DE69009978T3 - Verfahren zum stromlosen Abscheiden von Kupfer. - Google Patents

Verfahren zum stromlosen Abscheiden von Kupfer.

Info

Publication number
DE69009978T3
DE69009978T3 DE69009978T DE69009978T DE69009978T3 DE 69009978 T3 DE69009978 T3 DE 69009978T3 DE 69009978 T DE69009978 T DE 69009978T DE 69009978 T DE69009978 T DE 69009978T DE 69009978 T3 DE69009978 T3 DE 69009978T3
Authority
DE
Germany
Prior art keywords
electroless copper
copper deposition
deposition
electroless
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69009978T
Other languages
English (en)
Other versions
DE69009978D1 (de
DE69009978T2 (de
Inventor
Peter E Kukanskis
Edward T Donlon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
MacDermid Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23959652&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69009978(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by MacDermid Inc filed Critical MacDermid Inc
Publication of DE69009978D1 publication Critical patent/DE69009978D1/de
Publication of DE69009978T2 publication Critical patent/DE69009978T2/de
Application granted granted Critical
Publication of DE69009978T3 publication Critical patent/DE69009978T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/422Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1619Apparatus for electroless plating
    • C23C18/1628Specific elements or parts of the apparatus
    • C23C18/163Supporting devices for articles to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1655Process features
    • C23C18/1664Process features with additional means during the plating process
    • C23C18/1669Agitation, e.g. air introduction
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • H05K3/0088Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/187Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating means therefor, e.g. baths, apparatus
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0292Using vibration, e.g. during soldering or screen printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Electroplating Methods And Accessories (AREA)
DE69009978T 1990-03-14 1990-12-05 Verfahren zum stromlosen Abscheiden von Kupfer. Expired - Lifetime DE69009978T3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07493296 US5077099B1 (en) 1990-03-14 1990-03-14 Electroless copper plating process and apparatus

Publications (3)

Publication Number Publication Date
DE69009978D1 DE69009978D1 (de) 1994-07-21
DE69009978T2 DE69009978T2 (de) 1994-10-27
DE69009978T3 true DE69009978T3 (de) 1998-01-29

Family

ID=23959652

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69009978T Expired - Lifetime DE69009978T3 (de) 1990-03-14 1990-12-05 Verfahren zum stromlosen Abscheiden von Kupfer.

Country Status (6)

Country Link
US (1) US5077099B1 (de)
EP (1) EP0446522B2 (de)
JP (1) JPH04228578A (de)
CA (1) CA2029090C (de)
DE (1) DE69009978T3 (de)
ES (1) ES2057445T5 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05211384A (ja) * 1991-11-20 1993-08-20 Nec Corp 印刷配線板のめっき方法
FI98667C (fi) * 1993-07-08 1997-07-25 Picopak Oy Menetelmä ja laite kontaktinystyjen muodostamiseksi kemiallisesti puolijohdekiekoille
US5865894A (en) * 1997-06-11 1999-02-02 Reynolds Tech Fabricators, Inc. Megasonic plating system
EP0901153B1 (de) 1997-09-02 2009-07-15 Ebara Corporation Verfahren und Vorrichtung zum Aufbringen einer Schichten auf einen Körper
US6071385A (en) * 1997-11-04 2000-06-06 The Boeing Company Racking fixture for electrochemical processing
DE10015349A1 (de) * 2000-03-23 2001-10-25 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum Behandeln von durchgehende Löcher und/oder Vertiefungen aufweisenden Schaltungsträgern sowie Anwendung des Verfahrens und Verwendung der Vorrichtung
JP2006093651A (ja) * 2004-08-26 2006-04-06 Ngk Spark Plug Co Ltd 配線基板の製造方法および配線基板製造用無電解メッキ装置
TWI314957B (en) * 2005-12-29 2009-09-21 Ind Tech Res Inst Apparatus for metal plating on a substrate
US20090238979A1 (en) * 2008-03-21 2009-09-24 William Decesare Method of Applying Catalytic Solution for Use in Electroless Deposition
JP5762137B2 (ja) * 2011-05-27 2015-08-12 上村工業株式会社 めっき方法
RU2573596C1 (ru) * 2014-09-19 2016-01-20 Акционерное общество "Концерн радиостроения "Вега" Устройство для очистки и химической металлизации отверстий заготовок печатных плат
US20220056589A1 (en) * 2020-08-21 2022-02-24 Advanced Semiconductor Engineering, Inc. Electroless semiconductor bonding structure, electroless plating system and electroless plating method of the same
CN113179593B (zh) * 2021-03-26 2022-09-06 赣州金顺科技有限公司 一种电路板沉铜浸酸的预浸支撑桥架及其实施工艺

