EP2917947A1 - Neuartiges verfahren zur herstellung organischer elektronischer vorrichtungen - Google Patents
Neuartiges verfahren zur herstellung organischer elektronischer vorrichtungenInfo
- Publication number
- EP2917947A1 EP2917947A1 EP13792767.9A EP13792767A EP2917947A1 EP 2917947 A1 EP2917947 A1 EP 2917947A1 EP 13792767 A EP13792767 A EP 13792767A EP 2917947 A1 EP2917947 A1 EP 2917947A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- deposition
- layer
- equal
- formula
- carried out
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 46
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- -1 -OH Chemical group 0.000 claims description 12
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- 125000003118 aryl group Chemical group 0.000 claims description 10
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 9
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 238000000137 annealing Methods 0.000 claims description 7
- 125000001072 heteroaryl group Chemical group 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000004528 spin coating Methods 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 238000010494 dissociation reaction Methods 0.000 claims description 5
- 230000005593 dissociations Effects 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 238000007738 vacuum evaporation Methods 0.000 claims description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229910003437 indium oxide Inorganic materials 0.000 claims description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 238000000469 dry deposition Methods 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- RICKKZXCGCSLIU-UHFFFAOYSA-N 2-[2-[carboxymethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]ethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]acetic acid Chemical compound CC1=NC=C(CO)C(CN(CCN(CC(O)=O)CC=2C(=C(C)N=CC=2CO)O)CC(O)=O)=C1O RICKKZXCGCSLIU-UHFFFAOYSA-N 0.000 claims description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052772 Samarium Inorganic materials 0.000 claims description 2
- 125000004541 benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 230000005669 field effect Effects 0.000 claims description 2
- 125000002541 furyl group Chemical group 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000002883 imidazolyl group Chemical group 0.000 claims description 2
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 125000001624 naphthyl group Chemical group 0.000 claims description 2
- 125000002971 oxazolyl group Chemical group 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 125000003226 pyrazolyl group Chemical group 0.000 claims description 2
- 125000005412 pyrazyl group Chemical group 0.000 claims description 2
- 125000005495 pyridazyl group Chemical group 0.000 claims description 2
- 125000004076 pyridyl group Chemical group 0.000 claims description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 claims description 2
- 125000000168 pyrrolyl group Chemical group 0.000 claims description 2
- 125000005493 quinolyl group Chemical group 0.000 claims description 2
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 claims description 2
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims description 2
- 125000001544 thienyl group Chemical group 0.000 claims description 2
- 239000010408 film Substances 0.000 description 15
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
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- 238000005286 illumination Methods 0.000 description 6
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- 230000003287 optical effect Effects 0.000 description 6
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- YOLLTWVIOASMFW-UHFFFAOYSA-N 1,5-diphenylpentane-1,5-dione Chemical compound C=1C=CC=CC=1C(=O)CCCC(=O)C1=CC=CC=C1 YOLLTWVIOASMFW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000003480 eluent Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
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- 239000000463 material Substances 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- IUFDZNVMARBLOJ-UHFFFAOYSA-K aluminum;quinoline-2-carboxylate Chemical compound [Al+3].C1=CC=CC2=NC(C(=O)[O-])=CC=C21.C1=CC=CC2=NC(C(=O)[O-])=CC=C21.C1=CC=CC2=NC(C(=O)[O-])=CC=C21 IUFDZNVMARBLOJ-UHFFFAOYSA-K 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical group [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- YVOFTMXWTWHRBH-UHFFFAOYSA-N pentanedioyl dichloride Chemical compound ClC(=O)CCCC(Cl)=O YVOFTMXWTWHRBH-UHFFFAOYSA-N 0.000 description 1
- 150000002979 perylenes Chemical class 0.000 description 1
- CYQAYERJWZKYML-UHFFFAOYSA-N phosphorus pentasulfide Chemical compound S1P(S2)(=S)SP3(=S)SP1(=S)SP2(=S)S3 CYQAYERJWZKYML-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings
- C07D407/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/811—Controlling the atmosphere during processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/653—Aromatic compounds comprising a hetero atom comprising only oxygen as heteroatom
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a method for manufacturing organic electronic devices comprising a film based on dipyranylidenes of formula (I) as anodic interfacial layer, and to the organic devices obtained according to this process, and more particularly to organic solar cells (OSC). manufactured according to this process.
- OSC organic solar cells
- One of the main optimization methods consists in using at the anode of the photovoltaic system a conducting polymer such as poly (3,4-ethylenedioxythiophene) -poly (styrenesulphonate) (PEDOT: PSS), the latter being inserted between an electrode of tin-doped indium oxide (ITO) and a photosensitive active layer (Crispin et al., Journal of Polymer Science: Part B: Polymer Physics, Vol 41, 2561-2583 (2003)).
- the substrates coated with PEDOT: PSS are optically anisotropic and have little visible absorption; the conductivity of PEDOT: PSS-coated substrates prepared using commercial solutions is generally between 1 and 50 cm -1 .
- PEDOT PSS-based devices are still the subject of many works (Groenendaal et al., Adv., Mater., 2000, 12, No. 7) relating to:
- the anodic interfacial layers used in electronic devices must have:
- Output work means the minimum energy, measured in electron volts (eV), needed to pull an electron from the Fermi level of a metal to a point at infinity outside the metal.
- the photoelectric effect consists of a release of an electron when a photon with energy higher than the output work arrives on the metal. The difference between the incident photon energy and the output work is provided to the electron as kinetic energy.
- the photoelectric output work is calculated according to the formula:
- h is the constant of Pîanck and f 0 is the minimum frequency of the photon from which the photoelectric emission occurs.
- the output work of the electrodes plays a crucial role in the field of plastic electronics because it influences the distribution of the internal electric field and the height of the energy barrier between the electrode and the photosensitive active layer of the device. .
- This barrier greatly influences the injection of charge carriers, especially in the case of organic light-emitting diodes (OLEDs), or on the contrary, dominates the collection of charges from the active layer to the electrode, as for example in the case of CSOs .
- materials having high output work are preferred as the anode.
- the most commonly used devices are devices based on PEDOT: PSS.
- the PEDOT: PSS when it is used as interfacial layer on ITO electrodes, the PEDOT: PSS must be applied in the form of a thin film having a thickness of less than one hundred nanometers, in order to guarantee a high optical transmission; In this case, the PEDOT film: PSS has a low conductivity. Surface defects and holes may also appear on the surface of the PEDOT: PSS film when the applied polymer layers are too thin.
- z ' between 150 and 200 nm thick
- PEDOT PSS-based systems also have other disadvantages:
- the interface between the films of PEDOT: PSS and the ITO-based electrodes is unstable, the indium atoms diffusing into the polymer layer and impairing its performance, the electrical contact between the films of PEDOT: PSS and the ITO-based electrodes is weak, the polymer layer does not reach many electronically active sites on the surface of the ITO electrode, which increases series resistances and greatly reduces the collection of holes at the electrode,
- the conductivity and the roughness of the PEDOT: PSS layers are dependent on the conditions of application, and in particular on the moisture content and the annealing temperatures.
- the first object of the present invention therefore relates to a method of manufacturing an organic electronic device implemented in the absence of any exposure to air, and comprising at least the following steps:
- Xa and Xb which are identical or different, are chosen from N, P, O, S, Se or Te, Ri, R 2 , R 3 and R 4, which may be identical or different, represent a group chosen from aryl or heteroaryl rings; having 4 to 10 carbon atoms, said aryl or heteroaryl rings being optionally substituted by one or more halogen atoms, -OH, -CN, -NO 2 , alkyl groups having 1 to 30 carbon atoms, alkoxy -OCN or ester -C (O) OC n H2 n + 1, wherein 0 ⁇ n 16,
- step (iii) optionally, the annealing under an inert atmosphere of the photosensitive active layer deposited during step (ii),
- All the steps of the process are carried out under vacuum or inert atmosphere, so that the organic electronic device is never exposed to air during its manufacture.
- steps are carried out under an inert atmosphere, they are preferably carried out under an inert atmosphere of nitrogen or argon.
- the film comprising a compound of formula (I) in combination with a conductive intermediate layer can also act alone as a conductive electrode, without it being necessary to apply it on a substratum driver such as ⁇ .
- This improvement makes it possible in particular to manufacture ITO-free devices (ITO-free devices).
- Alkoxy an O-alkyl group in which the alkyl group is a saturated, linear or branched, saturated hydrocarbon aliphatic group;
- Halogen atom an atom of bromine, chlorine, iodine or fluorine; the bromine, chlorine and fluoro designations being preferred;
- Aryl group denotes any functional group or substituent derived from at least one aromatic ring; an aromatic ring corresponds to any planar mono- or polycyclic group comprising a delocalized ⁇ system in which each atom of the cycle comprises an orbital p, said orbital p overlapping each other;
- Heteroaryl group denotes any functional group or substituent derived from at least one aromatic ring as defined above and containing at least one heteroatom chosen from N, P, O and S.
- the compound of formula (I) of the invention is preferably present in the film in the form of particles having an average diameter less than or equal to 300 nm, preferably less than or equal to 250 nm, and even more preferably less than or equal to 200 nm.
- the aryl or heteroaryl rings R 1, R 2, R 3 and R 6 of the compound of formula (I) are preferably chosen from phenyl, naphthyl, anthracyl, benzoxazolyl, thiophenyl or alkoxy-thiophenyl, furyl, pyrrolyl and pyridyl rings.
- the film of step (i) may also comprise other constituents, and more particularly electron acceptor molecules leading to the formation of charge transfer complexes, such as the 7,7,8,8-tetracyana-p-quinodimethane (TCNQ) or tetrafluoro-7,7,8,8-tetracyana- ⁇ -quinodimethane (F 4 TCNQ).
- TCNQ 7,7,8,8-tetracyana-p-quinodimethane
- F 4 TCNQ tetrafluoro-7,7,8,8-tetracyana- ⁇ -quinodimethane
- These electron acceptor molecules are introduced in a small amount relative to the compound of formula (I).
- the ratio by electron acceptor molecule / compounds of formula (I) is between 1/99 and 5/95. And they act as doping agents by increasing the intrinsic conduction properties of the holes of the compound of formula (I),
- the film comprising at least one compound of formula (I) deposited during step (i) has a thickness less than 45 nm, preferably less than or equal to 30 nm, and even more preferably lower or equal to 15 nm.
- step (i) makes it possible to sublimate the compound of formula (I). It can be carried out by chemical vapor deposition CVD, this technique consisting in adding a metal precursor to a source of liquid carbon (such as toluene, benzene or cyclohexane), the solution then being converted into fine droplets, transported by an inert gas to an oven.
- a metal precursor such as toluene, benzene or cyclohexane
- the compound of formula (I) is placed in the form of powder in a crucible, then covered with alumina, and then heated under vacuum until the compound of formula (I) passes from the state solid in the liquid state (sublimation).
- Step (i) is carried out at an evaporation rate of less than 1 ⁇ / s, preferably less than or equal to 0.4 ⁇ / s, and even more preferably less than or equal to 0.1 ⁇ / s.
- the substrate of step (i) may be an insulating or conductive substrate.
- This substrate can be rigid or flexible.
- an insulating substrate it is preferably chosen from glass or polymers such as polyethylene terephthalate (PET), amorphous polyethylene (amorphous PE) and amorphous polystyrene (amorphous PS).
- a conductive substrate it is preferably chosen from metal oxides such as aluminum oxide, indium oxide, tin oxide, iridium oxide, silicon oxide, iron oxide and copper oxide, and even more preferably tin-doped indium oxide (ITO).
- ITO tin-doped indium oxide
- the distance between the source of the compound of formula (I) and the substrate during step (i) is between 10 and 40 cm, and preferably between 25 and 35 cm.
- the method of the invention may comprise between steps (i) and (ii) the deposition of a conductive intermediate layer, said layer being preferably a layer of PEDOT: PSS.
- This step is performed in a glove box under inert atmosphere.
- the deposition of the conductive intermediate layer is performed by spin coating ("spin coating").
- the deposition of a photosensitive active layer during step (ii) is carried out in a glove box placed under an inert atmosphere of nitrogen or argon.
- Said deposit is preferably made by spin coating (or “spin-coating").
- the photosensitive active layer of step (ii) is a layer consisting of at least two highly absorbing materials in the visible, one being electron donor and the other electron acceptor, this layer undergoing a high-speed charge transfer and creating positive charges (holes) and negative charges (electrons) under the effect of a light irradiation.
- This photosensitive active layer may be the combination of phthalocyanine derivatives, pentacene, thiophene, triphenylamine, p-type polymers, with molecules such as fullerene derivatives or perylenes, the mixture P 3 HT: PCBM being the preferred association.
- the active photosensitive layer deposited during step (ii) may also be coated with an exciton active dissociation layer (or EBL for Exciton Blocking Layer), which may be based on lithium fluoride (LiF) in OSC devices. or alumina based in OLED or PLED devices.
- the exciton active dissociation layer has a thickness of less than 10 ⁇ , preferably less than 8 ⁇ , and even more preferably of between 5 and 7 ⁇ .
- the optional annealing step (iii) under an inert atmosphere is advantageously carried out in a tubular furnace, at a temperature of between 30 and 150 ° C., preferably between 80 and 150 ° C., and even more preferably close to 120 ° C. C, for a period of between 1 minute and 24 hours, preferably between 5 to 20 minutes, and even more preferably for approximately 10 minutes.
- the step (iv) of deposition under an inert atmosphere of an exciton active dissociation layer may be a dry deposition carried out under an inert atmosphere, for example by chemical vapor deposition CVD, this deposition being preferably carried out at a temperature of 30.degree. evaporation rate less than 1 ⁇ / s, more preferably less than or equal to 0.4 ⁇ / s, and even more preferably less than or equal to 0.1 ⁇ / s.
- the dry deposition of step (iv) can be carried out at an annealing temperature of between 80 and 120 ° C and a pressure of between 10 ' and 10 ' mbar for a period of between 2 and 4 hours.
- step (v) is carried out in an ultrahigh vacuum chamber.
- This step (v) can be carried out dry at an evaporation rate of less than or equal to 3 ⁇ / s, and preferably of between 0.1 and 2 ⁇ / s,
- the layer of step (v) serving as a cathode electrode is based on aluminum, gold, calcium, copper, samarium, platinum, palladium, chromium, cobalt or aluminum. iridium.
- the substrate is made of glass, plastic or ITO-based, and the photosensitive active layer is based on P 3 HT: PCBM.
- OLEDs organic light-emitting diodes
- PLEDs polymeric light-emitting diodes
- OFET organic field-effect transistors
- OSC organic solar cells
- the invention particularly relates to an organic solar cell
- (OSC) obtained according to the process of the invention, wherein the substrate is based on polymer or oxide, and in the latter case preferably based on ITO.
- the compounds of formula (I) can be synthesized according to methods known to those skilled in the art, such as those described by Sandman et al., J. Chem. Soc. Chem. Commun., 1977, 687, 177-178, and Otsubo et al, J. Chem. Soc. Perkin Trans., 1993,
- FIG. 2 represents the EQE spectrum of the device of the invention (curve having a maximum of 80% for a wavelength of approximately 530 nm) and the absorption spectrum of the ITO / DIPO- 4 / PEDOT device: PSS / P 3 HT: PCBM, and
- Figure 3 shows AFM microscopy images (2D and 3D) of the anode layer of an OSC device according to the invention.
- a film-coated substrate comprising bis-4,4 '- (2,6-diphenyl-pyranylidene) ( ⁇ - ⁇ ) as a compound of formula (I) was prepared according to the procedure described hereinafter .
- Step 2 Synthesis of diphenyl-2,6-pyrylium perchlorate
- the 1,5-diphenyl-1,5-pentadione prepared in step 1 (10 mmol, 2.52 g) is mixed with phosphorus pentasulfide (15 mmol, 3.34 g), acetic acid (60 ml) and FeCl 3 (60 mmol, 6.40 g) and then refluxed for 3 hours.
- the solution then becomes orange and a white precipitate is formed.
- the precipitate is removed by sinter filtration and then washed with hot acetic acid.
- the solution is concentrated on a rotary evaporator and recrystallized by addition of ether (500 ml).
- the precipitate obtained is filtered on sintered and then dried on a rotary evaporator.
- the product obtained is a solid red mass of 850 mg.
- the yield of the reaction is 24%.
- Step 3 Synthesis of bis-4,4 '- (2,6-diphenyl-pyrannylidene) (DIPO- 4 )
- the diphenyl-2,6-pyrylium perchlorate solution (10 mmol, 3.50 g) is solubilized in 200 ml of distilled acetonitrile and the mixture is refluxed for 2 hours under inert atmosphere.
- Zinc powder (30 mmol, 1.96 g) is added in small portions, and the mixture is refluxed for 24 hours.
- the solution is filtered, rinsed with toluene and evaporated on a rotary evaporator.
- a black oil is obtained which is recrystallized from hexane / ethanol 1: 1.
- TLC eluent: petroleum ether / ethyl acetate 8: 2
- a black solid of mass 650 mg is obtained.
- the yield of the reaction is 13%.
- a l st step that aims to prepare an ITO substrate of 10 mm wide and 25 mm long, to avoid short-circuit phenomenon.
- An ITO electrode on a glass support is dipped with a solution of FeCl 3 + HCl heated at 50 ° C for 2 minutes, rinsed successively in different solvent baths: ethyl acetate, Decon (5% aqueous solution) , ethanol and acetone, then stripped in a UV-ozone chamber by forced oxidation.
- the distance between the crucible (molybdenum crucible covered with alumina) containing DIPO-O 4 and the glass / ITO substrate is 35 cm.
- the molecule Aq3 is used as reference standard for the deposition of all organic molecules.
- the frequency of the quartz crystal of 6.01 MHz is the nominal working frequency.
- the thicknesses obtained by this method are of the order of 120 ⁇ 10 nm.
- a fifth step during which the glass / ITO / DIPO-PIEDOT: PSS / P 3 HT: PCBM device is then transferred to a UHV (Ultra High Vacuum) chamber where a lithium fluoride LiF (Sigma) deposit is successively made.
- UHV Ultra High Vacuum
- a lithium fluoride LiF (Sigma) deposit is successively made.
- - Aldrich by thermal evaporation under a stable evaporation regime of 0.01 ⁇ / s, until a layer with a thickness of 0.5 nm is obtained, then an aluminum deposit by thermal evaporation under a regime stable evaporation rate of 0.4 ⁇ / s and a pressure of 10 " mbar until an aluminum layer thickness of 80 nm.
- a deposit of silver lacquer (area ⁇ 1 x 1 mm 2 ) is made using a thin object (needle tip) on the aluminum layer to allow a good electrical contact of the aluminum electrode. Once deposited, the lacquer is dried at room temperature for 45 minutes.
- the current-voltage characteristics of the devices in the dark and under illumination are measured under an inert nitrogen atmosphere using a Keithley 2406 current meter and a micro-tip station.
- the characteristics in the dark are determined by placing a black veil on the devices to avoid the influence of diffuse light.
- the current-voltage characteristics of devices under illumination are measured on an optical bench equipped with:
- a xenon lamp (Oriel, 150 W) simulating the solar spectrum and delivering a power of 75 or 100 mW.cm '2 at the OSC devices,
- the solar simulator is calibrated so as to restore the solar nominal power as the international conventions have fixed for this type of device (75 or 100 mW / cra 2 ).
- the measurements can be performed under white light or under mono-chromatic light. Under white light the component is contacted using the micro-peak station and is illuminated using the solar simulator.
- the electrical measuring apparatus (Keithley 2406) records in zero or variable field the current extracted from the OSC device of the invention. This measurement makes it possible to determine the external conversion efficiency PCE of the device (PCE for Power Conversion Efficiency).
- the OSC device of the invention has better performances than those obtained with the devices described in Application WO 2011/045478, and in particular:
- FIG. 3 shows AFM microscopy images (2D and 3D) which reveal a needle nanostructuration of the anode layer of the OSC device of the invention.
