ES2057445T5 - Procedimiento para depositar cobre por via quimica. - Google Patents

Procedimiento para depositar cobre por via quimica.

Info

Publication number
ES2057445T5
ES2057445T5 ES90313187T ES90313187T ES2057445T5 ES 2057445 T5 ES2057445 T5 ES 2057445T5 ES 90313187 T ES90313187 T ES 90313187T ES 90313187 T ES90313187 T ES 90313187T ES 2057445 T5 ES2057445 T5 ES 2057445T5
Authority
ES
Spain
Prior art keywords
procedure
electricity
metal
deposit
deposit copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES90313187T
Other languages
English (en)
Other versions
ES2057445T3 (es
Inventor
Peter E Kukanskis
Edward T Donlon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
MacDermid Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23959652&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2057445(T5) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by MacDermid Inc filed Critical MacDermid Inc
Application granted granted Critical
Publication of ES2057445T3 publication Critical patent/ES2057445T3/es
Publication of ES2057445T5 publication Critical patent/ES2057445T5/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/422—Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1619—Apparatus for electroless plating
    • C23C18/1628—Specific elements or parts of the apparatus
    • C23C18/163—Supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1655—Process features
    • C23C18/1664—Process features with additional means during the plating process
    • C23C18/1669—Agitation, e.g. air introduction
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • H05K3/0088—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/187—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating means therefor, e.g. baths, apparatus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0292—Using vibration, e.g. during soldering or screen printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

SE PRESENTA UN PROCESO PARA EL REVESTIMIENTO MECANICO QUE NO USA ELECTRICIDAD, PARTICULARMENTE PARA SER USADO EN SUBSTRATOS DE CIRCUITO IMPRESO PARA REVESTIR DE METAL A TRAVES DE AGUJEROS (14), Y MAS PARTICULARMENTE PARA DEPOSITAR ADITIVAMENTE METAL DE COBRE EN SUPERFICIES AGUJEREADAS, EN EL CUAL EL SUBSTRATO SE EXPONE AL MENOS INTERMITENTEMENTE A UN MOVIMIENTO DE VIBRACION EN CONTACTO CON UN BAÑO DE DEPOSITACION SIN ELECTRICIDAD, ASI MISMO (12) SE PRESENTA UN APARATO DEPOSITADOR DE METAL QUE FUNCIONA SIN ELECTRICIDAD PARA LLEVAR A CABO DICHO PROCESO.
ES90313187T 1990-03-14 1990-12-05 Procedimiento para depositar cobre por via quimica. Expired - Lifetime ES2057445T5 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07493296 US5077099B1 (en) 1990-03-14 1990-03-14 Electroless copper plating process and apparatus

Publications (2)

Publication Number Publication Date
ES2057445T3 ES2057445T3 (es) 1994-10-16
ES2057445T5 true ES2057445T5 (es) 1998-02-16

Family

ID=23959652

Family Applications (1)

Application Number Title Priority Date Filing Date
ES90313187T Expired - Lifetime ES2057445T5 (es) 1990-03-14 1990-12-05 Procedimiento para depositar cobre por via quimica.

Country Status (6)

Country Link
US (1) US5077099B1 (es)
EP (1) EP0446522B2 (es)
JP (1) JPH04228578A (es)
CA (1) CA2029090C (es)
DE (1) DE69009978T3 (es)
ES (1) ES2057445T5 (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05211384A (ja) * 1991-11-20 1993-08-20 Nec Corp 印刷配線板のめっき方法
FI98667C (fi) * 1993-07-08 1997-07-25 Picopak Oy Menetelmä ja laite kontaktinystyjen muodostamiseksi kemiallisesti puolijohdekiekoille
US5865894A (en) * 1997-06-11 1999-02-02 Reynolds Tech Fabricators, Inc. Megasonic plating system
KR100586481B1 (ko) 1997-09-02 2006-11-30 가부시키가이샤 에바라 세이사꾸쇼 기판을도금하는방법
US6071385A (en) * 1997-11-04 2000-06-06 The Boeing Company Racking fixture for electrochemical processing
DE10015349A1 (de) * 2000-03-23 2001-10-25 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum Behandeln von durchgehende Löcher und/oder Vertiefungen aufweisenden Schaltungsträgern sowie Anwendung des Verfahrens und Verwendung der Vorrichtung
JP2006093651A (ja) * 2004-08-26 2006-04-06 Ngk Spark Plug Co Ltd 配線基板の製造方法および配線基板製造用無電解メッキ装置
TWI314957B (en) * 2005-12-29 2009-09-21 Ind Tech Res Inst Apparatus for metal plating on a substrate
US20090238979A1 (en) * 2008-03-21 2009-09-24 William Decesare Method of Applying Catalytic Solution for Use in Electroless Deposition
JP5762137B2 (ja) * 2011-05-27 2015-08-12 上村工業株式会社 めっき方法
RU2573596C1 (ru) * 2014-09-19 2016-01-20 Акционерное общество "Концерн радиостроения "Вега" Устройство для очистки и химической металлизации отверстий заготовок печатных плат
US20220056589A1 (en) * 2020-08-21 2022-02-24 Advanced Semiconductor Engineering, Inc. Electroless semiconductor bonding structure, electroless plating system and electroless plating method of the same
CN113179593B (zh) * 2021-03-26 2022-09-06 赣州金顺科技有限公司 一种电路板沉铜浸酸的预浸支撑桥架及其实施工艺

