ES325504A1 - Un dispositivo semiconductor de efecto de campo de puerta aislada. - Google Patents
Un dispositivo semiconductor de efecto de campo de puerta aislada.Info
- Publication number
- ES325504A1 ES325504A1 ES0325504A ES325504A ES325504A1 ES 325504 A1 ES325504 A1 ES 325504A1 ES 0325504 A ES0325504 A ES 0325504A ES 325504 A ES325504 A ES 325504A ES 325504 A1 ES325504 A1 ES 325504A1
- Authority
- ES
- Spain
- Prior art keywords
- field effect
- semiconductive device
- door field
- isolated door
- insulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005669 field effect Effects 0.000 title abstract 2
- 239000012212 insulator Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 238000005036 potential barrier Methods 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/36—Unipolar devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
- Thin Film Transistor (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US448506A US3355637A (en) | 1965-04-15 | 1965-04-15 | Insulated-gate field effect triode with an insulator having the same atomic spacing as the channel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES325504A1 true ES325504A1 (es) | 1967-02-16 |
Family
ID=23780562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES0325504A Expired ES325504A1 (es) | 1965-04-15 | 1966-04-13 | Un dispositivo semiconductor de efecto de campo de puerta aislada. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3355637A (enrdf_load_stackoverflow) |
| JP (1) | JPS497390B1 (enrdf_load_stackoverflow) |
| DE (1) | DE1564524A1 (enrdf_load_stackoverflow) |
| ES (1) | ES325504A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1134656A (enrdf_load_stackoverflow) |
| NL (1) | NL6605087A (enrdf_load_stackoverflow) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3544399A (en) * | 1966-10-26 | 1970-12-01 | Hughes Aircraft Co | Insulated gate field-effect transistor (igfet) with semiconductor gate electrode |
| US3475234A (en) * | 1967-03-27 | 1969-10-28 | Bell Telephone Labor Inc | Method for making mis structures |
| US3576478A (en) * | 1969-07-22 | 1971-04-27 | Philco Ford Corp | Igfet comprising n-type silicon substrate, silicon oxide gate insulator and p-type polycrystalline silicon gate electrode |
| BE756782A (fr) * | 1969-10-03 | 1971-03-01 | Western Electric Co | Organe de memoire ayant une structure comportant deux couches isolantesentre un semiconducteur et une couche de metal |
| US3673471A (en) * | 1970-10-08 | 1972-06-27 | Fairchild Camera Instr Co | Doped semiconductor electrodes for mos type devices |
| US4032950A (en) * | 1974-12-06 | 1977-06-28 | Hughes Aircraft Company | Liquid phase epitaxial process for growing semi-insulating gaas layers |
| DE3174485D1 (en) * | 1980-12-23 | 1986-05-28 | Nat Res Dev | Field effect transistors |
| GB9116341D0 (en) * | 1991-07-29 | 1991-09-11 | Hitachi Europ Ltd | Lt-gaas semiconductor device |
| US6949443B2 (en) * | 2003-10-10 | 2005-09-27 | Taiwan Semiconductor Manufacturing Company | High performance semiconductor devices fabricated with strain-induced processes and methods for making same |
| JP6290342B1 (ja) | 2016-09-07 | 2018-03-07 | Ntn株式会社 | 左右輪駆動装置の制御装置 |
| JP6328721B2 (ja) | 2016-10-12 | 2018-05-23 | Ntn株式会社 | 駆動源制御装置およびこの駆動源制御装置を備えた車両 |
| WO2021075415A1 (ja) | 2019-10-16 | 2021-04-22 | 三菱自動車工業株式会社 | 電動車両のモータ制御装置 |
| CN114867636B (zh) | 2019-12-24 | 2025-03-07 | 提爱思科技股份有限公司 | 车辆座椅 |
| JP1693552S (enrdf_load_stackoverflow) * | 2021-04-09 | 2021-08-23 | ||
| JP1693553S (enrdf_load_stackoverflow) * | 2021-04-09 | 2021-08-23 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3263095A (en) * | 1963-12-26 | 1966-07-26 | Ibm | Heterojunction surface channel transistors |
-
1965
- 1965-04-15 US US448506A patent/US3355637A/en not_active Expired - Lifetime
-
1966
- 1966-03-31 GB GB14406/66A patent/GB1134656A/en not_active Expired
- 1966-04-05 DE DE19661564524 patent/DE1564524A1/de active Pending
- 1966-04-13 ES ES0325504A patent/ES325504A1/es not_active Expired
- 1966-04-15 JP JP41023847A patent/JPS497390B1/ja active Pending
- 1966-04-15 NL NL6605087A patent/NL6605087A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPS497390B1 (enrdf_load_stackoverflow) | 1974-02-20 |
| NL6605087A (enrdf_load_stackoverflow) | 1966-10-17 |
| US3355637A (en) | 1967-11-28 |
| DE1564524A1 (de) | 1970-01-22 |
| GB1134656A (en) | 1968-11-27 |
| DE1564524B2 (enrdf_load_stackoverflow) | 1970-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES325504A1 (es) | Un dispositivo semiconductor de efecto de campo de puerta aislada. | |
| DK119016B (da) | Felteffekttransistor med isoleret styreelektrode. | |
| MY7300263A (en) | Insulated gate field effect transistor | |
| IL30180A (en) | Gate structure for insulated gate field effect semi-conductor device | |
| JPS5222480A (en) | Insulating gate field effect transistor | |
| FR1505166A (fr) | Circuit utilisant des transistors à effet de champ du type à électrode de commande isolée | |
| ES315030A1 (es) | Un dispositivo semiconductor de efecto de campo de portal aislado. | |
| FR1463352A (fr) | Transistor à effet de champ à semi-conducteur en oxyde métallique | |
| JPS52117586A (en) | Semiconductor device | |
| FR90031E (fr) | Vanne à tiroir | |
| FR1473633A (fr) | Transistor à effet de champ | |
| FR1469938A (fr) | Transistors à effet de champ | |
| FR1483688A (fr) | Transistor à effet de champ | |
| Lin | Linear circuit techniques for insulated gate integrated field-effect devices. | |
| DK117645B (da) | Højspændingsisolator. | |
| AT274065B (de) | Transistorablenkschaltung | |
| FR1431642A (fr) | Perfectionnements à la fabrication de limiteurs de courant à effet de champ | |
| JPS5365081A (en) | Field effect semiconductor device | |
| NL149326B (nl) | Hoogspanningstransistor. | |
| AU423933B2 (en) | High voltage transient protection for an insulated gate field effect transistor | |
| CA821733A (en) | Semiconductor device comprising a field-effect transistor of the type having an insulated gate electrode and circuit arrangements comprising such a semiconductor device | |
| AU414187B2 (en) | Transistor deflection circuits | |
| FR1435488A (fr) | Transistors à effets de champ et à porte isolée | |
| AU423705B2 (en) | Gate structure for insulated gate field effect transistor | |
| CA702546A (en) | Monitoring gate circuit having elongated magnetic element |