ES8700454A1 - Procedimiento para la produccion de novolacas fenolicas fo- tosensibles - Google Patents

Procedimiento para la produccion de novolacas fenolicas fo- tosensibles

Info

Publication number
ES8700454A1
ES8700454A1 ES549408A ES549408A ES8700454A1 ES 8700454 A1 ES8700454 A1 ES 8700454A1 ES 549408 A ES549408 A ES 549408A ES 549408 A ES549408 A ES 549408A ES 8700454 A1 ES8700454 A1 ES 8700454A1
Authority
ES
Spain
Prior art keywords
group
substituted
formula
acid group
hydrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES549408A
Other languages
English (en)
Other versions
ES549408A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES8700454A1 publication Critical patent/ES8700454A1/es
Publication of ES549408A0 publication Critical patent/ES549408A0/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • C09D5/4419—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications with polymers obtained otherwise than by polymerisation reactions only involving carbon-to-carbon unsaturated bonds
    • C09D5/4469—Phenoplasts; Aminoplasts
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PREPARACION DE RESINAS FENOLICAS MODIFICADAS FOTOSENSIBLES Y ELECTRODEPOSITABLES, EN LAS QUE UNA PARTE POR LO MENOS, DE GRUPOS HIDROXILO FENOLICOS, ESTA REEMPLAZADA POR GRUPOS QUINONDIACIDOSULFONILOXILO Y UNA PARTE, POR LO MENOS DE LOS ANILLOS AROMATICOS DE LA NOVOLACA, EN POSICION ORTO O PARA O EN AMBAS, RESPECTO A UN GRUPO HIDROXILO FENOLICO O AL GRUPO QUINONDIACIDOSULFONILOXILO, ESTA SUSTITUIDO POR UN RADICAL DE FORMULA -CH(R1)R2, DONDE R1 ES HIDROGENO, ALQUILO, ARILO O UN GRUPO CARBOXILICO, R2 ES UN GRUPO DE ACIDO SULFONICO -SO3H O UN RADICAL -A-R3-X, DONDE R3 ES UN GRUPO DIVALENTE ALIFATICO, AROMATICO O ARILALIFATICO, EVENTUALMENTE SUSTITUIDOS CON UN GRUPO CARBOXILO, SULFONICO O FOSFONICO, A ES HIDROGENO O UN ALQUILO SUSTITUIDO O NO, O R3 Y R4 FORMAN JUNTOS UNA CADENA DE ALQUILENO Y X ES UN GRUPO CARBOXILICO O SULFONICO, UN GRUPO AMINICO, HIDROGENO O HIDROXILO. LA RESINA SE OBTIENE POR REACCION DE UNA NOVOLACA FENOLICA, OBTENIDA A PARTIR DE UN FENOL Y UN ALDEHIDO, CON UN ACIDO QUINONDIACIDO SULFONICO O CON UN DERIVADO DE ESTE, EN DICHA REACCION POR LO MENOS UNO DE LOS COMPONENTES SE HACE REACCIONAR ULTERIORMENTE CON UN ALDEHIDO Y UNA AMINA, UN MERCAPTOCOMPUESTO O UN ACIDO CARBOXILICO, SULFONICO O FOSFONICO.
ES549408A 1984-12-01 1985-11-29 Procedimiento para la produccion de novolacas fenolicas fo- tosensibles Expired ES8700454A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB848430377A GB8430377D0 (en) 1984-12-01 1984-12-01 Modified phenolic resins

Publications (2)

Publication Number Publication Date
ES8700454A1 true ES8700454A1 (es) 1986-10-01
ES549408A0 ES549408A0 (es) 1986-10-01

Family

ID=10570560

Family Applications (1)

Application Number Title Priority Date Filing Date
ES549408A Expired ES8700454A1 (es) 1984-12-01 1985-11-29 Procedimiento para la produccion de novolacas fenolicas fo- tosensibles

Country Status (7)

