EP3880621A1 - Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier - Google Patents
Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrierInfo
- Publication number
- EP3880621A1 EP3880621A1 EP18821709.5A EP18821709A EP3880621A1 EP 3880621 A1 EP3880621 A1 EP 3880621A1 EP 18821709 A EP18821709 A EP 18821709A EP 3880621 A1 EP3880621 A1 EP 3880621A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- stack
- layer
- layers
- functional
- essentially
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000011521 glass Substances 0.000 title claims abstract description 18
- 238000005530 etching Methods 0.000 title description 8
- 229920005989 resin Polymers 0.000 claims abstract description 65
- 239000011347 resin Substances 0.000 claims abstract description 65
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 35
- 239000011707 mineral Substances 0.000 claims abstract description 35
- 239000007787 solid Substances 0.000 claims abstract description 30
- 238000010438 heat treatment Methods 0.000 claims abstract description 26
- 239000000203 mixture Substances 0.000 claims abstract description 21
- 239000007788 liquid Substances 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 15
- 230000008030 elimination Effects 0.000 claims abstract description 6
- 238000003379 elimination reaction Methods 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims description 83
- 239000002904 solvent Substances 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 10
- 238000005240 physical vapour deposition Methods 0.000 claims description 9
- 238000002485 combustion reaction Methods 0.000 claims description 8
- 239000012705 liquid precursor Substances 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 238000005452 bending Methods 0.000 claims description 4
- 238000004377 microelectronic Methods 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 4
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 4
- 238000010791 quenching Methods 0.000 claims description 4
- 230000000171 quenching effect Effects 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 3
- 239000002346 layers by function Substances 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052793 cadmium Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000004744 fabric Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 238000007654 immersion Methods 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 229910003437 indium oxide Inorganic materials 0.000 claims description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000178 monomer Substances 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 229920003986 novolac Polymers 0.000 claims description 2
- 239000011368 organic material Substances 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- 239000004814 polyurethane Substances 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 2
- 239000002243 precursor Substances 0.000 claims description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 229940071182 stannate Drugs 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims 1
- 239000012044 organic layer Substances 0.000 claims 1
- 125000005402 stannate group Chemical group 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 238000004132 cross linking Methods 0.000 abstract description 3
- 239000013067 intermediate product Substances 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 4
- 229910001120 nichrome Inorganic materials 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010329 laser etching Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- BTZVKSVLFLRBRE-UHFFFAOYSA-N 2-methoxypropyl acetate Chemical compound COC(C)COC(C)=O BTZVKSVLFLRBRE-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 230000003471 anti-radiation Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- NJWNEWQMQCGRDO-UHFFFAOYSA-N indium zinc Chemical compound [Zn].[In] NJWNEWQMQCGRDO-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/02—Re-forming glass sheets
- C03B23/023—Re-forming glass sheets by bending
- C03B23/03—Re-forming glass sheets by bending by press-bending between shaping moulds
- C03B23/0307—Press-bending involving applying local or additional heating, cooling or insulating means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/34—Masking
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/355—Temporary coating
Definitions
- the invention relates to glazing on which a physical vapor deposition process (PVD for Physical Vapor Deposition) has been deposited under vacuum, mainly cathode sputtering assisted by magnetron, chemical vapor deposition assisted by plasma (PECVD for Plasma Enhanced Chemical Vapor Deposition) or evaporation or a liquid deposition process, of one or more thin layers having a spatial structure on scales that can vary from several cm to less than 10pm.
- PVD Physical Vapor Deposition
- PECVD Plasma Enhanced Chemical Vapor Deposition
- evaporation or a liquid deposition process of one or more thin layers having a spatial structure on scales that can vary from several cm to less than 10pm.
- the products targeted are varied: silver layers (solar control, low-emissivity, electromagnetic shielding, heating), layers modifying the level of reflection in the visible (anti-reflection or mirror layers), transparent or non-transparent electrode layers, layers electrochromic, electroluminescent, anti-iridescence, anti-fouling, anti-scratch, magnetic, colored or absorbent layers to modify the transmittance in the visible for aesthetic purposes.
- the products concerned are in particular the stacks deposited by magnetron sputtering.
- glazing covered with a conductive layer ensuring an electrode role - for example for a heating function (eglass for building applications, windshield or lateral heating (e) for automotive or aeronautical applications) or can be used as an antenna to receive electromagnetic waves.
- a heating function eglass for building applications, windshield or lateral heating (e) for automotive or aeronautical applications
- e glass for building applications, windshield or lateral heating (e) for automotive or aeronautical applications
- a particular case concerns the microwave band around the GHz (100pm ⁇ l ⁇ 1 m) which finds applications for radio transmissions (GSM, Satellite, Radar ).
- GSM Global System for Satellite, Radar
- the possibility of structuring the layer on a scale lower than that of the wavelength gives access to the range of metamaterials where the electromagnetic transmission can be modulated.
- the highly conductive layer and without earthing causes significant attenuation of the high frequency electromagnetic waves and it is difficult to ensure the compromise between thermal control (above the reduction of temperature rise in a vehicle) and good reception of communication signals.
- the conventional attenuation on a windshield of a thermal control layer can be for example from -30 to -45dB approximately between 0.4 and 5 GHz.
- the thermal control function can be provided not by a thin conductive layer but not a polyvinyl butyral (PVB) interlayer or other containing nanoparticles of a conductive compound such as oxide indium doped with tin (ITO for indium tin oxide) for example.
- ITO oxide indium doped with tin
- the thermal control is ensured by absorption and no longer reflection of the energy part of the spectrum.
- This solution is only possible for solar control, and not very effective compared to the reflection solution and requires laminated glazing.
- the second solution consists in etching the silver layer after deposition so as to selectively remove the silver on strips which are sufficiently thin (100 ⁇ m) to be difficult to perceive by the eye and spaced apart from each other by a few mm depending on the wavelengths which we wish to favor the transmission.
- Complex patterns can be used for this full face application. Representatives of this technique are in particular documents W09954961 A1 and WO2014033007 A1.
- the heating efficiency of a conductive layer depends on its surface or surface resistance R sq or R n , on the voltage between the electrodes but also on the distance between the electrodes. For building applications, this dependence poses a problem because, with the same electrical source, an electrical resistance of the glazing is required for each size of the heating zone.
- One solution may consist in etching once more for example a base layer Ag so as to modulate its overall surface resistance to allow it to be compatible with the distance between electrodes and the desired surface heating power.
- a silver-based glazing can be functionalized in the form of an antenna provided that the electromagnetic decoupling of the layer with the frame of the car is ensured, for example. This is also done by engraving.
- the alternative selective etching methods mainly come from the microelectronics industry. Some use temporary layers, others consist of direct etching.
- photolithography uses temporary layers to serve as a mask for selective acid attacks.
- Photo lithography allows very fine engravings (45-90 nm today industrially) but remains limited to the size of the masks today limited by the size of the optics.
- the laser etching of the conductive layer is provided by a point etching laser which will sublimate the thin layer stack by scanning the beam. This operation has low productivity on large glazing units and requires significant investment with regard to the surfaces treated.
- the impact etching of ions or electrons has the same limitations as laser etching in terms of productivity.
- inkjet printing techniques are still limited for sizes greater than 10 m 2 at printing times greater than one minute.
- Screen printing may be preferred to other techniques when a resolution scale smaller than 50 ⁇ m is sought: this process in fact provides relatively poor edge qualities at these small scales.
- the object of the invention is therefore to provide functional glazing units which allow radio frequencies to pass.
- functional glazing here means antenna glazing, heating, with thermal control, or the like, glazing with or without electrically conductive layer (s), as well as all the other glazings mentioned above.
- Radiofrequencies are high frequency electromagnetic waves, around the GHz, and find applications in radio transmissions (GSM, satellite, radar ...), communication (for example 2G / 3G / 4G).
- the invention relates to a method of depositing on a glass substrate a layer or a stack of layers essentially mineral (s) functional (s), characterized in that it comprises the steps consisting in
- the crosslinking of the resin by laser makes it possible to harden it along an extremely fine line, with a width of the order of a few tens of microns or even less, generally between 5 and 100 ⁇ m.
- a width of the order of a few tens of microns or even less generally between 5 and 100 ⁇ m.
- heat treatment is not necessary, the line of organic resin and the layer or the magnetron stack which covers it can be eliminated only by wiping techniques, blowing gaseous, washing, etc.
- a heat treatment can also be carried out in this case, in particular with a view to giving the glass substrate improved mechanical properties.
- the technique according to the invention provides excellent quality of the substrate and especially of the edges of areas not coated with the organic coating and covered with the mineral layer (s) (sharpness, resolution).
- the method makes it possible to produce an essentially organic coating pattern on an industrial production line, on a large surface substrate.
- the reduced cycle time makes it possible to validate the industrially applicable character.
- the liquid precursor composition of a photosensitive resin is deposited using a Mayer bar, a film puller, a spinner, by immersion or the like;
- the liquid precursor composition of a photosensitive resin is of the type which can be used for photolithography, in particular in the field of microelectronics, and comprises an epoxy resin in a solvent such as cyclopentanone, a monomer and / or oligomer acrylate, epoxyacrylate, polyester acrylate , polyurethane acrylate, polyvinylpyrrolidone + EDTA composition, polyamide, polyvinylbutyral, positive photosensitive resin of diazonaphthoquinone-novolak type, any organic material crosslinkable under ultraviolet, infrared or visible radiation, alone or as a mixture of several of them;
- a solvent such as cyclopentanone, a monomer and / or oligomer acrylate, epoxyacrylate, polyester acrylate , polyurethane acrylate, polyvinylpyrrolidone + EDTA composition, polyamide, polyvinylbutyral, positive photosensitive resin of diazonaphthoquinon
- the liquid precursor composition of a photosensitive resin is deposited on the substrate in a thickness of between 1 and 40 ⁇ m; in the context of the invention, this can be considered to be approximately equivalent to the thickness of the solid resin after crosslinking; this thickness must be sufficient to guarantee the elimination of the magnetron layer or stack in accordance with sharp edges, sufficiently resolved;
- the pattern of crosslinked solid resin comprises lines of widths between 5 and 20 ⁇ m; below 5 pm, the loss of the electromagnetic wave signal is too great to achieve the aim of the invention; above 20 pm, especially from 30, the ablation line of the magnetron layer or stack begins to be visible, even with difficulty, depending on the light conditions, contrast;
- the coated substrate is immersed in a good solvent for the noncrosslinked liquid composition, then it is extracted therefrom, then good solvent is gently sprayed onto the substrate, then the surface of the substrate is washed by gently spraying a solvent such as isopropanol to remove the correct solvent and in the vicinity of the crosslinked solid resin pattern, then the substrate and the crosslinked solid resin pattern are dried with a flow of gas such as nitrogen or air;
- the layer or stack of layers essentially functional mineral (s) is formed by a physical vapor deposition (PVD for Physical Vapor Deposition) process under vacuum such as cathode sputtering, in particular assisted by magnetron, evaporation or chemical vapor deposition assisted by plasma (PECVD for Plasma Enhanced Chemical Vapor Deposition) or by liquid;
- PVD physical vapor deposition
- PECVD Plasma Enhanced Chemical Vapor Deposition
- the layer or stack of layers essentially functional mineral (s) consists of Ag, transparent conductive oxide (TCO) such as indium oxide doped with tin (ITO), oxide indium zinc doped (IZO), ZnO: AI, Ga, cadmium stannate, Al, Nb, Cu, Au, compound of Si and N such as Si 3 N 4 , dielectric stack afferent, alone or in combination of several of them ;
- TCO transparent conductive oxide
- ITO indium oxide doped with tin
- IZO oxide indium zinc do
- the thickness of the layer or the stack of essentially functional mineral (s) layers is at least ten times less than that of the crosslinked solid resin pattern, and is in particular at most equal to 300, preferably 200 and especially 150 nm; this eliminates the fraction covering the solid resin crosslinked along sharp edges, as already mentioned above.
- the glass can no longer be cut once tempered, it can be, in certain applications, for example building, stored then cut, demarcated, etc. before tempering.
- This glazing can be sold as such, mainly in this case with the pattern of crosslinked solid resin and the magnetron layer or stack, then removed by quenching in a transformer, in accordance with the process of the invention.
- the heat treatment is part of a thermal quenching of the glass substrate.
- the resin disappears by combustion and effectively eliminates the layer or stack of layers essentially mineral (s) functional (s), possibly conductive (s) at the locations of the resin patterns, which causes selective etching wanted.
- the heat treatment forms part of a bending of the glass substrate, in particular of a bending by pressing.
- a preliminary heat treatment causes the combustion of the resin, then any pulverulent residue of combustion of the resin as well as the fraction of the magnetron layer or stack covering the crosslinked resin pattern is eliminated by any suitable means. , before the pressing tools come into contact with the glass substrate.
- at least one essentially organic photosensitive resin sequence is deposited again - layer or stack of essentially functional mineral layer (s) (s).
- This deposition is preferably carried out before the heat treatment for the combustion of the essentially organic resin closest to the substrate, and a subsequent heat treatment will produce the combustion of several superimposed essentially organic resins as well as the subsequent elimination of several layers or stacks of essentially functional mineral layers covering them.
- essentially organic resin sequences - layer or stack of essentially mineral (s) functional layer (s) from the second sequence, after the heat treatment of combustion of the first essentially organic resin and wiping or elimination by gas blast of its organic residues and of the mineral residues covering them, also forms part of the invention.
