EP3296432A4 - Poröse nickeldünnschicht und herstellungsverfahren dafür - Google Patents

Poröse nickeldünnschicht und herstellungsverfahren dafür Download PDF

Info

Publication number
EP3296432A4
EP3296432A4 EP16862129.0A EP16862129A EP3296432A4 EP 3296432 A4 EP3296432 A4 EP 3296432A4 EP 16862129 A EP16862129 A EP 16862129A EP 3296432 A4 EP3296432 A4 EP 3296432A4
Authority
EP
European Patent Office
Prior art keywords
manufacturing
thin film
porous nickel
nickel thin
porous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP16862129.0A
Other languages
English (en)
French (fr)
Other versions
EP3296432A1 (de
Inventor
Satoshi Yaegashi
Naruki ENDO
Tetsuhiko Maeda
Masashi Kumakawa
Satoshi Suzuki
Takashi Kosone
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanno Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Sanno Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanno Co Ltd, National Institute of Advanced Industrial Science and Technology AIST filed Critical Sanno Co Ltd
Publication of EP3296432A1 publication Critical patent/EP3296432A1/de
Publication of EP3296432A4 publication Critical patent/EP3296432A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
EP16862129.0A 2015-11-06 2016-11-02 Poröse nickeldünnschicht und herstellungsverfahren dafür Withdrawn EP3296432A4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015218685A JP6319771B2 (ja) 2015-11-06 2015-11-06 多孔質ニッケル薄膜及びその製造方法
PCT/JP2016/082608 WO2017078069A1 (ja) 2015-11-06 2016-11-02 多孔質ニッケル薄膜及びその製造方法

Publications (2)

Publication Number Publication Date
EP3296432A1 EP3296432A1 (de) 2018-03-21
EP3296432A4 true EP3296432A4 (de) 2018-12-19

Family

ID=58662202

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16862129.0A Withdrawn EP3296432A4 (de) 2015-11-06 2016-11-02 Poröse nickeldünnschicht und herstellungsverfahren dafür

Country Status (6)

Country Link
US (1) US20180230615A1 (de)
EP (1) EP3296432A4 (de)
JP (1) JP6319771B2 (de)
CN (1) CN107614756A (de)
TW (1) TWI617672B (de)
WO (1) WO2017078069A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6503151B1 (ja) 2017-07-06 2019-04-17 浜松ホトニクス株式会社 光学デバイス
WO2019009397A1 (ja) 2017-07-06 2019-01-10 浜松ホトニクス株式会社 光学デバイス
JP7174697B2 (ja) 2017-07-06 2022-11-17 浜松ホトニクス株式会社 光学デバイス
JP7112876B2 (ja) 2017-07-06 2022-08-04 浜松ホトニクス株式会社 光学デバイス
TWI782053B (zh) * 2017-07-06 2022-11-01 日商濱松赫德尼古斯股份有限公司 光學裝置
TWI822686B (zh) 2017-07-06 2023-11-21 日商濱松赫德尼古斯股份有限公司 光學裝置
EP4160295A1 (de) 2017-11-15 2023-04-05 Hamamatsu Photonics K.K. Verfahren zur herstellung einer optischen vorrichtung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060127768A1 (en) * 2000-11-13 2006-06-15 Matsushita Electric Industrial Co., Ltd. Porous nickel foil for negative electrode of alkaline battery, production method therefor and production device therefor
WO2016065560A1 (en) * 2014-10-29 2016-05-06 Kechuang Lin Porous materials and systems and methods of fabricating thereof

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2716322B2 (ja) * 1992-08-24 1998-02-18 株式会社 イケックス工業 メッキ製品の製造方法
JP2001085015A (ja) * 1999-09-17 2001-03-30 Sumitomo Metal Steel Products Inc アルカリ蓄電池負極用多孔ニッケル箔およびその製造方法
JP2003293188A (ja) * 2002-04-09 2003-10-15 Sumitomo Metal Mining Co Ltd ニッケルめっき皮膜
CN101298686B (zh) * 2007-04-30 2010-09-29 比亚迪股份有限公司 一种泡沫金属的制备方法
JP5366076B2 (ja) * 2008-11-21 2013-12-11 奥野製薬工業株式会社 多孔質めっき皮膜形成用添加剤を含有する多孔質めっき皮膜用電気めっき浴
TWI429789B (zh) * 2010-03-11 2014-03-11 Omron Tateisi Electronics Co 接觸件製造用組成物及使用其之接觸件以及連接器及製造接觸件製造用組成物之方法
JP5487487B2 (ja) * 2010-08-20 2014-05-07 富山住友電工株式会社 金属多孔体及びその製造方法
JP5635382B2 (ja) * 2010-12-08 2014-12-03 住友電気工業株式会社 高耐食性を有する金属多孔体の製造方法
JP2013014819A (ja) * 2011-07-06 2013-01-24 Murata Mfg Co Ltd 多孔質金属膜、電極、集電体、電気化学センサ、蓄電デバイス及び摺動部材並びに多孔質金属膜の製造方法
JP6212869B2 (ja) * 2012-02-06 2017-10-18 三菱マテリアル株式会社 酸化物スパッタリングターゲット
JP6047711B2 (ja) * 2012-02-08 2016-12-21 石原ケミカル株式会社 無電解ニッケル及びニッケル合金メッキ方法、並びに当該メッキ用の前処理液
CN103243357B (zh) * 2013-05-13 2015-09-23 重庆大学 三维多孔镍薄膜的制备方法
JP6056023B2 (ja) * 2014-11-05 2017-01-11 株式会社山王 金属複合水素透過膜とその製造方法
JP6014920B1 (ja) * 2015-08-19 2016-10-26 株式会社山王 金属複合水素透過膜とその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060127768A1 (en) * 2000-11-13 2006-06-15 Matsushita Electric Industrial Co., Ltd. Porous nickel foil for negative electrode of alkaline battery, production method therefor and production device therefor
WO2016065560A1 (en) * 2014-10-29 2016-05-06 Kechuang Lin Porous materials and systems and methods of fabricating thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2017078069A1 *

Also Published As

Publication number Publication date
WO2017078069A1 (ja) 2017-05-11
CN107614756A (zh) 2018-01-19
US20180230615A1 (en) 2018-08-16
TWI617672B (zh) 2018-03-11
JP6319771B2 (ja) 2018-05-09
EP3296432A1 (de) 2018-03-21
JP2017088940A (ja) 2017-05-25
TW201718896A (zh) 2017-06-01

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