EP3769093A1 - Verfahren zur kontinuierlichen bestimmung sämtlicher komponenten eines widerstandstensors von dünnschichten - Google Patents
Verfahren zur kontinuierlichen bestimmung sämtlicher komponenten eines widerstandstensors von dünnschichtenInfo
- Publication number
- EP3769093A1 EP3769093A1 EP19712738.4A EP19712738A EP3769093A1 EP 3769093 A1 EP3769093 A1 EP 3769093A1 EP 19712738 A EP19712738 A EP 19712738A EP 3769093 A1 EP3769093 A1 EP 3769093A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- contact points
- voltage
- resistance
- thin film
- tensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 44
- 239000010409 thin film Substances 0.000 title claims abstract description 42
- 239000013598 vector Substances 0.000 claims description 44
- 238000005259 measurement Methods 0.000 claims description 22
- 230000000694 effects Effects 0.000 claims description 6
- 230000002829 reductive effect Effects 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 2
- 230000003071 parasitic effect Effects 0.000 claims description 2
- 230000002123 temporal effect Effects 0.000 claims description 2
- 239000011159 matrix material Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 5
- 230000005355 Hall effect Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000010363 phase shift Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000036962 time dependent Effects 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/08—Measuring resistance by measuring both voltage and current
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/28—Measuring attenuation, gain, phase shift or derived characteristics of electric four pole networks, i.e. two-port networks; Measuring transient response
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
Definitions
- Connection is provided with an input voltage, wherein at each of the contact points, an input voltage is applied, that the currents flowing through the contact points are detected and that from the voltage and current values of the full resistance tensor of the section
- the invention provides a way to minimize the number of contact points required for precision measurements and allows the components of the resistance tensor to be provided without disturbing current and voltage switching
- Time-variable input voltages UJt are applied at the contact points K x to K 3 , and the time-varying currents hit) are determined. Under vector addition of the 3
- Another expedient operation is a trigonalization of the electrical resistance tensor p by Schur decomposition.
- p Schur of the resistance tensor the independent components of the
- the transverse resistance follows:
- a portion T which is provided with at least three contact points Ki to K 3 for connection to each other input voltage UJt), wherein the contact points Ki to K 3 an arbitrarily large partial area T of the thin film whose resistance tensor p are determined should include.
- the maximum number of contact points for carrying out the method according to the invention is not limited, but the Wiring costs and the computational effort for the implementation of the method with the number of
- the resistance tensor p can be calculated from the ratio of the amplitudes and the phases of the
- the following embodiment relates to the inventive method for determining all components of a resistance tensor p at an arbitrarily shaped homogeneous section T, which with three electrical
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Measurement Of Resistance Or Impedance (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102018106466.7A DE102018106466B3 (de) | 2018-03-20 | 2018-03-20 | Verfahren zur kontinuierlichen Bestimmung sämtlicher Komponenten eines Widerstandstensors von Dünnschichten |
PCT/EP2019/056760 WO2019179972A1 (de) | 2018-03-20 | 2019-03-19 | Verfahren zur kontinuierlichen bestimmung sämtlicher komponenten eines widerstandstensors von dünnschichten |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3769093A1 true EP3769093A1 (de) | 2021-01-27 |
Family
ID=65894999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19712738.4A Withdrawn EP3769093A1 (de) | 2018-03-20 | 2019-03-19 | Verfahren zur kontinuierlichen bestimmung sämtlicher komponenten eines widerstandstensors von dünnschichten |
Country Status (5)
Country | Link |
---|---|
US (1) | US11402345B2 (de) |
EP (1) | EP3769093A1 (de) |
CN (1) | CN111886506A (de) |
DE (1) | DE102018106466B3 (de) |
WO (1) | WO2019179972A1 (de) |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3123427C2 (de) | 1981-06-12 | 1985-10-24 | Siemens AG, 1000 Berlin und 8000 München | Anordnung zum Messen des elektrischen Widerstandes und der Temperatur von durch Aufdampfen oder Aufstäuben auf Substraten abgeschiedenen dünnen, metallischleitenden Schichten während der Schichtherstellung |
US4868490A (en) * | 1988-09-14 | 1989-09-19 | Texas Instruments Incorporated | Method and apparatus for sheet resistance measurement of a wafer during a fabrication process |
CH682017A5 (en) * | 1990-02-01 | 1993-06-30 | Radivoje Popovic | Appts. for measuring characteristic values of semiconductor wafer - employs homogeneous magnetic field and predefined test current to establish specific resistance and Hall coefft. of sample |
US5495178A (en) * | 1992-11-10 | 1996-02-27 | Cheng; David | Method and apparatus for measuring film thickness |
WO1998010302A2 (en) | 1996-09-09 | 1998-03-12 | Physical Electronics Laboratory | Method for reducing the offset voltage of a hall device |
JP4399084B2 (ja) * | 2000-03-31 | 2010-01-13 | 日置電機株式会社 | 四端子法によるインピーダンス測定方法 |
JP3632832B2 (ja) * | 2000-04-27 | 2005-03-23 | シャープ株式会社 | シート抵抗測定方法 |
KR20020052796A (ko) * | 2000-12-26 | 2002-07-04 | 이구택 | 전기강판의 표면 절연 저항율 측정장치 |
NO312925B1 (no) * | 2001-05-08 | 2002-07-15 | Sintef Energiforskning As | Kontaktkontroll |
JP5001492B2 (ja) * | 2001-06-27 | 2012-08-15 | トヨタ自動車株式会社 | 電着塗装における塗膜厚み予測装置及び塗膜厚み予測方法 |
DE102007041612A1 (de) | 2007-09-03 | 2009-03-12 | Forschungszentrum Jülich GmbH | Verfahren zur amplituden- und phasengenauen Messung der Impedanz einer Probe |
JP2009192370A (ja) * | 2008-02-14 | 2009-08-27 | Sii Nanotechnology Inc | 導電率測定装置及び導電率測定方法 |
JP2011137774A (ja) * | 2009-12-25 | 2011-07-14 | Astellatech Inc | シート抵抗測定用端子およびこれを用いた測定リード |
JP2012237622A (ja) * | 2011-05-11 | 2012-12-06 | Nidec-Read Corp | 測定装置及び測定方法 |
US20140303916A1 (en) * | 2013-04-04 | 2014-10-09 | Brigham Young University | Four-line electrical impedance probe |
JP6375661B2 (ja) * | 2014-03-26 | 2018-08-22 | 日本電産リード株式会社 | 抵抗測定装置、基板検査装置、検査方法、及び検査用治具のメンテナンス方法 |
DE102017105317B3 (de) * | 2017-03-14 | 2018-05-09 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Vorrichtung zum Charakterisieren des elektrischen Widerstandes eines Messobjekts |
CN207007942U (zh) * | 2017-03-20 | 2018-02-13 | 西安交通大学 | 输电导线的交流电阻测量系统及固定器 |
-
2018
- 2018-03-20 DE DE102018106466.7A patent/DE102018106466B3/de active Active
-
2019
- 2019-03-19 US US16/981,735 patent/US11402345B2/en active Active
- 2019-03-19 EP EP19712738.4A patent/EP3769093A1/de not_active Withdrawn
- 2019-03-19 WO PCT/EP2019/056760 patent/WO2019179972A1/de unknown
- 2019-03-19 CN CN201980020739.XA patent/CN111886506A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
CN111886506A (zh) | 2020-11-03 |
DE102018106466B3 (de) | 2019-04-25 |
WO2019179972A1 (de) | 2019-09-26 |
US11402345B2 (en) | 2022-08-02 |
US20210231595A1 (en) | 2021-07-29 |
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