EP3092531B1 - Verfahren zur befestigung eines uhrenglases an einem uhrengehäuse - Google Patents
Verfahren zur befestigung eines uhrenglases an einem uhrengehäuse Download PDFInfo
- Publication number
- EP3092531B1 EP3092531B1 EP15700185.0A EP15700185A EP3092531B1 EP 3092531 B1 EP3092531 B1 EP 3092531B1 EP 15700185 A EP15700185 A EP 15700185A EP 3092531 B1 EP3092531 B1 EP 3092531B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- glass
- watch case
- layer
- electrode
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 39
- 239000011521 glass Substances 0.000 title claims description 27
- 239000000463 material Substances 0.000 claims description 15
- 238000009792 diffusion process Methods 0.000 claims description 12
- 150000002500 ions Chemical class 0.000 claims description 12
- 230000005012 migration Effects 0.000 claims description 10
- 238000013508 migration Methods 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 230000000873 masking effect Effects 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 238000005498 polishing Methods 0.000 claims description 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 4
- 239000010980 sapphire Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 229910052596 spinel Inorganic materials 0.000 claims description 4
- 239000011029 spinel Substances 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 3
- 238000003754 machining Methods 0.000 claims description 3
- 239000011707 mineral Substances 0.000 claims description 3
- 238000004381 surface treatment Methods 0.000 claims description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- 238000002161 passivation Methods 0.000 claims description 2
- 239000005297 pyrex Substances 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000007790 solid phase Substances 0.000 claims description 2
- 230000003746 surface roughness Effects 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 3
- 239000004411 aluminium Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 229910017109 AlON Inorganic materials 0.000 claims 1
- 239000002223 garnet Substances 0.000 claims 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 39
- 239000013078 crystal Substances 0.000 description 32
- 230000008569 process Effects 0.000 description 10
- 239000002800 charge carrier Substances 0.000 description 9
- 230000005684 electric field Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 239000012535 impurity Substances 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 3
- 238000000429 assembly Methods 0.000 description 3
- 230000000712 assembly Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 3
- 238000005219 brazing Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000006557 surface reaction Methods 0.000 description 2
- 206010030924 Optic ischaemic neuropathy Diseases 0.000 description 1
- 241000135309 Processus Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 238000005255 carburizing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- -1 des ions Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010002 mechanical finishing Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000011176 pooling Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B39/00—Watch crystals; Fastening or sealing of crystals; Clock glasses
- G04B39/02—Sealing crystals or glasses
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/06—Devices for shaping or setting watch glasses
Definitions
- the present invention relates to a method for attaching an upper and/or lower crystal to a watch case, more precisely to a bezel or to a bezel middle part of a watch case.
- the present invention aims to provide a method for attaching a crystal to a watch case without using a gasket or glue while ensuring a tight and resistant attachment.
- the subject of the present invention is a method for attaching a crystal to a watch case which is distinguished by the characteristics listed in claim 1.
- the specificity and the object of the present invention is to produce a gas-tight and liquid-tight assembly without welding, without solder and without organic compound (glue).
- Several preparations of the surfaces are necessary and illustrated in the appended drawing which illustrates schematically and by way of example, the successive steps of an execution of the method of fixing a crystal on a watch case according to the invention.
- the present method makes it possible to fix a watch crystal which can typically be made of mineral glass, sapphire or other transparent or translucent ceramics with or without anti-reflective coating on part or all of the surface, to a bezel or carrure bezel of a watch case by the anodic bonding technique.
- the zone of the watch case on which the crystal is fixed is typically made of stainless steel, platinum or gold, or comprises the various alloys associated with these materials.
- the aforementioned materials can be coated with rhodium or any other material used for the manufacture of watch cases or jewelry or jewelry products.
- the anodic bonding process is used in the general field of microtechnology, more particularly in the biomedical, aerospace and electronics sectors, where connections are made between materials compatible from the point of view of thermal expansion coefficients close to the anodic assembly technology.
- anode assemblies is mainly used for thin and flat films and layers, in particular such as metal, glass and silicon wafers.
