GB2240549B - Photoresist materials - Google Patents

Photoresist materials

Info

Publication number
GB2240549B
GB2240549B GB9102023A GB9102023A GB2240549B GB 2240549 B GB2240549 B GB 2240549B GB 9102023 A GB9102023 A GB 9102023A GB 9102023 A GB9102023 A GB 9102023A GB 2240549 B GB2240549 B GB 2240549B
Authority
GB
United Kingdom
Prior art keywords
photoresist materials
photoresist
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9102023A
Other versions
GB9102023D0 (en
GB2240549A (en
Inventor
Tsutomu Noguchi
Hidemi Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2081590A external-priority patent/JPH03225340A/en
Priority claimed from JP8379690A external-priority patent/JPH03282548A/en
Application filed by Sony Corp filed Critical Sony Corp
Publication of GB9102023D0 publication Critical patent/GB9102023D0/en
Publication of GB2240549A publication Critical patent/GB2240549A/en
Application granted granted Critical
Publication of GB2240549B publication Critical patent/GB2240549B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB9102023A 1990-01-31 1991-01-30 Photoresist materials Expired - Fee Related GB2240549B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2081590A JPH03225340A (en) 1990-01-31 1990-01-31 Resist material
JP8379690A JPH03282548A (en) 1990-03-30 1990-03-30 Resist material

Publications (3)

Publication Number Publication Date
GB9102023D0 GB9102023D0 (en) 1991-03-13
GB2240549A GB2240549A (en) 1991-08-07
GB2240549B true GB2240549B (en) 1993-01-13

Family

ID=26357805

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9102023A Expired - Fee Related GB2240549B (en) 1990-01-31 1991-01-30 Photoresist materials

Country Status (2)

Country Link
DE (1) DE4102946A1 (en)
GB (1) GB2240549B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977307B2 (en) * 2003-09-18 2007-09-19 東京応化工業株式会社 Positive photoresist composition and resist pattern forming method
CN101770169B (en) * 2008-12-30 2012-03-21 乐凯集团第二胶片厂 Positive lithograph plate photosensitive composition with high resolution and high sensitivity

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184553A2 (en) * 1984-12-01 1986-06-11 Ciba-Geigy Ag Modified phenolic resins and their fabrication
EP0070624B1 (en) * 1981-06-22 1986-11-20 Philip A. Hunt Chemical Corporation Novolak resin and a positive photoresist composition containing the same
EP0225464A2 (en) * 1985-12-10 1987-06-16 International Business Machines Corporation Composite resist structures

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0070624B1 (en) * 1981-06-22 1986-11-20 Philip A. Hunt Chemical Corporation Novolak resin and a positive photoresist composition containing the same
EP0184553A2 (en) * 1984-12-01 1986-06-11 Ciba-Geigy Ag Modified phenolic resins and their fabrication
EP0225464A2 (en) * 1985-12-10 1987-06-16 International Business Machines Corporation Composite resist structures

Also Published As

Publication number Publication date
GB9102023D0 (en) 1991-03-13
DE4102946A1 (en) 1991-08-01
GB2240549A (en) 1991-08-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee