EP3013598B2 - Verfahren zur herstellung eines mehrschichtkörpers - Google Patents

Verfahren zur herstellung eines mehrschichtkörpers Download PDF

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Publication number
EP3013598B2
EP3013598B2 EP14733628.3A EP14733628A EP3013598B2 EP 3013598 B2 EP3013598 B2 EP 3013598B2 EP 14733628 A EP14733628 A EP 14733628A EP 3013598 B2 EP3013598 B2 EP 3013598B2
Authority
EP
European Patent Office
Prior art keywords
layer
decorative
resist
mask
zones
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP14733628.3A
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German (de)
English (en)
French (fr)
Other versions
EP3013598B1 (de
EP3013598A1 (de
Inventor
Ludwig Brehm
Tibor MANNSFELD
Juri Attner
Thorsten SCHALLER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leonhard Kurz Stiftung and Co KG
Original Assignee
Leonhard Kurz Stiftung and Co KG
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Publication date
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Application filed by Leonhard Kurz Stiftung and Co KG filed Critical Leonhard Kurz Stiftung and Co KG
Priority to RS20170445A priority Critical patent/RS55994B1/sr
Priority to PL14733628T priority patent/PL3013598T3/pl
Priority to HRP20170741TT priority patent/HRP20170741T1/hr
Publication of EP3013598A1 publication Critical patent/EP3013598A1/de
Application granted granted Critical
Publication of EP3013598B1 publication Critical patent/EP3013598B1/de
Publication of EP3013598B2 publication Critical patent/EP3013598B2/de
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/351—Translucent or partly translucent parts, e.g. windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • B42D25/387—Special inks absorbing or reflecting ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/41—Marking using electromagnetic radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/415—Marking using chemicals
    • B42D25/42—Marking using chemicals by photographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/445—Marking by removal of material using chemical means, e.g. etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers

Definitions

  • the invention relates to a method for producing a multilayer body with a carrier layer and a single- or multi-layer decorative layer formed on and/or in the carrier layer.
  • Optical security elements are often used to make it more difficult to copy documents or products in order to prevent their misuse, especially counterfeiting.
  • Optical security elements are used to secure documents, banknotes, credit and debit cards, ID cards, packaging for high-quality products and the like. It is known to use optically variable elements as optical security elements that cannot be duplicated using conventional copying methods. It is also known to equip security elements with a structured metal layer that is designed in the form of text, logos or other patterns.
  • Creating a structured metal layer from a metal layer applied over the entire surface requires a large number of processes, particularly if particularly fine structures are to be created that are highly resistant to counterfeiting. For example, it is known to partially demetallize and thus structure a metal layer applied over the entire surface by positive or negative etching or by laser ablation. Alternatively, it is possible to apply metal layers to a carrier in a structured form using vapor deposition masks.
  • the more manufacturing steps are required to produce the security element the greater the importance of the registration accuracy of the individual process steps, i.e. the accuracy of the positioning of the individual tools relative to one another when forming the security element in relation to features or layers or structures already present on the security element.
  • Steps a) to e) of the process according to the invention are preferably carried out in the order given.
  • the multilayer body can be used, for example, as a label, laminating film, hot stamping film or transfer film to provide an optical security element that is used to secure documents, banknotes, credit and debit cards, ID cards, packaging for high-quality products and the like.
  • the decorative layers and the at least one metal layer arranged in precise register with them can serve as an optical security element.
  • the metal layer serves as a mask during the production of the multilayer body, preferably as an exposure mask for exposure, ie the photoactivation of a photoactivatable layer, which can be comprised of the first and/or second decorative layer, or as a mask to protect the first zones or the second zones, for example from solvent intervention, and on the finished multilayer body to provide an optical effect.
  • the metal layer therefore fulfills several, completely different functions.
  • step c) and/or step e) can also be carried out only in a partial region of the multilayer body, which then forms in particular the first region.
  • the first and second decorative layers are structured using the metal layer as a mask in the first region such that the first and second decorative layers are at least partially removed in the first or second zones, respectively, or that the metal layer is structured using the first or second decorative layer as a mask.
  • the problem can arise that linear and/or non-linear distortions in the multilayer body caused by previous, in particular thermally and/or mechanically demanding process steps cannot be completely compensated over the entire surface of the multilayer body by aligning the mask on the multilayer body, even though the mask alignment takes place at existing register or registration marks (usually arranged on the horizontal and/or vertical edges of the multilayer body).
  • the tolerance fluctuates over the entire surface of the multilayer body in a comparatively large range.
  • the first and second zones defined by the structuring of the first or second decorative layer or the metal layer are preferably used directly or indirectly as a mask for structuring the remaining layers, so that these problems are avoided.
  • the mask designed as a decorative layer or metal layer is therefore subject to all subsequent process steps of the multilayer body and thus automatically follows all distortions in the multilayer body itself that may be caused by these process steps.
  • no additional tolerances in particular no additional tolerance fluctuations, can occur over the surface of the multilayer body, since the subsequent creation of a mask and the subsequent positioning of this mask, which is independent of the previous process sequence, as precisely as possible is avoided.
  • the tolerances or register accuracies in the method according to the invention are only due to edges of the first and second zones and the metal layer that may not be formed absolutely precisely, the quality of which is determined by the respective manufacturing process used.
  • the tolerances or register accuracies in the method according to the invention are approximately in the micrometer range and thus far below the resolution of the eye; i.e. the unaided human eye can no longer perceive existing tolerances.
  • Register or register accuracy refers to the precise arrangement of layers lying on top of each other.
  • a layer comprises at least one layer.
  • a decorative layer comprises one or more decorative and/or protective layers, which are in particular designed as lacquer layers.
  • the decorative layers can be arranged on the carrier layer over the entire surface or in a pattern-like structured form.
  • the at least one metal layer can consist of a single metal layer or of a sequence of two or more metal layers, preferably different metal layers.
  • the metal used for the metal layers is preferably aluminum, copper, gold, silver or an alloy of these metals.
  • step c) i.e. for structuring the metal layer, a first resist layer that can be activated by means of electromagnetic radiation is applied to the side of the metal layer facing away from the first decorative layer and the first resist layer is exposed using an exposure mask using said electromagnetic radiation.
  • step c) i.e. for structuring the metal layer
  • a first resist layer that can be activated by means of electromagnetic radiation is applied to the side of the metal layer facing away from the first decorative layer and the first resist layer is exposed using an exposure mask using said electromagnetic radiation.
  • the second decorative layer applied in step d) comprises one or more second colored resist layers that can be activated by means of electromagnetic radiation.
  • step e) the one or more second colored resist layers are exposed by means of said electromagnetic radiation from the side of the carrier layer, with the metal layer serving as an exposure mask. In this way, the second decorative layer structured in perfect register with the metal layer.
  • the one or more second, colored resist layers comprise at least two resist layers containing different colorants or colorants of different concentrations.
