EP3536827B1 - Procédé de traitement de surface destiné à une tête de repoussage de tantale - Google Patents
Procédé de traitement de surface destiné à une tête de repoussage de tantale Download PDFInfo
- Publication number
- EP3536827B1 EP3536827B1 EP18761041.5A EP18761041A EP3536827B1 EP 3536827 B1 EP3536827 B1 EP 3536827B1 EP 18761041 A EP18761041 A EP 18761041A EP 3536827 B1 EP3536827 B1 EP 3536827B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- spinneret
- tantalum
- lithium
- film
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title claims description 120
- 229910052715 tantalum Inorganic materials 0.000 title claims description 114
- 238000009987 spinning Methods 0.000 title description 28
- 238000003672 processing method Methods 0.000 title 1
- 239000000835 fiber Substances 0.000 claims description 68
- 238000000576 coating method Methods 0.000 claims description 51
- 239000011248 coating agent Substances 0.000 claims description 48
- 238000000034 method Methods 0.000 claims description 43
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 36
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 34
- 229910052744 lithium Inorganic materials 0.000 claims description 34
- 150000001875 compounds Chemical class 0.000 claims description 33
- 238000005498 polishing Methods 0.000 claims description 29
- 238000004381 surface treatment Methods 0.000 claims description 24
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical group [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 claims description 23
- 238000002166 wet spinning Methods 0.000 claims description 23
- 150000003839 salts Chemical class 0.000 claims description 16
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 12
- 239000007864 aqueous solution Substances 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 229910003002 lithium salt Inorganic materials 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 8
- 238000002848 electrochemical method Methods 0.000 claims description 6
- RHDUVDHGVHBHCL-UHFFFAOYSA-N niobium tantalum Chemical compound [Nb].[Ta] RHDUVDHGVHBHCL-UHFFFAOYSA-N 0.000 claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 5
- 239000008151 electrolyte solution Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- -1 oxygen-containing inorganic lithium salt Chemical class 0.000 claims description 5
- 229910001257 Nb alloy Inorganic materials 0.000 claims description 4
- 159000000002 lithium salts Chemical class 0.000 claims description 4
- 229910001362 Ta alloys Inorganic materials 0.000 claims description 3
- 150000002894 organic compounds Chemical class 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 58
- 239000000243 solution Substances 0.000 description 32
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 18
- 238000002048 anodisation reaction Methods 0.000 description 16
- 238000005121 nitriding Methods 0.000 description 16
- 239000000126 substance Substances 0.000 description 16
- 230000007704 transition Effects 0.000 description 14
- 238000007743 anodising Methods 0.000 description 11
- 229920000297 Rayon Polymers 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 239000002585 base Substances 0.000 description 6
- JUWSSMXCCAMYGX-UHFFFAOYSA-N gold platinum Chemical compound [Pt].[Au] JUWSSMXCCAMYGX-UHFFFAOYSA-N 0.000 description 6
- 238000007380 fibre production Methods 0.000 description 5
- 229910000510 noble metal Inorganic materials 0.000 description 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910012463 LiTaO3 Inorganic materials 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- KEXXDMPEUZTTIS-UHFFFAOYSA-N ethane-1,2-diol;phosphoric acid Chemical compound OCCO.OP(O)(O)=O KEXXDMPEUZTTIS-UHFFFAOYSA-N 0.000 description 3
- 238000002074 melt spinning Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- SYTIQXASYKJXRY-UHFFFAOYSA-N [Au].[Rh].[Pt] Chemical compound [Au].[Rh].[Pt] SYTIQXASYKJXRY-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000000578 dry spinning Methods 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- 238000001891 gel spinning Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229920002972 Acrylic fiber Polymers 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229910000629 Rh alloy Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
-
- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01D—MECHANICAL METHODS OR APPARATUS IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS
- D01D4/00—Spinnerette packs; Cleaning thereof
- D01D4/02—Spinnerettes
- D01D4/022—Processes or materials for the preparation of spinnerettes
Definitions
- the method of the present invention further comprises a polishing step (d): subjecting the fiber outlet face of the tantalum spinneret treated in step (c) to a polishing treatment to remove the film layer containing lithium-containing compound on the surface of the fiber outlet face.
- a layer of amorphous Ta 2 O 5 film is formed on the tantalum spinneret by anodization in step (a).
- the tantalum spinneret is placed in an oxygen-containing electrolyte solution at room temperature to 380°C, preferably room temperature to 300°C, and an anode voltage of 3 to 800V is applied constantly for 0.01 to 2 hours, with a voltage-increasing current density of 1 to 200 mA/cm 2 to form a layer of amorphous Ta 2 O 5 film.
- the non-aqueous oxygen-containing electrolyte may be anhydrous concentrated sulfuric acid or a molten salt or a mixture of a molten salt and a base, such as potassium nitrate, sodium nitrate, lithium nitrate, or a mixture thereof with a base such as lithium, sodium or potassium-containing base.
- the melting temperature should be controlled to the melting point of the molten salt to below 380°C, because tantalum will be significantly oxidized above 400°C. A voltage of 3 to 66V is applied.
- step (c) When the coating temperature in step (c) is from 250°C to 430°C, preferably from 300°C to 400°C, more preferably from 300°C to 350°C, step (a) of forming a layer of Ta 2 O 5 film before coating on the tantalum spinneret may be omitted.
- the mixed melt or the mixed melt liquid has a temperature of 300°C to 520°C, the applied anode voltage is 5 to 25V, and the voltage-increasing current density is 5 to 20 mA/cm 2 .
- an ultrasonic generator can be placed in the mixed melt or the mixed melt liquid in step (c).
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Ceramic Engineering (AREA)
- Textile Engineering (AREA)
- Spinning Methods And Devices For Manufacturing Artificial Fibers (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Claims (12)
- Procédé de traitement de surface d'une filière de tantale, caractérisé en ce que le procédé comprend les étapes suivantes :(a) placer la filière de tantale dans une solution d'électrolyte contenant de l'oxygène à une température ambiante de 380°C et appliquer une tension anodique de 3 à 800V de façon constante pendant 0,01 à 2 heures, avec une densité de courant augmentant la tension de 1 à 200 mA/cm2pour former une couche de film de Ta2O5 amorphe ;(b) éventuellement polissage : polissage d'une face de sortie de fibre de la filière de tantale traitée à l'étape (a) pour éliminer le 5film de Ta2O5 sur une surface de la face de sortie de fibre ; et(c) revêtement : soumettre la filière de tantale traitée dans l'étape (b) à un traitement de revêtement par un procédé électrochimique à sel fondu pour former une couche de film contenant un composé contenant du lithium.
- Procédé selon la revendication 1, comprenant en outre une étape de polissage (d) :
soumettre la face de sortie de fibre de la filière de tantale traitée à l'étape (c) à un traitement de polissage pour éliminer la couche de film contenant un composé contenant du lithium sur la surface de la face de sortie de fibre. - Procédé selon la revendication 1, dans lequel la solution d'électrolyte contenant de l'oxygène est une solution aqueuse, une solution non aqueuse, ou un mélange d'un électrolyte aqueux et d'un composé organique.
- Procédé selon la revendication 1, dans lequel à l'étape (c), le procédé électrochimique à sel fondu est un procédé électrochimique à sel de lithium fondu.
- Procédé selon la revendication 1, dans lequel, à l'étape (c), la filière est placée dans un sel inorganique de lithium contenant de l'oxygène ou un liquide fondu mixte d'un sel inorganique de lithium contenant de l'oxygène et d'hydroxyde de lithium, ou un liquide de fusion mixte d'un sel et d'hydroxyde de lithium ou un liquide de fusion mixte d'un sel de lithium et d'un sel contenant de l'oxygène à une température de 250°C à 650°C, de préférence de 250°C à 430°C, plus préférentiellement de 300°C à 400°C, encore plus préférentiellement de 300°C à 350°C, et une tension anodique de 1 à 66V est appliquée constamment pendant 0,01 à 200 heures, avec une densité de courant augmentant la tension de 1 à 1000 mA/cm2 pour former une couche de film contenant un composé contenant du lithium.
- Procédé selon la revendication 5, dans lequel le mélange fondu ou le liquide de mélange fondu a une température de 300°C à 520°C, de préférence de 300°C à 350°C, la tension anodique appliquée est de 5 à 25V, et la densité de courant augmentant la tension est de 5 à 20 mA/cm2.
- Procédé selon la revendication 5, dans lequel le sel de lithium inorganique contenant de l'oxygène est LiNO3.
- Procédé selon la revendication 5, dans lequel un générateur d'ultrasons est disposé dans le mélange fondu ou le liquide de mélange fondu à l'étape (c).
- Procédé selon la revendication 1, dans lequel la filière tantale est nitrurée ou non nitrurée avant l'étape (a).
- Procédé selon la revendication 1, dans lequel la filière de tantale comprend une filière de tantale pur et une filière d'alliage de tantale, de préférence une filière d'alliage de tantale-niobium.
- Procédé selon la revendication 1, dans lequel le procédé est un procédé de traitement de surface de la filière tantale pour le filage au mouillé.
- Une filière de tantale comprenant :(a) une couche de film amorphe de Ta2O5 ; et(b) une couche de film contenant un composé contenant du lithium formé à partir de la couche de film de Ta2O5 amorphe.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710124797 | 2017-03-03 | ||
| CN201710587999.8A CN108531906B (zh) | 2017-03-03 | 2017-07-19 | 钽喷丝头的表面处理方法 |
| PCT/CN2018/077938 WO2018157867A1 (fr) | 2017-03-03 | 2018-03-02 | Procédé de traitement de surface destiné à une tête de repoussage de tantale |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| EP3536827A1 EP3536827A1 (fr) | 2019-09-11 |
| EP3536827A4 EP3536827A4 (fr) | 2020-04-29 |
| EP3536827B1 true EP3536827B1 (fr) | 2022-01-26 |
| EP3536827B9 EP3536827B9 (fr) | 2022-05-18 |
Family
ID=63489542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP18761041.5A Active EP3536827B9 (fr) | 2017-03-03 | 2018-03-02 | Procédé de traitement de surface destiné à une tête de repoussage de tantale |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP3536827B9 (fr) |
| JP (1) | JP6808848B2 (fr) |
| CN (1) | CN108531906B (fr) |
| ES (1) | ES2908746T3 (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110835786B (zh) * | 2019-11-19 | 2021-11-30 | 中国石油化工股份有限公司 | 一种扁平形腈纶纤维的制备方法 |
| CN111005050B (zh) * | 2020-02-19 | 2021-08-03 | 南昌航空大学 | 一种提高烧结钕铁硼磁体耐蚀性双涂层的制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4678546A (en) * | 1985-03-27 | 1987-07-07 | North China Research Institute Of Electro-Optics | Process for providing lithium tantalum oxide coated tantalum articles with improved wear resistance |
| CN85101505B (zh) * | 1985-04-01 | 1988-03-30 | 华北光电技术研究所 | 钽铌器件熔盐电解法制膜及产品 |
| JPH0660436B2 (ja) * | 1986-03-28 | 1994-08-10 | ユ ツオン リユ | タンタル、ニオブまたはその合金製物品の保護膜およびその製法 |
| CN86102269B (zh) * | 1986-04-09 | 1988-11-23 | 华北光电技术研究所 | 带膜钽铌喷丝头(板)的制造方法及应用 |
| CN2151155Y (zh) * | 1992-11-15 | 1993-12-29 | 李士华 | 钽材制品离子电解镀膜 |
| CN1279224C (zh) * | 2001-04-09 | 2006-10-11 | 北京华宇创新科贸有限责任公司 | 用于湿法纺丝的钽喷丝头的表面处理方法 |
| CN1428465A (zh) * | 2001-12-27 | 2003-07-09 | 北京华宇创新科贸有限责任公司 | 用于湿法纺丝的钽喷丝头的表面处理方法 |
| CN100443629C (zh) * | 2006-06-22 | 2008-12-17 | 上海交通大学 | 钽喷丝头表面化学气相沉积金刚石薄膜强化方法 |
-
2017
- 2017-07-19 CN CN201710587999.8A patent/CN108531906B/zh active Active
-
2018
- 2018-03-02 JP JP2019545305A patent/JP6808848B2/ja active Active
- 2018-03-02 EP EP18761041.5A patent/EP3536827B9/fr active Active
- 2018-03-02 ES ES18761041T patent/ES2908746T3/es active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3536827B9 (fr) | 2022-05-18 |
| ES2908746T9 (es) | 2022-06-13 |
| CN108531906B (zh) | 2020-05-29 |
| EP3536827A4 (fr) | 2020-04-29 |
| ES2908746T3 (es) | 2022-05-03 |
| JP2020509250A (ja) | 2020-03-26 |
| EP3536827A1 (fr) | 2019-09-11 |
| JP6808848B2 (ja) | 2021-01-06 |
| CN108531906A (zh) | 2018-09-14 |
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