ES379775A1 - Production of light-sensitive compounds and reproduction material employing the same - Google Patents

Production of light-sensitive compounds and reproduction material employing the same

Info

Publication number
ES379775A1
ES379775A1 ES379775A ES379775A ES379775A1 ES 379775 A1 ES379775 A1 ES 379775A1 ES 379775 A ES379775 A ES 379775A ES 379775 A ES379775 A ES 379775A ES 379775 A1 ES379775 A1 ES 379775A1
Authority
ES
Spain
Prior art keywords
compound
group
aromatic
condensation
acidic medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES379775A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of ES379775A1 publication Critical patent/ES379775A1/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G12/00—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08G12/02—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes
    • C08G12/04—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
    • C08G12/06—Amines
    • C08G12/08—Amines aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G12/00—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08G12/02—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes
    • C08G12/04—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
    • C08G12/22—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds with carboxylic acid amides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G16/00—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00
    • C08G16/02—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00 of aldehydes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates

Abstract

A process for the preparation of a condensation product of an aromatic diazonium compound consisting of reacting at least one compound A (-D) n and at least one compound B1 of general formula E (-CHRa-ORb) m in a strongly acidic medium, where A is a radical of a compound containing at least two members selected from the group consisting of an aromatic ring and a heterocyclic ring of aromatic nature, the compound of which is susceptible to condensation at least one position with a active carbonyl compound in an acidic medium, D is a diazonium salt group attached to an aromatic carbon atom of A, n is an integer from 1 to 10, E is a residue obtained by separating m H atoms of a compound free of diazonium groups and capable of condensation in at least one position with an active carbonyl compound in an acidic medium, Ra is selected from the group consisting of hydrogen, alkyl, aryl, and heterocyclic groups, is selected from the group consisting of hydrogen, alkyl, and acyl of 1 to 4 carbon atoms and a phenyl group, and m is an integer from 1 to 10, the condensation product containing, on average, about 0.1 to 50 units derived from E (-CHRa-ORb) m per unit of A (-D) n. (Machine-translation by Google Translate, not legally binding)
ES379775A 1969-05-20 1970-05-18 Production of light-sensitive compounds and reproduction material employing the same Expired ES379775A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82629669A 1969-05-20 1969-05-20

Publications (1)

Publication Number Publication Date
ES379775A1 true ES379775A1 (en) 1973-02-01

Family

ID=25246170

Family Applications (1)

Application Number Title Priority Date Filing Date
ES379775A Expired ES379775A1 (en) 1969-05-20 1970-05-18 Production of light-sensitive compounds and reproduction material employing the same

Country Status (20)

Country Link
JP (1) JPS4945323B1 (en)
AT (1) AT327171B (en)
BE (1) BE750693A (en)
BG (1) BG20629A3 (en)
CA (1) CA971160A (en)
CH (1) CH607098A5 (en)
DE (2) DE2024242C2 (en)
DK (1) DK143621C (en)
ES (1) ES379775A1 (en)
FI (1) FI53896C (en)
FR (1) FR2048537A5 (en)
GB (1) GB1312926A (en)
IL (1) IL34548A (en)
NL (1) NL174835C (en)
NO (1) NO133756C (en)
PL (1) PL92450B1 (en)
SE (1) SE386435B (en)
SU (1) SU660590A3 (en)
YU (1) YU33996B (en)
ZA (1) ZA703394B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2058178C2 (en) * 1970-11-26 1982-04-01 Hoechst Ag, 6000 Frankfurt Process for the production of screen printing forms
GB1450196A (en) * 1972-11-25 1976-09-22 Hoechst Ag Light-sensitive preparations
JPS5128001A (en) * 1974-08-29 1976-03-09 Polychrome Corp Kizaijono kankohifuku oyobi sonoseizoho
FR2406230A1 (en) * 1977-10-11 1979-05-11 Eastman Kodak Co PHOTOSENSITIVE AND PRODUCED COMPOSITION
DE2822887A1 (en) * 1978-05-26 1979-11-29 Hoechst Ag LIGHT SENSITIVE RECORDING MATERIAL AND METHOD FOR THE PRODUCTION OF RELIEF RECORDS
EP0061150B1 (en) * 1981-03-20 1986-10-15 American Hoechst Corporation Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same
US4436804A (en) 1981-03-20 1984-03-13 American Hoechst Corporation Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith
US4469772A (en) * 1982-06-03 1984-09-04 American Hoechst Corporation Water developable dye coating on substrate with two diazo polycondensation products and water soluble polymeric binder
DE3364925D1 (en) * 1982-06-03 1986-09-04 Hoechst Co American Photosensitive composition developable with water, and photosensitive copying material produced therefrom
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
CN110317130B (en) * 2018-03-29 2021-12-21 深圳翰宇药业股份有限公司 Compound and preparation method and application thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL134368C (en) 1961-01-25

Also Published As

Publication number Publication date
PL92450B1 (en) 1977-04-30
DE2065733A1 (en) 1975-09-04
ATA763971A (en) 1975-04-15
DE2024242A1 (en) 1970-12-17
NO133756C (en) 1976-06-23
SU660590A3 (en) 1979-04-30
YU33996B (en) 1978-09-08
IL34548A (en) 1985-04-30
DK143621B (en) 1981-09-14
DE2065733C2 (en) 1982-10-07
JPS4945323B1 (en) 1974-12-03
NL174835C (en) 1984-08-16
GB1312926A (en) 1973-04-11
CA971160A (en) 1975-07-15
FI53896C (en) 1978-08-10
NO133756B (en) 1976-03-15
IL34548A0 (en) 1970-07-19
DE2024242C2 (en) 1984-09-20
AT327171B (en) 1976-01-26
DK143621C (en) 1982-02-15
FI53896B (en) 1978-05-02
NL7006716A (en) 1970-11-24
SE386435B (en) 1976-08-09
CH607098A5 (en) 1978-11-30
BG20629A3 (en) 1975-12-05
FR2048537A5 (en) 1971-03-19
ZA703394B (en) 1971-06-30
YU125470A (en) 1978-02-28
BE750693A (en) 1970-11-20
NL174835B (en) 1984-03-16

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