EP3865311A1 - Procédé de fabrication d'un élément de sécurité - Google Patents

Procédé de fabrication d'un élément de sécurité Download PDF

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Publication number
EP3865311A1
EP3865311A1 EP20157387.0A EP20157387A EP3865311A1 EP 3865311 A1 EP3865311 A1 EP 3865311A1 EP 20157387 A EP20157387 A EP 20157387A EP 3865311 A1 EP3865311 A1 EP 3865311A1
Authority
EP
European Patent Office
Prior art keywords
layer
motif
embossing
lacquer layer
security element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20157387.0A
Other languages
German (de)
English (en)
Inventor
Stephan Trassl
Sonja Landertshamer
Anita FUCHSBAUER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hueck Folien GmbH
Original Assignee
Hueck Folien GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hueck Folien GmbH filed Critical Hueck Folien GmbH
Priority to EP20157387.0A priority Critical patent/EP3865311A1/fr
Publication of EP3865311A1 publication Critical patent/EP3865311A1/fr
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/29—Securities; Bank notes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/351—Translucent or partly translucent parts, e.g. windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/44—Marking by removal of material using mechanical means, e.g. engraving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • B42D25/465—Associating two or more layers using chemicals or adhesives
    • B42D25/47—Associating two or more layers using chemicals or adhesives using adhesives

Definitions

  • first motif and second motif are to be understood as meaning those optically perceptible components from which the optically perceptible form of the security feature, for example the form of a pattern, is composed.
  • a security feature can be formed, for example, by characters, letters, numbers, lines, symbols, guilloches, lettering, symbols or motifs or combinations of the aforementioned elements, in particular in the form of a pattern.
  • one of the motifs represents a positive of the security feature, while the other motif represents a negative of the security feature. Only through the optical combination of the first motif and the second motif does the viewer obtain a security feature with a completely optically perceptible shape, in particular with optically perceptible contours, outlines and areas.
  • the second motif is generally that optically perceptible component of the security element which defines the contours, lines or line structures and / or outlines or outlines.
  • the second motif can therefore also be referred to as a contour or contour structure.
  • the first motif is generally that optically perceptible component of the security element which is at least partially flat and whose shape is essentially determined by the second motif.
  • the first motif can therefore also be referred to as a surface pattern, surface structure or pattern structure.
  • the circular line would correspond to the second motif, while the area within the circular line and / or the area between the circular line and an outer boundary of the security element form the first motif.
  • documents of value are understood to mean bank notes, stocks, bonds, certificates, vouchers, checks, high-quality admission tickets, labels for product security, credit or money cards.
  • documents at risk of forgery such as passports, identification cards or other identification documents, can also be regarded as documents of value, in particular if these comprise a security paper.
  • Such security elements usually comprise a polymer or polymer compositions as the carrier substrate or base material.
  • Security elements typically have optically variable security features such as holograms or certain color-shifting effects in order to ensure better protection against forgery.
  • optically variable security elements is that the security features on these security elements cannot be imitated by mere copying with copiers, since the effects of an optically variable security feature are lost through copying or even appear black.
  • a method for producing a security element with color change properties in which a thin-film element is formed by means of a structured spacer layer which is arranged between an absorber layer and a reflective layer.
  • This structured spacer layer is produced either by a printing process or by filling in a pre-embossed relief structure.
  • the structured spacer layer defines a pattern arrangement which has a color shift effect.
  • carrier films are preferably used as carrier substrates.
  • the carrier substrates can be, for example, PI (polyimide), PP (polypropylene), MOPP (monoaxially stretched polypropylene), PE (polyethylene), PPS (polyphenylene sulfide), PEEK (polyetheretherketone), PEK (polyetherketone), PEI (polyetherimide) , PSU (polysulfone), PAEK (polyaryletherketone), LCP (liquid crystal polymers), PEN (polyethylene naphthalate), PBT (polybutylene terephthalate), PET (polyethylene terephthalate), PA (polyamide), PC (polycarbonate), COC (cyclo-olefin Copolymers), POM (polyoxymethylene), ABS (acrylonitrile-butadiene-styrene), PVC (polyvinylchloride), PTFE (polytetrafluoro
  • a basic structure of the security element comprises, on the one hand, the carrier substrate and, on the other hand, the absorber layer, which is applied either directly to the carrier substrate or to an intermediate layer arrangement applied to the carrier substrate.
  • a metallic layer can be used as the absorber layer, which can be, for example, a pure metal layer or a layer containing metallic clusters.
  • the absorber layer preferably comprises at least one metal from the group consisting of aluminum, gold, palladium, platinum, chromium, silver, copper, nickel, tantalum, tin or their alloys, for example gold / palladium, copper / nickel, copper / aluminum or chromium.
  • a deformable varnish layer preferably a UV-curable varnish layer or a thermoplastic varnish layer
  • the embossing varnish layer is used as the embossing varnish layer, which enables the embossing varnish layer in the so-called Residual-free embossing, which is described in detail below, can be partially removed.
  • the embossing lacquer layer preferably has dielectric properties, which has proven to be particularly advantageous for suitability as a (dielectric) intermediate layer of a thin-film element.
  • the second motif can be defined and produced in a particularly high resolution in a simple manner.
  • the step of embossing the second motif into the embossing lacquer layer so that the embossing lacquer layer is removed in one embossing direction up to the layer immediately below the embossing lacquer layer is also referred to as residue-free embossing.
  • Partial removal by embossing the second motif is to be understood in the context of the invention as meaning that the embossing lacquer layer in the form of the second motif in an embossing direction from a first boundary surface of the embossing lacquer layer almost to a second, adjacent to the layer immediately below the embossing lacquer layer, Interface of the embossing lacquer layer is removed.
  • the embossing lacquer layer has a recess or embossing in the form of the second motif, which extends in the embossing direction essentially over the entire extent of the embossing lacquer layer.
  • Such a (residue-free) embossing process can be achieved through the interaction of the depth of penetration and the design of the embossing tool or the embossing structure, the parameters being selected so that the layer located below the embossing lacquer layer in the embossing direction, for example the absorber layer or another lacquer layer, is not or is at least not significantly damaged, while the embossing lacquer layer is removed as completely as possible.
  • the embossing lacquer layer remains in the form of the first motif due to the embossing in the form of the second motif.
  • a reflective layer is then applied, preferably over the entire surface. The reflective layer is preferably applied in the area of the first motif directly to the part of the embossing lacquer layer that remains after the embossing.
  • the layer sequence absorber layer, embossing lacquer layer and reflective layer forms a thin-layer element in the form of the first motif, which in a known manner creates a color shift effect for the viewer, with the part of the embossing lacquer layer remaining after the embossing of the second motif forms the intermediate layer of the thin-film element.
  • a metallic layer can be used as the reflective layer, which preferably comprises at least one metal selected from the group consisting of aluminum, gold, chromium, silver, copper, tin, platinum, nickel and their alloys, for example nickel / chromium or copper / aluminum. It is also conceivable that the reflective layer contains a semiconductor such as silicon. Finally, it is also conceivable that the reflective layer is produced by applying a printing ink with metallic pigments, preferably from a metal from the group mentioned above.
  • the reflective layer is applied over the entire surface or in part by known processes such as spraying, vapor deposition, sputtering, or, for example, as printing ink by known printing processes (gravure, flexographic, screen, digital printing), by painting, roller application processes, slot nozzle, immersion (rolldip or . dip coating) or curtain coating and the like.
  • known processes such as spraying, vapor deposition, sputtering, or, for example, as printing ink by known printing processes (gravure, flexographic, screen, digital printing), by painting, roller application processes, slot nozzle, immersion (rolldip or . dip coating) or curtain coating and the like.
  • a layer with a high refractive index which is also referred to as an HRI [High Refractive Index] layer, can also be used as the reflective layer.
  • dielectric materials with a refractive index of greater than or equal to 1.65 come into question, such as zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO 2 ), carbon (C), indium oxide (In 2 O 3 ), indium tin oxide (ITO), tantalum pentoxide (Ta 2 O 5 ), cerium oxide (CeO 2 ), yttrium oxide (Y 2 O 3 ), europium oxide (Eu 2 O 3 ), iron oxides such as iron (II , III) oxide (Fe 3 O 4 ) and iron (III) oxide (Fe 2 O 3 ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO 2 ), lanthanum oxide (La 2
  • the second motif is embossed into the embossing lacquer layer in such a way that the embossing lacquer layer is removed in one embossing direction as far as a layer immediately below the embossing lacquer layer, a security feature with a color shift effect can thus be produced in a simple manner according to the invention, which has a particularly high level Has resolution in relation to the second motif, in particular in relation to the contours, lines or line structures and / or outlines or outlines of the security feature, since particularly small contour thicknesses are possible for the second motif.
  • the contour thickness of the second motif can preferably be less than 100 ⁇ m, preferably less than 50 ⁇ m, in particular less than 10 ⁇ m.
  • the contour thickness is understood to mean the normal distance between two flanks of the second motif, which correlates with the corresponding thickness of the embossing structure of the embossing tool.
  • the so-called residue-free embossing can be used to generate extremely fine lines or line structures, contours and / or outlines or outline lines as a second motif, so that the optically perceptible shape of the security feature formed by the first and second motif can be resolved much more highly than with conventional application method, the security feature at the same time generating a color shift effect in the form of the first motif, in particular in the form of the surface pattern, the surface structure or the pattern structure, for the viewer.
  • the so-called residue-free embossing enables the precise simultaneous production or definition of the first and second motif, with the embossed embossing lacquer layer being integrated directly into the thin-film element producing the color shift effect and defining its shape.
  • an optical effect that can be distinguished from the color shift effect of the thin-film element can be generated in a simple manner, so that a viewer of the security element when looking at the security feature can use both the first motif (in particular surface pattern) when looking at the security feature due to the different optical effects , Surface structure or the pattern structure) and the second motif (in particular lines or line structures, contours and / or outlines or outlines) can perceive the security feature and in any case can perceive a color shift effect in the form of the first motif.
  • the aforementioned object is achieved in that the first motif and the second motif can be produced by partially removing an embossing lacquer layer applied directly or indirectly to the absorber layer, the second motif being embossed into the embossing lacquer layer in such a way that the embossing lacquer layer in an embossing direction up to is removed to a layer lying directly below the embossing lacquer layer, the part of the embossing lacquer layer remaining after the embossing in the form of the first motif forming the intermediate layer of the thin-film element in order to produce the color shift effect in the form of the first motif, and wherein, due to the embossing of the second motif in the embossing lacquer layer, the optically distinguishable effect is formed in the form of the second motif.
  • the embossing lacquer layer can either be applied directly, preferably flat, to the carrier substrate, or the embossing lacquer layer can be applied indirectly, that is to say with the interposition of one or more intermediate layers, onto the carrier substrate.
  • the second motif is embossed into the embossing lacquer layer in such a way that the embossing lacquer layer is removed in one embossing direction down to a layer immediately below the embossing lacquer layer, and the fact that the intermediate layer of the thin-film element is embossed) embossing lacquer layer in the form of the first motif, the positive effects mentioned above in connection with the method according to the invention are produced in the security element according to the invention achieved. In particular, a resolution of the security feature that cannot be represented by the methods known from the prior art is achieved.
  • a contour thickness of the second motif of less than 100 ⁇ m, preferably less than 50 ⁇ m, in particular less than 10 ⁇ m, can be achieved.
  • the contour thickness is understood to be the normal distance between two flanks of the second motif, which correlates with the corresponding contour thickness of an embossing structure of the embossing tool. According to the current state of research, such small contour thicknesses in combination with a thin-film element in the form of the first motif can be produced exclusively by so-called residue-free embossing.
  • thermoplastic lacquer which is then stabilized or hardened, is used as the embossing lacquer layer, it is preferably a thermoplastic lacquer based on methyl methacrylate (MMA) or ethyl cellulose or cycloolefin copolymer.
  • Modifiers can be added to the respective base polymer to set the required thermoplastic properties or to set the subsequent stabilizability.
  • possible modifiers include, for example, additives to set the desired glass transition temperature, i.e. the temperature range in which the lacquer is in the thermoplastic state, or modifiers to achieve permanent curing of the embossing lacquer layer.
  • the components are preferably dissolved in a solvent, for example in aqueous solvents, water, alcohols, ethyl acetate, methyl ethyl ketone or mixtures thereof.
  • Nitrocellulose is preferably added to a thermoplastic lacquer for an embossing lacquer layer based on MMA to increase the glass transition temperature.
  • Polyethylene waxes are preferably added to a thermoplastic lacquer for an embossing lacquer layer based on cycloolefin copolymers.
  • Crosslinkers are preferably added to a thermoplastic lacquer based on ethyl cellulose to adjust the hardenability.
  • the embossing lacquer layer is generally between 4% and 50% depending on the type of base polymer selected, the desired properties of the embossing lacquer layer and the type and concentration of the modifiers.
  • a UV-curable lacquer is used as the embossing lacquer layer, it is preferably a lacquer system based on a polyester, an epoxy, an acrylate or a polyurethane system which contains one or more photoinitiators.
  • the photoinitiator (s) can be used to set the hardening at a defined wavelength or in a defined wavelength range, with the degree of hardening also being able to be varied if necessary. It is also conceivable that a water-thinnable UV-curable lacquer, preferably based on polyester, is used.
  • a security element according to the invention can also have further layers which are arranged on the thin-layer element in the form of the first motif and / or in the embossed area in the form of the second motif.
  • one embodiment variant of the method according to the invention provides that the embossing lacquer layer is cured after the embossing of the second motif.
  • Such curing is particularly advantageous when the embossing lacquer layer consists of a UV-curable lacquer or a thermoplastic lacquer.
  • the hardening can be, for example, hardening by means of UV radiation or by means of thermal hardening processes.
  • Another embodiment of the method according to the invention provides that the absorber layer, embossing lacquer layer and reflective layer are applied directly to the respective previously applied layer, so that after the application of the reflective layer, a reflection effect in the form of the second motif is formed.
  • Such a method can be used to produce an embodiment variant of a security element according to the invention in which the reflective layer is partially applied directly to the absorber layer in order to produce the optically distinguishable effect in the form of the second motif.
  • the thin-film element in the form of the first motif (in particular surface pattern, surface structure or pattern structure) generates the color shift effect
  • the second motif in particular lines or line structures, contours and / or outlines or outlines
  • This embodiment variant is characterized by a particularly simple layer structure in which no additional intermediate layers are necessary. Because the reflective layer is applied, preferably over the entire area, the reflective layer forms the thin-layer element with the remaining part of the embossing lacquer layer in the form of the first motif, which functions as an intermediate layer, and the absorber layer. Where the embossing lacquer layer was removed by embossing the second motif, i.e. in the area of the embossing, the reflective layer is applied directly to the absorber layer located under the embossing lacquer layer, so that - due to the lack of an intermediate layer - no thin-film element is formed. Accordingly, the viewer perceives the second motif as a simple reflection effect.
  • a first further lacquer layer is applied between the absorber layer and the embossing lacquer layer, so that a second color shift effect in the form of the second motif develops after the reflection layer has been applied.
  • This embodiment variant is characterized in that the first and second motifs each generate color shift effects in the viewer that can be optically differentiated from one another.
  • the first further lacquer layer forms a further thin-film element in the form of the second motif, in which the first further lacquer layer forms the intermediate layer, where the embossing lacquer layer has been partially removed by the embossing of the second motif.
  • the distance between the absorber layer and the reflective layer in the thin-film element in the form of the first motif is greater - the distance includes both the intermediate layer and the corresponding sections of the first further lacquer layer - than in the further thin-film element in the form of the second motif, where only the first further lacquer layer is between
  • the absorber layer and reflective layer are produced in a simple manner, namely by preferably applying only one further layer, in particular the reflective layer, over the entire surface, two color-shift effects which can be optically distinguished from one another.
  • Another embodiment of the method according to the invention provides that the embossing lacquer layer is provided with a diffractive surface structure before the reflective layer is applied.
  • a further embodiment variant of a security element according to the invention can be produced by means of such a method, in which the side of the intermediate layer facing the reflective layer has a diffractive surface structure.
  • the diffractive structure is produced either before the embossing, during the embossing - for example by means of the embossing tool - or after the embossing.
  • Diffractive surface structures can be designed, for example, as diffraction structures, surface relief, diffraction grating, holograms or Kinegrams®.
  • phase modulations occur due to different optical path lengths of the partial beams that pass through the diffractive surface structure, which can generate interference patterns.
  • the diffractive structure is produced by the same embossing tool with which the second motif is embossed.
  • a further variant embodiment of the method according to the invention provides that after the application of the reflective layer, an adhesive layer is applied to the security element, the security element being attached by means of the adhesive layer can be attached to a value document substrate of a value document.
  • the adhesive layer which can be embodied as a hot-melt adhesive layer, for example, the security element can be connected in a simple manner by applying or attaching to the value document substrate of a value document.
  • the adhesive layer can for example be applied directly to the reflective layer of the thin-film element.
  • the interlayer arrangement comprising one or more interlayers is applied between the adhesive layer and the reflective layer.
  • further lacquer layers, in particular protective lacquer layers and / or primer layers, further reflective layers, colored layers or combinations thereof come into consideration as intermediate layers.
  • the carrier substrate in particular of the thin-film element or of the one comprising the thin-film element, is preferred Part of the security element, designed to be detachable, so that the carrier substrate can be removed from the security element after the connection to the value document substrate has been established.
  • a further embodiment variant of a security element according to the invention can be produced by means of such a method, the security element comprising an adhesive layer, the adhesive layer being designed to attach the security element to a value document substrate of a value document.
  • the carrier substrate is preferably designed to be detachable, as described above.
  • a second further lacquer layer is applied between the carrier substrate and the absorber layer.
  • the second further lacquer layer can be, for example, a UV-curable lacquer layer.
  • the second further lacquer layer can on the one hand, if the security element is designed as a transfer element, be designed to enable the carrier substrate to be detached from the thin-film element or from the part of the security element comprising the thin-film element.
  • Such a property can be achieved, for example, in that the adhesion between the second further lacquer layer and the carrier substrate is less than between the second further lacquer layer and the layer opposite the carrier substrate, preferably the absorber layer.
  • the second further lacquer layer can also be provided with a diffractive structure in a simple manner, for example by embossing. In this way, an additional optical effect can be generated or the optical effects that have already been created can be intensified.
  • a further embodiment variant of the security element according to the invention can be produced by means of such a method, wherein between the carrier substrate and the Thin-film element a second further lacquer layer is arranged.
  • the second further lacquer layer is preferably applied directly to the carrier substrate, particularly preferably directly between the carrier substrate and the absorber layer.
  • the embossing of the second motif into the embossing lacquer layer is carried out by means of an embossing tool, which embossing tool is designed such that a contour thickness of the second motif is less than 50 ⁇ m, preferably less than 10 ⁇ m .
  • embossing tool is designed such that a contour thickness of the second motif is less than 50 ⁇ m, preferably less than 10 ⁇ m .
  • a further embodiment variant of a security element according to the invention can be produced by means of such a method, in which a contour thickness of the second motif is less than 50 ⁇ m, preferably less than 10 ⁇ m.
  • the second motif can be easily embossed into the embossing lacquer layer, the second motif likewise having a contour thickness which is less than 50 ⁇ m. This is because the embossed structure acts as a positive for the second motif and the contour strengths approximately correspond to one another. It can preferably be provided that the contour thickness is between 10 ⁇ m and 50 ⁇ m or that the contour thickness is less than 10 ⁇ m.
  • Such a configuration of the embossing tool or of the security element allows the production of extremely fine lines or line structures, contours and / or outlines or outline lines as a second motif, so that the optically perceptible form of the security feature formed by the first and second motif are much more resolved can than with conventional application methods.
  • Fig. 1 shows a schematic representation of a value document 15 which is provided with a security element 10 according to the invention.
  • the security element 10 is firmly connected to the value document 15; the security element 10 is preferably embedded in the value document 15 or applied or laminated to the value document 15.
  • the security element 10 has a security feature 16 which is composed of a first motif 11 and a second motif 12.
  • the optically perceptible shape of the security feature 16 is formed by the interaction of the first motif 11 and the second motif 12.
  • the second motif 12 generally forms the contours, outlines or outline lines or generally the lines or linear structures of the security feature 16, while the first motif 11 forms at least the areas defined by the second motif 12 fills and thus functions as a surface pattern, surface structure or pattern structure.
  • the shape of the security feature 16 can be formed, for example, by characters, letters, numbers, lines, symbols, guilloches, lettering, symbols or motifs or combinations of the aforementioned elements, in particular in the form of a pattern.
  • the second motif 12 defines the outline or the contour of a capital of a column.
  • the first motif 11 includes both the areas within the contour defined by the second motif 12 and the area between the contour defined by the second motif 12 and a rectangular outer boundary of the security feature 16.
  • the first motif 11 of a security element 10 is designed in such a way that a color shift effect is generated for the viewer.
  • the security feature 16 comprises a thin-film element 9 (see e.g. Fig. 2g ) in the form of the first motif 11.
  • the structure and the manufacturing steps of the security element 10, in particular the security feature 16, will be discussed in detail.
  • the contour of the capital of the column defined by the second motif 12 remains visually distinguishable.
  • the optical effect by which the second motif 12 is made visually distinguishable from the first motif 11 depends on the layer structure selected, as will be shown in the following on the basis of different exemplary embodiments.
  • the Figures 2a to 2g show various stages of the manufacturing process of a first exemplary embodiment of the security element 10, the cutting position being symbolically indicated by the line II in FIG Fig. 1 is marked.
  • the layer thicknesses shown are not shown to scale but are only used for illustration.
  • Figure 2a shows a sectional view of a region of the security element 10 on which the security feature 16 is applied.
  • the security element 10 comprises a carrier substrate 1, preferably in the form of a carrier film, as a basic structure before the layers for the security feature 16 are applied.
  • an absorber layer 3 is applied to the carrier substrate 1 over the entire area in the area of the security feature 16 (see FIG Figure 2b ).
  • the absorber layer 3 is designed as a metallic layer.
  • the optical density [OD] of the absorber layer 3 is usually in the range between 0.1 and 0.9, preferably between 0.3 and 0.6.
  • embossing lacquer layer 2 is applied to the absorber layer 3, also over the entire area.
  • the embossing lacquer layer 2 can either be a UV-curable lacquer layer or a thermoplastic lacquer layer which is suitable for the subsequent embossing process.
  • FIG. 2d to 2f the process of so-called residue-free embossing is shown schematically:
  • An embossing tool 13 with an embossing structure 13a is pressed onto the embossing lacquer layer 2 in an embossing direction 17, which as a rule runs normal to the carrier substrate 1 (see FIG Fig. 2e ).
  • the embossed structure 13a corresponds to the positive of the second motif 12 to be produced by the embossing process.
  • the parameters of the embossing process are selected in such a way that the embossed structure 13a only partially removes the embossed lacquer layer 2 over essentially the entire extent of the embossed lacquer layer 2 in the embossing direction 17 - one speaks here of so-called residue-free embossing.
  • the second motif 12 is incorporated into the embossing lacquer layer 2 in this way embossed that the embossing lacquer layer 2 is removed in an embossing direction 17 up to a layer lying directly below the embossing lacquer layer 2, in the present case up to the absorber layer 3.
  • the first motif 11 is defined by the part of the embossing lacquer layer 2 remaining after the embossing process (not embossed), which subsequently functions as an intermediate layer 2a (in the form of the first motif), and the second motif 12 is shaped by an embossing 2b of the second motif 12 is defined in the embossing lacquer layer 2.
  • the shape of the second motif 12 is defined by a structured recess in the embossing lacquer layer 2, i.e.
  • embossing 2b in the form of the second motif 12 which extends from a boundary surface of the embossing lacquer layer 2 facing the carrier substrate 1 to one facing away from the carrier substrate 2 Boundary surface of the embossing lacquer layer 2 extends.
  • a contour thickness 14 of the embossed structure 13a is shown schematically, which represents the normal distance between two flanks of the embossed structure 13a facing away from one another.
  • the areas of the embossing lacquer layer 2 produced by the embossing can also be seen: on the one hand the areas of the intermediate layer 2a as the remaining part of the embossing lacquer layer 2 and on the other hand the areas of the embossing 2b.
  • the contour thickness 14 is less than 50 ⁇ m, at least in sections.
  • the embossing 2b in the form of the second motif 12 with a Produce a contour thickness 14 that is at least partially smaller than 50 ⁇ m (see Fig. 2f ).
  • a particularly high resolution of the security feature 16 can thus be achieved, which would not be possible using a conventional application method for a structured spacer layer.
  • the contour thickness 14 of the second motif 12 corresponds to the normal distance between two flanks, preferably an embossed groove, of the embossment 2b.
  • the part of the embossing lacquer layer 2 remaining after the embossing can be cured, preferably by means of UV radiation or a thermal process.
  • the embossing 2b in the form of the second motif 12 is defined by the partial removal of the embossing lacquer layer 2, while the remaining sections of the embossing lacquer layer 2 in the form of the first motif 11 subsequently as an intermediate layer 2a of a thin-film element 9 to be produced in the form of the second motif 12 act and thus define the shape of the thin-film element 9.
  • the thickness of the embossing lacquer layer 2 or the intermediate layer 2a remaining after embossing is between 50 and 800 nm, preferably between 100 and 700 nm, particularly preferably between 150 and 600 nm.
  • the thickness is advantageously selected so that it is in the wavelength range of 400-700 nm has an optimum of 2-6 QWOT [Quarter Wave Optical Thickness].
  • Figure 2g shows the cross-section of the security element 10 in the area of the security feature 16 after the last step, which is essential for the generation of the color shift effect and for the optical distinguishability of the first motif and the second motif, the full-surface application of a reflective layer 4.
  • the reflective layer 4 By applying the reflective layer 4, preferably by vapor deposition or printing of the reflective layer 4 on the security element 10, two different areas are formed: Where the reflective layer 4 is applied to the part of the embossing lacquer layer 2 that remains after the residue-free embossing, a thin-layer element 9 in the form of the first motif 11, which generates the color shift effect, is formed, which consists of the absorber layer 3, the embossing lacquer layer 2 as an intermediate layer 2a (also known as a spacer layer or Referred to as spacer layer) and the reflective layer 4.
  • the intermediate layer 2a or the embossing lacquer layer 2 preferably has dielectric properties.
  • the reflective layer 4 is applied directly to the absorber layer 3, i.e. where the second motif 12 was embossed in the embossing lacquer layer 2 or where the embossing 2b is arranged, a reflective section in the form of the second motif 12 is formed, which is seen by the viewer an optical effect that can be distinguished from the color shift effect of the thin-film element 9, namely a reflection effect, is generated.
  • the viewer can optically perceive the shape of the security feature 16 when the security element 10 is viewed from a viewing direction 19 in which the layers of the thin-film element 9 are perceived in the order absorber layer 3, intermediate layer 20 and reflective layer 4 because the first motif 11 and the second motif 12 produce different optical effects.
  • This difference becomes particularly clear when the security element 11 is tilted, since when looking at the thin-film element 9 in the form of the first motif 11 a color-shifting effect can be seen, while the second motif 12 functioning as a contour can be seen as a reflection effect essentially unaffected by the viewing angle.
  • the optical density [OD] of the reflective layer 4 is usually in the range of between 1 and 3, preferably between 1.5 and 2.5, provided it is a metallic layer, as in the present exemplary embodiment.
  • a second exemplary embodiment of the security element 10 is shown, only the differences from the first exemplary embodiment being discussed. While the layer structure is unchanged, that part of the embossing lacquer layer 2 which forms the intermediate layer 2 a of the thin-film element 9 and remains after the embossing without residues has a diffractive surface structure 5.
  • the diffractive surface structure 5 can be a diffraction grating or a sub-wavelength structure which can generate additional interference patterns for the viewer.
  • the embossing tool 13 also has a further embossing structure for producing the diffractive surface structure 5 on the intermediate layer 2a, so that the second motif 12 and the diffractive surface structure 5 can be embossed in a common process step.
  • the further embossed structure would be arranged on the base of the embossed structure 13 between two mutually facing flanks of the embossed structure 13.
  • FIG. 4 shows a third embodiment of the security element 10, again only the differences will be discussed.
  • the security element 10 has a first further lacquer layer 8 a, which is applied over the entire area to the absorber layer 3 and is arranged between the absorber layer 3 and the embossed lacquer layer 2.
  • the thin-film element 9 is formed in the form of the first motif 11 and, on the other hand, a further thin-film element 18 in the form of the second motif 12 is formed in the area of the embossing 2b.
  • the thin-film element 9 in the form of the first motif 11 comprises, in addition to that resulting from the embossing lacquer layer 2 Intermediate layer 2a has another intermediate layer formed by the first further lacquer layer 8a and thus produces a first color-shift effect for the viewer.
  • the further thin-film element 18, which is formed where the second motif 12 was embossed in the embossing lacquer layer 2, i.e. in the area of the embossing 2b, comprises in the exemplary embodiment the absorber layer 3, the reflective layer 4 and the first further lacquer layer 8a, which is between the absorber layer 3 and reflective layer 4 is arranged. Since the distance between the absorber layer 3 and the reflective layer 4 in the thin-film element 9 and in the further thin-film element 18 are of different sizes, two different and visually distinguishable color shift effects are generated for the viewer. In other words, in this exemplary embodiment, a color-shifting effect can be observed both in the contour defined by the second motif 12 and in the surface pattern defined by the first motif 11.
  • the intermediate layer 2a is provided with the diffractive surface structure 5, this is not essential for the generation of the two color shift effects.
  • FIG. 5 a fourth exemplary embodiment of the security element 10, the security element 10 being designed as a transfer element and being applied to a value document substrate 6.
  • a security element 10 in the present case it has an adhesive layer 7, for example a hot-melt adhesive layer, which forms the boundary layer of the security element 10 opposite the carrier substrate 1.
  • the adhesive layer 7 is applied directly to the reflective layer 4 in the present exemplary embodiment.
  • the layer structure can be connected to the value document substrate 6 of a value document 15 by means of the adhesive layer 7.
  • the carrier substrate 1 required for the production of the security element 10 is no longer required after the security element 10, which is designed as a transfer element, has been applied, the carrier substrate 1 is designed to be detachable from the security element 10, so that the carrier substrate 1 can be peeled off after the connection to the value document substrate 6, as symbolic in Fig. 5 shown.
  • a second further lacquer layer 8b for example a UV-curable lacquer layer, is arranged between the carrier substrate 1 and the absorber layer 3, which second further lacquer layer 8b adheres better to the absorber layer 3 than to the carrier substrate 1.
  • the second further lacquer layer 8b thus functions as an adhesion-reducing layer with regard to the carrier substrate 1.
  • the second further lacquer layer 8b can serve to protect the absorber layer 3 from, in particular mechanical, damage after the security element 10 has been applied to the value document substrate 6.
  • the adhesive layer 7 For the transport of a security element 10 designed as a transfer element, provision can be made for the adhesive layer 7 to be covered by a removable protective film.

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EP20157387.0A 2020-02-14 2020-02-14 Procédé de fabrication d'un élément de sécurité Pending EP3865311A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP20157387.0A EP3865311A1 (fr) 2020-02-14 2020-02-14 Procédé de fabrication d'un élément de sécurité

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Application Number Priority Date Filing Date Title
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021001589A1 (de) 2021-03-25 2022-09-29 Giesecke+Devrient Currency Technology Gmbh Herstellungsverfahren für ein optisch variables Sicherheitselement

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004016441A2 (fr) * 2002-07-17 2004-02-26 Leonhard Kurz Gmbh & Co. Kg Element optiquement variable a epaisseur de couche d'ecartement variable
WO2015117765A1 (fr) 2014-02-07 2015-08-13 Giesecke & Devrient Gmbh Fabrication d'un élément de sécurité présentant des propriétés de changement de couleur
WO2016034274A1 (fr) * 2014-09-03 2016-03-10 Giesecke & Devrient Gmbh Élément de sécurité optiquement variable
WO2017028950A1 (fr) * 2015-08-17 2017-02-23 Giesecke & Devrient Gmbh Élément de sécurité, procédé de production de ce dernier et support de données équipé de l'élément de sécurité
WO2017220960A1 (fr) * 2016-06-22 2017-12-28 De La Rue International Limited Procédés de fabrication de motif d'image pour dispositif de sécurité

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004016441A2 (fr) * 2002-07-17 2004-02-26 Leonhard Kurz Gmbh & Co. Kg Element optiquement variable a epaisseur de couche d'ecartement variable
WO2015117765A1 (fr) 2014-02-07 2015-08-13 Giesecke & Devrient Gmbh Fabrication d'un élément de sécurité présentant des propriétés de changement de couleur
WO2016034274A1 (fr) * 2014-09-03 2016-03-10 Giesecke & Devrient Gmbh Élément de sécurité optiquement variable
WO2017028950A1 (fr) * 2015-08-17 2017-02-23 Giesecke & Devrient Gmbh Élément de sécurité, procédé de production de ce dernier et support de données équipé de l'élément de sécurité
WO2017220960A1 (fr) * 2016-06-22 2017-12-28 De La Rue International Limited Procédés de fabrication de motif d'image pour dispositif de sécurité

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021001589A1 (de) 2021-03-25 2022-09-29 Giesecke+Devrient Currency Technology Gmbh Herstellungsverfahren für ein optisch variables Sicherheitselement

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