NL7608635A - PROCESS FOR THE MANUFACTURE OF STRUCTURES OF POSITIVE LAYERS OF PHOTO VACUUM ON A SUPPORT. - Google Patents

PROCESS FOR THE MANUFACTURE OF STRUCTURES OF POSITIVE LAYERS OF PHOTO VACUUM ON A SUPPORT.

Info

Publication number
NL7608635A
NL7608635A NL7608635A NL7608635A NL7608635A NL 7608635 A NL7608635 A NL 7608635A NL 7608635 A NL7608635 A NL 7608635A NL 7608635 A NL7608635 A NL 7608635A NL 7608635 A NL7608635 A NL 7608635A
Authority
NL
Netherlands
Prior art keywords
photo
vacuum
manufacture
structures
support
Prior art date
Application number
NL7608635A
Other languages
Dutch (nl)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7608635A publication Critical patent/NL7608635A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
NL7608635A 1975-08-04 1976-08-03 PROCESS FOR THE MANUFACTURE OF STRUCTURES OF POSITIVE LAYERS OF PHOTO VACUUM ON A SUPPORT. NL7608635A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2534795A DE2534795C3 (en) 1975-08-04 1975-08-04 Process for the production of structures from positive photoresist layers

Publications (1)

Publication Number Publication Date
NL7608635A true NL7608635A (en) 1977-02-08

Family

ID=5953192

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7608635A NL7608635A (en) 1975-08-04 1976-08-03 PROCESS FOR THE MANUFACTURE OF STRUCTURES OF POSITIVE LAYERS OF PHOTO VACUUM ON A SUPPORT.

Country Status (7)

Country Link
JP (1) JPS5219531A (en)
BE (1) BE844743A (en)
DE (1) DE2534795C3 (en)
FR (1) FR2320584A1 (en)
GB (1) GB1548017A (en)
IT (1) IT1067163B (en)
NL (1) NL7608635A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329135B2 (en) * 1973-12-12 1978-08-18
AU544060B2 (en) * 1980-07-28 1985-05-16 Polychrome Corp. Accelerated diazo sensitised
DE3216268A1 (en) * 1982-04-30 1983-11-03 Siemens AG, 1000 Berlin und 8000 München Method of reducing line width variations in the production of patterns composed of photoresist layers on substrates provided for integrated semiconductor circuits by optical projection exposure
DE3310962A1 (en) * 1983-03-25 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Method of reducing line-width variations in the production of photoresist patterns
JPS6155649A (en) * 1984-08-27 1986-03-20 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
FR2618230A1 (en) * 1987-07-17 1989-01-20 Thomson Semiconducteurs Photolithograpy process
KR930008139B1 (en) * 1990-08-30 1993-08-26 Samsung Electronics Co Ltd Method for preparation of pattern
KR950008384B1 (en) * 1992-12-10 1995-07-28 삼성전자주식회사 Method of forming pattern

Also Published As

Publication number Publication date
DE2534795A1 (en) 1977-02-10
JPS5219531A (en) 1977-02-14
FR2320584B1 (en) 1979-09-28
FR2320584A1 (en) 1977-03-04
DE2534795B2 (en) 1977-09-29
BE844743A (en) 1976-11-16
IT1067163B (en) 1985-03-12
DE2534795C3 (en) 1978-05-24
GB1548017A (en) 1979-07-04

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Legal Events

Date Code Title Description
BV The patent application has lapsed