EP3597794A4 - Metallplatte, abscheidungsmaske und herstellungsverfahren dafür - Google Patents

Metallplatte, abscheidungsmaske und herstellungsverfahren dafür Download PDF

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Publication number
EP3597794A4
EP3597794A4 EP18767292.8A EP18767292A EP3597794A4 EP 3597794 A4 EP3597794 A4 EP 3597794A4 EP 18767292 A EP18767292 A EP 18767292A EP 3597794 A4 EP3597794 A4 EP 3597794A4
Authority
EP
European Patent Office
Prior art keywords
manufacturing
metal plate
deposition mask
method therefor
therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP18767292.8A
Other languages
English (en)
French (fr)
Other versions
EP3597794B1 (de
EP3597794A1 (de
Inventor
Jee Heum Paik
Yoon Tai Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Innotek Co Ltd
Original Assignee
LG Innotek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Innotek Co Ltd filed Critical LG Innotek Co Ltd
Priority to EP21193813.9A priority Critical patent/EP3940113A1/de
Publication of EP3597794A1 publication Critical patent/EP3597794A1/de
Publication of EP3597794A4 publication Critical patent/EP3597794A4/de
Application granted granted Critical
Publication of EP3597794B1 publication Critical patent/EP3597794B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B32B15/015—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium the said other metal being copper or nickel or an alloy thereof
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroplating Methods And Accessories (AREA)
EP18767292.8A 2017-03-14 2018-03-08 Metallplatte, abscheidungsmaske und herstellungsverfahren dafür Active EP3597794B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP21193813.9A EP3940113A1 (de) 2017-03-14 2018-03-08 Metallplatte, abscheidungsmaske und herstellungsverfahren dafür

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020170031938A KR102330373B1 (ko) 2017-03-14 2017-03-14 금속판, 증착용 마스크 및 이의 제조방법
PCT/KR2018/002742 WO2018169250A1 (ko) 2017-03-14 2018-03-08 금속판, 증착용 마스크 및 이의 제조방법

Related Child Applications (2)

Application Number Title Priority Date Filing Date
EP21193813.9A Division-Into EP3940113A1 (de) 2017-03-14 2018-03-08 Metallplatte, abscheidungsmaske und herstellungsverfahren dafür
EP21193813.9A Division EP3940113A1 (de) 2017-03-14 2018-03-08 Metallplatte, abscheidungsmaske und herstellungsverfahren dafür

Publications (3)

Publication Number Publication Date
EP3597794A1 EP3597794A1 (de) 2020-01-22
EP3597794A4 true EP3597794A4 (de) 2021-01-06
EP3597794B1 EP3597794B1 (de) 2021-10-27

Family

ID=63522458

Family Applications (2)

Application Number Title Priority Date Filing Date
EP21193813.9A Pending EP3940113A1 (de) 2017-03-14 2018-03-08 Metallplatte, abscheidungsmaske und herstellungsverfahren dafür
EP18767292.8A Active EP3597794B1 (de) 2017-03-14 2018-03-08 Metallplatte, abscheidungsmaske und herstellungsverfahren dafür

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP21193813.9A Pending EP3940113A1 (de) 2017-03-14 2018-03-08 Metallplatte, abscheidungsmaske und herstellungsverfahren dafür

Country Status (6)

Country Link
US (3) US11293105B2 (de)
EP (2) EP3940113A1 (de)
JP (4) JP6868706B2 (de)
KR (2) KR102330373B1 (de)
CN (2) CN113622004B (de)
WO (1) WO2018169250A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102154556B1 (ko) 2018-11-30 2020-09-10 (주)영진아스텍 이종 다층 전주도금과 열처리를 통한 고해상도 저열팽창성 oled 기반 마이크로 디스플레이용 미세 금속 마스크의 제조방법
KR20210086073A (ko) * 2019-12-31 2021-07-08 엘지디스플레이 주식회사 박막 증착용 마스크 프레임 및 이를 이용한 유기발광 표시패널의 제조방법
KR20220023927A (ko) * 2020-08-21 2022-03-03 삼성디스플레이 주식회사 표시장치 및 그것의 제조설비
KR102558317B1 (ko) * 2020-11-19 2023-07-21 크레아퓨쳐 주식회사 내식성 강화 인바시트 및 그의 제조방법
TWI828015B (zh) * 2021-12-01 2024-01-01 達運精密工業股份有限公司 精密金屬遮罩的製造方法
KR20240070405A (ko) 2022-11-12 2024-05-21 김진우 Oled 메탈 마스크 및 이의 제조 방법

Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2005154879A (ja) * 2003-11-28 2005-06-16 Canon Components Inc 蒸着用メタルマスク及びそれを用いた蒸着パターンの製造方法
JP2015168884A (ja) * 2014-09-29 2015-09-28 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
WO2016129534A1 (ja) * 2015-02-10 2016-08-18 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク

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KR100778540B1 (ko) * 2006-06-12 2007-11-22 주식회사 이코니 금속 마스크 제조 방법 및 금속 마스크 프레임 어셈블리제조 방법
KR20080064720A (ko) * 2007-01-05 2008-07-09 (주)우리정도 도금형 바이메탈 및 이의 제조 방법
JP2011034681A (ja) 2009-07-29 2011-02-17 Hitachi Displays Ltd 金属加工方法、金属マスク製造方法及び有機ｅｌ表示装置製造方法
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CN110760793A (zh) 2015-04-24 2020-02-07 Lg伊诺特有限公司 沉积掩膜
KR102388829B1 (ko) 2015-07-17 2022-04-21 도판 인사츠 가부시키가이샤 메탈 마스크용 기재의 제조 방법, 증착용 메탈 마스크의 제조 방법, 메탈 마스크용 기재, 및, 증착용 메탈 마스크
WO2017013904A1 (ja) 2015-07-17 2017-01-26 凸版印刷株式会社 メタルマスク基材、メタルマスク基材の管理方法、メタルマスク、および、メタルマスクの製造方法
CN105177496B (zh) 2015-09-25 2019-06-04 信利（惠州）智能显示有限公司 掩膜板的制作方法
KR101693514B1 (ko) * 2015-12-24 2017-01-06 주식회사 포스코 전기강판용 Fe-Ni-P 합금 다층 강판 및 이의 제조방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005154879A (ja) * 2003-11-28 2005-06-16 Canon Components Inc 蒸着用メタルマスク及びそれを用いた蒸着パターンの製造方法
JP2015168884A (ja) * 2014-09-29 2015-09-28 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
WO2016129534A1 (ja) * 2015-02-10 2016-08-18 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク

Also Published As

Publication number Publication date
US11293105B2 (en) 2022-04-05
CN110431256B (zh) 2021-08-20
EP3597794B1 (de) 2021-10-27
US11781224B2 (en) 2023-10-10
JP7401622B2 (ja) 2023-12-19
KR20180104964A (ko) 2018-09-27
KR102373189B9 (ko) 2023-12-07
CN113622004B (zh) 2024-04-16
EP3597794A1 (de) 2020-01-22
KR102330373B1 (ko) 2021-11-23
KR102373189B1 (ko) 2022-03-11
EP3940113A1 (de) 2022-01-19
JP6868706B2 (ja) 2021-05-12
CN113622004A (zh) 2021-11-09
CN110431256A (zh) 2019-11-08
JP2024037820A (ja) 2024-03-19
JP2020509238A (ja) 2020-03-26
KR20210144629A (ko) 2021-11-30
JP2021107582A (ja) 2021-07-29
US20220090270A1 (en) 2022-03-24
WO2018169250A1 (ko) 2018-09-20
US20210140061A1 (en) 2021-05-13
US20230383414A1 (en) 2023-11-30
JP7150086B2 (ja) 2022-10-07
JP2023002550A (ja) 2023-01-10

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