FI20096201A0 - Massa-aaltoresonaattori ja menetelmä sen valmistamiseksi - Google Patents

Massa-aaltoresonaattori ja menetelmä sen valmistamiseksi

Info

Publication number
FI20096201A0
FI20096201A0 FI20096201A FI20096201A FI20096201A0 FI 20096201 A0 FI20096201 A0 FI 20096201A0 FI 20096201 A FI20096201 A FI 20096201A FI 20096201 A FI20096201 A FI 20096201A FI 20096201 A0 FI20096201 A0 FI 20096201A0
Authority
FI
Finland
Prior art keywords
manufacture
wave resonator
mass wave
mass
resonator
Prior art date
Application number
FI20096201A
Other languages
English (en)
Swedish (sv)
Inventor
Antti Jaakkola
Heikki Kuisma
Original Assignee
Valtion Teknillinen
Vti Technologies Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Valtion Teknillinen, Vti Technologies Oy filed Critical Valtion Teknillinen
Priority to FI20096201A priority Critical patent/FI20096201A0/fi
Publication of FI20096201A0 publication Critical patent/FI20096201A0/fi
Priority to CN2010800523146A priority patent/CN102742156A/zh
Priority to JP2012539375A priority patent/JP2013511881A/ja
Priority to EP10831206.7A priority patent/EP2502346A4/en
Priority to PCT/FI2010/050935 priority patent/WO2011061402A1/en
Priority to US13/508,997 priority patent/US20120280758A1/en
Priority to KR1020127015895A priority patent/KR20120101080A/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H01P11/008—Manufacturing resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P7/00—Resonators of the waveguide type
    • H01P7/06—Cavity resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P7/00—Resonators of the waveguide type
    • H01P7/08—Strip line resonators
    • H01P7/082—Microstripline resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • H03H3/0076—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks for obtaining desired frequency or temperature coefficients
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H03H9/2436—Disk resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02244—Details of microelectro-mechanical resonators
    • H03H2009/02283—Vibrating means
    • H03H2009/0233—Vibrating means comprising perforations
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H03H2009/241—Bulk-mode MEMS resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H03H2009/2442—Square resonators

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
FI20096201A 2009-11-19 2009-11-19 Massa-aaltoresonaattori ja menetelmä sen valmistamiseksi FI20096201A0 (fi)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FI20096201A FI20096201A0 (fi) 2009-11-19 2009-11-19 Massa-aaltoresonaattori ja menetelmä sen valmistamiseksi
CN2010800523146A CN102742156A (zh) 2009-11-19 2010-11-19 体声波谐振器及其制造方法
JP2012539375A JP2013511881A (ja) 2009-11-19 2010-11-19 バルク弾性波共振器及びその製造方法
EP10831206.7A EP2502346A4 (en) 2009-11-19 2010-11-19 VOLUME ACOUSTIC WAVE RESONATOR AND METHOD OF MANUFACTURING THE SAME
PCT/FI2010/050935 WO2011061402A1 (en) 2009-11-19 2010-11-19 Bulk acoustic wave resonator and method of manufacturing thereof
US13/508,997 US20120280758A1 (en) 2009-11-19 2010-11-19 Bulk acoustic wave resonator and method of manufacturing thereof
KR1020127015895A KR20120101080A (ko) 2009-11-19 2010-11-19 벌크 탄성파 공진기 및 그 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20096201A FI20096201A0 (fi) 2009-11-19 2009-11-19 Massa-aaltoresonaattori ja menetelmä sen valmistamiseksi

Publications (1)

Publication Number Publication Date
FI20096201A0 true FI20096201A0 (fi) 2009-11-19

Family

ID=41395248

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20096201A FI20096201A0 (fi) 2009-11-19 2009-11-19 Massa-aaltoresonaattori ja menetelmä sen valmistamiseksi

Country Status (7)

Country Link
US (1) US20120280758A1 (fi)
EP (1) EP2502346A4 (fi)
JP (1) JP2013511881A (fi)
KR (1) KR20120101080A (fi)
CN (1) CN102742156A (fi)
FI (1) FI20096201A0 (fi)
WO (1) WO2011061402A1 (fi)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015108989A1 (en) * 2014-01-14 2015-07-23 Qualtre, Inc. Mems apparatus with intentional geometrical imperfections for alignment of resonant modes and to compensate for manufacturing variations
US9876483B2 (en) 2014-03-28 2018-01-23 Avago Technologies General Ip (Singapore) Pte. Ltd. Acoustic resonator device including trench for providing stress relief
US10352904B2 (en) 2015-10-26 2019-07-16 Qorvo Us, Inc. Acoustic resonator devices and methods providing patterned functionalization areas
CN108474764B (zh) * 2015-11-06 2021-12-10 Qorvo美国公司 声学谐振器设备和提供气密性及表面功能化的制造方法
US10267770B2 (en) 2016-07-27 2019-04-23 Qorvo Us, Inc. Acoustic resonator devices and methods with noble metal layer for functionalization
US11444595B2 (en) 2016-08-11 2022-09-13 Qorvo Biotechnologies, Llc Acoustic resonator device with controlled placement of functionalization material
CN114301406B (zh) * 2021-12-29 2024-04-02 苏州达波新材科技有限公司 空腔型压电单晶体声波谐振器及其制备方法
CN114894229B (zh) * 2022-04-26 2024-05-03 武汉敏声新技术有限公司 一种薄膜体声波传感器及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004279384A (ja) * 2003-03-19 2004-10-07 Sumitomo Precision Prod Co Ltd 振動子の製造方法、振動子及びフォトマスク
US6894586B2 (en) * 2003-05-21 2005-05-17 The Regents Of The University Of California Radial bulk annular resonator using MEMS technology
US20050073078A1 (en) * 2003-10-03 2005-04-07 Markus Lutz Frequency compensated oscillator design for process tolerances
US7205867B2 (en) * 2005-05-19 2007-04-17 Robert Bosch Gmbh Microelectromechanical resonator structure, and method of designing, operating and using same
JP2007181087A (ja) * 2005-12-28 2007-07-12 Toshiba Corp 薄膜圧電共振器およびフィルタ回路
JP2009529820A (ja) * 2006-03-09 2009-08-20 エヌエックスピー ビー ヴィ 少なくとも１個の共振器モード形状を有するｍｅｍｓ共振器
US7616077B1 (en) * 2007-03-22 2009-11-10 Sandia Corporation Microelectromechanical resonator and method for fabrication
US7750758B2 (en) * 2007-09-05 2010-07-06 Robert Bosch Gmbh Multi-ring resonator system and method
EP2239845A1 (en) * 2009-04-09 2010-10-13 Nxp B.V. MEMS resonator

Also Published As

Publication number Publication date
EP2502346A1 (en) 2012-09-26
KR20120101080A (ko) 2012-09-12
WO2011061402A1 (en) 2011-05-26
US20120280758A1 (en) 2012-11-08
EP2502346A4 (en) 2013-08-21
JP2013511881A (ja) 2013-04-04
CN102742156A (zh) 2012-10-17

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