  • One or more of the one or more second, colored resist layers can be applied in a pattern using a printing process. These colored resist layers are preferably designed in a pattern to form a first motif.
  • the first resist layer is exposed in step c) from the side of the carrier layer, the mask for exposing the first resist layer being formed by the first decorative layer.
  • the first decorative layer has, viewed perpendicular to the plane of the carrier layer, a first transmittance in the first region in the one or more first zones and a second transmittance that is greater than the first transmittance in the one or more second zones, wherein the said transmittances preferably relate to electromagnetic radiation with a wavelength suitable for photoactivation of the first resist layer.
  • the first decorative layer acts as an exposure mask, since it has a transmittance in the first zone that is lower than the transmittance in the second zone. The exposure then takes place through the metal layer and thus the layer to be structured.
  • an etching resist layer in particular a colored one, is partially applied to a partial area of the metal layer in which no first resist layer is provided.
  • the etching resist layer can be used to structure the metal layer in this partial area in a later etching process independently of the exposure of the first resist layer, whereby further graphic effects can be achieved.
  • the etching resist layer preferably consists of polyvinyl chloride.
  • the first decorative layer also fulfils several completely different functions, namely the function of an exposure mask and the provision of optical information.
  • the first decorative layer is preferably designed such that a viewer of an object decorated by means of the multilayer body can view the at least one metal layer through the first decorative layer.
  • the first decorative layer can be transparent or translucent, for example. It is also possible for the first decorative layer to form a (colored) second motif that is visible to the human observer and is designed independently of the first and second zones.
  • the first decorative layer can be colored transparent or translucent, for example.
  • the first resist layer is structured in precise register with the first and second zones of the multilayer body, i.e. the structures of the structured first resist layer are arranged in register with the first and second zones of the decorative layer.
  • the at least one metal layer is structured in precise register with the resist layer. The method therefore allows the formation of at least four layers that are precisely registered with one another: the first decorative layer, the first resist layer, the at least one metal layer and the second decorative layer.
  • the multilayer body has the metal layer and the two decorative layers in precise register in the first zone or in the second zone of the multilayer body.
  • the first decorative layer as an exposure mask for the first resist layer or the metal layer as an exposure mask for a second resist layer possibly covered by the second decorative layer
  • a perfect register accuracy of the respective exposure mask to the metal layer or the second decorative layer is inevitably achieved, i.e. the first decorative layer and the structured metal layer itself function as exposure masks at least in some areas.
  • the first decorative layer or the metal layer and the exposure mask thus each form a common functional unit.
  • This method which is as simple as it is effective, creates a significant advantage over conventional methods in which a separate exposure mask has to be brought into register with layers of the multilayer body, whereby in practice register deviations can rarely be completely avoided.
  • the first decorative layer comprises a first lacquer layer which is arranged on the carrier layer in the first zone with a first layer thickness and in the second zone either not arranged thereon or arranged thereon with a second layer thickness which is smaller than the first layer thickness, so that the first decorative layer has the said first transmittance in the zone and the said second transmittance in the second zone.
  • the lacquer layers can be applied in a patterned manner particularly easily using a printing process, for example gravure printing, offset printing, screen printing or inkjet printing, so that both the mask function and the desired optical effect are realized.
  • a printing process for example gravure printing, offset printing, screen printing or inkjet printing
  • the lacquer layers contain a UV absorber and/or a colorant.
  • the thickness and material of the first decorative layer such that the first transmittance is greater than zero.
  • the thickness and material of the first decorative layer are selected such that electromagnetic radiation with the wavelength suitable for photoactivation partially penetrates the first decorative layer in the first zone.
  • the exposure mask formed by the first decorative layer is therefore designed to be radiation-permeable in the first zone.
  • the thickness and the material of the first decorative layer are selected such that the ratio between the second and the first degree of transmission is equal to or greater than 2.
  • the ratio between the first and the second degree of transmission is preferably 1:2, also referred to as contrast 1:2.
  • a contrast of 1:2 is at least an order of magnitude lower than with conventional masks. It has not previously been common to use a mask for exposing a resist layer that has such a low contrast as the first decorative layer preferably used described here. When exposing a resist with a conventional mask (e.g. a chrome mask), opaque (OD>2) and completely transparent areas are present; the mask therefore has a high contrast.
  • the area of the photoactivatable first resist layer exposed through the first zones is preferably activated to a lesser extent than the area of the photoactivatable first resist layer exposed through the second zones (higher transmittance).
  • the first resist layer can be applied temporarily to the metal layer during the production of the multilayer body, where it serves to structure the metal layer, or it can also be part of the second decorative layer or serve to structure the second decorative layer.
  • the thickness and material of the first decorative layer are selected such that the electromagnetic radiation, measured after passing through a layer package consisting of the carrier layer and the decorative layer, has a transmittance of approximately 0% to 30%, preferably approximately 1% to 15%, in the first zone and a transmittance of approximately 60% to 100%, preferably approximately 70% to 90%, in the second zone.
  • the transmittances are preferably selected from these value ranges so that a contrast of 1:2 is obtained.
  • the first resist layer is exposed in step c) from the side facing away from the carrier layer, wherein a mask is arranged between the first resist layer and a light source that is used for exposure in order to expose the first resist layer.
  • the mask has a first transmittance in the one or more first zones in the first region, viewed perpendicular to the plane of the carrier layer, and a second transmittance that is greater than the first transmittance in the one or more second zones, wherein said transmittances preferably relate to electromagnetic radiation with a wavelength suitable for photoactivation of the first resist layer.
  • an external mask can be used without causing registration problems.
  • the structures in the metal layer created using the external mask then later act as a mask for the creation of further, precisely registered structures in the first and/or second decorative layer in the manner described.
  • Exposure is the selective irradiation of a photoactivatable layer through an exposure mask with the aim of locally changing the solubility of the photoactivatable layer by a photochemical reaction.
  • photoactivatable layers which can be formed as photoresists:
  • a first type of photoactivatable layer e.g.
  • negative resist its solubility decreases when exposed compared to unexposed areas of the layer, for example because the light causes the layer to harden;
  • a second type of photoactivatable layer e.g. positive resist
  • their solubility increases when exposed to light compared to unexposed areas of the layer, for example because the light causes the layer to decompose.
  • the first and/or second resist layer when using a positive photoresist in the second zone or when using a negative photoresist in the first zone is removed.
  • a solvent such as a lye or acid.
  • the more heavily exposed second region of the resist layer in the one or more second zones has a higher solubility than the less heavily exposed first region of the resist layer in the one or more first zones. Therefore, a solvent dissolves the material of the resist layer (positive photoresist) arranged in the second zone faster and better than the material of the resist layer arranged in the first zone.
  • the resist layer can be structured, i.e. the resist layer is removed in the second zone but remains in the first zone.
  • the first resist layer is then preferably used as an etching mask for an etching step by which the areas of the metal layer not covered by the first resist layer or one of the metal layers are removed.
  • the first resist layer can then be stripped, i.e. removed.
  • UV radiation is used for the exposure of the first and/or second resist layer, preferably with a radiation maximum in the range of 365 nm.
  • the transmission properties of the decorative layer used as a mask can therefore be different in the ultraviolet range than in the visual range.
  • the structure of the mask is therefore not dependent on the visually perceptible optical effect that is to be achieved by the decorative layers.
  • PET polyethylene terephthalate
  • PET polyethylene terephthalate
  • the maximum emission of a high-pressure mercury lamp is in the range of this wavelength.
  • the first and/or second resist layer has a thickness in the range of 0.3 ⁇ m to 0.7 ⁇ m.
  • step c) is carried out after step d) and in step c) the metal layer is structured using the second decorative layer as a mask, in particular by applying an etchant and removing the areas of the metal layer not protected by the mask.
  • step e) the first decorative layer is then structured using the metal layer as a mask, in particular by applying a solvent and removing the areas of the first decorative layer not protected by the mask.
  • the second decorative layer has an additional function as a mask, which is then used to structure the metal layer in precise register.
  • this embodiment does not require any exposure or development steps, so that the process is particularly simple.
  • the metal layer can in turn be used as a mask for structuring the first decorative layer, for example by removing the areas of the first decorative layer not covered by the metal layer using a solvent.
  • the second decorative layer is applied in a pattern by printing, the second decorative layer being provided in the first zones with a third layer thickness and in the second zones with a fourth layer thickness that is different from the third layer thickness, the fourth layer thickness in particular being zero. This makes it easy to achieve both the mask function and the desired optical effect of the second decorative layer.
  • the second decorative layer is resistant to an etchant used to structure the metal layer and to a solvent used to structure the first decorative layer.
  • the second decorative layer can therefore serve both as a protective mask for structuring the metal layer and for structuring the first decorative layer.
  • the second decorative layer comprises one or more colored layers, which are applied in particular by a printing process.
  • the first resist layer and/or areas of the first decorative layer not protected by the metal layer are removed using a solvent.
  • a preferred embodiment provides for the resist layer to be largely completely removed ("stripping") during the step for structuring the metal layer or in a separate, subsequent, later step.
  • the resist layer By reducing the number of layers lying on top of one another in the multilayer body, its resistance and durability can be increased, since adhesion problems between adjacent layers are minimized.
  • the optical appearance of the multilayer body can be improved, since after removing the resist layer, which can in particular be colored and/or not completely transparent, but only translucent or opaque, the areas underneath are exposed again. For special applications without particularly high requirements for resistance or optical appearance, however, it is also possible to leave the first resist layer on the structured layer.
  • step c the zones of the metal layer not protected by the first resist layer and/or the second decorative layer are removed using an etchant.
  • an etchant such as an acid or alkali.
  • This can be achieved in a simple manner using a solvent/etching agent such as an alkali or acid, which is able to remove both the resist layer - in the exposed area in the case of a positive resist, in the unexposed area in the case of a negative resist - and the layer to be structured, ie attacks both materials.
  • the resist layer must be designed in such a way that it resists the solvent or etching agent used to remove the layer to be structured for at least a sufficient time, ie for the exposure time of the solvent or etching agent when using a positive resist in the unexposed area, and when using a negative resist in the exposed area.
  • the carrier layer comprises at least one functional layer, in particular a release layer and/or a protective lacquer layer, on the side facing the first decorative layer.
  • the functional layer enables the carrier layer to be easily removed from a transfer layer which comprises at least one layer of the first and second decorative layer and the metal layer.
  • the first and/or second decorative layer comprise a replication lacquer layer into which a surface relief is molded, and/or that a surface relief is molded into the surface of the carrier layer facing the first decorative layer.
  • the surface relief preferably comprises a diffractive structure, preferably with a spatial frequency between 200 and 2000 lines/mm, in particular a hologram, a Kinegram® , a linear grating or a cross grating, a zero-order diffraction structure, in particular with a spatial frequency of more than 2000 lines/mm, a blaze grating, a refractive structure, in particular a microlens field or a retroreflective structure, an optical lens, a free-form surface structure, and/or a matt structure, in particular an isotropic or anisotropic matt structure.
  • a matt structure refers to a structure with light-scattering properties, which preferably has a stochastic surface matt profile.
  • Matt structures preferably have a relief depth (peakto valley, PV) between 100 nm and 5000 nm, more preferably between 200 nm and 2000 nm. Matt structures preferably have a surface roughness (Ra) between 50 nm and 2000 nm, more preferably between 100 nm and 1000 nm.
  • the matt effect can be either isotropic, ie the same at all azimuth angles, or anisotropic, ie varying at different azimuth angles.
  • a replication layer is generally understood to be a layer that can be produced with a relief structure on the surface. This includes, for example, organic layers such as plastic or lacquer layers or inorganic layers such as inorganic plastics (e.g. silicones), semiconductor layers, metal layers, etc., but also combinations thereof. It is preferred that the replication layer is designed as a replication lacquer layer.
  • a radiation-curable or heat-curable (thermosetting) replication layer or a thermoplastic replication lacquer layer can be applied, a relief can be molded into the replication layer and the replication layer can be cured, if necessary, with the relief embossed in it.
  • a compensating layer is applied, which rests in particular on the surface areas of the first decorative layer, the second decorative layer and/or the carrier layer facing away from the carrier layer.
  • the metal layer and the first resist layer are removed in the first or second zone and are present in the other area, or in the corresponding process variants, are present in the zones protected by the second resist layer and are removed in the remaining area.
  • the leveling layer recessed areas/depressions in the metal layer, the first decorative layer and/or the second decorative layer can be at least partially filled. It is possible that by applying the leveling layer, recessed areas/depressions in the first or second resist layer can also be at least partially filled.
  • the leveling layer can comprise one or more different layer materials.
  • the leveling layer can be designed as a protective and/or adhesive and/or decorative layer.
  • an adhesion-promoting layer adheresive layer
  • the target substrate can be, for example, paper, cardboard, textile or another fibrous material, or a plastic or a composite material made of, for example, paper, cardboard, textile and plastic, and can be flexible or predominantly rigid.
  • a protective varnish is applied to the side of the multilayer body facing away from the carrier layer. This protects the multilayer body from environmental influences and mechanical manipulation.
  • first and/or second decorative layer is bleached by exposure. This causes any photoreactive substances still present in the non-exposed areas of the multilayer body to react and prevents subsequent uncontrolled bleaching. In this way, a particularly color-stable multilayer body is obtained.
  • the multilayer body preferably comprises a carrier layer, in particular a full-surface carrier layer.
  • the carrier layer must be permeable to the radiation used in the respective exposure step.
  • the carrier layer it is possible for the carrier layer to have a single-layer or multi-layer carrier film.
