A (en) 1976-11-16
JPS5219531A (en) 1977-02-14

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee