EP3865312B1 - Procédé de fabrication d'un élément de sécurité - Google Patents

Procédé de fabrication d'un élément de sécurité Download PDF

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Publication number
EP3865312B1
EP3865312B1 EP20157388.8A EP20157388A EP3865312B1 EP 3865312 B1 EP3865312 B1 EP 3865312B1 EP 20157388 A EP20157388 A EP 20157388A EP 3865312 B1 EP3865312 B1 EP 3865312B1
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EP
European Patent Office
Prior art keywords
layer
embossing
motif
lacquer layer
lift
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Application number
EP20157388.8A
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German (de)
English (en)
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EP3865312A1 (fr
EP3865312C0 (fr
Inventor
Stephan Trassl
Sonja Landertshamer
Anita FUCHSBAUER
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Hueck Folien GmbH
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Hueck Folien GmbH
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Priority to EP20157388.8A priority Critical patent/EP3865312B1/fr
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Publication of EP3865312B1 publication Critical patent/EP3865312B1/fr
Publication of EP3865312C0 publication Critical patent/EP3865312C0/fr
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/29—Securities; Bank notes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/351—Translucent or partly translucent parts, e.g. windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/44—Marking by removal of material using mechanical means, e.g. engraving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/445—Marking by removal of material using chemical means, e.g. etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • B42D25/465—Associating two or more layers using chemicals or adhesives
    • B42D25/47—Associating two or more layers using chemicals or adhesives using adhesives

Definitions

  • the invention relates to a method for producing a security element with a security feature, which security feature comprises a first motif having a color-shifting effect and a second motif.
  • first motif and second motif are to be understood as meaning those optically perceptible components from which the optically perceptible form of the security feature, for example the shape of a pattern, is composed.
  • a security feature can be formed, for example, by characters, letters, numbers, lines, symbols, guilloches, lettering, symbols or motifs or combinations of the aforementioned elements, in particular in the form of a pattern.
  • one of the motifs represents a positive of the security feature, while the other motif represents a negative of the security feature. Only through the optical combination of the first motif and the second motif does the viewer receive a security feature with a complete, visually perceptible shape, in particular with optically perceptible contours and outlines.
  • the first motif is generally that optically perceptible component of the security element which defines the contours, lines or line structures and/or outlines or outline lines.
  • the first motif can therefore also be referred to as a contour or contour structure.
  • the second motif is usually that optically perceptible component of the security element which is at least partially flat and whose shape is essentially determined by the first motif.
  • the second motif can therefore also are referred to as surface patterns, surface structures or pattern structures.
  • the circular line would correspond to the first motif, while the area within the circular line and/or the area between the circular line and an outer boundary of the security element would form the second motif.
  • valuable documents refers to banknotes, stocks, bonds, certificates, vouchers, checks, high-quality admission tickets, labels for product security, credit or cash cards.
  • valuable documents can also be viewed as valuable documents, especially if they include security paper.
  • security features are generally provided, such as a security thread or a watermark that is at least partially incorporated into the paper .
  • further security features can be formed by security elements, for example window films, security threads, security tapes or security strips, which are glued or laminated onto the document of value or integrated into the document of value.
  • Such security elements usually include a polymer or polymer compositions as the carrier substrate or base material.
  • security elements typically have optically variable security features such as holograms or certain color-shifting effects to ensure better protection against counterfeiting.
  • optically variable security elements is that the security features on these security elements cannot be imitated by simply copying them with copiers, since the effects of an optically variable security feature are lost through copying or even only appear black.
  • a method for producing a security element with color change properties in which a thin-film element is formed by means of a structured spacer layer which is arranged between an absorber layer and a reflection layer.
  • This structured spacer layer is produced either by a printing process or by filling a pre-embossed relief structure. Accordingly, the structured spacer layer defines a pattern arrangement which has a color shift effect.
  • a manufacturing process for a security element comprising a carrier and an embossing lacquer layer with a first and a second relief structure is known. Disclosed are the process steps of printing the first and second relief structures with a printing layer and printing a soluble wash ink, with the areas of the first and second relief structures remaining free. Subsequently, the full-surface application of a colored thin-film element and the subsequent washing out of the washing color is disclosed, so that the thin-film element remains on the first and second relief structures.
  • carrier films are preferably used as carrier substrates.
  • the carrier substrates can be, for example, PI (polyimide), PP (polypropylene), MOPP (monoaxially stretched polypropylene), PE (polyethylene), PPS (polyphenylene sulfide), PEEK (polyetheretherketone), PEK (polyetherketone), PEI (polyetherimide) , PSU (polysulfone), PAEK (polyaryl ether ketone), LCP (liquid crystal polymers), PEN (polyethylene naphthalate), PBT (polybutylene terephthalate), PET (polyethylene terephthalate), PA (polyamide), PC (polycarbonate), COC (cyclo-olefin copolymers), POM (polyoxymethylene), ABS ( Acrylonitrile butadiene styrene), PVC (polyvinyl chloride), PTFE (polytetrafluoride), PE (
  • a basic structure for the production of the security element comprises, on the one hand, the carrier substrate and, on the other hand, the lift-off embossing lacquer layer, which is applied either directly to the carrier substrate or to an intermediate layer arrangement which is applied to the carrier substrate and comprises one or more intermediate layers.
  • lift-off capable lacquers refer to lacquers that can be removed from the underlying layer structure in a subsequent step using a lift-off process or a lift-off process, whereby directly Further layers applied to a lift-off-capable paint layer are removed together with the lift-off-capable paint layer.
  • lift-off capable lacquers refer to lacquers that can be removed from the underlying layer structure in a subsequent step using a lift-off process or a lift-off process, whereby directly Further layers applied to a lift-off-capable paint layer are removed together with the lift-off-capable paint layer.
  • a victim layer In this context one also speaks of a victim layer.
  • An embossing lacquer layer is generally referred to as a deformable lacquer layer, preferably a UV-curable lacquer layer or a thermoplastic lacquer layer, which enables the embossing lacquer layer to be partially removed during so-called residue-free embossing, which is described in detail below.
  • a lift-off embossing lacquer layer is applied, which on the one hand has the properties of an embossing lacquer layer and, on the other hand, is also designed to be lift-off capable.
  • Suitable lift-off embossing varnishes are varnishes based on acrylates with polar residual groups and/or surface-active additives and photoinitiators.
  • Acrylates with polar residual groups are, for example, 4-acrylooylmorpholine (ACMO), ethoxy-ethoxy-ethyl acrylate (Miramer M170/M100/M150/170), (2-ethyl-2-methyl-1,3-dioxalate-4yl)methyl- acrylate (MEDOL-10) 4-hydroxybutyl acrylate, 2-hydroxyethyl acrylate, caprolactone acrylate, tetrahydrofurfuryl acrylate or Ebercryl P115 (reactive tertiary amine).
  • the acrylate monomer can be selected from the group comprising isobornyl acrylate (IBOA) and isobornyl methacrylate (IBOMA), which are sold, for example, under the name Sipomer® by
  • Surface-active additives include, for example, TEGO TWIN 4100 (siloxane-based Gemini surfactant), TEGO RAD2200N (siloxane polyether acrylate), Flouwet AC 600 (polyfluorohexylethyl acrylate), Visocoat 8F (1H,1H,5H-octafluoropentyl acrylate), Fombin MD40 ( Perfluoroether urethane acrylate) or PolyFox 3510 (perfluoroether urethane methacrylate) in question.
  • TEGO TWIN 4100 siloxane-based Gemini surfactant
  • TEGO RAD2200N siloxane polyether acrylate
  • Flouwet AC 600 polyfluorohexylethyl acrylate
  • Visocoat 8F (1H,1H,5H-octafluoropentyl acrylate
  • Fombin MD40 Perfluoroether urethane acryl
  • Suitable photoinitiators are, for example, Genocure LTM, Irgacure 819, Irgacure 184, Darocure 1173, KL200 (2-hydroxy-2-methyl-1-phenyl-propanone) or combinations thereof.
  • the first motif in the finished security element can be easily defined and produced in a particularly high resolution, as described in detail below.
  • the layer lying below the embossing lacquer layer is removed, is also referred to as residue-free embossing.
  • Partial removal by embossing the first motif is to be understood in the context of the invention as meaning that the lift-off embossing lacquer layer in the form of the first motif is in an embossing direction from a first interface of the embossing lacquer layer almost to a second one, immediately below the embossing lacquer layer lying layer adjacent, interface of the embossing lacquer layer is removed.
  • the lift-off embossing lacquer layer has a recess in the form of the first motif, which essentially extends over the entire extent of the embossing lacquer layer in the embossing direction.
  • Such a (residue-free) embossing process can be achieved through the interaction of penetration depth and design of the embossing tool or embossing structure, with the parameters being chosen so that the layer located below the embossing lacquer layer in the embossing direction, for example the carrier substrate or another layer of lacquer, is not or at least not significantly damaged, while the embossing lacquer layer is removed as completely as possible.
  • the lift-off embossing lacquer layer remains in the form of the second motif.
  • the remaining lift-off-capable embossing lacquer layer in the form of the second motif subsequently serves as a sacrificial layer, so that the subsequently applied layers of the thin-film element, on the one hand, on the lift-off-capable embossing lacquer layer in the form of the second motif and, on the other hand, in the area of the embossing in the form of first motif on the immediately below the Lift-off capable embossing lacquer layer lying layer, in particular on the carrier substrate or on another lacquer layer, are applied.
  • the lift-off embossing lacquer layer remaining after embossing functions as a structured sacrificial layer or mask layer for the thin-film element.
  • an absorber layer, a reflection layer and a dielectric spacer layer arranged between the absorber layer and the reflection layer are applied in a manner known per se, preferably over the entire surface in the area of the security feature.
  • a metallic layer can be used as the absorber layer, which can be, for example, a pure metal layer or a layer containing metallic clusters.
  • the absorber layer preferably comprises at least one metal from the group consisting of aluminum, gold, palladium, platinum, chromium, silver, copper, nickel, tantalum, tin or their alloys, for example gold/palladium, copper/nickel, copper/aluminum or chromium.
  • dielectric materials with a refractive index less than or equal to 1.65 come into consideration, for example aluminum oxide (Al 2 O 3 ), metal fluorides, for example magnesium fluoride (MgF 2 ), aluminum fluoride (AlF 3 ), silicon oxide (SiO x ). , silicon dioxide (SiO 2 ), cerium fluoride (CeF 3 ), sodium aluminum fluorides (e.g.
  • Na 3 AlF 6 or Na 3 Al 3 F 14 Na 3 AlF 6 or Na 3 Al 3 F 14 ), neodymium fluoride (NdF 3 ), lanthanum fluoride (LaF 3 ), samarium fluoride (SmF 3 ) , barium fluoride (BaF 2 ), calcium fluoride (CaF 2 ), lithium fluoride (LiF), low-refractive index organic monomers and/or low-refractive index organic polymers.
  • Na 3 AlF 6 or Na 3 Al 3 F 14 neodymium fluoride
  • LaF 3 lanthanum fluoride
  • SmF 3 samarium fluoride
  • barium fluoride BaF 2
  • calcium fluoride CaF 2
  • lithium fluoride (LiF) low-refractive index organic monomers and/or low-refractive index organic polymers.
  • the previously mentioned materials can be vapor deposited or, especially when it comes to monomers and polymers, printed on
  • Dielectric materials with a refractive index greater than 1.65 are also suitable for the dielectric spacer layer of the thin-film element, for example zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ).
  • ZnS zinc sulfide
  • ZnO zinc oxide
  • TiO 2 titanium dioxide
  • C carbon
  • In 2 O 3 indium oxide
  • a metallic layer can be used as the reflection layer, which preferably comprises at least one metal selected from the group consisting of aluminum, gold, chromium, silver, copper, tin, platinum, nickel and their alloys, for example nickel/chrome or copper/aluminum. It is also conceivable that the reflection layer contains a semiconductor, such as silicon. Finally, it is also conceivable that the reflection layer is produced by applying a printing ink with metallic pigments, preferably made of a metal from the group mentioned above.
  • the reflection layer is applied over the entire surface or in part by known methods, such as spraying, vapor deposition, sputtering, or, for example, as printing ink by known printing methods (gravure, flexo, screen, digital printing), by painting, roller application methods, slot nozzles, dipping (rolldip or . dip coating) or curtain coating processes and the like are applied.
  • known methods such as spraying, vapor deposition, sputtering, or, for example, as printing ink by known printing methods (gravure, flexo, screen, digital printing), by painting, roller application methods, slot nozzles, dipping (rolldip or . dip coating) or curtain coating processes and the like are applied.
  • a layer with a high refractive index which is also referred to as an HRI [High Refractive Index] layer, can also be used as a reflection layer.
  • HRI layers include dielectric materials with a refractive index of greater than or equal to 1.65, such as zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ), indium -Tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttrium oxide (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as iron (II, III) oxide ( Fe 3 O 4 ) and iron (III) oxide (Fe 2 O 3 ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO 2 ), lanthanum oxide (La 2 O 3
  • ZnS
  • the embossing lacquer layer is removed, for example using polar solvents and/or additives selected from dilute acids, dilute alkalis, water containing surfactants, propylene glycol monomethyl ether acetate (PGMEA), N-methyl-2-pyrrolidone (NMP), methyl ethyl ketone (MEK) or acetone.
  • polar solvents and/or additives selected from dilute acids, dilute alkalis, water containing surfactants, propylene glycol monomethyl ether acetate (PGMEA), N-methyl-2-pyrrolidone (NMP), methyl ethyl ketone (MEK) or acetone.
  • PMEA propylene glycol monomethyl ether acetate
  • NMP N-methyl-2-pyrrolidone
  • MEK methyl ethyl ketone
  • the first motif is embossed into the embossing lacquer layer in such a way that the lift-off embossing lacquer layer is removed in an embossing direction down to a layer lying directly below the embossing lacquer layer and thus the lift-off embossing lacquer layer remains in the form of the second motif after embossing.
  • Layers of the thin-film element are applied partially, namely in the area of the embossing in the form of the first motif, to the layer located immediately below the embossing lacquer layer and partially, namely where the embossing lacquer layer remains in the form of the second motif after the embossing, is applied to the layer structure, so that After the lift-off embossing lacquer layer has been removed - together with the sections of the thin-film element applied thereon - the thin-film element remains in the form of the first motif on the layer located immediately below the embossing lacquer layer.
  • a security feature with a color-shifting effect can be produced in a simple manner, which has a particularly high resolution in relation to the first motif, in particular in relation to the contours, lines or line structures and / or outlines or outline lines of the security feature, because particularly small contour thicknesses are possible for the first motif.
  • the contour thickness of the first motif can be smaller than 100 ⁇ m, preferably smaller than 50 ⁇ m, in particular smaller than 10 ⁇ m.
  • security features can preferably be produced whose contours, lines or line structures and/or outlines or outline lines (i.e. their first motif) have the particularly small contour thickness mentioned above, but still - due to the thin-film element - produce a color-shifting effect in the viewer .
  • Contour thickness is understood to mean the normal distance between two flanks of the first motif, which correlates with the corresponding thickness of the embossing structure of the embossing tool.
  • residue-free embossing can be used to create particularly extremely fine lines or line structures, contours and/or outlines or outline lines as a first motif with a color-shifting effect, so that the optically perceptible shape of the security feature formed by the first and second motifs can be resolved significantly higher than with conventional ones Application method, wherein the security feature simultaneously produces an effect in the viewer that is visually distinguishable from the color shift effect in the form of the second motif, in particular in the form of the surface pattern, the surface structure or the pattern structure.
  • the so-called residue-free embossing enables the precise simultaneous production or definition of the first and second motif, with the embossed lift-off embossing lacquer layer acting as a sacrificial layer and defining the shape of the second motif in the finished security element.
  • the method according to the invention can also be used to produce security elements whose security features have at least partially resolved first motifs in the diffractive area, in particular lines or line structures, contours and / or outlines or outline lines, and at the same time produce a color shift effect due to the thin-film element.
  • diffractive gratings with an additional color-shifting effect can thus be produced, which produce a combination of diffractive effects and color-shifting effects. Dissolved in the diffractive area or triggering a diffractive effect on the viewer is understood to mean that the corresponding structure size is smaller than 2.5 ⁇ m or that the contour thickness is smaller than 2.5 ⁇ m.
  • a see-through effect in the form of the second motif is created. If the layer structure is designed in such a way that the second motif on the security element is perceived by the viewer as a see-through effect, in other words is perceived as essentially transparent or transparent, different optical effects can be caused to the viewer depending on the viewing direction. Such a see-through effect can generally be created in that all layers of the layer structure of the security element are essentially transparent after the lift-off embossing lacquer layer has been removed in the area of the second motif. “Substantially transparent” means that there is a transmittance of > 80%, either based on each individual layer or all layers together.
  • Such a see-through effect can also be achieved, for example, in that the security feature has a color-shifting thin-film structure in the form of the second motif, the color-shifting thin-film structure consisting of an absorber layer and a dielectric spacer layer.
  • the color-shifting thin-film structure is designed in such a way that the color-shifting effect can only be perceived or detected by machine and not with the naked eye, in order to create a see-through effect for the viewer, since the color-shifting thin-film structure is perceived by the human eye as essentially transparent.
  • a security element with a security feature which includes a thin-film element in the form of the first motif and a color-shifting thin-film structure in the form of the second motif, the second motif being perceived by the viewer as a see-through effect despite the color-shifting thin-film structure, also through Modification or adaptation of the method steps described above can be produced.
  • the first motif is at least partially resolved in the diffractive region or is designed as a diffractive grating
  • the first motif can be perceived as a color shift effect when viewed from the side of the absorber layer, while when viewed from the side of the Reflection layer made of only the diffractive grid is optically effective.
  • the lift-off embossing lacquer layer is hardened after the first motif has been embossed.
  • the embossing lacquer layer consists of a UV-curable lacquer or a thermoplastic lacquer.
  • the hardening can be, for example, hardening by means of UV irradiation or by means of thermal hardening processes.
  • the lift-off embossing lacquer layer is applied directly to the carrier substrate.
  • the effect in the form of the second motif can be achieved by designing the carrier substrate in that the carrier substrate is essentially transparent or transparent, so that the second motif can be seen as a see-through effect.
  • This variant generally makes sense if the carrier substrate remains on the security element when the security element is attached to a document of value. If the carrier substrate is removed when attaching the security element to a document of value, as is usually the case with so-called transfer elements, the structure described above leads to a see-through effect in the form of the second motif in the protected document of value.
  • a base lacquer layer is applied, preferably to the carrier substrate.
  • the base coat layer applied over the entire surface, preferably in the area of the security feature can be used to create additional coatings Refraction effects are generated or the base coat layer serves, in the case of a security element designed as a transfer element, as a carrier layer or base layer for the further layer structure, in particular for metallic intermediate layers.
  • the security element is designed as a transfer element
  • the base coat layer can also be designed to enable the carrier substrate to be detached from the thin-film element or from the part of the security element comprising the thin-film element.
  • Such a property can be achieved, for example, in that the adhesion between the base coat layer and the carrier substrate is lower than between the base coat layer and the layer opposite the carrier substrate, preferably the absorber layer.
  • a further embodiment variant of the method according to the invention provides that a diffractive structure is impressed into the base coat layer. This is usually a further embossing step that is independent of the embossing of the first motif.
  • the base lacquer layer is preferably designed as a preferably UV-curable or thermoplastic embossed lacquer layer.
  • thermoplastic lacquer which is then stabilized or hardened, is used as the embossing lacquer layer, it is preferably a thermoplastic lacquer based on methyl methacrylate (MMA) or ethyl cellulose or cycloolefin copolymer.
  • Modifiers can be added to the respective base polymer to adjust the required thermoplastic properties or to adjust the subsequent stabilization.
  • suitable modifiers include, for example, additives for setting the desired glass transition temperature, i.e. the temperature range in which the lacquer is in a thermoplastic state, or modifiers for achieving permanent hardening of the embossed lacquer layer.
  • the components are in a solvent, for example in aqueous solvents, water, alcohols, ethyl acetate, methyl ethyl ketone or the like Mixtures, dissolved.
  • Nitrocellulose is preferably added to a thermoplastic lacquer for an embossed lacquer layer based on MMA to increase the glass transition temperature.
  • Polyethylene waxes are preferably added to a thermoplastic lacquer for an embossed lacquer layer based on cycloolefin copolymers.
  • Crosslinkers are preferably added to a thermoplastic lacquer based on ethyl cellulose to adjust the hardenability.
  • the concentration of the base polymer in the applied embossing lacquer layer is generally between 4% and 50%, depending on the type of base polymer selected, on the desired properties of the embossing lacquer layer and on the type and concentration of the modifiers.
  • a UV-curable lacquer is used as the embossing lacquer layer, it is preferably a lacquer system based on a polyester, an epoxy, an acrylate or polyurethane system that contains one or more photoinitiators.
  • the photoinitiator(s) can be used to set the hardening at a defined wavelength or in a defined wavelength range, whereby the degree of hardening can optionally also be varied. It is also conceivable that a water-thinnable UV-curable varnish, preferably based on polyester, is used.
  • Diffractive surface structures can be designed, for example, as diffraction structures, surface reliefs, diffraction gratings, holograms or Kinegrams® .
  • phase modulations occur which can generate interference patterns due to different optical path lengths of the partial beams that pass through the diffractive surface structure.
  • further anti-counterfeiting measures can be taken.
  • a top lacquer layer is applied, preferably over the entire area in the area of the security feature, the refractive indices of the top lacquer layer and the base lacquer layer being selected so that no optically perceptible effect can be seen at an interface between the top lacquer layer and the base lacquer layer.
  • the optical effect generated by the diffractive surface structure in the area of the second motif, in particular the surface pattern can be extinguished by appropriate choice of the top coat layer, so that the diffractive surface structure is in shape with the color-shifting effect of the thin-film element of the first motif is superimposed.
  • top coat can also be used to stabilize the layer structure in between, regardless of the choice of refractive indices. It can be advantageous if the top coat coats the thin-film element in the form of the first motif. “Coating” is understood to mean that the top coat layer not only covers the surface of the thin-film element in the form of the first motif or the base coat layer or the carrier substrate, but also that a film of the top coat layer covers the flanks of the thin-film element.
  • a further reflection layer and / or a color layer is applied to create an optical effect in the form of the second motif.
  • a reflection effect in the form of the second motif is created for the viewer when the security element is viewed from the direction of the carrier substrate.
  • the color layer the second motif is perceived by the viewer in the color of the color layer when viewed from the direction of the carrier substrate. It is advantageous if the reflection layer forms the top layer of the thin-film element (i.e.
  • the thin-film element has been applied to the carrier substrate in the order of absorber layer, spacer layer, reflection layer), since in this case the further reflection layer or the color layer is applied over the entire area in the area of the security feature can be done without negatively affecting the color shift effect, which can be seen when viewed from the direction of the carrier substrate.
  • a base coat layer is provided with a diffractive surface structure and a further reflection layer is provided, the reflection effect and the diffractive effect can overlap.
  • a further embodiment variant of the method according to the invention provides that after the lift-off embossing lacquer layer has been removed, an adhesive layer is applied to the security element, the security element can be attached to a value document substrate of a value document by means of the adhesive layer.
  • the adhesive layer which can be designed, for example, as a hot-melt adhesive layer, the security element can be connected in a simple manner by applying or attaching it to the value document substrate of a value document.
  • the adhesive layer can, for example, be applied directly to the reflection layer of the thin-film element.
  • the one or more intermediate layers between the adhesive layer and the reflection layer, Interlayer arrangement is applied.
  • Possible intermediate layers are, for example, further lacquer layers, in particular protective lacquer layers or primer layers, further reflection layers, color layers or combinations thereof.
  • the carrier substrate is designed to be removable, in particular from the thin-film element or from the part of the security element comprising the thin-film element, so that the carrier substrate can be removed from the security element after the connection to the valuable document substrate has been established.
  • the color-shifting effect is created when the absorber layer is the first layer of the thin-film element in the line of sight that the viewer perceives.
  • a further reflection layer or a color layer can be arranged, for example, either between the lift-off embossing lacquer layer and the carrier substrate or on the side of the carrier substrate opposite the embossing lacquer layer in order to produce an optical effect in the form of the second motif.
  • the embossing of the second motif into the embossing lacquer layer is carried out by means of an embossing tool, which embossing tool is designed such that that a contour thickness of the first motif is less than 50 ⁇ m, preferably less than 10 ⁇ m, in particular less than 2.5 ⁇ m.
  • an embossing tool which embossing tool is designed such that that a contour thickness of the first motif is less than 50 ⁇ m, preferably less than 10 ⁇ m, in particular less than 2.5 ⁇ m.
  • the first motif can be embossed into the embossing lacquer layer in a simple manner, whereby the first motif also has a contour thickness that is smaller than 50 ⁇ m, preferably smaller than 10 ⁇ m.
  • the embossed structure acts as a positive of the first motif and the contour thicknesses approximately correspond to each other. It can preferably be provided that the contour thickness is between 10 ⁇ m and 50 ⁇ m or that the contour thickness is less than 10 ⁇ m.
  • the contour thickness is less than 2.5 ⁇ m in order to produce a color-shifting diffractive structure.
  • such a design of the embossing tool or the security element allows the production of extraordinarily fine lines or line structures, contours and/or outlines or outline lines as a second motif, so that the optically perceptible shape of the security feature formed by the first and second motifs has a significantly higher resolution than with conventional application methods.
  • Fig. 1 shows a schematic representation of a valuable document 15, which is provided with a security element 10 according to the invention.
  • the security element 10 is firmly connected to the valuable document 15, preferably the security element 10 is embedded in the valuable document 15 or applied or laminated onto the valuable document 15 or a valuable document substrate 6 of the valuable document 15.
  • the security element 10 has a security feature 16, which is composed of a first motif 11 and a second motif 12.
  • the visually perceptible shape of the security feature 16 is formed by the interaction of the first motif 11 and the second motif 12.
  • the first motif 11 usually forms the contours, outlines or outline lines or generally the lines or line structures of the security feature 16, while the second motif 12 fills at least the areas defined by the first motif 11 and thus functions as a surface pattern, surface structure or pattern structure.
  • the shape of the security feature 16 can be formed, for example, by characters, letters, numbers, lines, symbols, guilloches, lettering, symbols or motifs or combinations of the aforementioned elements, in particular in the form of a pattern.
  • the first motif 11 defines the outline lines or the contour of a capital of a column.
  • the second motif 12 includes both the areas within the contour defined by the first motif 11 and the area between the contour defined by the first motif 11 and a rectangular outer boundary of the security feature 16.
  • the first motif 11 of a security element 10 is designed in such a way that a color shift effect is created for the viewer.
  • the security feature 16 includes a thin-film element 9 (see, for example, Fig. 2g ) in the form of the first motif 11.
  • the structure and manufacturing steps of the security element 10, in particular the security feature 16, will be discussed in detail below.
  • the color-shifting effect is generated by the thin-film element 9 in the form of the first motif 11 when the security feature 16 is tilted, the areas encompassed by the second motif 12 remain visually distinguishable.
  • the optical effect that makes the second motif 12 optically distinguishable from the first motif 11 depends on the layer structure selected, as will be shown below using different exemplary embodiments.
  • FIGS. 2a to 2g show different stages of the manufacturing process of a first exemplary embodiment Security element 10, with the cutting position symbolically indicated by line II in Fig. 1 is marked.
  • the layer thicknesses shown are not shown to scale but are only used for illustration.
  • Figure 2a shows a sectional view of an area of the security element 10, on which the security feature 16 is applied.
  • the security element 10 comprises a carrier substrate 1 as a base structure before the layers for the security feature 16 are applied, preferably in the form of a substantially transparent carrier film.
  • a lift-off embossing lacquer layer 2 is applied to the carrier substrate 1 over the entire area in the area of the security element 16 (see Fig. 2b ).
  • FIG. 2c to 2e The process of so-called residue-free embossing is shown schematically: An embossing tool 13 with an embossing structure 13a is pressed onto the lift-off embossing lacquer layer 2 in an embossing direction 17, which usually runs normal to the carrier substrate 1 (see Fig. 2d ).
  • the embossed structure 13a corresponds to the positive of the first motif 11, with the embossed structure 13a and the first motif 11 having essentially the same contour thickness 14.
  • the parameters of the embossing process are selected in such a way that only the lift-off embossing lacquer layer 2 is partially removed by the embossing structure 13a over essentially the entire extent of the embossing lacquer layer 2 in the embossing direction 17 - this is referred to as so-called residue-free embossing.
  • the first motif 11 is embossed into the embossing lacquer layer 2 in such a way that the embossing lacquer layer 2 is removed in an embossing direction 17 down to a layer lying directly below the embossing lacquer layer 2, in the present case up to the carrier substrate 1.
  • the second motif 12 is formed by the (unembossed) part of the embossing lacquer layer 2 remaining after the embossing process, subsequently as a sacrificial layer 2a (in the form of the second motif 12), the first motif 11 is defined and defined by the impression 2b in the form of the first motif 11 in the lift-off embossing lacquer layer 2.
  • the shape of the first motif 11 is defined by a structured recess in the embossing lacquer layer 2, i.e.
  • FIG. 2c A contour thickness 14 of the embossed structure 13a is shown schematically, which represents the normal distance between two opposite flanks of the embossed structure 13a.
  • the contour thickness 14 is at least partially less than 50 ⁇ m, preferably less than 10 ⁇ m.
  • the first motif 11 with a contour thickness 14 which is at least in sections smaller than 50 ⁇ m, preferably smaller than 10 ⁇ m, can be produced by means of the method according to the invention by embossing the embossed structure 13a into the embossed lacquer layer 2 (see Fig. 2e ).
  • a particularly high resolution of the security feature 16 can thus be achieved, which would not be possible to produce a thin-film element 9 using a conventional application process.
  • the contour thickness 14 of the first motif 11 corresponds to the normal distance between two flanks, preferably an embossed groove, the impression 2b.
  • the part of the embossing lacquer layer 2 remaining after the embossing can be hardened in a further step, preferably using UV radiation or using a thermal process.
  • the impression 2b in the form of the first motif 11 is defined by the partial removal of the embossing lacquer layer 2 in order to determine the shape of a subsequently applied thin-film element 9, while the remaining sections of the embossing lacquer layer 2 in the form of the second motif 11 are subsequently used as a sacrificial layer 2a (also known as a mask layer) act to determine in which areas no color shift effect should be created.
  • a sacrificial layer 2a also known as a mask layer
  • the three layers of the thin-film element 9 are applied one after the other, with the application again taking place over the entire area in the area of the security feature 16.
  • An absorber layer 3 is applied as the first layer.
  • the absorber layer 3 is designed as a metallic layer.
  • the optical density [OD] of the absorber layer 3 is usually in the range between 0.1 and 0.9, preferably between 0.3 and 0.6.
  • a dielectric spacer layer 20 which preferably has dielectric properties, is applied to the absorber layer 3.
  • a preferably UV-curable and/or transparent lacquer layer can be used as the spacer layer 20 (also called spacer layer or spacer layer) or can be dielectric materials.
  • the thickness of the dielectric spacer layer 20 is also between 50 and 800 nm, preferably between 100 and 700 nm, particularly preferably between 150 and 600 nm. The thickness is advantageously selected so that it has an optimum in the wavelength range of 400 - 700 nm 2 - 6 QWOT [Quarter Wave Optical Thickness].
  • a reflection layer 4 is applied to the dielectric spacer layer 20 as the third layer.
  • the reflection layer 4 in the present exemplary embodiment is a metallic layer.
  • the optical density [OD] of the reflection view 4 is in the usual way, provided it is a metallic layer, in the range between 1 and 3, preferably between 1.5 and 2.5.
  • the lift-off process is, for example, a treatment with a polar solvent or an aqueous solution containing additives selected from dilute acids, dilute alkalis, water containing surfactants, propylene glycol monomethyl ether acetate (PGMEA), N-methyl-2-pyrrolidone (NMP), methyl ethyl ketone (MEK) or acetone, whereby the type of additive depends on the properties of the lift-off embossing lacquer layer used.
  • a polar solvent or an aqueous solution containing additives selected from dilute acids, dilute alkalis, water containing surfactants, propylene glycol monomethyl ether acetate (PGMEA), N-methyl-2-pyrrolidone (NMP), methyl ethyl ketone (MEK) or acetone
  • Figure 2g Shows accordingly Figure 2g the security element 10 after removing the sacrificial layer 2a (also called washing out), with only the thin-film element 9 in the form of the first motif 11 remaining on the carrier substrate 1.
  • the security element 10 is viewed from a first viewing direction 19, in which the layers of the security element 10 are perceived in the order of carrier substrate 1, absorber layer 3, dielectric spacer layer 20 and reflection layer 4, and the carrier substrate 1 is essentially transparent, this creates Thin-film element 9 in the form of the first motif 11 creates a color-shifting effect on the viewer, while the second motif 12 creates a see-through effect, i.e. the viewer can see through the second motif 12.
  • Figure 2h shows an alternative exemplary embodiment in which all the steps described above are carried out analogously, only the layers of the thin-film element 9 are applied in the reverse order. Accordingly, the reflection layer 4 is applied first, then the dielectric spacer layer 20 and finally the absorber layer 3. If the security element 10 is viewed from a second viewing direction 20 opposite the first viewing direction 19, in which the layers of the security element 10 are perceived in the order of absorber layer 3, dielectric spacer layer 20, reflection layer 4 and carrier substrate 1, the thin-film element 9 is produced in shape of the first motif 11 a color-shifting effect on the viewer. In the present exemplary embodiment, the second motif 12 is perceived as a see-through effect - regardless of the viewing direction - provided that the carrier substrate 1 is essentially transparent.
  • a second exemplary embodiment of the security element 10 is shown, with only the differences from the first exemplary embodiment being discussed. While in the first exemplary embodiment the lift-off embossing lacquer layer 2 is applied directly to the carrier substrate 1, in the second exemplary embodiment a base lacquer layer 8 is applied to the carrier substrate 1, preferably at least in the area of the security feature 16 over the entire surface. In the present exemplary embodiment, the base lacquer layer 8 is a UV-curable or thermoplastic embossed lacquer layer.
  • Figure 3a shows the security element 10 after, on the one hand, the base coat layer 8 has been applied and, on the other hand, a diffractive surface structure 5 has been embossed into the base coat layer 8.
  • the diffractive surface structure 5 can be a diffraction grating or a subwavelength structure, which can generate additional interference patterns for the viewer.
  • the diffractive surface structure 5 is produced using a first embossing tool and cured either using UV radiation or using thermal processes before further application of layers.
  • Figure 3c finally shows the security element 10 of the second exemplary embodiment after the lift-off step, with the sacrificial layer 2a and the parts of the thin-film element 9 located thereon having been removed.
  • the color-shifting effect of the thin-film element 9 in the form of the first motif 11 is enhanced by the diffractive surface structure 5, while the second motif 12 appears as a see-through effect with superimposed diffractive effects (for example, additional holograms can be visible in the second motif 12).
  • FIG. 4 A third exemplary embodiment is shown, which represents a further development of the second exemplary embodiment.
  • a top lacquer layer 21 is applied to the security element 10.
  • the topcoat layer 21 encases the thin-film element 9 in the form of the first motif 11, so that the flanks of the thin-film element 9 are also covered by the topcoat layer 21 in order to protect the thin-film element 9, for example, from mechanical damage.
  • the refractive indices of the top coat layer 21 and the base coat layer 8 are selected so that no optically perceptible effect can be seen at an interface between the top coat layer 21 and the base coat layer 8, so that the optical effect of the diffractive surface structure 5 in the area of the second motif 12 is extinguished.
  • the second motif 12 is perceptible exclusively as a see-through effect, while the first motif 11 is perceptible as a diffractively enhanced color shift effect.
  • FIG. 5 A fourth exemplary embodiment is shown, which also represents a further development of the second exemplary embodiment.
  • a further reflection layer 18, preferably in the form of a metallic layer is applied instead of the top coat layer 21, a further reflection layer 18, preferably in the form of a metallic layer, is applied.
  • the second motif 12 can be seen as a diffractively enhanced reflection effect.
  • a further reflection layer 18 can also be applied to a base coat layer 8 without a diffractive surface structure 5 or to a security element 10 without a base coat layer 8 in order to produce a reflection effect in the form of the second motif 12.
  • the layer structure of which can correspond to each of the exemplary embodiments described here it is possible for the contour thickness 14 of the first motif 11 to be smaller than 2.5 ⁇ m at least in sections, preferably in more than 50% of the first motif 11 . Due to the extremely fine contour thickness 14, the first motif 11 produces not only a color shift effect but also a diffractive optical effect, with the two optical effects superimposed as seen from the direction of the absorber layer 3. Such precise production of a thin-film element 9 is not possible using application methods known from the prior art.
  • FIG. 6 a fifth exemplary embodiment of the security element 10, wherein the security element 10 is designed as a transfer element and is applied to a value document substrate 6.
  • a security element 10 in the present case it has an adhesive layer 7, for example a hot-melt adhesive layer, which forms the boundary layer of the security element 10 opposite the carrier substrate 1.
  • the adhesive layer 7 in the present exemplary embodiment is applied directly to the reflection layer 4.
  • the layer structure as shown, can be connected to the value document substrate 6 of a value document 15.
  • the carrier substrate 1 required for the production of the security element 10 is no longer required after the security element 10 designed as a transfer element has been applied, the carrier substrate 1 is designed to be detachable from the security element 10, so that the carrier substrate 1 can be removed after being connected to the value document substrate 6, as symbolic in Fig. 5 shown.
  • a base coat layer 8 for example a UV-curable lacquer layer, is again arranged between the carrier substrate 1 and the absorber layer 3, the base coat layer 8 adhering better to the absorber layer 3 than to the carrier substrate 1.
  • the base coat layer 8 can serve to protect the absorber layer 3 from, in particular mechanical, damage after the security element 10 has been applied to the valuable document substrate 6.
  • the adhesive layer 7 is covered by a removable protective film.
  • the exemplary embodiments described above can also each be designed as a transfer element or that a transfer element is also conceivable without the provision of a base coat layer 8 or with one or more additional intermediate layers between the adhesive layer 7 and the thin-film element 9.

Claims (12)

  1. Procédé pour la fabrication d'un élément de sécurité (10) avec une caractéristique de sécurité (16), laquelle caractéristique de sécurité (16) comprend un premier motif (11) produisant un effet de variation chromatique et un deuxième motif (12), comprenant les étapes suivantes :
    - préparation d'un substrat de support (1) ;
    - application d'une couche de vernis à graver pelable (2) ;
    - création du deuxième motif (12) par enlèvement partiel de la couche de vernis à graver pelable (2) selon la forme du premier motif (11) en gravant le premier motif (11) dans la couche de vernis à graver pelable (2) de telle manière que la couche de vernis à graver pelable (2) est enlevée dans une direction de gravure (17) jusqu'à une couche (1,8) qui se trouve immédiatement en dessous de la couche de vernis à graver pelable (2) ;
    - application d'un élément en couche mince (9) produisant l'effet de variation chromatique et comprenant une couche absorbante (3), une couche d'espacement diélectrique (20) et une couche réfléchissante (4) ;
    - retrait du reste de la couche de vernis à graver pelable (2) au moyen d'un procédé de pelage, de sorte que les zones de l'élément en couche mince (9) appliquées sur la couche de vernis à graver pelable (2) selon la forme du deuxième motif (12) soient enlevés en même temps que la couche de vernis à graver pelable (2), tandis que l'élément en couche mince (9) demeure sous la forme du premier motif (11) sur la couche (1,8) située directement en dessous de la couche de vernis à graver pelable (2).
  2. Procédé selon la revendication 1, caractérisé en ce que, après l'enlèvement de la couche de vernis à graver pelable (2), un effet de transparence de la forme du deuxième motif (12) est obtenu.
  3. Procédé selon l'une des revendications 1 à 2, caractérisé en ce que la couche de vernis à graver pelable (2) est durcie après la gravure.
  4. Procédé selon l'une des revendications 1 à 3, caractérisé en ce que la couche de vernis à graver pelable (2) est appliquée directement sur le substrat de support (1).
  5. Procédé selon l'une des revendications 1 à 3, caractérisé en ce qu'une couche de vernis de base (8) est appliquée avant l'application de la couche de vernis à graver pelable (2).
  6. Procédé selon la revendication 5, caractérisé en ce qu'une structure diffractive (5) est gravée dans la couche de vernis de base (8).
  7. Procédé selon l'une des revendications 5 à 6, caractérisé en ce qu'une couche de vernis de couverture (21) est appliquée après l'enlèvement de la couche de vernis à graver pelable (2), les indices de réfraction de la couche de vernis de couverture (21) et de la couche de vernis de base (8) étant choisis de telle manière qu'aucun effet visible ne soit perceptible à l'interface entre la couche de vernis de couverture (21) et la couche de vernis de base (8).
  8. Procédé selon l'une des revendications 1 à 7, caractérisé en ce que les étapes suivantes sont exécutées dans l'ordre indiqué pour appliquer l'élément en couche mince (9) :
    - application de la couche absorbante (3) ;
    - application de la couche d'espacement diélectrique (20) ;
    - application de la couche réfléchissante (4).
  9. Procédé selon la revendication 8, caractérisé en ce que, après l'enlèvement de la couche de vernis à graver pelable (2), une autre couche réfléchissante (18) et/ou une couche de couleur sont appliquées afin de produire un effet optique de la forme du deuxième motif (12).
  10. Procédé selon l'une des revendications 8 à 9, caractérisé en ce qu'une couche adhésive (7) est appliquée sur l'élément de sécurité (10) après l'enlèvement de la couche de vernis à graver pelable (2), l'élément de sécurité (10) pouvant être appliqué au moyen de la couche adhésive (7) sur un substrat de document de valeur (6) d'un document de valeur (15).
  11. Procédé selon l'une des revendications 1 à 7, caractérisé en ce que les étapes suivantes sont exécutées dans l'ordre indiqué pour appliquer l'élément en couche mince (9) :
    - application de la couche réfléchissante (4) ;
    - application de la couche d'espacement diélectrique (20) ;
    - application der couche absorbante (3).
  12. Procédé selon l'une des revendications 1 à 11, caractérisé en ce que la gravure du premier motif (11) dans la couche de vernis à graver pelable (2) est réalisé au moyen d'un outil de gravure (13), lequel outil de gravure (13) est dimensionné de telle façon que l'épaisseur de contour (14) du premier motif (11) soit inférieure à 50 µm.
EP20157388.8A 2020-02-14 2020-02-14 Procédé de fabrication d'un élément de sécurité Active EP3865312B1 (fr)

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DE102014001688A1 (de) 2014-02-07 2015-08-13 Giesecke & Devrient Gmbh Herstellung eines Sicherheitselements mit Farbänderungseigenschaften
DE102015010744A1 (de) * 2015-08-17 2017-02-23 Giesecke & Devrient Gmbh Sicherheitselement, Verfahren zum Herstellen desselben und mit dem Sicherheitselement ausgestatteter Datenträger
GB2549481B (en) * 2016-04-18 2019-06-05 De La Rue Int Ltd Security devices and methods of manufacture thereof
GB2551555B (en) * 2016-06-22 2018-09-26 De La Rue Int Ltd Methods of manufacturing an image pattern for a security device
DE102016014662A1 (de) * 2016-12-09 2018-06-14 Giesecke+Devrient Currency Technology Gmbh Wertdokument

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