- the assembly proposed by the present invention is carried out by means of intermediate layers, this with the aim of consolidating the bond, increasing the speed of diffusion and allowing assembly for a greater range of materials. and more massive parts, subjected to high stresses and having to resist shocks.
- This fixing method is applied to mechanical components subjected to high mechanical stresses, in particular between a watch crystal on a steel, gold or platinum watch case in particular.
- the method for attaching a watch crystal to a watch case according to the invention consists in producing a permanent and sealed anode assembly between the case and the crystal by the use of surface treatment on the areas of the crystal and/ or the box coming into contact allowing the migration of ions and electrons.
- An electrode is connected to the crystal and a counter-electrode is connected to the watch case and then a voltage of between 1kV and 15kV is applied to improve the intimate contact between the partners and to bring kinetic energy assisted by the electric field to the charged particles For allow them to diffuse and create new ionic or covalent metallic bonds.
- the crystal and/or the watch case Prior to their placement, are provided in the areas coming into contact with a semiconductor or insulating element promoting migration, such as glass or silicon.
- a semiconductor or insulating element promoting migration such as glass or silicon.
- the process is carried out at low temperature ensuring that none of the materials in the system, watch case, glass or intervening layers, leave their solid phase.
- the electrodes are adapted to the geometry of the contact surface.
- the geometry of the electrode is considered in three dimensions, the part in contact with the sapphire is without edges and without tip, typically of curved shape.
- a surface functionalization by ion implantation makes it possible to improve the phenomena of diffusion by the contribution of element in the matrix and by the disturbance of the crystal lattice or of the stoichiometry.
- a surface functionalization by UV exposure makes it possible to improve the phenomena of diffusion by the disturbance of the crystal lattice or of the stoichiometry resulting from the supply of energy in the matrix.
- a surface treatment allowing a structural modification of the substrates typically comprising heat, activation plasma, etching plasma or sonochemical treatments can be used to facilitate the diffusion phenomena.
- the assembly described is carried out by anodic bonding only, no element is fused, even partially. This differentiates the assembly obtained in a significant way from assemblies obtained by laser or ultrasonic welding.
- the assembly described makes it possible to produce metal-to-metal, metal-to-non-metal and non-metal-to-non-metal connections.
- the intermediate semiconductor element can be attached by a separate piece or deposited by physical or chemical means (PVD, PE-CVD, Sol-gel, electroplating).
- the thin intermediate layers considered have a non-constant stoichiometry.
- the degree of nitriding or carburizing oxidation varies with layer thickness.
- the thin layer of the bezel may also contain its natural or forced passivation layer.
- a masking layer is deposited on the glass in order to mask the contact zone.
- This layer may consist of metallic elements and alloys of at least one of the following elements: Ti, Fe, Al, Cr, V, Pt, Ta, W, Ga, Sn, Zn, Au and Ag.
- watch case also includes the other components of the casing such as the back and the middle.
- a watch case is considered to be all the components enabling the movement to be enclosed in a watertight manner.
- the crystal considered consists of at least one of the following elements: aluminum oxide such as sapphire, spinel, spinel AION, aluminum oxynitride, yttria, YAG (Yttrium Aluminum Garnet) and Nd :YAG or silicon oxide such as mineral glass or pyrex.
- aluminum oxide such as sapphire, spinel, spinel AION, aluminum oxynitride, yttria, YAG (Yttrium Aluminum Garnet) and Nd :YAG or silicon oxide such as mineral glass or pyrex.
- the temperature of the partners, watchcase and crystal, during the bonding process is below 380°C, and preferably below 250°C.
- the temperature may vary during assembly, for example from 120°C to 250°C.
- the rate of extension of the anode link is for example greater than 1 mm 2 /minute.
- the surface roughness of the bezel is obtained by mechanical machining or fine stamping with the addition of chemical electropolishing.
- step No. 2 ie polishing the upper face of the bezel, can be omitted.
- bezel can be replaced by a middle bezel or any other part of the watch case on which the crystal must be fixed.
- An alternative consists of using an added glass material between the crystal and the caseband coated according to the figure 1 .
- the intermediate layer is deposited on the upper face of the bezel by the physical or chemical technology mentioned above and the composition of the matrix of this intermediate layer typically consists of TixOy, Si x O y , Si x N y , Al x O y or mixtures of oxides containing light metal atoms / ions such as Li, Na, K, Ca, Be, or halogens favoring ion migration.
- the addition of a thin metallic layer is possible before the deposition of the intermediate layer in order to better guarantee the shine and the visual metallic aspect under the transparent glass. This can by its choice increase the adhesion between the intermediate layer, the transition between the materials can even be done gradually.
- the anode assembly is carried out under a voltage of less than 15 kV.
- the anode assembly will take place at a temperature below 250°C.
- the determination of the nature of the intermediate layer or layers requires the qualification of the materials to be assembled, typically its physico-chemical composition, the mechanical properties, the surface condition, in order to optimize the characteristics of the deposit which will serve as the first intermediate layer. This is qualified by the following factors: adhesion with the raw materials, types of defects and gaps allowing the diffusion of ions and migration, electronegativity of the ions contained within the intermediate layer(s), concentration of ions and gaps, orientation of these same gaps.
- the layer or layers can contain alkaline, alkaline-earth and halogenated materials because of their ease of migration and the size of their atoms.
- the intermediate layer(s) will define the quality of the bond, its mechanical properties and sealing, but also its aesthetic properties. To understand the importance of this or these intermediate layers and to differentiate an assembly according to the present invention from conventional welding or brazing techniques where there is no question of the use of an electric field, it is a question of understanding the specific atomic transfers during the anode assembly process.
- any charged particle placed under the influence of a uniform electric field moves at a speed proportional to this field, the proportionality factor being called the electric mobility of the particle.
- This migration will take place from the anode towards the cathode for the positively charged particles, in the opposite direction for the negatively charged particles.
- a potential difference is observed between the partners, which generates a plating between the partners induced under the effect of electrostatic forces. If this plating is insufficient, the application of a mechanical load to force contact between the partners is considered.
- the electric field increases the diffusion process, assembly speeds are reduced on the order of minutes, encouraging increased throughput and better reproducibility.
- Transport phenomena Properties relating to electric currents and displacements of charge carriers under the influence of applied forces are called transport phenomena.
- transport phenomena mobility, whether for example vacancies, impurities, charge carriers (the materials are differentiated by the Debye length of the majority carriers and their behavior is described in particular by the continuity equation ) as well as diffusion (based on Fick's laws) are the key mechanisms of anodic assembly.
- the parameters that most influence the mobility of the charge carriers are the temperature and the volume number of impurities.
- the defects can be distinguished impurities and gaps.
- the choice of the intermediate layer or layers strongly depends on the "properties" of the charge carriers.
- the chemical composition of the layer(s) is naturally important since the transport phenomena depend on the characteristics of the atomic bonds.
- the bonds created during the anodic assembly process are mostly covalent type bonds. These strong bonds are established by the pooling of a pair of electrons from each of the charge carriers.
- PVD deposition method is preferred, but an intermediate layer (mono or multilayer) can be deposited by another physical or chemical deposition process.
- the temperature and the voltage applied as well as the contact time are closely linked and complementary since they control the electrostatic force necessary for the chemical reaction between the parts to be assembled.
- the voltage will not go beyond 15 kV, and the temperature will not exceed 250°C.
- the gap between the parts to be assembled has a significant effect on the magnitude of the electrostatic force, which implies that the quality of the bond formed by anodic assembly also depends on the surface condition.
- electrochemical polishing is used.
- the deposit of a layer mimicking the material of the bezel is deposited on the ice before the deposition of the functional layer. Such a deposit is selective, masking the assembly zone, with an aesthetic function.
- This selectivity is obtained by masking technique, typically by lithography, stamping, selective etching or by adhesion promotion.