Country Link
US (1) US4839253A (es)
EP (1) EP0184553B1 (es)
JP (1) JPH0625242B2 (es)
CA (1) CA1258344A (es)
DE (1) DE3583659D1 (es)
ES (1) ES8700454A1 (es)
GB (1) GB8430377D0 (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
GB8708747D0 (en) * 1987-04-11 1987-05-20 Ciba Geigy Ag Formation of image
GB8802314D0 (en) * 1988-02-03 1988-03-02 Vickers Plc Improvements in/relating to radiation-sensitive compounds
US5047128A (en) * 1990-01-02 1991-09-10 Shipley Company Inc. Electrodialysis cell for removal of excess electrolytes formed during electrodeposition of photoresists coatings
GB2240549B (en) * 1990-01-31 1993-01-13 Sony Corp Photoresist materials
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
BR9103260A (pt) * 1990-08-02 1992-02-18 Ppg Industries Inc Composicao de resina fotossensivel que pode ser eletrodepositada e pode receber fotoimagem
US5314789A (en) * 1991-10-01 1994-05-24 Shipley Company Inc. Method of forming a relief image comprising amphoteric compositions
US5384229A (en) * 1992-05-07 1995-01-24 Shipley Company Inc. Photoimageable compositions for electrodeposition
EP0653681B1 (en) * 1993-11-17 2000-09-13 AT&T Corp. A process for device fabrication using an energy sensitive composition
US5589553A (en) * 1995-03-29 1996-12-31 Shipley Company, L.L.C. Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
KR100363695B1 (ko) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 유기난반사방지중합체및그의제조방법
JP5981465B2 (ja) * 2014-01-10 2016-08-31 信越化学工業株式会社 ネガ型レジスト材料及びこれを用いたパターン形成方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (es) * 1950-10-31
FR1517197A (fr) * 1966-03-25 1968-03-15 Ici Ltd Compositions d'enduisage rétifiables contenant une matière acide filmogène et unematière phénolique
GB1227602A (es) * 1967-11-24 1971-04-07
JPS505083B1 (es) * 1970-09-16 1975-02-28
JPS505084B1 (es) * 1970-09-16 1975-02-28
JPS5024641B2 (es) * 1972-10-17 1975-08-18
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
US4362853A (en) * 1980-10-24 1982-12-07 Ciba-Geigy Corporation Resinous salts, their preparation, and their use in coatings
JPS57150844A (en) * 1981-03-13 1982-09-17 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS58134631A (ja) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd 感光性組成物
US4507446A (en) * 1982-03-23 1985-03-26 Ciba-Geigy Corporation Water-soluble or water-dispersible resinous sulphur or phosphorus containing salts, their preparation, and their use in coatings
JPS58203433A (ja) * 1982-05-21 1983-11-26 Fuji Photo Film Co Ltd 感光性組成物
US4410675A (en) * 1982-12-15 1983-10-18 Ciba-Geigy Corporation Resinous salts, their preparations, and their use in coatings
AT375953B (de) * 1983-03-21 1984-09-25 Vianova Kunstharz Ag Verfahren zur herstellung von selbstvernetzenden, kathodisch abscheidbaren etl-bindemitteln auf basis modifizierter alkylphenol-formaldehyd -kondensationsprodukte
DE3586263D1 (de) * 1984-03-07 1992-08-06 Ciba Geigy Ag Verfahren zur herstellung von abbildungen.
US4592816A (en) * 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
US4578438A (en) * 1985-03-11 1986-03-25 Ciba-Geigy Corporation Preparation of resinous products

Also Published As

Publication number Publication date
US4839253A (en) 1989-06-13
GB8430377D0 (en) 1985-01-09
EP0184553B1 (de) 1991-07-31
EP0184553A2 (de) 1986-06-11
CA1258344A (en) 1989-08-08
JPS61133217A (ja) 1986-06-20
JPH0625242B2 (ja) 1994-04-06
EP0184553A3 (en) 1988-08-10
DE3583659D1 (de) 1991-09-05
ES549408A0 (es) 1986-10-01

Similar Documents

Publication Publication Date Title
ES8700454A1 (es) Procedimiento para la produccion de novolacas fenolicas fo- tosensibles
ES8706332A1 (es) Un procedimiento para la preparacion de resina de novolaca fenolica modificada
DE3889638D1 (de) Substituierte Propanphosphinsäure-Verbindungen.
EP0493367A3 (en) Silicone resist materials containing polysilanes and methods of making the same
ATE23869T1 (de) Fluoralkyloxialkylgruppen aufweisendes diorganopolysiloxan und dessen verwendung.
SE8301395D0 (sv) Kelatiserande foreningar med funktionella grupper vilka tillater kovalent koppling till bio-organiska molekyler
DE69722240D1 (de) Sulfataseinhibitoren
ES8800321A1 (es) Un metodo para la preparacion de una composicion de betumem-derivado de organofosforo acido.
ES8309009A1 (es) Un procedimiento mejorado para la fabricacion de un materialcopiador sensible a la luz
SE7706392L (sv) N-fosfonometylenmonoaminoalkanmono- och -polyfosfonsyror respektive n-fosfonometylendiaminoalkanpolyfosfonsyror samt sett for deras framstellning
ES551990A0 (es) Procedimiento para preparar un derivados de cefalosporina.
EP0212808A3 (en) Curable resins
ES8600265A1 (es) Procedimiento para la obtencion de benzofuranos o bien 2,3-dihidrobenzofuranos
ATE8940T1 (de) Lichtempfindliches gemisch auf basis von onaphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial.
ES2017615B3 (es) Composicion de foto-resistencia y circuito impreso.
ES2155851T3 (es) Resinas epoxi basadas en resorcinol sustituido.
EP0301101A4 (en) POSITIVE PHOTO-SENSITIVE RESIN PREPARATION.
DE3681258D1 (de) Substituierte diazaoxaspirodecane, ihre herstellung und ihre verwendung als stabilisatoren fuer polymere.
JPS646948A (en) Positive type photosensitive resin composition and production thereof
BR9105632A (pt) Resina de poliester moldavel tendo em fusao alta estabilidade termica,e peca moldada produzida a partir da mesma
SE8602191D0 (sv) Thermoplastische polyamidformmassen mit verminderter wasseraufnahme
EP0147596A3 (en) A positive lithographic resist composition
JPS6446746A (en) Positive type photoresist composition
JPS6432265A (en) Electrophotographic sensitive body
EP0311881A3 (de) Verwendung von Alkylenoxid-Addukten in Flussmitteln und Umschmelzflüssigkeiten

Legal Events

Date Code Title Description
PC1A Transfer granted
FD1A Patent lapsed

Effective date: 20040624