- the glass substrate obtained by the process of the invention is also capable of being integrated into a laminated glazing or other laminated composite product, and / or into a multiple glazing.
- s essentially mineral
- s essentially mineral
- a uniform thickness of a composition is applied by spin-coating (spinner) liquid precursor of an organic photosensitive resin, sold by the company MicroChem Corp under the registered trademark MicroChem® SU-8 2015.
- This liquid composition contains in mass percentages:
- the substrate, the crosslinked solid resin pattern and the noncrosslinked liquid resin are placed for one minute in a bath of good solvent for the noncrosslinked resin. It is, as a percentage by mass,
- the substrate, the crosslinked solid resin pattern and the noncrosslinked liquid resin are then removed from the bath, then good solvent is gently sprayed using a pipette to complete the washing (removal) of the noncrosslinked liquid resin.
- the correct solvent is washed from the surface of the substrate and from the solid resin pattern crosslinked with isopropanol using a pipette.
- the substrate + the crosslinked solid resin pattern are dried with a flow of nitrogen.
- the lines of the crosslinked solid resin pattern are 30 +/- 2 ⁇ m wide, and 20 +/- 5 ⁇ m high.
- the crosslinked resin pattern is a 3 mm square mesh network (distance between the midpoints of two consecutive parallel lines).
- a stack of thin layers is deposited in a conforming manner by magnetron-assisted cathode sputtering on the glass + pattern of crosslinked solid resin.
- This stack of thin layers has the following constitution, in which the thicknesses are in nm: S1 3 N 4 20 / SnZnO 6 / ZnO 7 / NiCr 0.5 / Ag 9 / NiCr 0.5 / ZnO 5 / Si 3 N 4 40 / SnZnO 30 / ZnO 5 / NiCr 0.5 / Ag 14 / NiCr 0.5 / ZnO 5 / S13N4 28.
- the layers of ZnO are non-porous. This stack with thermal control function is hardenable.
- the glass substrate, the crosslinked solid resin pattern and the stack of mineral layers are tempered in a thermal annealing oven sold under the registered trademark Nabertherm® (model N41 / H), at 650 ° C for 10 minutes, in order to give the substrate and its stack of mineral layers their final mechanical properties. Tempering also partially removes the crosslinked solid resin pattern, thereby peeling off the mineral layers that cover it. Mechanical action should be taken to completely remove resin residue; for this purpose, this mechanical action is sufficient in the absence of the heat treatment because the lines of the pattern of crosslinked solid resin have a width less than 40 ⁇ m.
- the final product has the stack of thin layers described above, structured in a pattern corresponding to the negative of that produced with the resin.
- the transmission attenuation of the glazing of the invention comprising the magnetron stack except in a grid pattern of 3 mm X 3 mm, line width of 30 pm, is -9, respectively -19, respectively -25 dB.
- the transmission attenuation of the glazing of the invention is -9, respectively -19, respectively -25 dB.
- the transmission attenuation of the glazing of the invention is -9, respectively -19, respectively -25 dB.
- it is - 25, respectively -40, respectively -54 dB.
- the invention provides functional glazing with reduced attenuation of the transmission of waves of frequencies between 0.4 and 5 GHz.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/FR2018/052836 WO2020099729A1 (fr) | 2018-11-14 | 2018-11-14 | Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier |
Publications (1)
Publication Number | Publication Date |
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EP3880621A1 true EP3880621A1 (fr) | 2021-09-22 |
Family
ID=64734081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP18821709.5A Withdrawn EP3880621A1 (fr) | 2018-11-14 | 2018-11-14 | Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier |
Country Status (7)
Country | Link |
---|---|
US (1) | US20220073424A1 (fr) |
EP (1) | EP3880621A1 (fr) |
JP (1) | JP7234358B2 (fr) |
CN (1) | CN112969671A (fr) |
BR (1) | BR112021008628A2 (fr) |
CA (1) | CA3118348A1 (fr) |
WO (1) | WO2020099729A1 (fr) |
Families Citing this family (1)
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EP4118465A4 (fr) * | 2020-03-11 | 2024-03-13 | Labforinvention | Revêtements de fenêtres écoénergétiques |
Family Cites Families (21)
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DE2025122C3 (de) | 1969-07-17 | 1974-07-25 | Vianova-Kunstharz Ag, Wien | Verfahren zur Härtung von Anstrichstoffen und Überzügen mittels von einem Laser emittierter Infrarot-Strahlung |
LU86722A1 (fr) * | 1986-12-23 | 1988-07-14 | Glaverbel | Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse |
JPH06139845A (ja) * | 1992-10-27 | 1994-05-20 | Matsushita Electric Ind Co Ltd | パターン化した透明導電膜の形成方法 |
JPH10221522A (ja) * | 1997-02-07 | 1998-08-21 | Dainippon Printing Co Ltd | ブラックマトリックスの形成方法 |
DE19817712C1 (de) | 1998-04-21 | 2000-02-03 | Sekurit Saint Gobain Deutsch | Transparente Platte, insbesondere Glasscheibe mit einer Beschichtung und einem Strahlungsfenster |
US7645478B2 (en) * | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
JP2009061766A (ja) | 2007-08-13 | 2009-03-26 | Fujifilm Corp | 機能性支持体、グラフトポリマー層形成用材料、それにより得られるグラフトポリマー層積層体、金属イオン含有材料、及び、金属膜積層体 |
JP2011153035A (ja) | 2010-01-26 | 2011-08-11 | Central Glass Co Ltd | 車両用窓ガラスの製造方法 |
FR2959865B1 (fr) * | 2010-05-07 | 2013-04-05 | Commissariat Energie Atomique | Diminution des effets de casquettes dues a l'ablation laser d'un niveau metallique par utilisation d'une couche de polymere photo- ou thermo-reticulable non reticule |
GB201009847D0 (en) * | 2010-06-11 | 2010-07-21 | Dzp Technologies Ltd | Deposition method, apparatus, printed object and uses |
TW201333626A (zh) * | 2011-11-14 | 2013-08-16 | Orthogonal Inc | 用於圖案化使用非氟化光阻之有機材料的方法 |
JP2013145358A (ja) | 2011-12-16 | 2013-07-25 | Nitto Denko Corp | 赤外線反射フィルム |
ES2731756T3 (es) | 2012-08-28 | 2019-11-18 | Saint Gobain | Luna revestida con áreas parcialmente decapadas |
FR3005878B1 (fr) * | 2013-05-24 | 2016-05-27 | Saint Gobain | Procede d'obtention d'un substrat muni d'un revetement |
FR3010232A1 (fr) * | 2013-09-05 | 2015-03-06 | Commissariat Energie Atomique | Module photovoltaique semi-transparent et procede d'obtention correspondant. |
KR102582577B1 (ko) | 2014-05-23 | 2023-09-25 | 가부시끼가이샤 레조낙 | 레지스트 패턴의 형성 방법, 프린트 배선판의 제조 방법, 투영 노광용 감광성 수지 조성물 및 감광성 엘리먼트 |
PL234891B1 (pl) | 2014-07-04 | 2020-04-30 | Politechnika Wroclawska | Sposób wytwarzania cienkich i ultra cienkich warstw polimerowych na podłożach stałych |
CN107533286B (zh) | 2015-04-29 | 2022-02-08 | 3M创新有限公司 | 溶胀性成膜组合物及采用所述溶胀性成膜组合物进行纳米压印光刻的方法 |
FR3048245B1 (fr) * | 2016-02-26 | 2018-03-16 | Saint-Gobain Glass France | Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier |
FR3048244B1 (fr) * | 2016-02-26 | 2018-03-16 | Saint-Gobain Glass France | Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier |
CN106954347B (zh) | 2017-04-21 | 2019-10-01 | 北京石油化工学院 | 光打印制备纳米银线电路板的方法 |
-
2018
- 2018-11-14 JP JP2021523732A patent/JP7234358B2/ja active Active
- 2018-11-14 CN CN201880099520.9A patent/CN112969671A/zh active Pending
- 2018-11-14 BR BR112021008628-5A patent/BR112021008628A2/pt unknown
- 2018-11-14 WO PCT/FR2018/052836 patent/WO2020099729A1/fr unknown
- 2018-11-14 US US17/291,179 patent/US20220073424A1/en not_active Abandoned
- 2018-11-14 EP EP18821709.5A patent/EP3880621A1/fr not_active Withdrawn
- 2018-11-14 CA CA3118348A patent/CA3118348A1/fr active Pending
Also Published As
Publication number | Publication date |
---|---|
US20220073424A1 (en) | 2022-03-10 |
BR112021008628A2 (pt) | 2021-08-10 |
CA3118348A1 (fr) | 2020-05-22 |
CN112969671A (zh) | 2021-06-15 |
JP7234358B2 (ja) | 2023-03-07 |
JP2022510109A (ja) | 2022-01-26 |
WO2020099729A1 (fr) | 2020-05-22 |
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