Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q25/00—Antennas or antenna systems providing at least two radiating patterns
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q3/00—Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system
  • H01Q3/26—Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system varying the relative phase or relative amplitude of energisation between two or more active radiating elements; varying the distribution of energy across a radiating aperture
  • H01Q3/2664—Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system varying the relative phase or relative amplitude of energisation between two or more active radiating elements; varying the distribution of energy across a radiating aperture electrically moving the phase centre of a radiating element in the focal plane of a focussing device
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q13/00—Waveguide horns or mouths; Slot antennas; Leaky-waveguide antennas; Equivalent structures causing radiation along the transmission path of a guided wave
  • H01Q13/02—Waveguide horns
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q19/00—Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic
  • H01Q19/10—Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic using reflecting surfaces
  • H01Q19/12—Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic using reflecting surfaces wherein the surfaces are concave
  • H01Q19/13—Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic using reflecting surfaces wherein the surfaces are concave the primary radiating source being a single radiating element, e.g. a dipole, a slot, a waveguide termination
  • H01Q19/138—Parallel-plate feeds, e.g. pill-box, cheese aerials
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q19/00—Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic
  • H01Q19/10—Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic using reflecting surfaces
  • H01Q19/18—Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic using reflecting surfaces having two or more spaced reflecting surfaces
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q21/00—Antenna arrays or systems
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q21/00—Antenna arrays or systems
  • H01Q21/0006—Particular feeding systems
  • H01Q21/0031—Parallel-plate fed arrays; Lens-fed arrays
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01Q—ANTENNAS, i.e. RADIO AERIALS
  • H01Q3/00—Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system
  • H01Q3/26—Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system varying the relative phase or relative amplitude of energisation between two or more active radiating elements; varying the distribution of energy across a radiating aperture

Definitions

• Multi-beam two-dimensional trainer, antenna comprising such a multi-beam trainer and satellite telecommunication system comprising such an antenna
• the present invention relates to a two-dimensional multi-beam trainer, an antenna comprising such a multi-beam trainer and a satellite telecommunication system comprising such an antenna. It applies in particular to the field of satellite telecommunications.
• a first beam-forming antenna architecture called a reflector antenna with a focal network, consists in using a source network associated with a reflector, for example a parabolic one, the source network, called the focal grating, being placed in a plane focal located at the focus of the reflector.
• the reflector reflects a received incident plane wave and focuses it in the focal plane of the reflector on the focal grating. According to the direction of arrival of the plane wave incident on the reflector, its focusing by the reflector is performed at different points of the focal plane.
• the reflector thus makes it possible to concentrate the energy of the incident signals received on a reduced area of the focal network, this area depending on the direction of arrival of the incident signal.
• the synthesis of a beam corresponding to a particular direction can therefore be made from a reduced number of preselected sources of the focal network, typically of the order of seven sources for a focal network comprising, for example, the order of two hundred sources.
• the sources selected for the synthesis of a beam are different from one beam to another and selected according to the direction of arrival of the signals incident on the reflector.
• a beamformer For the synthesis of a beam, a beamformer combines all the focused signals on the selected sources dedicated to that beam. As the number of sources dedicated to a beam is small, this type of antenna has the advantage of operating with a beamformer of reduced complexity and not posing any major problem for its realization even when the number of beams increases significantly, by example for 400 beams.
• a second beam-forming antenna architecture called a phased array antenna, consists of using a network of direct-radiating sources in which all the sources participate in the synthesis of each of the beams. synthesis of each beam being carried out by a beamformer by applying a phase shift matrix at the output of the array of radiating sources so as to compensate for the radiation delay of the sources relative to each other for each direction of radiation of the grating network. radiant sources. As a result, all the beams are formed by all the sources, only the delay law applied to each source changes from one beam to another beam.
• This architecture has the advantage of a lower sensitivity of the antenna in case of loss of sources and reduces the number of amplification chains by a factor of two but has the disadvantage of a beamformer very complex to realize, or even unachievable now when the number of beams to be synthesized is very important.
• the beamformer must combine the 300 microwave signals at the output of each source.
• this combination must be performed 100 times. Matrices corresponding phase shift are therefore very bulky and can not be performed with microwave circuits. Therefore, this type of antenna currently exists only for a limited number of beams and sources, such as for example 6 beams and 64 sources.
• microwave signals are converted at each source into digital signals before being input to the digital beamformer.
• this solution requires the implementation of frequency transposition devices and analog / digital converters at each source, which increases the complexity, mass, volume and consumption of the antenna and is not acceptable for a use in the field of multimedia telecommunications.
• a third multibeam antenna architecture consists in using a phased array comprising small sources magnified by an optical system comprising one or more reflectors.
• This architecture can be called imager network antenna, since the focal network generally retains the same characteristics as a phased array with direct radiation, the synthesis of a spot being performed by almost all sources.
• a first imaging network antenna configuration has two parabolic reflectors, main and secondary, having the same focus and a phased array.
• the main parabolic reflector is large, the secondary parabolic reflector is smaller, the phased array placed in front of the secondary reflector has smaller sources.
• the behavior of this antenna is similar to that of the direct-radiation phased array antenna, but has the advantage of increasing the size of the radiating aperture of the antenna relative to a direct-radiation phased array antenna, with a magnification factor defined by the ratio of the diameters of the two reflectors, which makes it possible to reduce the size of the sources of the phased network and therefore the size of the beams.