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
FR1412339A (fr) * 1964-10-23 1965-09-24 Produktionsgenossenschaft Des Dispositif pour argenter intérieurement des objets en verre, en particulier des articles pour arbre de noël
US3577324A (en) * 1968-01-24 1971-05-04 Sondell Research Dev Co Process of coating particles with metals
US3615735A (en) * 1968-08-13 1971-10-26 Shipley Co Electroless copper plating
US3934054A (en) * 1969-08-25 1976-01-20 Electro Chemical Engineering Gmbh Electroless metal plating
US3667590A (en) * 1970-01-02 1972-06-06 Dennis E Mead Vibratory pile feeder
JPS525873A (en) * 1975-07-02 1977-01-17 Toyoda Automatic Loom Works Plating of synthetic resin goods
US4209331A (en) * 1978-05-25 1980-06-24 Macdermid Incorporated Electroless copper composition solution using a hypophosphite reducing agent
US4279948A (en) * 1978-05-25 1981-07-21 Macdermid Incorporated Electroless copper deposition solution using a hypophosphite reducing agent
US4228213A (en) * 1979-08-13 1980-10-14 Western Electric Company, Inc. Method of depositing a stress-free electroless copper deposit
CA1219179A (en) * 1982-09-27 1987-03-17 Etd Technology, Inc. Apparatus and method for electroless plating
US4734296A (en) * 1982-09-27 1988-03-29 Etd Technology, Inc. Electroless plating of through-holes using pressure differential
US4597988A (en) * 1983-06-06 1986-07-01 Macdermid, Incorporated Process for preparing printed circuit board thru-holes
US4756930A (en) * 1983-06-06 1988-07-12 Macdermid, Incorporated Process for preparing printed circuit board thru-holes
US4608275A (en) * 1983-07-01 1986-08-26 Macdermid, Incorporated Oxidizing accelerator
JPS6067674A (ja) * 1983-09-21 1985-04-18 Komatsu Ltd 無電解めつき法
JPS6162655A (ja) * 1984-09-04 1986-03-31 Koji Yoshimura 摩擦減速機
US4695505A (en) * 1985-10-25 1987-09-22 Shipley Company Inc. Ductile electroless copper
JPS62154797A (ja) * 1985-12-27 1987-07-09 株式会社　プランテツクス プリント基板製造装置
JPH0666550B2 (ja) * 1988-07-12 1994-08-24 株式会社プランテックス プリント基板製造装置

Also Published As

Publication number Publication date
EP0446522A1 (en) 1991-09-18
JPH04228578A (ja) 1992-08-18
US5077099A (en) 1991-12-31
DE69009978T3 (de) 1998-01-29
EP0446522B1 (en) 1994-06-15
CA2029090C (en) 1998-04-14
CA2029090A1 (en) 1991-09-15
EP0446522B2 (en) 1997-08-27
ES2057445T3 (es) 1994-10-16
US5077099B1 (en) 1997-12-02
DE69009978T2 (de) 1994-10-27
DE69009978D1 (de) 1994-07-21

Similar Documents

Publication Publication Date Title
ES2057445T5 (es) Procedimiento para depositar cobre por via quimica.
MX144954A (es) Mejoras en metodo para metalizar un circuito semiconductor integrado
SE8402705D0 (sv) Losning for borttagning av lodmetall
DK0502120T3 (da) Fremgangsmåde til direkte elektroplettering af et dielektrisk substrat
NL191641C (nl) Werkwijze voor het vervaardigen van een grondplaat met een geleiderpatroon uit veel draden voor toepassing als drager van elektronische componenten.
GB724379A (en) A method for making a predetermined metallic pattern on an insulating base
ES2028084T3 (es) Un catodo adecuado para su uso en procesos electroquimicos que desprenden hidrogeno.
EP0248683A3 (en) Composition and process for the electrolytic coating of circuit boards without an electroless metal coating
SE7903711L (sv) Sett och bad for pletering
ES8304224A1 (es) Un procedimiento para la produccion de depositos de metal de paladio sobre un sustrato.
JPS54131868A (en) Electronic apparatus terminal for through-hole
JPS543843A (en) Surface treatment of base material for imparting electrical conductivity
JPS5545501A (en) Soldering tool
ES466175A1 (es) Metodo para fabricar un captador de energia solar.
JPS53121489A (en) Semiconductor device
JPS5437581A (en) Wafer etching device
JPS5266374A (en) Galvanization of non electrolytic nickel for semiconductor substrate
JPS5330404A (en) Depositing method for metal from solution of metal salt by electrolysis
JPS5427362A (en) Semiconductor device
JPS5564201A (en) Copper mirror
Holtzman Composition and Process for the Electrolytic Coating of Circuit Boards Without an Electroless Metal Coating
JPS56142886A (en) Tin plating method for aluminum alloy
JPS548466A (en) One side etching method of semiconductor wafer
JPS5571043A (en) Semiconductor device
JPS53145470A (en) Evaporation wiring treating method

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 446522

Country of ref document: ES