- optical rendering color surface appearance
- the optical rendering, color surface appearance is obtained by adapting the layers, in particular by their thickness, their composition and their pre-treatments.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Joining Of Glass To Other Materials (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Claims (13)
- Verfahren zur Befestigung eines Glases an einem Uhrengehäuse, das Folgendes umfasst:Anbringen, durch Flächenbehandlung, mindestens einer dünnen Zwischenschicht, welche die Migration der Ionen und/oder der Elektronen ermöglicht, auf einer Zone der Fläche des Glases, die dazu bestimmt ist, mit einer entsprechenden Zone des Uhrengehäuses in Kontakt zu gelangen, und/oder auf der entsprechenden Zone des Uhrengehäuses;Ansetzen dieser Zonen des Uhrengehäuses und des Glases gegeneinander;dadurch gekennzeichnet, dass auch die folgenden Schritte durchgeführt werden:Erhitzen der Uhrengehäuse-Glas-Anordnung auf eine Erhitzungstemperatur, die niedrig genug ist, um sicherzustellen, dass kein Material des Systems seine feste Phase verlässt;Verbinden des Glases mit einer Elektrode und des Uhrengehäuses mit einer Gegenelektrode; undAnlegen einer Spannung, welche die Diffusion der geladenen Partikel zwischen dem Glas und dem Uhrengehäuse beschleunigt und somit neue metallische, ionische oder kovalente Bindungen erzeugt, zwischen dieser Elektrode und dieser Gegenelektrode.
- Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass die Spannung eine Gleichspannung von zwischen 1 kV und 15 kV ist.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Erhitzungstemperatur 250 °C nicht überschreitet und/oder dass sie zwischen 120 °C und 250 °C schwankt.
- Verfahren nach einem der vorhergehenden Ansprüche, wobei vor dem Ansetzen der Zonen des Uhrengehäuses und des Glases gegeneinander eine Schicht aus einem Halbleiter- oder isolierenden Element angeordnet wird, das die Migration zwischen der Zone des Glases und der Zone des Uhrengehäuses begünstigt, wie Gläser, Silizium.
- Verfahren nach Anspruch 4, dadurch gekennzeichnet, dass das Halbleiter- oder isolierende Element durch ein getrenntes Teil angestückt oder physikalisch oder chemisch (PVD, PE-CVD, Sol-Gel, Galvanotechnik) abgeschieden wird.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die mindestens eine Zwischenschicht eine Schicht umfasst, die auf dem Glas angebracht wird und eine chemische und strukturelle Entwicklung aufweist, wobei der Teil, der mit dem Glas in Kontakt ist, rein metallischer Beschaffenheit ist und je nach seinem Wachstum sein Oxidationsgrad sich allmählich entwickelt, um an der Fläche mit einem vollständigen TiO2-Oxidationszustand zu enden.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass jede Elektrode eine Geometrie aufweist, die an die Fläche angepasst ist, mit der sie in Kontakt ist.
- Verfahren nach Anspruch 7, dadurch gekennzeichnet, dass die Geometrie der Elektrode, die mit dem Glas in Kontakt ist, gekrümmt und ohne Spitzen ist.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die mindestens eine Zwischenschicht eine nicht konstante Stöchiometrie aufweist, wobei der Oxidations-, Nitrierungs- oder Zementierungsgrad mit der Dicke der Schicht schwankt.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die mindestens eine Zwischenschicht eine dünne Schicht umfasst, die auf dem Gehäuse angebracht ist und eine natürliche oder erzwungene Passivierungsschicht enthält.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die mindestens eine Zwischenschicht eine Maskierungsschicht umfasst, die auf dem Glas abgeschieden wird, um seine Kontaktzone zu maskieren, wobei diese Schicht aus metallischen Elementen und Legierungen von mindestens einem der folgenden Elemente besteht: Ti, Fe, Al, Cr, V, Pt, Ta, W, Ga, Sn, Zn, Au und Ag.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Glas aus mindestens einem der folgenden Elemente besteht: Aluminiumoxid wie Saphir, Spinell, Aluminiumoxynitrid-Spinell-ALON, Yttriumoxid, YAG (Yttrium-Aluminium-Granat) und Nd:YAG oder Siliziumoxid wie mineralisches Glas oder Pyrex.
- Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Flächenrauigkeit des Gehäuses durch eine mechanische Bearbeitung oder ein Feinstanzen mit einer zusätzlichen chemischen Elektropolierung erhalten wird.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH102014 | 2014-01-07 | ||
PCT/EP2015/050085 WO2015104252A2 (fr) | 2014-01-07 | 2015-01-06 | Procédé de fixation d'une glace sur une boîte de montre |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3092531A2 EP3092531A2 (de) | 2016-11-16 |
EP3092531B1 true EP3092531B1 (de) | 2023-06-28 |
Family
ID=49958120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP15700185.0A Active EP3092531B1 (de) | 2014-01-07 | 2015-01-06 | Verfahren zur befestigung eines uhrenglases an einem uhrengehäuse |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP3092531B1 (de) |
JP (1) | JP6518264B2 (de) |
CN (1) | CN105960611B (de) |
WO (1) | WO2015104252A2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017006219A1 (fr) * | 2015-07-06 | 2017-01-12 | Cartier International Ag | Procédé de fixation par assemblage anodique |
CH711295B1 (fr) * | 2015-07-06 | 2019-11-29 | Cartier Int Ag | Procédé de fixation par assemblage anodique. |
JP6419391B2 (ja) * | 2016-11-29 | 2018-11-07 | 京セラ株式会社 | 時計ケース |
CN107065496B (zh) * | 2017-04-15 | 2019-09-17 | 伯恩光学(惠州)有限公司 | 手表镜片 |
CH714459B1 (fr) * | 2017-12-19 | 2024-06-14 | Guenat Sa Montres Valgine | Glace de montre. |
CH716104A1 (fr) * | 2019-04-18 | 2020-10-30 | Sy&Se Sa | Procédé d'amélioration de l'adhérence d'une couche sur un substrat. |
CN110204223A (zh) * | 2019-04-25 | 2019-09-06 | 厦门祐尼三的新材料科技有限公司 | 一种夹层玻璃及其制备方法 |
CN114953643A (zh) * | 2022-06-15 | 2022-08-30 | Oppo广东移动通信有限公司 | 终端及其壳体组件以及壳体组件的键合方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH649435GA3 (de) * | 1981-05-22 | 1985-05-31 | ||
CH652270GA3 (de) * | 1983-05-19 | 1985-11-15 | ||
CH678680GA3 (en) * | 1990-02-20 | 1991-10-31 | Watch glass mounting - has a deposited metal layer between decorative layer and solder to prevent visible effects of soldering | |
JPH08166469A (ja) * | 1994-12-15 | 1996-06-25 | Citizen Watch Co Ltd | 時計用文字板およびその製造方法 |
US6823693B1 (en) * | 1998-03-06 | 2004-11-30 | Micron Technology, Inc. | Anodic bonding |
US20110151157A1 (en) * | 2008-04-02 | 2011-06-23 | Empa Eidgenossische Material-Profungs-Und Forschun | Composite object and method for the production thereof |
JP5529463B2 (ja) * | 2009-08-25 | 2014-06-25 | セイコーインスツル株式会社 | パッケージの製造方法および圧電振動子の製造方法 |
-
2015
- 2015-01-06 EP EP15700185.0A patent/EP3092531B1/de active Active
- 2015-01-06 JP JP2016562067A patent/JP6518264B2/ja active Active
- 2015-01-06 WO PCT/EP2015/050085 patent/WO2015104252A2/fr active Application Filing
- 2015-01-06 CN CN201580003923.5A patent/CN105960611B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP2017501425A (ja) | 2017-01-12 |
EP3092531A2 (de) | 2016-11-16 |
WO2015104252A2 (fr) | 2015-07-16 |
CN105960611B (zh) | 2019-11-05 |
JP6518264B2 (ja) | 2019-05-22 |
CN105960611A (zh) | 2016-09-21 |
WO2015104252A3 (fr) | 2015-12-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3092531B1 (de) | Verfahren zur befestigung eines uhrenglases an einem uhrengehäuse | |
EP3320403B1 (de) | Verfahren zur fixierung durch anodische verbindung | |
EP1837722B1 (de) | Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür | |
EP3743538B1 (de) | Gelenkzapfen eines regulators und verfahren zu dessen herstellung | |
EP1837721A1 (de) | Mikromechanisches Bauteil aus Isoliermaterial und Herstellungsverfahren dafür | |
WO2017006219A1 (fr) | Procédé de fixation par assemblage anodique | |
EP2589568A1 (de) | Verbessertes mikromechanisches Bauteil das eine elektrische Entladung ermöglicht | |
EP3495894B1 (de) | Verfahren zur herstellung einer uhrkomponente | |
EP3141966A1 (de) | Erzeugungsverfahren einer dekoroberfläche eines mikromechanischen uhrenbauteils, und entsprechendes mikromechanisches uhrenbauteil | |
WO2018172894A1 (fr) | Procédé de fabrication d'un composant horloger et composant obtenu par le procédé | |
EP3956494B1 (de) | Förderung der adhäsion von dünnschichten | |
