FI20155151A - Peililevy Fabry-Perot-interferometriä varten ja Fabry-Perot-interferometri - Google Patents

Peililevy Fabry-Perot-interferometriä varten ja Fabry-Perot-interferometri Download PDF

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Publication number
FI20155151A
FI20155151A FI20155151A FI20155151A FI20155151A FI 20155151 A FI20155151 A FI 20155151A FI 20155151 A FI20155151 A FI 20155151A FI 20155151 A FI20155151 A FI 20155151A FI 20155151 A FI20155151 A FI 20155151A
Authority
FI
Finland
Prior art keywords
fabry
perot interferometer
mirror plate
perot
interferometer
Prior art date
Application number
FI20155151A
Other languages
English (en)
Swedish (sv)
Other versions
FI127159B (fi
Inventor
Aapo Varpula
Mika Prunnila
Kestutis Grigoras
Original Assignee
Teknologian Tutkimuskeskus Vtt Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teknologian Tutkimuskeskus Vtt Oy filed Critical Teknologian Tutkimuskeskus Vtt Oy
Priority to FI20155151A priority Critical patent/FI127159B/fi
Priority to PCT/FI2016/050139 priority patent/WO2016142583A1/en
Priority to US15/556,662 priority patent/US10495514B2/en
Priority to JP2017547156A priority patent/JP6730300B2/ja
Priority to EP16761146.6A priority patent/EP3268708B1/en
Priority to CN201680014528.1A priority patent/CN107430032B/zh
Publication of FI20155151A publication Critical patent/FI20155151A/fi
Application granted granted Critical
Publication of FI127159B publication Critical patent/FI127159B/fi

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0278—Control or determination of height or angle information for sensors or receivers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/45—Interferometric spectrometry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02019—Chemical etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/25—Fabry-Perot in interferometer, e.g. etalon, cavity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J2003/2866—Markers; Calibrating of scan
    • G01J2003/2879—Calibrating scan, e.g. Fabry Perot interferometer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
FI20155151A 2015-03-09 2015-03-09 Peililevy Fabry-Perot-interferometriä varten ja Fabry-Perot-interferometri FI127159B (fi)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FI20155151A FI127159B (fi) 2015-03-09 2015-03-09 Peililevy Fabry-Perot-interferometriä varten ja Fabry-Perot-interferometri
PCT/FI2016/050139 WO2016142583A1 (en) 2015-03-09 2016-03-08 A mirror plate for a fabry-perot interferometer and a fabry-perot interferometer
US15/556,662 US10495514B2 (en) 2015-03-09 2016-03-08 Mirror plate for a fabry-perot interferometer and a fabry-perot interferometer
JP2017547156A JP6730300B2 (ja) 2015-03-09 2016-03-08 ファブリペロー干渉計のためのミラープレート、およびファブリペロー干渉計
EP16761146.6A EP3268708B1 (en) 2015-03-09 2016-03-08 A mirror plate for a fabry-perot interferometer and a fabry-perot interferometer
CN201680014528.1A CN107430032B (zh) 2015-03-09 2016-03-08 用于法布里-珀罗干涉仪的镜板以及法布里-珀罗干涉仪

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20155151A FI127159B (fi) 2015-03-09 2015-03-09 Peililevy Fabry-Perot-interferometriä varten ja Fabry-Perot-interferometri

Publications (2)

Publication Number Publication Date
FI20155151A true FI20155151A (fi) 2016-09-10
FI127159B FI127159B (fi) 2017-12-15

Family

ID=56879977

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20155151A FI127159B (fi) 2015-03-09 2015-03-09 Peililevy Fabry-Perot-interferometriä varten ja Fabry-Perot-interferometri

Country Status (6)

Country Link
US (1) US10495514B2 (fi)
EP (1) EP3268708B1 (fi)
JP (1) JP6730300B2 (fi)
CN (1) CN107430032B (fi)
FI (1) FI127159B (fi)
WO (1) WO2016142583A1 (fi)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6958131B2 (ja) * 2017-08-31 2021-11-02 セイコーエプソン株式会社 光学モジュール、電子機器、及び光学モジュールの制御方法
CN109870449B (zh) * 2019-02-25 2021-11-26 京东方科技集团股份有限公司 一种气体监控装置、系统和方法，以及橱柜
US11796391B2 (en) * 2019-10-09 2023-10-24 Hamamatsu Photonics K.K. Light detection device
WO2022091769A1 (ja) * 2020-10-30 2022-05-05 パナソニックＩｐマネジメント株式会社 光検出装置、構造体の製造方法、および光検出装置の製造方法
CN114647076A (zh) * 2022-03-23 2022-06-21 优尼科(青岛)微电子有限公司 一种静电式mems法珀腔芯片的调平系统及调平方法

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US5525828A (en) * 1991-10-31 1996-06-11 International Business Machines Corporation High speed silicon-based lateral junction photodetectors having recessed electrodes and thick oxide to reduce fringing fields
US6381022B1 (en) * 1992-01-22 2002-04-30 Northeastern University Light modulating device
US5799028A (en) * 1996-07-18 1998-08-25 Sdl, Inc. Passivation and protection of a semiconductor surface
US6399405B1 (en) * 1998-12-21 2002-06-04 Xerox Corporation Process for constructing a spectrophotometer
US20050032357A1 (en) * 2002-01-17 2005-02-10 Rantala Juha T. Dielectric materials and methods for integrated circuit applications
CN1619295A (zh) 2004-12-10 2005-05-25 南京农业大学 猪肉颜色分级仪
CN100538432C (zh) * 2006-01-19 2009-09-09 精工爱普生株式会社 波长可变滤波器、波长可变滤波器模块及光谱分析器
JP4379457B2 (ja) * 2006-01-19 2009-12-09 セイコーエプソン株式会社 光学デバイス、波長可変フィルタ、波長可変フィルタモジュール、および光スペクトラムアナライザ
JP2010127739A (ja) * 2008-11-27 2010-06-10 Toppan Printing Co Ltd 分光感度特性測定装置および分光感度特性測定方法
JP2011027780A (ja) 2009-07-21 2011-02-10 Denso Corp ファブリペロー干渉計及びその製造方法
IL201742A0 (en) * 2009-10-25 2010-06-16 Elbit Sys Electro Optics Elop Tunable spectral filter
JP5716412B2 (ja) 2011-01-24 2015-05-13 セイコーエプソン株式会社 波長可変干渉フィルター、光モジュール、及び光分析装置
FI125612B (fi) 2012-05-08 2015-12-15 Teknologian Tutkimuskeskus Vtt Oy Fabry-Perot -interferometri
JP6182918B2 (ja) 2013-03-18 2017-08-23 セイコーエプソン株式会社 干渉フィルター、光学フィルターデバイス、光学モジュール、及び電子機器
FI125690B (fi) * 2013-06-18 2016-01-15 Teknologian Tutkimuskeskus Vtt Oy Peili Fabry-Perot-interferometriä varten ja menetelmä sen valmistamiseksi

Also Published As

Publication number Publication date
EP3268708B1 (en) 2020-04-29
CN107430032A (zh) 2017-12-01
JP2018511822A (ja) 2018-04-26
US20180052049A1 (en) 2018-02-22
EP3268708A4 (en) 2018-08-29
CN107430032B (zh) 2019-04-16
WO2016142583A1 (en) 2016-09-15
JP6730300B2 (ja) 2020-07-29
US10495514B2 (en) 2019-12-03
EP3268708A1 (en) 2018-01-17
FI127159B (fi) 2017-12-15

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