  • a thickness of the carrier film of the multi-layer body according to the invention in the range of 12 to 100 ⁇ m has proven to be useful.
  • PMMA polymethyl methacrylate
  • the first decorative layer viewed perpendicular to the plane of the carrier layer, has a first transmittance in the first zone and a second transmittance in the second zone that is greater than the first transmittance, wherein the said transmittances relate to electromagnetic radiation in the visual and/or ultraviolet and/or infrared spectrum.
  • a first decorative layer can itself serve as an exposure mask for structuring the metal layer, resulting in a multilayer body with a particularly precisely registered layer arrangement.
  • the second decorative layer in the first zone or the second zone to have at least one resist layer photoactivated by means of said electromagnetic radiation, wherein the at least one metal layer and the resist layer are aligned with one another in precise register.
  • first and/or second decorative layer may comprise one or more layers that are colored with at least one opaque and/or at least one transparent colorant that is colored or color-producing at least in one wavelength range of the electromagnetic spectrum, in particular is brightly colored or color-producing, in particular that a colorant is contained in one or more of the layers of the first and/or second decorative layer that can be excited outside the visible spectrum and produces a visually recognizable colored impression. It is preferred if the first and/or second decorative layer is at least partially transparent to visible light with a wavelength in a range of approximately 380 to 750 nm.
  • pigments or dyes can also be used which produce a specific, premixed special color or a color from a special color system (e.g. RAL, HKS, Pantone ® ), for example orange or violet.
  • the first decorative layer fulfills a dual function in the process variants in which exposure takes place through the first decorative layer.
  • the first decorative layer serves as an exposure mask for forming at least one metal layer, which is arranged in precise register with the first and second zones of the multilayer body.
  • the first decorative layer serves as an exposure mask for regional demetallization of a metal layer.
  • both decorative layers, or at least one or more layers of the respective decorative layer serve as an optical element on the multilayer body, in particular as a single- or multi-colored color layer for coloring the at least one structured layer, wherein the color layer is arranged in precise register above and/or next to/adjacent to the at least one metal layer.
  • the first and/or second decorative layer comprises a replication lacquer layer into which a surface relief comprising at least one relief structure is molded and the at least one metal layer is arranged on the surface of the at least one relief structure.
  • the at least one relief structure can be arranged at least partially in the first zone and/or in the second zone.
  • the surface layout of the relief structure can be adapted to the surface layout of the first and second zones, in particular designed in register therewith, or the surface layout of the relief structure is designed, for example, as a continuous endless pattern independent of the surface layout of the first and second zones.
  • the relief structure can of course also be introduced in the process variants that do not require zones of different transmission in the decorative layer and can be adapted to the surface layout of the decorative layer.
  • the resist layer according to the invention By arranging the resist layer according to the invention on the first side of the carrier layer such that the resist layer is arranged on the side of the at least one metal layer facing away from the carrier layer and the decorative layer is arranged on the other side of the at least one metal layer, it is possible to arrange the layer to be structured at least partially on a relief structure, in contrast to structuring processes using wash varnish.
  • first and/or second Decorative layer comprises one or more of the following layers: liquid crystal layer, polymer layer, in particular conductive or semiconductive polymer layer, interference thin film layer package, pigment layer.
  • the first and/or decorative layer has a thickness in the range of 0.5 ⁇ m to 5 ⁇ m.
  • UV absorbers are added to the material used to form the decorative layer, particularly if the material of the decorative layer does not contain a sufficient amount of UV-absorbing components, such as UV-absorbing pigments or UV-absorbing dyes.
  • the decorative layer contains inorganic absorbers with a high scattering proportion, in particular nano-scale UV absorbers based on inorganic oxides. TiO 2 and ZnO in highly dispersed form, as used in sunscreen creams with a high sun protection factor, have proven to be particularly suitable oxides. These inorganic absorbers lead to a high scattering and are therefore particularly suitable for a matt, especially silk-matt, coloring of the decorative layers.
  • the decorative layers may contain organic UV absorbers, in particular benzotriazole derivatives, with a mass fraction in a range of approximately 3% to 5%, in particular if the material of the decorative layers does not contain a sufficient amount of UV-absorbing components, such as UV-absorbing pigments or UV-absorbing dyes. Suitable organic UV absorbers are sold under the trade name Tinuvin ® by BASF. It is possible for the decorative layer to contain fluorescent dyes or organic or inorganic fluorescent pigments in combination with highly disperse pigments, in particular Mikrolith ® -K. By exciting these fluorescent pigments, the majority of the UV radiation is filtered out in the respective decorative layer, so that only an insignificant fraction of the radiation reaches the resist layer.
  • the fluorescent pigments can be used in the multilayer body as an additional security feature.
  • UV-activatable resist layers offers advantages: By using a UV absorber that is transparent in the visual wavelength range in the first and/or second decorative layer, the "color" property of the respective decorative layer in the visual wavelength range can be separated from the desired properties of the respective decorative layer for structuring the respective resist layer (e.g. sensitive in the near UV) and thus the at least one metal layer. In this way, a high contrast between the first and second zones can be achieved, regardless of the visually recognizable coloring of the decorative layers.
  • the at least one metal layer can have a thickness in the range from 20 nm to 70 nm. It is preferred that the metal layer of the multilayer body serves as a reflection layer for light incident from the side of the replication layer.
  • the metal layer can consist, for example, of aluminum or copper or silver, which is galvanically reinforced in a subsequent process step.
  • the metal used for galvanic reinforcement can be the same or different from the metal of the structured layer.
  • One example is, for example, the galvanic reinforcement of a thin aluminum layer, copper layer or silver layer with copper.
  • the leveling layer is designed as an adhesion layer, e.g. an adhesive layer.
  • Fig. 1a to 3e are drawn schematically and not to scale in order to ensure a clear representation of the essential features.
  • Fig. 1a shows an intermediate product 100a in the production of a multilayer body 100, which in the finished state in Fig. 1d is shown.
  • the multilayer body 100 comprises a carrier layer with a first side 11 and a second side 12.
  • the carrier layer comprises a carrier film 1 and a functional layer 2.
  • a first decorative layer 3 is arranged on the functional layer 2, which comprises a first lacquer layer 31 formed in a first zone 8 and a replication layer 4.
  • a metal layer 5 is arranged on the replication layer 4 in register with the first lacquer layer 3.
  • a second decorative layer 7 is provided on the metal layer 5, arranged in register with the metal layer 5.
  • a leveling layer 10 fills height differences between the replication layer 4, the metal layer 5 and the second decorative layer 7.
  • the carrier film 1 is preferably a transparent plastic film with a thickness between 8 ⁇ m and 125 ⁇ m, preferably in the range from 12 to 50 ⁇ m, more preferably in the range from 16 to 23 ⁇ m.
  • the carrier film 1 can be monoaxially or biaxially stretched. It is also possible for the carrier film 1 to consist not only of one layer, but also of several layers.