WO2018172895A1 (fr) | Procédé de fabrication d'un composant horloger en métal-céramique | |
EP2978871A2 (de) | Verfahren für eine diamantdampfabscheidung | |
EP3141519B1 (de) | Herstellungsverfahren für ein mikromechanisches uhrenbauteil | |
CH707986A2 (fr) | Pièce pour l'horlogerie. | |
CH719428A2 (fr) | Pierre d'horlogerie et procédé de fabrication d'une telle pierre. | |
WO2023156201A1 (fr) | Pierre d'horlogerie et procede de fabrication d'une telle pierre | |
CH707669B1 (fr) | Pièce de micro-mécanique en matériau électriquement isolant ou en silicium ou un de ses composés et son procédé de fabrication. | |
CH720559A2 (fr) | Procédé de fabrication d'un cadran horloger à base de polymère | |
CH716645B1 (fr) | Procédé de fabrication d'un composant d'habillement pour pièce d'horlogerie ou de joaillerie et composant d'habillement en matériau d'origine naturelle revêtu. | |
CH711499A2 (fr) | Procédé de formation d'une surface décorative sur une pièce micromécanique horlogère et ladite pièce micromécanique horlogère. | |
CH707800B1 (fr) | Procédé de dépôt de diamant en phase vapeur et équipement pour réaliser ce procédé. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20160615 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAX | Request for extension of the european patent (deleted) | ||
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
|
17Q | First examination report despatched |
Effective date: 20210428 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
|
REG | Reference to a national code |
Ref document number: 602015084320 Country of ref document: DE Ref country code: DE Ref legal event code: R079 Free format text: PREVIOUS MAIN CLASS: G04B0039020000 Ipc: G04D0003060000 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: GRANT OF PATENT IS INTENDED |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: G04B 39/02 20060101ALI20230116BHEP Ipc: G04D 3/06 20060101AFI20230116BHEP |
|
INTG | Intention to grant announced |
Effective date: 20230130 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE PATENT HAS BEEN GRANTED |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 1583247 Country of ref document: AT Kind code of ref document: T Effective date: 20230715 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: LANGUAGE OF EP DOCUMENT: FRENCH |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 602015084320 Country of ref document: DE |
|
REG | Reference to a national code |
Ref country code: LT Ref legal event code: MG9D |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: NO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230928 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: MP Effective date: 20230628 |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MK05 Ref document number: 1583247 Country of ref document: AT Kind code of ref document: T Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: RS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: LV Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: LT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: HR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230929 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20231028 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SM Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20231030 Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20231028 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R097 Ref document number: 602015084320 Country of ref document: DE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20240119 Year of fee payment: 10 Ref country code: GB Payment date: 20240123 Year of fee payment: 10 Ref country code: CH Payment date: 20240202 Year of fee payment: 10 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20240124 Year of fee payment: 10 |
|
26N | No opposition filed |
Effective date: 20240402 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20230628 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20240106 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20240106 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20240131 |