EP4077770A1 - Galvanisierzusammensetzung und verfahren zum abscheiden einer chrombeschichtung auf einem substrat - Google Patents

Galvanisierzusammensetzung und verfahren zum abscheiden einer chrombeschichtung auf einem substrat

Info

Publication number
EP4077770A1
EP4077770A1 EP20838402.4A EP20838402A EP4077770A1 EP 4077770 A1 EP4077770 A1 EP 4077770A1 EP 20838402 A EP20838402 A EP 20838402A EP 4077770 A1 EP4077770 A1 EP 4077770A1
Authority
EP
European Patent Office
Prior art keywords
electroplating composition
electroplating
substrate
preferred
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20838402.4A
Other languages
English (en)
French (fr)
Inventor
Simon Pape
Jana Breitfelder
Anke WALTER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Publication of EP4077770A1 publication Critical patent/EP4077770A1/de
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used

Definitions

  • WO 2018/185154 A1 discloses a method for electrolytically depositing a chro mium or chromium alloy coating on a substrate.
  • US 4,009,085 discloses lubricating compositions and a process for treating a metal sheet to impart lubricity and abrasion resistance thereto.
  • US 3,432,408 A relates to the prevention of mist and spray in acidic hexavalent electroplating baths.
  • At least one complexing agent for the trivalent chromium ions at least one additive selected from the group consisting of betaines, polymeric glycols, monomeric diols, and mixtures thereof.
  • the electroplating composition of the present invention comprises at least one additive selected from the group consisting of betaines, polymeric glycols, mon omeric diols and mixtures thereof.
  • the electroplating composition of the present invention is an aqueous electroplating composition comprising trivalent chromium ions.
  • the electroplating composition comprises further additives and/or metal ions, more preferably iron ions, nickel ions, copper ions and/or zinc ions.
  • the electroplating composition of the present invention is preferably used more than one time for depositing a chromium coating on a plurality of different sub strates, preferably during a continuous process.
  • the electroplating composition is repeatedly utilized during electroplating, preferably for a usage of at least 100 Ah per liter electroplating composition, preferably at least 150 Ah per liter, more preferably at least 200 Ah per liter, most preferably at least 300 Ah per liter.
  • ester comprises C 8 -C 20 ester, more preferably C 9 -C 17 ester, most pref erably C10-C16 ester.
  • amide comprises C8-C 20 amide, more preferably C9-C 17 amide, most preferably C 10 -C 16 amide.
  • N-substituted-N,N-Dialkyl-ammonium sulfobetaines and the N-substituted-N,N- Dialkyl-N-alkyl ammonium sulfobetaines, respectively, is N-substituted with a substituent selected from the group consisting of alkyl, and amidoalkyl, wherein amidoalkyl is preferably cocoamidopropyl.
  • CCE cathodic current efficiency
  • an electroplating composition of the present invention wherein the electroplating composition comprises the betaines in a total concentration in a range from 0.0005 g/L to 1 g/L, based on the total volume of the electroplating composition, preferably from 0.001 g/L to 0.5 g/L, more preferably from 0.005 g/L to 0.3 g/L, and most preferably from 0.01 g/L to 0.2 g/L.
  • the polymeric glycols are polyalkylene glycols, preferably polyethylene glycols.
  • CCE cathodic current efficiency
  • an electroplating composition of the present inven tion wherein the monomeric diols comprise, in addition to the C1-C10 diols and its preferred variants, or alternatively to the C1-C10 diols, and its preferred variants, preferably in addition, one or more than one C11-C25 diol, preferably one or more than one C12-C23 diol, more preferably one or more than one C13-C21 diol, even more preferably one or more than one C 14 -C 20 diol, most preferably one or more than one C 15 -C 19 diol, even most preferably one or more than one C 16 -C 18 diol, most preferably in combination with one or more than one betaine.
  • the monomeric diols comprise, in addition to the C1-C10 diols and its preferred variants, or alternatively to the C1-C10 diols, and its preferred variants, preferably in addition, one or more than one C11-C25 diol
  • an electroplating composition of the present invention wherein the one or more than one C11-C25 diol, and its preferred variants, comprises an anti foam compound.
  • the one or more than one C11-C25 diol, and its preferred variants comprises an anti foam compound.
  • C11-C25 diols have the potential to function as an anti-foam compound.
  • Ci to C10 diols are often excellent solvents for aforementioned anti-foam compounds.
  • the electroplating composition of the present invention comprises one or more than one betaine, most preferably if the electroplating composition of the present invention comprises one or more than one betaine and one or more than one C11-C25 diol, and its preferred variants.
  • the trivalent chromium ions can be efficiently stabilized in the electroplat ing composition by the complexing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
EP20838402.4A 2019-12-18 2020-12-17 Galvanisierzusammensetzung und verfahren zum abscheiden einer chrombeschichtung auf einem substrat Pending EP4077770A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19217662 2019-12-18
PCT/EP2020/086688 WO2021122932A1 (en) 2019-12-18 2020-12-17 Electroplating composition and method for depositing a chromium coating on a substrate

Publications (1)

Publication Number Publication Date
EP4077770A1 true EP4077770A1 (de) 2022-10-26

Family

ID=69024102

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20838402.4A Pending EP4077770A1 (de) 2019-12-18 2020-12-17 Galvanisierzusammensetzung und verfahren zum abscheiden einer chrombeschichtung auf einem substrat

Country Status (6)

Country Link
US (1) US20230015534A1 (de)
EP (1) EP4077770A1 (de)
JP (1) JP2023507017A (de)
KR (1) KR20220116477A (de)
CN (1) CN114829677A (de)
WO (1) WO2021122932A1 (de)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL75772C (de) 1948-03-20
US3432408A (en) 1966-08-03 1969-03-11 Udylite Corp Chromium plating electrolyte and method for preventing mist therein
US4009085A (en) 1975-01-31 1977-02-22 M & T Chemicals Inc. Lubricating coating for metal sheet
US4450052A (en) 1982-07-28 1984-05-22 M&T Chemicals Inc. Zinc and nickel tolerant trivalent chromium plating baths
EP2705176B1 (de) 2011-05-03 2016-04-13 ATOTECH Deutschland GmbH Galvanisierungsbad und verfahren zur herstellung von dunklen chromschichten
EP2899299A1 (de) 2014-01-24 2015-07-29 COVENTYA S.p.A. Galvanisierbad auf der Basis von dreiwertigem Chrom und Verfahren zur Abscheidung von Chrom
GB2534883A (en) 2015-02-03 2016-08-10 Univ Leicester Electrolyte for electroplating
CN105063676A (zh) * 2015-08-17 2015-11-18 内蒙古第一机械集团有限公司 一种三价铬电镀硬铬的方法
US9850588B2 (en) * 2015-09-09 2017-12-26 Rohm And Haas Electronic Materials Llc Bismuth electroplating baths and methods of electroplating bismuth on a substrate
CN110446802B (zh) 2017-04-04 2023-02-28 安美特德国有限公司 在至少一个基底上电解沉积铬或铬合金层的方法
CN108034969A (zh) 2017-12-15 2018-05-15 闽南师范大学 一种硫酸盐三价铬镀铬电镀液及其应用方法

Also Published As

Publication number Publication date
US20230015534A1 (en) 2023-01-19
CN114829677A (zh) 2022-07-29
WO2021122932A1 (en) 2021-06-24
KR20220116477A (ko) 2022-08-23
JP2023507017A (ja) 2023-02-20

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Owner name: ATOTECH DEUTSCHLAND GMBH & CO. KG