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
FR1412339A (fr) * 1964-10-23 1965-09-24 Produktionsgenossenschaft Des Dispositif pour argenter intérieurement des objets en verre, en particulier des articles pour arbre de noël
US3577324A (en) * 1968-01-24 1971-05-04 Sondell Research Dev Co Process of coating particles with metals
US3615735A (en) * 1968-08-13 1971-10-26 Shipley Co Electroless copper plating
US3934054A (en) * 1969-08-25 1976-01-20 Electro Chemical Engineering Gmbh Electroless metal plating
US3667590A (en) * 1970-01-02 1972-06-06 Dennis E Mead Vibratory pile feeder
JPS525873A (en) * 1975-07-02 1977-01-17 Toyoda Automatic Loom Works Plating of synthetic resin goods
US4209331A (en) * 1978-05-25 1980-06-24 Macdermid Incorporated Electroless copper composition solution using a hypophosphite reducing agent
US4279948A (en) * 1978-05-25 1981-07-21 Macdermid Incorporated Electroless copper deposition solution using a hypophosphite reducing agent
US4228213A (en) * 1979-08-13 1980-10-14 Western Electric Company, Inc. Method of depositing a stress-free electroless copper deposit
CA1219179A (en) * 1982-09-27 1987-03-17 Etd Technology, Inc. Apparatus and method for electroless plating
US4734296A (en) * 1982-09-27 1988-03-29 Etd Technology, Inc. Electroless plating of through-holes using pressure differential
US4756930A (en) * 1983-06-06 1988-07-12 Macdermid, Incorporated Process for preparing printed circuit board thru-holes
US4597988A (en) * 1983-06-06 1986-07-01 Macdermid, Incorporated Process for preparing printed circuit board thru-holes
US4608275A (en) * 1983-07-01 1986-08-26 Macdermid, Incorporated Oxidizing accelerator
JPS6067674A (ja) * 1983-09-21 1985-04-18 Komatsu Ltd 無電解めつき法
JPS6162655A (ja) * 1984-09-04 1986-03-31 Koji Yoshimura 摩擦減速機
US4695505A (en) * 1985-10-25 1987-09-22 Shipley Company Inc. Ductile electroless copper
JPS62154797A (ja) * 1985-12-27 1987-07-09 株式会社 プランテツクス プリント基板製造装置
JPH0666550B2 (ja) * 1988-07-12 1994-08-24 株式会社プランテックス プリント基板製造装置

Also Published As

Publication number Publication date
JPH04228578A (ja) 1992-08-18
DE69009978D1 (de) 1994-07-21
CA2029090A1 (en) 1991-09-15
ES2057445T3 (es) 1994-10-16
DE69009978T2 (de) 1994-10-27
EP0446522B2 (de) 1997-08-27
US5077099A (en) 1991-12-31
ES2057445T5 (es) 1998-02-16
EP0446522A1 (de) 1991-09-18
EP0446522B1 (de) 1994-06-15
US5077099B1 (en) 1997-12-02
CA2029090C (en) 1998-04-14

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings