EP3807961A1 - Optische baugruppe zur verringerung einer spektralen bandbreite eines ausgabestrahls eines lasers - Google Patents
Optische baugruppe zur verringerung einer spektralen bandbreite eines ausgabestrahls eines lasersInfo
- Publication number
- EP3807961A1 EP3807961A1 EP19727388.1A EP19727388A EP3807961A1 EP 3807961 A1 EP3807961 A1 EP 3807961A1 EP 19727388 A EP19727388 A EP 19727388A EP 3807961 A1 EP3807961 A1 EP 3807961A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- laser
- expansion
- resonator
- limiting diaphragm
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
- H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
- H01S3/0805—Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
- H01S3/08068—Holes; Stepped surface; Special cross-section
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0811—Construction or shape of optical resonators or components thereof comprising three or more reflectors incorporating a dispersive element, e.g. a prism for wavelength selection
- H01S3/0812—Construction or shape of optical resonators or components thereof comprising three or more reflectors incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Definitions
- Optical assembly for reducing a spectral bandwidth of an output beam from a laser
- the invention relates to an optical assembly for reducing a spectral bandwidth of an output beam from a laser.
- the invention further relates to a bandwidth-limited laser with such an assembly.
- a bandwidth narrowing module for setting a spectral bandwidth of a laser beam is known from DE 10 2009 020 501 A1. It is an object of the present invention to further develop an optical assembly for reducing a spectral bandwidth of a laser beam in such a way that undesired thermal effects due to inhomogeneous heating of optical components of the optical assembly in laser operation are reduced due to a local power density of an intracavity laser beam. who are avoided.
- US Pat. No. 6,785,319 B1 discloses a UV laser with a beam expansion lens having two prisms.
- US Pat. No. 6,285,701 B1 discloses a laser resonator for improving a narrow-band emission from an excimer laser.
- US 2008/0253413 A1 discloses a laser-based lithography system with improved bandwidth control. This object is achieved according to the invention by an optical assembly with the features specified in claim 1. Laser light incident in the optical assembly is only guided through the optical grating, which can be arranged in a Littrow arrangement, to a resonator of the laser if the wavelength of the resonator-internal laser beam fulfills the grating equation.
- the amplifying wavelength that is guided into the beam path of the laser beam inside the resonator depends on the angle at which the laser beam strikes the optical grating.
- the generation of an output beam with a small bandwidth therefore requires a small angular distribution, ie a narrow angular spectrum, in the laser beam incident on the optical grating.
- a reduction in the angle of incidence distribution in the optical assembly is achieved in that the cavity-internal laser beam is expanded with the help of the beam expansion optics before it hits the optical grating in the direction transverse to the direction of propagation of the cavity-internal laser beam, that is to say laterally. This widening reduces the divergence and thus the angular distribution of the laser beam inside the resonator.
- Expanding laser beam section of a beam pointing optics ie in the beam path between the grating and the beam expanding optics or within the beam expanding optics leads to the possibility of specifying a useful beam cross section within a resonator of the laser in such a way that a temperature profile in or on the optical components of the optical assembly linked to the cross section of the cavity of the resonator has no or at most a low temperature gradient within the useful beam cross section.
- the widening laser beam section is a beam section inside the resonator, in which the laser beam inside the resonator is widened laterally.
- the optical assembly then produces its bandwidth-reducing effect largely independently of an internal resonator power.
- a change between laser powers (high duty cycle / low duty cycle) and / or a change between different spectral bandwidths is possible without hysteresis of the spectral bandwidth that can be achieved in each case.
- the beam expansion optics can have at least one prism.
- the beam expansion optics can have two prisms, three prisms, four prisms or even an even larger number of prisms.
- the beam expansion optics can have at least one mirror.
- the beam expansion optics can have at least one cylindrical lens.
- the optical assembly and / or the laser, the component of which can be the optical assembly can have a purging device for purging the optical components of the optical assembly and / or the laser with a purge gas, for example with nitrogen or helium.
- the purge gas can be used for heat dissipation by residual absorption on or in the optical Components of deposited heat contribute. However, thermally induced refractive index gradients in the purge gas can also contribute to the wavefront deformation.
- the element that limits the beam width can prevent radiation components from contributing to the useful beam that undesirably strike edge areas of the optical components in the optical assembly or propagate through corresponding edge areas that generally do not meet sufficiently high requirements for wave front maintenance like the central area and which also have the strongest temperature gradients.
- the beam limiting diaphragm can be a diaphragm component that is separate from the other optical components of the optical assembly.
- the beam limiting diaphragm can be formed by an at least partially reflective coating of another component of the optical assembly, for example a component of the beam expansion optics.
- the optical assembly has an additional entrance beam limiting diaphragm in the beam path of the cavity-internal laser beam on a side of the beam expansion optics facing away from the grating.
- Such an additional entrance beam limiting diaphragm which is arranged in the unexpanded part of the beam path of the cavity-internal laser beam, makes it possible, in combination with a tunable beam expansion optics, the width of the useful area at the location of the beam limiting diaphragm, which acts in the beam path of the expanding laser beam section. to optimize.
- the arrangement of the entrance beam limiting diaphragm is such that with a minimal expansion of the laser beam inside the resonator by means of the then adjustable beam display.
- the width of the additional entrance beam limiting diaphragm is chosen such that the beam limiting diaphragm arranged in the expanding laser beam section is outshined by the resonator-internal laser beam and that the width of a useful beam cross section on the grating is defined by the beam limiting diaphragm arranged in the expanding laser beam section.
- the additional entrance beam limiting diaphragm ensures that the beam limiting diaphragm arranged in the widening laser beam section is outshined by the beam widening optics in practically all adjustment positions except for the one with the least widening, so that the optical grating is uniformly acted upon with intensity.
- a beam limiting diaphragm according to claim 2 avoids problems that could arise due to the heating of the beam limiting diaphragm itself by absorption.
- the beam limiting diaphragm can be designed in such a way that it absorbs less than 3% of the laser beam incident on it within the resonator or else less than 1%.
- a transmissive design of the beam limiting diaphragm according to claim 3 makes it possible for parts of the laser beam inside the resonator that do not further contribute to the amplification in the laser resonator to bring about a desired heat input in edge areas of optical components of the optical assembly and / or the laser, which in turn leads to Reduction of temperature gradients in the useful beam cross section can advantageously contribute.
- the beam limiting diaphragm can be designed to be overall transmitting for the laser beam inside the resonator.
- a wedge plate design of the beam limiting diaphragm according to claim 4 makes it possible to decouple the portions of the internal radiation that pass through the at least one wedge plate with a predetermined angular offset.
- beam limiting sections of the beam limiting diaphragm can each be designed as a wedge plate.
- the beam limiting diaphragm according to claim 5 can alternatively or additionally change a polarization state of the cavity-internal laser beam and thereby contribute to the fact that radiation which passes through the beam limiting diaphragm is no longer amplified in the laser medium.
- the laser medium can generate a polarization-sensitive amplification, or a further polarization-optical component can be arranged in the resonator-internal beam path, which component acts as an analyzer and only allows the laser radiation to be amplified to pass through.
- the beam limiting diaphragm or sections thereof can be designed, for example, as a birefringent plate, which acts in particular as a lambda / quarter plate.
- a reflective design of the beam limiting diaphragm according to claim 6 can protect critical areas of subsequent optics (optical mount, adhesive points) by shading against the action of laser radiation, so that, in particular, undesired absorption is avoided there.
- the beam limiting diaphragm can be designed to be reflective for the laser beam inside the resonator.
- the beam limiting aperture can be realized by reflecting plates and / or by one reflective coating at least in sections.
- the beam limiting diaphragm can be designed as a combination of refractive and reflective components.
- a reflecting beam limiting diaphragm can also be applied directly to an optical component of the assembly, for example to a prism of the beam expansion optics.
- Such a coating can also have a function other than a reflecting function, ie it can generally have an aperture effect by influencing the laser beam inside the resonator such that it is no longer amplified by the laser medium after the action of the beam limiting aperture.
- a multi-part design of the beam limiting diaphragm according to claim 7 increases flexibility in the arrangement of the beam limiting diaphragm.
- the beam limiting diaphragm can be made in two parts or with a larger number of parts.
- An embodiment of the beam limiting diaphragm according to claim 8 with offset beam limiting sections leads to an even greater flexibility.
- the thermal effects which are brought about by using the beam limiting diaphragm, in particular on these components adjacent in the beam path of the resonator-internal laser beam, can be finely specified in this way.
- An arrangement of the beam limiting diaphragm according to claim 9 has proven to be particularly suitable, in particular, for fine specifying a thermal load on the grating.
- a tunable design of the beam expansion optics according to claim 10 has proven itself for the specific bandwidth specification.
- Such an Tunable beam expansion optics are known, for example, from US Pat. No. 7,899,095 B2.
- the beam expansion optics can be designed in such a way that when the expansion factor changes in the beam path behind the beam limiting diaphragm, it acts exclusively on the divergence of the internal laser beam, but not on its cross section.
- the advantages of a bandwidth-limited laser according to claim 12 correspond to those which have already been explained above with reference to the optical assembly according to the invention.
- the laser can be an excimer laser.
- the laser can be an illumination laser for a projection exposure system in microlithography, with which structured semiconductor components, for example semiconductor chips, can be produced.
- the bandwidth-limited laser can be used as a light source in DUV semiconductor lithography.
- a spectral bandwidth of the laser can be reduced, for example, by a factor of 1,000 and, depending on the embodiment, can be tuned to adjust the variable bandwidth, for example in the range between 0.15 pm and 0.6 pm (E95 width).
- the bandwidth-limited laser can serve as a seed laser, which is amplified to generate an exposure beam for DUV semiconductor lithography. Other uses of the laser where a corresponding spectral bandwidth limitation is desired are also possible.
- Cross-sectional dimension of an intracavity laser beam lies in the plane of the drawing, a resonator of a hand-limited excimer laser with a
- FIG. 2 shows a specific embodiment of an optical assembly for
- FIG. 1 shows a prism of a beam expansion optics of the optical assembly according to FIG. 2 to clarify a thermal effect of the beam limiting diaphragm of the optical assembly according to FIG. 2;
- Fig. 4 shows a diagram of a temperature profile of the prism
- FIG. 5 shows, in a representation similar to FIG. 2, a further embodiment of an optical assembly for reducing the spectral bandwidth of the output beam of a laser, which can be used instead of the optical assembly according to FIG. 1.
- An excimer laser 1 shown schematically in FIG. 1 has a resonator with a coupling-out mirror 2, which is designed to be partially transparent to an output beam 3 of the laser 1 and on the side of a laser medium 4 opposite the coupling-out mirror 2 has an optical assembly 5 for reduction a spectral bandwidth of the output beam 3.
- the optical assembly 5 additionally has the function of a second resonator mirror of the resonator of the laser 1.
- the optical assembly 5 has a beam expansion optics 6 arranged within the laser resonator for enlarging a beam cross section of an intracavity laser beam 7 in one Expanded cross-sectional dimension, namely that cross-sectional dimension of the resonator-internal laser beam 7, which coincides with the plane of the drawing in FIG. 1.
- the beam expansion optics 6 has a series of optical components, for example prisms PI, P2, for beam expansion. These prisms PI, P2, ... are arranged between the laser medium 4 and an optical grating 8.
- the optical grating 8 is arranged for the laser beam 7 inside the resonator to be retroreflective.
- the resonator-internal laser beam 7 has an unexpanded beam cross section Qi and, in the case of retroreflection on the optical grating 8, a beam cross section Q 2 which is enlarged in comparison therewith.
- the divergence between the beam expansion system 6 and the grating 8 is reduced in the direction of expansion.
- an expansion laser beam section 9 of the cavity laser beam 7 is an expansion laser beam section 9 of the cavity laser beam 7, in which the beam cross section of the cavity laser beam 7 in the expansion cross-sectional dimension is larger than Qi.
- the optical assembly 5 has a beam limiting diaphragm 10 with beam limiting sections 10a, 10b.
- the beam limiting diaphragm 10 acts in the widening cross-sectional dimension in such a way that a useful beam cross-section of the laser beam 7 internal to the resonator in the widening cross-sectional dimension that is let through by the beam limiting diaphragm 10 is smaller than a beam cross-section in the widening cross-sectional dimension that would exist without the beam limiting diaphragm 10 ,
- the beam limiting diaphragm 10 thus leads to a narrowing of the cavity-internal laser beam 7 in the widening cross-sectional dimension.
- All sub-areas of the resonator of the laser 1 with optical components are flushed with a suitable flushing gas, for example with nitrogen or helium, via a flushing device 11 shown schematically in FIG. 1, in order to reduce absorption by the flushing gas atmosphere itself and contamination of the surfaces and dissipate heat that is deposited there, for example, by residual absorption of the components.
- a suitable flushing gas for example with nitrogen or helium
- the beam limiting diaphragm 10 is designed in several parts in the embodiment according to FIG. 1 and has a fiber beam 7 inside the resonator in FIG.
- the two beam limits tongue sections 10a, 10b limit the cavity-internal laser beam 7 in the widening cross-sectional dimension, ie from opposite sides.
- the beam limiting diaphragm 10 is designed in such a way that it absorbs less than 5% and in particular less than 1% of the energy of the dimmed cross-section of the intra-cavity laser beam 7 that strikes it.
- the beam limiting diaphragm 10 is at least partially transmissive, that is to say permeable to the laser beam inside the resonator, and acts on transmitted parts of the laser beam 7 inside the resonator in such a way that these transmitted parts are no longer amplified in the laser medium 4.
- the two beam delimiting sections 10a, 10b can be designed as wedge plates, and thus lead to an angular deflection of the portions of the intra-cavity laser beam 7 passing through them.
- the beam limiting diaphragm 10 can also be designed, in sections, to be reflective for the cavity-internal laser beam 7 and, for this purpose, has a correspondingly sectionally reflecting coating. With these reflective sections, e.g. Edge areas of the beam cross-section are eliminated by casting shadows that should not fall on critical areas of subsequent optics.
- the beam limiting diaphragm 10 can also have a polarization-optical effect and in this way influence parts of the resonator-internal laser beam 7 in such a way that they are no longer amplified in the laser medium 4.
- the basic function of an optical assembly for reducing a spectral bandwidth of an output beam of a laser with a beam expansion optics and an optical grating is known from US 6,496,528 B2 and US 7,899,095 B2 and from US 8,379,687 B2.
- the width of the beam cross section Qi of the cavity-internal laser beam 7 is defined by two further aperture diaphragms 12, 13 on the one hand between the first prism PI of the beam expansion optics 6 and the laser medium 4 and on the other hand between the laser medium 4 and the coupling-out mirror 2.
- the aperture 12 defines the width of the beam entering the assembly 5.
- FIG. 1 This is shown in FIG. 1 by an additional, dashed beam path 7 '.
- the first prism PI in the beam expansion optics 6 can be displaced and in particular can be designed to be tiltable about a tilt axis perpendicular to the plane of the drawing in FIG. 1.
- the setting range of the beam expansion optics 6 and the width of the entrance aperture 12 can be coordinated with one another in such a way that with the slightest expansion, the beam limiting diaphragm 10 is approximately completely illuminated and, with increasing expansion, completely overlaid. is radiated and so there is the same usable beam width on the optical grating regardless of a bandwidth tuning position of the beam expansion optics.
- a change in the tuning position of the beam expansion optics 6 thus only leads to a change in the divergence of the laser beam 7 inside the resonator, but not to a change in the cross section of the useful cross section in the widening cross-sectional dimension.
- FIG. 2 A special embodiment of an optical assembly 14 is described below with reference to FIG. 2, which can be used in the laser 1 instead of the optical assembly 5. Components and functions that correspond to those described above with reference to FIGS.
- the beam expansion optics 6 have a total of four prisms PI, P2, P3 and P4, which in the expansion laser beam section 9, which lies between the prism P 1 and the optical grating 8, have the beam cross section of the resonator-internal laser beam 7 in expand the cross-sectional dimension in each case.
- a widening factor which reflects the widening of the resonator-internal laser beam 7 by the respective prism PI to P4 in the widening cross-sectional dimension, can be between 1.5 and 5 and, for example, 3 for each prism.
- a divergence of the intracavity laser beam 7 decreases.
- the assembly 14 also has a deflection mirror M in the beam path of the laser beam 7 inside the resonator.
- the two beam limiting sections 10a, 10b of the beam limiting diaphragm 10 of the optical assembly 14 are widened along the beam path of the laser beam 7 inside the resonator -Laser beam section arranged offset from one another. This offset is such that a light path of the laser beam 7 within the resonator from the respective beam limiting section 10a or 1 Ob to the grating 8 is approximately the same length.
- 3 and 4 illustrate the effect of the beam limiting diaphragm 10 on, in particular, a thermal homogenization of the optical properties in the useful area of the laser beam 7 inside the resonator.
- This is shown in a simplified manner using the prism PI of the beam expansion optics 6, the effect for a series of prisms P2, P3 and P4 (as in the embodiment according to FIG. 2) is basically comparable.
- a beam cross section Qi originally wider in the widening cross-sectional dimension (cf. the beam limiting course 15 shown in dashed lines in FIG. 3 or the course 7 'shown in dashed lines in FIG. 1 in the case of a series of optics) is applied to the Beam cross section Qb of the actual useful area of the cavity-internal laser beam 7 limited.
- FIG. 4 shows the temperature profile of the prism P1 in cross section (transverse dimension q) of the laser beam 7 inside the resonator.
- a gradual drop in the heat input then takes place in the heat input zone W2 which adjoins laterally on both sides and in the outer heat input zone W3 which adjoins it laterally.
- a temperature gradient is therefore present in the heat input zones W2, W3.
- the central heat input zone W1 results without any significant temperature gradients.
- the prism P1 therefore does not interfere with the wave front of the beam propagation in the useful area of the resonator-internal laser beam 7 when it passes through the prism P1, since this useful area only passes through the heat input zone W 1 without any significant temperature gradients.
- the beam limiting diaphragm 10 When the beam limiting diaphragm 10 is designed as a transmissive wedge plate with a weak angular deflection, the returning part of the radiation inside the resonator that is not part of the useful area, that is to say reflected by the grating 8, can also be used to heat the prism P 1 in FIG Lead heat input zones W2, W3 and so keep the temperature gradient in the central heat input zone W 1 minimal as desired.
- the intracavity laser radiation in FIG. 2 strikes the prisms P1 to P4, the mirror M and also the grating 8 with a larger cross-sectional area than the extension of the useful area of the intracavity laser beam in the expansion cross-sectional dimension.
- FIG. 5 A further embodiment of an optical assembly 17 is described below with reference to FIG. 5, which can be used in the laser 1 instead of the assemblies 5 or 14.
- Components and functions which correspond to those which have already been explained above with reference to FIGS. 1 to 3 have the same reference numbers and will not be discussed again in detail.
- the beam expansion optics 6 again comprises four prisms P1, P2, P3 and P4.
- the first prism P1 in particular is designed to be tiltable.
- the prisms P3 and P4 are also designed to be tiltable.
- a corresponding version the beam expansion optics 6 of the assembly 17 is described in US Pat. No. 7,899,095 B2.
- the width of the illumination of the grating can be kept largely constant regardless of the expansion factor.
- a variation of the expansion factor by turning PI then only affects the divergence of the incident beam without significantly changing the width of the illumination on the grating.
- the beam guidance of the resonator-internal laser beam 7, which generally has very low temperature gradients when the beam is limited with the aid of the internal diaphragm 10, through the optical components of the optical assembly 17 and the avoidance of a temperature distribution on the grating that changes with the widening makes it possible in particular to change to perform between high and low spectral bandwidth even when the laser 1 is operated with high laser power, in particular the change between a maximum value and a Minimum value of the spectral bandwidth can be essentially free of hysteresis.
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- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018209602.3A DE102018209602B4 (de) | 2018-06-14 | 2018-06-14 | Optische Baugruppe zur Verringerung einer spektralen Bandbreite eines Ausgabestrahls eines Lasers |
