ES2115886T3 - Fotoprotectores en emulsion acuosa que contienen ligantes neutralizados por aminoacrilatos. - Google Patents

Fotoprotectores en emulsion acuosa que contienen ligantes neutralizados por aminoacrilatos.

Info

Publication number
ES2115886T3
ES2115886T3 ES94307900T ES94307900T ES2115886T3 ES 2115886 T3 ES2115886 T3 ES 2115886T3 ES 94307900 T ES94307900 T ES 94307900T ES 94307900 T ES94307900 T ES 94307900T ES 2115886 T3 ES2115886 T3 ES 2115886T3
Authority
ES
Spain
Prior art keywords
photoprotectors
aminoacrylate
aqueous emulsion
emulsion containing
containing binders
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94307900T
Other languages
English (en)
Inventor
Daniel E Lundy
Robert K Barr
Thanh N Tran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Morton International LLC
Original Assignee
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/199,037 external-priority patent/US5364737A/en
Application filed by Morton International LLC filed Critical Morton International LLC
Application granted granted Critical
Publication of ES2115886T3 publication Critical patent/ES2115886T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Paper (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Dental Preparations (AREA)

Abstract

UNA COMPOSICION FLOTANTE CON LA QUE SE PUEDEN FORMAR IMAGENES POR VIA FOTOMECANICA O SUSTANCIA PROTECTORA FOTOSENSIBLE QUE CONTIENE UN POLIMERO AGLUTINANTE DE LATEX QUE POSEE UNA FUNCIONALIDAD DEL ACIDO PARA QUE SE PUEDA REVELAR EN UNA SOLUCION ACUOSA ALCALINA, CUYA FUNCIONALIDAD DEL ACIDO SE NEUTRALIZA A AL MENOS 1 MOL POR CIENTO CON UN AMINOACRILATO, UNA FRACCION MONOMERICA FOTOPOLIMERIZABLE Y UN SISTEMA QUIMICO FOTOINICIADOR.
ES94307900T 1994-01-25 1994-10-27 Fotoprotectores en emulsion acuosa que contienen ligantes neutralizados por aminoacrilatos. Expired - Lifetime ES2115886T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/238,133 US5393643A (en) 1994-01-25 1994-05-04 Waterborne photoresists having binders neutralized with amino acrylates

Publications (1)

Publication Number Publication Date
ES2115886T3 true ES2115886T3 (es) 1998-07-01

Family

ID=27392162

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94307900T Expired - Lifetime ES2115886T3 (es) 1994-01-25 1994-10-27 Fotoprotectores en emulsion acuosa que contienen ligantes neutralizados por aminoacrilatos.

Country Status (12)

Country Link
EP (1) EP0664488B1 (es)
JP (1) JPH07234507A (es)
CN (1) CN1071911C (es)
AT (1) ATE164012T1 (es)
AU (1) AU660881B1 (es)
BR (1) BR9500257A (es)
CA (1) CA2133148C (es)
DE (1) DE69408969T2 (es)
ES (1) ES2115886T3 (es)
HK (1) HK1005069A1 (es)
IL (1) IL112008A (es)
SG (1) SG49621A1 (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
NL1013299C2 (nl) 1999-10-15 2001-04-18 Stahl Int Bv Dispersies in water van een polyurethaan met geblokkeerde reactieve groepen.
NL1013300C2 (nl) 1999-10-15 2001-04-18 Stahl Int Bv Werkwijze voor de bereiding van een dispersie van een anionische polymeer in water waarin geen vluchtige tertiaire-amines voorkomen, de verkregen dispersies en coatings welke met de genoemde dispersies verkregen worden.
JP4397601B2 (ja) * 2003-02-06 2010-01-13 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フェノール−ビフェニレン樹脂を含むネガ型感光性樹脂組成物
US8703385B2 (en) * 2012-02-10 2014-04-22 3M Innovative Properties Company Photoresist composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2443785A1 (de) * 1974-09-13 1976-04-01 Basf Ag Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) * 1975-10-03 1978-03-14 Rohm And Haas Company Polyurethane thickeners in latex compositions
US4767826A (en) * 1985-07-18 1988-08-30 Polytechnic Institute Of New York Radiation-sensitive polymers
US4743698A (en) * 1985-10-01 1988-05-10 Alco Chemical Corp. Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
DE3639955A1 (de) * 1986-11-22 1988-05-26 Wolfen Filmfab Veb Verfahren zur herstellung fotopolymerisierbarer materialien
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JP3240769B2 (ja) * 1992-10-02 2001-12-25 ジェイエスアール株式会社 感光性樹脂組成物
JPH06258832A (ja) * 1992-11-17 1994-09-16 W R Grace & Co 感光性樹脂組成物
JPH06230573A (ja) * 1993-01-29 1994-08-19 Japan Synthetic Rubber Co Ltd レジスト組成物
DE69502741T2 (de) * 1994-01-10 1998-10-01 Du Pont Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung

Also Published As

Publication number Publication date
CN1106935A (zh) 1995-08-16
CN1071911C (zh) 2001-09-26
EP0664488B1 (en) 1998-03-11
IL112008A0 (en) 1995-03-15
DE69408969T2 (de) 1998-07-02
BR9500257A (pt) 1995-10-17
SG49621A1 (en) 1998-06-15
ATE164012T1 (de) 1998-03-15
DE69408969D1 (de) 1998-04-16
JPH07234507A (ja) 1995-09-05
IL112008A (en) 1999-03-12
AU660881B1 (en) 1995-07-06
EP0664488A1 (en) 1995-07-26
CA2133148A1 (en) 1995-07-26
CA2133148C (en) 1999-06-15
HK1005069A1 (en) 1998-12-18

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