JPS57150844A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS57150844A
JPS57150844A JP56036166A JP3616681A JPS57150844A JP S57150844 A JPS57150844 A JP S57150844A JP 56036166 A JP56036166 A JP 56036166A JP 3616681 A JP3616681 A JP 3616681A JP S57150844 A JPS57150844 A JP S57150844A
Authority
JP
Japan
Prior art keywords
orthoquinonediazide
compd
polymer electrolyte
high polymer
photosensitive compsn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56036166A
Other languages
Japanese (ja)
Inventor
Akira Nogami
Nobumasa Sasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP56036166A priority Critical patent/JPS57150844A/en
Publication of JPS57150844A publication Critical patent/JPS57150844A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain a photosetting type photosensitive compsn. which is free from the decomposition occurring in moisture and has an excellent shelf life by compounding prescribed amts. of an orthoquinonediazide compd. and a cationic high polymer electrolyte thereby preparing the photosensitive compsn. CONSTITUTION:An orthoquinonediazide compd. is compounded at 0.01-0.5pt.wt. based on 1pt.wt. a cationic high polymer electrolyte, whereby a photosensitive compsn. is prepd. Various aliphat. or arom. hydroxy or amino compds. and sulfonate and sulfonamide of orthoquinonediazide are suitable as the orthoquinonediazide compd. For the cationic high polymer electrolyte, a compd. of the structure having ammonium salt, sulfonium salt, etc. can be used for the basic skeleton. Said photosensitive compsn. is dissolved in water, methanol, etc. and the soln. is coated on backing.
JP56036166A 1981-03-13 1981-03-13 Photosensitive composition Pending JPS57150844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56036166A JPS57150844A (en) 1981-03-13 1981-03-13 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56036166A JPS57150844A (en) 1981-03-13 1981-03-13 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS57150844A true JPS57150844A (en) 1982-09-17

Family

ID=12462168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56036166A Pending JPS57150844A (en) 1981-03-13 1981-03-13 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS57150844A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173545A (en) * 1983-11-08 1985-09-06 ヘキスト　アクチエンゲゼルシヤフト Photosensitive composition and manufacture of negative relief copy
EP0184553A2 (en) * 1984-12-01 1986-06-11 Ciba-Geigy Ag Modified phenolic resins and their fabrication
JPS63141048A (en) * 1986-10-23 1988-06-13 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド Image formation
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173545A (en) * 1983-11-08 1985-09-06 ヘキスト　アクチエンゲゼルシヤフト Photosensitive composition and manufacture of negative relief copy
JPH0431381B2 (en) * 1983-11-08 1992-05-26
EP0184553A2 (en) * 1984-12-01 1986-06-11 Ciba-Geigy Ag Modified phenolic resins and their fabrication
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
JPS63141048A (en) * 1986-10-23 1988-06-13 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド Image formation

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