| PCT/EP2019/063857 WO2019238417A1 (de) | 2018-06-14 | 2019-05-28 | Optische baugruppe zur verringerung einer spektralen bandbreite eines ausgabestrahls eines lasers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP3807961A1 true EP3807961A1 (de) | 2021-04-21 |
Family
ID=66676547
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19727388.1A Pending EP3807961A1 (de) | 2018-06-14 | 2019-05-28 | Optische baugruppe zur verringerung einer spektralen bandbreite eines ausgabestrahls eines lasers |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12300959B2 (de) |
| EP (1) | EP3807961A1 (de) |
| JP (1) | JP7136934B2 (de) |
| CN (1) | CN112352360B (de) |
| DE (1) | DE102018209602B4 (de) |
| WO (1) | WO2019238417A1 (de) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116565677A (zh) * | 2023-04-12 | 2023-08-08 | 武汉华日精密激光股份有限公司 | 一种泵浦激光器 |
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| CN1007483B (zh) * | 1986-05-15 | 1990-04-04 | 北京工业学院 | 宽通频带耦合的多频可调谐激光器 |
| JP3175180B2 (ja) * | 1990-03-09 | 2001-06-11 | キヤノン株式会社 | 露光方法及び露光装置 |
| CN2070955U (zh) * | 1990-05-16 | 1991-02-06 | 北京理工大学 | 双频高功率相关补偿调谐染料激光器 |
| US5489984A (en) * | 1994-04-01 | 1996-02-06 | Imra America, Inc. | Differential ranging measurement system and method utilizing ultrashort pulses |
| US5559816A (en) * | 1994-10-26 | 1996-09-24 | Lambda Physik Gesellschaft Zur Herstellung Von Lasern Mbh | Narrow-band laser apparatus |
| US5898725A (en) * | 1997-01-21 | 1999-04-27 | Cymer, Inc. | Excimer laser with greater spectral bandwidth and beam stability |
| US6285701B1 (en) | 1998-08-06 | 2001-09-04 | Lambda Physik Ag | Laser resonator for improving narrow band emission of an excimer laser |
| US6785319B1 (en) | 1999-01-06 | 2004-08-31 | Komatsu Ltd. | Ultraviolet laser device |
| JP2007096359A (ja) * | 1999-06-01 | 2007-04-12 | Komatsu Ltd | 紫外レーザ装置 |
| DE19934638B4 (de) | 1999-07-23 | 2004-07-08 | Jenoptik Ldt Gmbh | Modensynchronisierter Festkörperlaser mit mindestens einem konkaven Faltungsspiegel |
| US6496528B2 (en) * | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
| US6603788B1 (en) * | 1999-11-23 | 2003-08-05 | Lambda Physik Ag | Resonator for single line selection |
| DE102005016200A1 (de) * | 2004-04-23 | 2005-09-15 | Carl Zeiss Laser Optics Gmbh | Verfahren und Vorrichtung zur Bandbreiteneinengung eines Lasers |
| US8379687B2 (en) | 2005-06-30 | 2013-02-19 | Cymer, Inc. | Gas discharge laser line narrowing module |
| US7659529B2 (en) | 2007-04-13 | 2010-02-09 | Cymer, Inc. | Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element |
| DE102009010560A1 (de) * | 2009-02-17 | 2010-08-26 | Carl Zeiss Smt Ag | Projektionsbelichtungsverfahren, Projektionsbelichtungsanlage, Laserstrahlungsquelle und Bandbreiten-Einengungsmodul für eine Laserstrahlungsquelle |
| DE102009020501A1 (de) | 2009-05-08 | 2010-12-23 | Carl Zeiss Laser Optics Gmbh | Bandbreiteneinengungsmoduls zur Einstellung einer spektralen Bandbreite eines Laserstrahls |
| CN103875138B (zh) * | 2011-06-13 | 2017-01-18 | Wi-电荷有限公司 | 空间分布式激光器共振器 |
| KR101978013B1 (ko) * | 2012-01-20 | 2019-05-13 | 엑살로스 아게 | Oct를 위한 그리즘을 갖춘 파장-가변형 외부 캐비티 레이저 다이오드 |
| JP2013247240A (ja) * | 2012-05-25 | 2013-12-09 | Gigaphoton Inc | レーザ装置 |
| CN102983485A (zh) * | 2012-11-30 | 2013-03-20 | 中国科学院上海光学精密机械研究所 | 窄线宽准分子激光器 |
-
2018
- 2018-06-14 DE DE102018209602.3A patent/DE102018209602B4/de active Active
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2019
- 2019-05-28 EP EP19727388.1A patent/EP3807961A1/de active Pending
- 2019-05-28 JP JP2020569769A patent/JP7136934B2/ja active Active
- 2019-05-28 WO PCT/EP2019/063857 patent/WO2019238417A1/de not_active Ceased
- 2019-05-28 CN CN201980039591.4A patent/CN112352360B/zh active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| JP7136934B2 (ja) | 2022-09-13 |
| WO2019238417A1 (de) | 2019-12-19 |
| JP2021528844A (ja) | 2021-10-21 |
| CN112352360A (zh) | 2021-02-09 |
| CN112352360B (zh) | 2024-04-12 |
| DE102018209602B4 (de) | 2022-05-12 |
| DE102018209602A1 (de) | 2019-12-19 |
| US20210098958A1 (en) | 2021-04-01 |
| US12300959B2 (en) | 2025-05-13 |
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