  • the carrier film 1 it is possible for the carrier film 1 to have a release layer in addition to a plastic carrier, for example a plastic film described above, which enables the layer structure consisting of layers 2 to 6 and 10 to be released from the plastic film, for example when using the multilayer body 100 as a hot stamping film
  • the functional layer 2 can comprise a release layer, e.g. made of hot-melt material, which facilitates the detachment of the carrier film 1 from the layers of the multilayer body 100, which are arranged on a side of the release layer 2 facing away from the carrier film 1.
  • a release layer e.g. made of hot-melt material
  • the multilayer body 100 is designed as a transfer layer, as is used, for example, in a hot embossing process or an IMD process.
  • a protective layer e.g. a protective lacquer layer, in addition to a release layer.
  • the protective layer forms one of the upper layers of the layers arranged on the surface of the substrate and can protect layers arranged underneath from abrasion, damage, chemical attacks or the like.
  • the multilayer body 100 can be a section of a transfer film, for example a hot stamping film, which can be arranged on a substrate by means of an adhesive layer.
  • the adhesive layer is preferably arranged on the side of the compensation layer 10 facing away from the carrier film 1.
  • the adhesive layer can be a hot melt adhesive that melts when exposed to heat and connects the multilayer body 100 to the surface of the substrate.
  • the transparent, colored lacquer layer 31 is printed on the functional layer 2 in zone 8.
  • Transparent means that the lacquer layer 31 is at least partially permeable to radiation in the visible wavelength range.
  • Colored means that the lacquer layer 31 shows a visible color impression in sufficient daylight.
  • the lacquer layer 31 can comprise several differently colored partial areas, such as in Fig. 1d indicated by different hatching. This can provide a first motif. Furthermore, the decorative layer 7, as in Fig. 1d indicated by different shades, form differently colored areas or areas with different optical properties, which in particular provide a second motif.
  • Both the zones 8 printed with the lacquer layer 31 and the unprinted zones 9 of the functional layer 2 are covered by a replication layer 4, which preferably equalizes any relief structures present in the decorative layer 3, i.e. the differing levels in the printed zones 8 and the unprinted zones 9.
  • a thin metal layer 5 is arranged on the replication layer 4, congruent with the lacquer layer 31.
  • a second decorative layer 7 is arranged congruent with the metal layer 5.
  • Both the zones 8 of the replication layer 4 covered with the metal layer 5 and decorative layer 7 and the uncovered zones 9 of the replication layer 4 are covered with a leveling layer 10, which equalizes, i.e. covers and fills, structures caused by the relief structures and the metal layer 5 arranged in regions (e.g. relief structure, different layer thicknesses, height offset), so that the multi-layer body has a flat, essentially structureless surface on the side of the leveling layer 10 facing away from the carrier film 1.
  • the compensation layer 10 has a similar refractive index to the replication layer 4, i.e. if the refractive index difference is less than approximately 0.15, then the zones of the relief structures in the replication layer 4 that are not covered with the metal layer 5 and directly adjacent to the compensation layer 10 are optically erased because there are no longer any optically recognizable layer boundaries between the replication layer 4 and the compensation layer 10 due to the similar refractive index of both layers.
  • Figure 1a shows a first production stage 100a of the multilayer body 100, in which the carrier film 1 comprises a functional layer 2 on a first side 11, on which in turn a decorative layer 3 is arranged.
  • the carrier film 1 comprises a functional layer 2 on a first side 11, on which in turn a decorative layer 3 is arranged.
  • One side of the functional layer 2 borders on the carrier film 1, its other side on the decorative layer 3.
  • the decorative layer 3 has a first zone 8 in which a lacquer layer 31 is formed, and a second zone 9 in which the lacquer layer 31 is not present.
  • the lacquer layer 31 is printed on the functional layer 2, e.g. by screen printing, gravure printing or offset printing. The formation of the lacquer layer 31 in certain areas (in the first zones 8) results in a pattern-like design of the decorative layer 3.
  • the lacquer layer 31 preferably has a layer thickness of 0.1 ⁇ m to 2 ⁇ m, particularly preferably of 0.3 ⁇ m to 1.5 ⁇ m.
  • a replication layer 4, which is part of the first decorative layer 3, is applied to the functional layer 2 and the lacquer layer 31 arranged thereon in some areas (in the zones 8).
  • This can be an organic layer that is applied in liquid form by classic coating methods such as printing, pouring or spraying.
  • the replication layer 4 is applied over the entire surface here.
  • the layer thickness of the replication layer 4 varies because it compensates/levels out the different levels of the decorative layer 3, comprising the printed, first zone 8 and the unprinted, second zone 9; in the first zone 8, the layer thickness of the replication layer 4 is thinner than in the second zone 9, so that the side of the replication layer 4 facing away from the carrier layer 1 has a flat, essentially structureless surface before the formation of relief structures.
  • the replication lacquer layer 9 preferably has a layer thickness of 0.1 ⁇ m to 3 ⁇ m, particularly preferably of 0.1 ⁇ m to 1.5 ⁇ m.
  • the replication layer 4 can also be applied only in a partial area of the multilayer body 100.
  • the surface of the replication layer 4 can be structured in areas using known methods.
  • a thermoplastic replication varnish is applied as the replication layer 4 by printing, spraying or painting and a relief structure is molded into the particularly thermally curable/dryable replication varnish 4 using a heated stamp or a heated replication roller.
  • the replication layer 4 can also be a UV-curable replication varnish, which is structured, for example, by a replication roller and simultaneously and/or subsequently hardened using UV radiation. The structuring can also be produced by UV irradiation through an exposure mask.
  • the metal layer 5 is applied to the replication layer 4.
  • the metal layer 5 can be formed, for example, as a vapor-deposited metal layer, e.g. made of silver or aluminum.
  • the metal layer is applied over the entire surface here. However, it can also be applied only in a partial area of the multilayer body 100, e.g. with the aid of a vapor-deposition mask that shields parts of the area.
  • the metal layer preferably has a Layer thickness of 20 nm to 70 nm.
  • a photoactivatable resist layer 6 is applied to the metal layer 5.
  • the resist layer 6 can be an organic layer that is applied in liquid form by classic coating methods such as printing, pouring or spraying. It can also be provided that the resist layer 6 is vapor-deposited or laminated as a dry film.
  • the photoactivatable layer 6 can be, for example, a positive photoresist AZ 1512 from Clariant or MICROPOSIT ® S1818 from Shipley, which is applied to the layer 5 to be structured in a surface density of 0.1 g/m 2 to 10 g/m 2 , preferably 0.1 g/m 2 to 1 g/m 2 .
  • the layer thickness depends on the desired resolution and the process.
  • the application is provided here over the entire surface. However, an application can also be provided only in a partial area of the multilayer body 100.
  • Figure 1b shows a second production stage 100b of the multilayer body 100, in which the first production stage 100a of the multilayer body 100 was irradiated and then developed.
  • Electromagnetic radiation with a wavelength that is suitable for activating the photoactivatable resist layer 6 is radiated through the multilayer body 100d from the second side 12 of the carrier film 1, ie the side of the carrier film 1 that is opposite the side of the carrier film 1 coated with the resist layer 6.
  • the irradiation serves to activate the photoactivatable resist layer 6 in the second zone 9, in which the decorative layer 3 has a higher degree of transmission than in the first zone 8.
  • the strength and duration of the exposure to the electromagnetic radiation is adapted to the multilayer body 100a in such a way that the radiation in the second zone 9 leads to an activation of the photoactivatable resist layer 6, but does not lead to an activation of the photoactivatable resist layer 6 in the first zone 8 printed with the lacquer layer 31. It has proven to be useful if the contrast between the first zone 8 and the second zone 9 caused by the lacquer layer 31 is greater than two. It has also proven to be useful if the lacquer layer 31 is designed in such a way that the radiation, after passing through the entire multilayer body 100a, has a ratio of the transmission levels, ie a contrast ratio of approximately 1:2 between the first zone 8 and the second zone 9.
  • the exposure is preferably carried out with an illuminance of 100 mW/cm 2 to 500 mW/cm 2 , preferably 150 mW/cm 2 to 350 mW/cm 2 .
  • a developer solution e.g. solvents or alkalis, in particular a sodium carbonate solution or a sodium hydroxide solution, is applied to the surface of the exposed photoactivatable resist layer 6 facing away from the carrier film 1.
  • the exposed resist layer 6 has been removed in the second zone 9.
  • the resist layer 6 is retained because the amount of radiation absorbed in these zones has not led to sufficient activation.
  • the resist layer 6 is therefore made of a positive photoresist.
  • the more heavily exposed zones 9 are soluble in the developer solution, eg the solvent.
  • the unexposed or less heavily exposed zones 8 are soluble in the developer solution.
  • the tolerances or register accuracies in the method according to the invention are based only on the not absolutely exact course of the color edge of the first and second zones 8 and 9 defined by the lacquer layer 31, the quality of which is determined by the respective printing process used, and are approximately in the micrometer range, and thus far below the resolution of the eye; ie the unaided human eye can no longer perceive existing tolerances.
  • the second resist layer can be, for example, a positive photoresist AZ 1512 from Clariant or MICROPOSIT ® S1818 from Shipley, which is applied in a surface density of 0.1 g/m 2 to 10 g/m 2 , preferably 0.5 g/m 2 to 1 g/m 2 .
  • the application is provided here over the entire surface.
  • an application can also be provided only in a partial area of the multilayer body 100. Since the second decorative layer 7 is to be retained at least in some areas in the finished multilayer body 100, dyes, pigments, nanoparticles or the like can also be introduced into the paint in order to achieve an optical effect.
  • the second decorative layer 7 is now also exposed from side 12 of the carrier layer 1, for which the parameters already described for the exposure of the first resist layer 6 can be applied.
  • the lacquer layer 31 and the metal layer 5 now act together as a mask, so that the at least one resist layer of the second decorative layer 7 is only exposed in zone 9, while the zone 8 covered by the lacquer layer 31 and the structured layer 5 remains unexposed.
  • the second decorative layer 7 is now treated for development with a developer solution, e.g. a lye, in particular a sodium carbonate solution or a sodium hydroxide solution. This removes the exposed resist layer of the second decorative layer 7 in the second zone 9.
  • the second resist layer remains in the first zone 8 because the amount of radiation absorbed in these zones has not led to sufficient activation.
  • a negative resist this is reversed as already described, so that the second resist layer is removed in the first zone 8 and remains in the second zone 9.
  • a UV-cured or heat-cured varnish is used as a leveling layer.
  • the leveling layer 10 can be applied in the first zone 8 and the second zone 9 in a different layer thickness, e.g. by doctoring, printing or spraying, so that the leveling layer 10 has a flat, essentially structureless surface on its side facing away from the carrier layer 1.
  • the layer thickness of the leveling layer 10 varies because it compensates/levels the different levels of the metal layer 5 arranged in the first zone 8 and the replication layer 4 exposed in the second zone 9.
  • the layer thickness of the leveling layer 10 is selected to be greater than the layer thickness of the metal layer 5 in the first zone 8, so that the side of the leveling layer 10 facing away from the carrier layer 1 has a flat surface.
  • the leveling layer 10 can also be applied only in a partial area of the multi-layer body 100. It is possible that one or more further layers, e.g. an adhesion or adhesive layer, are applied to the flat leveling layer 10.
  • the first and second zones 8 and 9 defined by the lacquer layer 31 and the metal layer 5 are used as a mask for structuring the second decorative layer 7.
  • no additional tolerances and no additional tolerance fluctuations can occur over the surface of the multilayer body 100, since the subsequent creation of a mask and the subsequent positioning of this mask, which is independent of the previous process sequence, as precisely as possible in register is avoided.
  • Fig. 2d shows another multilayer body 200, which is produced by a variant of the method.
  • the process steps and intermediate products 200a, 200b and 200c are shown in the Figures 2a to 2c shown.
  • the further multilayer body 200 corresponds to the Figure 1d multilayer body 100 shown.
  • the same reference numerals are therefore used for the same structures and functional elements.
  • the multilayer body 200 also comprises a carrier layer with a first side 11 and a second side 12.
  • the carrier layer comprises a carrier film 1 and a functional layer 2.
  • a first decorative layer 3, which is formed by a replication layer 4, is arranged on the functional layer 2.
  • the decorative layer 3 can also be multilayered and, for example, have a colored layer and a replication layer.
  • a metal layer 5 is arranged on the replication layer 4.
  • a second decorative layer 7, arranged in register with the metal layer 5, is provided on the metal layer 5.
  • a leveling layer 10 fills height differences between the replication layer 4, the metal layer 5 and the second decorative layer 7.
  • the multilayer body 200 differs from the multilayer body 100 only in that the decorative layer 3 does not have separate lacquer regions 31, but is formed entirely from a colored replication lacquer, which may contain dyes, pigments, UV-activatable substances, nanoparticles or the like, or alternatively is formed entirely from a correspondingly colored lacquer layer and a transparent colorless replication lacquer.
  • a colored replication lacquer which may contain dyes, pigments, UV-activatable substances, nanoparticles or the like, or alternatively is formed entirely from a correspondingly colored lacquer layer and a transparent colorless replication lacquer.
  • the Figure 2a shown intermediate product 200a is provided.
  • a carrier film 1 is first provided with a functional layer 2, onto which the decorative layer 3 is applied over the entire surface.
  • reliefs for example diffractive structures, can also be introduced into the replication layer 4 of the decorative layer 3.
  • the replication layer 4 is then metallized over the entire surface in the manner already described.
  • a second decorative layer 7 comprising one or more resist layers, also of different colors, is now partially printed onto the metallic layer 5 to be structured that is obtained in this way, so that in zone 8 the metal layer 5 is protected by the second decorative layer 7, while in zone 9 the metal layer 5 is not covered by the second decorative layer 7.
  • the second decorative layer 7 comprises layers, in particular resist layers, which can contain dyes, pigments, UV-activatable substances, nanoparticles or the like.
  • the second decorative layer 7 can be formed, for example, from a PVC-based lacquer.
  • the intermediate product 200a of the multilayer body 200 is now treated with an etching agent, in particular a sodium carbonate solution or a sodium hydroxide solution, which is applied to the surface of the intermediate product 200a facing away from the carrier film 1.
  • an etching agent in particular a sodium carbonate solution or a sodium hydroxide solution
  • the alkali can dissolve the metal layer 5 in the zone 9, so that the metal layer 5 in the zone 9 is removed. This can ensure that the metal layer 5 is formed in perfect register with the second decorative layer 7.
  • the second decorative layer 7 therefore acts here as an etching resist.
  • the intermediate product 200b is then treated with a solvent, which should preferably have a flash point of more than 65°C.
  • the solvent is chosen such that the second decorative layer 7 is insensitive to the solvent, while the material of the replication layer 4 can dissolve in the solvent.
  • Suitable varnishes, especially for the replication varnish 4, which have these properties are, for example, polyacrylates or polyacrylates in combination with cellulose derivatives.
  • a leveling layer 10 is finally applied, which evens out any relief structures present in the replication layer 4, as well as the removed zones 9 of the replication layer 4 and the metal layer 5, so that a smooth surface of the multilayer body 200 is obtained.
  • further functional layers or the like can of course also be applied.
  • first decorative layer 3, metal layer 5 and second decorative layer 7 In contrast to the process described above, no exposure is necessary here to produce a register-aligned arrangement of three layers (first decorative layer 3, metal layer 5 and second decorative layer 7).
  • the resolution of the structures produced is limited only by the resolution achievable when printing the second decorative layer 7 and by the lateral diffusion of the lye or solvent during the corresponding process steps.
  • Fig. 3e shows another multilayer body 300, which is produced by a variant of the method.
  • the process steps and intermediate products 300a, 300b, 300c and 300d are shown in the Figures 3a to 3d
  • the further multilayer body 300 also corresponds to the Fig. 1d and Fig. 2d multilayer bodies 100 and 200 shown.
  • the same reference numerals are therefore used for identical structures and functional elements.
  • the multilayer body 300 also comprises a carrier layer with a first side 11 and a second side 12, which comprises a carrier film 1 and a functional Layer 2.
  • a replication layer 4 is arranged on this, which is colored and simultaneously functions as the first decorative layer 3.
  • the decorative layer 3 can also be multi-layered and, for example, have a colored layer and a replication layer.
  • a metal layer 5 in register with the first decorative layer 3 and a second decorative layer 7 arranged in register with the metal layer 5 are provided on the replication layer 4. Differences in height of the replication layer 4, the metal layer 5 and the second decorative layer 7 are filled by a leveling layer 10.
  • the multilayer body 300 differs from the multilayer body 100 only in that the decorative layer 3 does not have separate lacquer areas 31, but is formed entirely from a colored replication lacquer, which can contain dyes, pigments, UV-activatable substances, nanoparticles or the like, or alternatively is formed entirely from a correspondingly colored lacquer layer and a transparent colorless replication lacquer.
  • a colored replication lacquer which can contain dyes, pigments, UV-activatable substances, nanoparticles or the like, or alternatively is formed entirely from a correspondingly colored lacquer layer and a transparent colorless replication lacquer.
  • Fig. 3a shows a first intermediate product 300a in the production of the multilayer body 300 according to a variant of the method.
  • a carrier film 1 is first provided with a functional layer 2, onto which the decorative layer 3 is applied over the entire surface.
  • reliefs for example diffractive structures, can also be introduced into the replication layer 4 of the decorative layer 3.
  • the replication layer 4 is then metallized over the entire surface in the manner already described.
  • a resist 6 is then applied over the entire surface to the metal layer 5 thus obtained.
  • a mask 13 is now placed on the side of the resist 6 facing away from the carrier film 1.
  • the mask 13 here is a separate part, i.e. it is not formed by structures of the multilayer body 300 itself.
  • the mask comprises zones 8 that are opaque to the electromagnetic radiation used to expose the photoactivatable resist 6, as well as zones 9 that are transparent to said radiation. Since the mask 13 is arranged on the side of the resist 6 facing away from the carrier film 1, the exposure of the resist 6 must also take place from this side, i.e. it cannot take place from the side of the carrier film 1, as in the production of the multilayer body 100. However, all other parameters of the exposure and subsequent development of the resist 6 correspond to the method explained with reference to the production of the multilayer body 100. After exposure of the resist 6, the mask 13 can be removed and the resist 6 can be developed in the manner already described. The metal layer 5 is then structured using an etchant in the manner also already described.
  • a combination of a positive resist 6 with a positive mask 13 is used.
  • the resist 6 is therefore protected by the mask in zone 8 and only exposed in zone 9.
  • the resist 6 is therefore removed during development, so that the metal layer 5 is exposed in zone 5 and is removed by the etchant in the subsequent etching step.
  • a negative mask can also be used in combination with a negative resist.
  • the Fig. 3b shown intermediate product 300b is obtained, in which the structured layer is only present in the zones 8, while the replication layer 4 is exposed in the zones 9.
  • the resist 6 is also still present on the surface of the metal layer 5 facing away from the carrier film 1.
  • the resist 6 is removed by solvent treatment ("stripped").
  • solvent treatment for this purpose, reference is made to the explanations after Fig. 2c and 2d This can also be done in the manner already described for the production of the multilayer body 100.
  • the replication layer 4 is simultaneously removed in the zone 9 in which it is not protected by the metal layer 5.
  • a second decorative layer 7 is applied to the metal layer 5 or the exposed zones 9 of the functional layer 2 over the entire surface, so that the Fig. 3d shown intermediate product 300d is obtained.
  • the second decorative layer 7 comprises at least one layer of a photoactivatable resist, preferably two or more photoactivatable, differently colored layers, and at the same time acts as a leveling layer that compensates for the height differences due to the partial removal of the metal layer 5 and the replication layer 4.
  • the second decorative layer 7 remains partially in the finished multilayer body and takes on an optical function there.
  • the second decorative layer 7 therefore comprises at least one layer that is colored with dyes, pigments, UV-active substances, nanoparticles or the like.
  • the zone 8 formed by the remaining decorative layer 3 and the metal layer 5 is opaque to the electromagnetic radiation used to expose the resist of the second decorative layer 7.
  • the resist of the second decorative layer 7 can now be exposed from the side of the carrier film and the resist can then be developed in the manner already described. Since the remaining decorative layer 3 acts as a mask together with the metal layer 5, the resist is therefore only exposed in zone 9. When using a positive resist, the resist is therefore removed in zone 9 during development, so that it only remains where it is directly on the metal layer 5. rests on, is preserved.
  • the zone 9 in which the resist of the second decorative layer 7 was removed is provided with a leveling layer 10 in order to compensate for the height differences.
  • a cross-linked, transparent sealing layer 14 can be applied to the side of the multilayer body 300 facing away from the carrier film 1 in order to protect its surface from mechanical damage.
  • This method also produces a structure of three precisely registered layers, namely the first decorative layer 3, the metal layer 5 and the second decorative layer 7. Since an external mask is only used to structure the metal layer 5, which then serves as a mask to remove the replication layer in zone 8 or to expose the resist of the second decorative layer 7 in zone 8, the problems described at the beginning when using masks do not occur here.
  • the remaining zones 8 of the first decorative layer 3 and the second decorative layer 7 are necessarily created with precise raster alignment to the metal layer 5.
  • Fig. 4d shows another multilayer body 400, which is produced by a variant of the method.
  • the process steps and intermediate products 400a, 400b and 400c are shown in the Figures 4a to 4c shown.
  • the multilayer body 400 differs from the one in Fig. 1a shown multilayer body 100 merely in that the second decorative layer 7 is formed in a first partial region by a photoactivatable resist layer and in a second partial region by a partially applied etching resist layer.
  • the decorative layer 3 can have first zones 8 and/or second zones 9 as in the first partial region.
  • the structure of the multilayer body 400 corresponds to the multilayer body 100 in the Fig. 1a to 1d and the process steps described therein are also carried out to produce a multilayer body 400 as shown in Fig. 4d in the first sub-area.
  • the second sub-area is now provided, in which an etching resist layer 15 is partially applied instead of the photoactivatable resist layer 6.
  • the motif or the external shape of the etching resist layer 15 should determine the motif or the external shape of the partial metallization to be achieved.
  • the etching resist layer 15 can consist of a PVC-based lacquer, for example, and be colored using pigments and/or dyes, or be colorless, transparent, or translucent.
  • the metal layer 5 in the second zone 9 is removed by an etchant.
  • the etchant can be an acid or alkali, for example NaOH (sodium hydroxide) or Na 2 CO 3 (sodium carbonate) in a concentration of 0.05% to 5%, preferably 0.3% to 3%. In this way, the Figure 4b shown areas of the metal layer 5 are formed.
  • the metal layer 5 can be structured in the first partial area in register with the first and second zones 8 and 9 defined by the lacquer layer 31 and in the second partial area in register with the etching resist layer 15 without additional technological effort.
  • a further, second decorative layer 7 is applied to the zones 8 covered by the structured layer 5 and to the zones 9 of the replication layer 4 not covered by the structured layer 5.
  • the second decorative layer 7 comprises at least one second photoactivatable resist layer.
  • the second decorative layer 7 preferably has two or more second resist layers, in particular differently colored ones.
  • the second resist layers can also be printed on in a pattern.
  • the etching resist layer 15 still present in the second partial area also forms part of the decorative layer 7.
  • the application of the decorative layer 7 in the first partial area can also be omitted, so that in the first partial area the metal layer 5 is present without a coating and in the second partial area with the applied etching resist layer 15.
  • the metal layer 5 can be colored using a colored etching resist layer 15 only in the second partial area and in the first partial area the metal layer 5 is in exact register with the first decorative layer, but is not colored on the side facing away from the first decorative layer and, in the case of aluminum, is shiny silver and reflective.
  • the decorative layer 7 is exposed, developed and partially removed in the first partial area.
  • Multilayer body 400 shown in Figure 4c The multilayer body 400 is formed in the production stage 400c of the multilayer body 400 shown in FIG. 1 by applying a leveling layer 10 to the exposed second decorative layer 7 arranged in the first zone 8 and to the replication layer 4 arranged in the second zone 9 and exposed by removing the metal layer 5 and the first 6 and second resist layers.
  • the leveling layer 10 is applied over the entire surface here.
  • the leveling layer 10 can be implemented in one or more layers. It is possible that an adhesion-promoting layer (adhesive layer) (not shown here) is applied to the side of the leveling layer 10 facing away from the carrier layer, which can also be multi-layered.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Laminated Bodies (AREA)
  • Credit Cards Or The Like (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
EP14733628.3A 2013-06-28 2014-06-26 Verfahren zur herstellung eines mehrschichtkörpers Active EP3013598B2 (de)

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RS20170445A RS55994B1 (sr) 2013-06-28 2014-06-26 Postupak za izradu višeslojnog tela kao i višeslojno telo
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DE102013106827.8A DE102013106827A1 (de) 2013-06-28 2013-06-28 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper
PCT/EP2014/063623 WO2014207165A1 (de) 2013-06-28 2014-06-26 Verfahren zur herstellung eines mehrschichtkörpers sowie mehrschichtkörper

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KR102488710B1 (ko) * 2017-08-23 2023-01-13 도판 인사츠 가부시키가이샤 적층체, 신분증명서, 및, 신분증명서의 검증 방법
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RU208267U1 (ru) * 2021-07-01 2021-12-13 Олег Умарович Айбазов Банковская карта
KR20240152358A (ko) * 2022-03-23 2024-10-21 도판 홀딩스 가부시키가이샤 화장 시트의 제조 방법 및 화장 시트
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PL3013598T3 (pl) 2017-08-31
MX346389B (es) 2017-03-17
JP2019073019A (ja) 2019-05-16
US10029505B2 (en) 2018-07-24
RU2016102641A3 (enrdf_load_stackoverflow) 2018-05-29
WO2014207165A1 (de) 2014-12-31
HRP20170741T1 (hr) 2017-07-28
JP6478230B2 (ja) 2019-03-06
RU2664356C2 (ru) 2018-08-16
AU2014301007A1 (en) 2016-01-28
CA2926821C (en) 2022-05-17
BR112015032480B1 (pt) 2021-12-21
US10926571B2 (en) 2021-02-23
HUE034529T2 (en) 2018-02-28
MX2015017592A (es) 2016-04-07
CN105431302A (zh) 2016-03-23
BR112015032480A2 (pt) 2017-07-25
EP3013598B1 (de) 2017-03-01
RU2016102641A (ru) 2017-08-03
RS55994B1 (sr) 2017-09-29
DE102013106827A1 (de) 2014-12-31
JP2016533921A (ja) 2016-11-04
US20180304667A1 (en) 2018-10-25
AU2014301007B2 (en) 2017-11-30
CN105431302B (zh) 2017-08-08
ES2625750T3 (es) 2017-07-20
CA2926821A1 (en) 2014-12-31
US20160185150A1 (en) 2016-06-30
EP3013598A1 (de) 2016-05-04

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