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FR1260589A FR2997793B1 (fr) | 2012-11-08 | 2012-11-08 | Nouveau procede de fabrication de dispositifs electroniques organiques |
PCT/IB2013/060000 WO2014072944A1 (fr) | 2012-11-08 | 2013-11-08 | Nouveau procédé de fabrication de dispositifs électroniques organiques |
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EP (1) | EP2917947A1 (de) |
JP (1) | JP2016503581A (de) |
CN (1) | CN104769734A (de) |
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DE102019114456B4 (de) * | 2019-05-29 | 2024-07-04 | Senorics Gmbh | Bispyranilidene, Dithiobispyranilidene und Diselenobispyranilidene und deren Verwendung |
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JPH0462979A (ja) * | 1990-07-02 | 1992-02-27 | Matsushita Electric Ind Co Ltd | 水素化アモルファスシリコンを用いた電気素子 |
GB9808061D0 (en) * | 1998-04-16 | 1998-06-17 | Cambridge Display Tech Ltd | Polymer devices |
JP4589346B2 (ja) * | 1999-07-14 | 2010-12-01 | 三星モバイルディスプレイ株式會社 | 有機エレクトロルミネッセンス素子及びパネルの製造方法と製造装置 |
JP2004165516A (ja) * | 2002-11-14 | 2004-06-10 | Matsushita Electric Works Ltd | 有機太陽電池 |
US20060211272A1 (en) * | 2005-03-17 | 2006-09-21 | The Regents Of The University Of California | Architecture for high efficiency polymer photovoltaic cells using an optical spacer |
JP2007039785A (ja) * | 2005-07-04 | 2007-02-15 | Seiko Epson Corp | 真空蒸着装置及び電気光学装置の製造方法 |
JP2007275697A (ja) * | 2006-04-03 | 2007-10-25 | Seiko Epson Corp | スピンコート装置およびスピンコート方法 |
KR101312269B1 (ko) * | 2007-01-05 | 2013-09-25 | 삼성전자주식회사 | 고분자 태양전지 및 그의 제조방법 |
EP2200103A1 (de) * | 2008-12-18 | 2010-06-23 | Universiteit Hasselt | Verfahren zum Steuern des Gehalts kristalliner Nanofasern von organischen Schichten, die in organischen elektronischen Vorrichtungen verwendet werden |
JP5444743B2 (ja) * | 2009-02-03 | 2014-03-19 | コニカミノルタ株式会社 | 有機光電変換素子 |
WO2011045478A1 (fr) | 2009-10-13 | 2011-04-21 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Derives de type dipyrannylidene comme couche interfaciale anodique dans des dispositifs electroniques |
US8383931B2 (en) * | 2009-10-13 | 2013-02-26 | Commissariat A L'energie Atomique | Derivatives or dipyrannylidene type as anode interface layer in electronic devices |
JP2011114004A (ja) * | 2009-11-24 | 2011-06-09 | Panasonic Electric Works Co Ltd | 有機太陽電池 |
CN101740727B (zh) * | 2009-12-24 | 2012-01-04 | 彩虹集团公司 | 一种oled显示器件的制备方法 |
JP5805394B2 (ja) * | 2011-01-04 | 2015-11-04 | 公立大学法人 滋賀県立大学 | 有機薄膜太陽電池の製造方法 |
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2012
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2013
- 2013-11-08 WO PCT/IB2013/060000 patent/WO2014072944A1/fr active Application Filing
- 2013-11-08 US US14/441,640 patent/US9793480B2/en not_active Expired - Fee Related
- 2013-11-08 JP JP2015541282A patent/JP2016503581A/ja not_active Ceased
- 2013-11-08 EP EP13792767.9A patent/EP2917947A1/de not_active Withdrawn
- 2013-11-08 CN CN201380058401.6A patent/CN104769734A/zh active Pending
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WO2014072944A1 (fr) | 2014-05-15 |
JP2016503581A (ja) | 2016-02-04 |
US20150280125A1 (en) | 2015-10-01 |
FR2997793A1 (fr) | 2014-05-09 |
CN104769734A (zh) | 2015-07-08 |
US9793480B2 (en) | 2017-10-17 |
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