• Its main disadvantage lies in the complexity of the beamformer associated with the phased array because, as in the case of the phased array antenna with direct radiation, all the sources participate in the contribution of all the beams.
• a second imaging network antenna configuration has a single parabolic reflector and a defocused phased array placed in front of the reflector.
• This configuration has a magnification factor of the radiating aperture of the antenna relative to a phased array antenna with direct radiation, equal to the ratio between the focal length of the parabolic reflector and the distance at which the grating has been defocused.
• most of the sources participate in an identical manner to the contribution of all the beams, but the operation of the phased array is a little different from that of a phased array with direct radiation, or that of the associated phased array.
• the defocused network associated with a single reflector imaging array antenna pattern emits a spherical wave, which is converted into a plane wave by the main reflector.
• the two imaging array antenna configurations have two major drawbacks. Due to the distance of the phased array from the focus of the reflector or reflectors, they induce aberrations. Indeed, the phase distribution on the radiating aperture associated with the main reflector is affected by a phase spatial distortion which is all the more important that the signal beam is detuned. These phase distortions result in a degradation of the radiated beam and must be compensated for by a modification of the power supply law of the phased array.
• the two imaging array antenna configurations also have a second drawback resulting from the variation of the size of the radiating aperture as a function of the misalignment of the beam and due to the fact that the intercept surface of a beam emitted by the phased array varies depending on the misalignment angle. To get an opening radiating identical size, it is then necessary to adjust the size of the phased array according to the misalignment angle.
• an orthogonal beamformer developed for a direct-radiation phased array is not optimal if it is used for imaging array antennas.
• the beamformer must be designed in conjunction with the optical system of the antenna, ie with the reflector (s), which is impossible with existing beamformers for which the beamformer is designed independently reflectors of the antenna.
• a fourth beamforming antenna architecture includes a quasi-optical beamformer in which a signal from a set of input ports is guided between two parallel metal plates to an output port. The propagation of the transmitted signal is interrupted by a reflecting wall which reflects it and focuses it on the output port.
• the input and output ports are situated in the same propagation medium defined between two parallel plates, the propagation medium possibly comprising a dielectric.
• the input and output ports are distributed along two distinct orthogonal axes and the reflector wall is illuminated with an offset angle so that it transmits the entire signal from the input ports to one or more , exit port.
• the input and output ports are located in two different superimposed propagation media, each propagation medium being defined between two parallel metal plates.
• the two substrate layers constituting the two propagation media are coupled by an internal reflecting wall extending transversely to the plane of the layers.
• the first substrate layer for example the lower layer, comprises at least one microwave energy source placed at the focus of the internal reflector.
• the output ports are located in the second layer of substrate.
• the document FR 2 944 153 describes arranging coupling slots extending along the inner reflector.
• the energy source placed at the focus of the internal reflector emits a guided cylindrical incident wave in the tri-plate propagation medium.
• the cylindrical incident wave is reflected by the internal reflector which transforms it into a plane wave.
• the reflected plane wave is then conveyed by waveguides to a network of radiating slots.
• the energy is then radiated by radiating slits in the form of a beam.
• the formation of the beam radiated by the antenna is achieved naturally by simply guiding the wave in the substrate layer, or in the two substrate layers, and via the quasi-optical transition means constituted by the internal reflector and possibly the coupling slots.
• the displacement of the source in the plane of the focus of the reflector generates wavefronts corresponding to given propagation directions.
• Scanning and misalignment of the beam in elevation, in a plane perpendicular to the plane of the antenna, is obtained by switching from different sources.
• the sources are located in the same plane, the misalignment of the beam can not be realized in all directions of space but only in one plane and no azimuth beam formation is possible.
• a first object of the invention is to provide a multi-beam formatter that does not have the drawbacks of existing beam formers, which is simple to implement, allowing the formation of a large number of thin beams with good beam coverage in a wide angular range and to ensure a misalignment of the beams in all directions of space.
• a second object of the invention is to provide a beamformer that can be designed and sized in association with reflectors of an antenna.
• a third object of the invention is to provide a multi-beam forming antenna and in particular an imaging array antenna comprising such a multi-beam trainer and wherein the phase aberrations are greatly reduced.
• the invention relates to a two-dimensional multi-beam trainer comprising a first beam forming stage intended to synthesize beams focused in a first direction X of the space and a second beam forming stage intended to focus the beams. beams formed by the first stage in a second direction Y of space, the two stages being connected to each other.
• Each floor has at least two flat multilayer structures superimposed one above the other.
• Each multi-layer structure of the first and second stages comprises an internal reflector extending transversely to the plane of the multi-layer structure, at least two first internal sources arranged in front of the internal reflector and respectively connected to two first input ports.
• the two second internal sources of the same multi-layer structure of the first beam-forming stage are respectively connected to two first internal sources of two different multi-layer structures of the second beam-forming stage via the input ports. / output, called link ports, to which are respectively connected the second and first internal sources.
• the first beam forming stage comprises Ny multilayer planar structures superimposed one above the other, each multi-layer structure of the first stage comprising Nx first internal sources arranged in front of the internal reflector of the multi structure. -layer matching and connected to Nx input / output ports aligned parallel to an axis V and Mx second sources arranged in the focal plane of the corresponding internal reflector and connected to Mx connecting ports aligned parallel to an axis U perpendicular to the axis V.
• the second beam forming stage comprises Mx multi-layer planar structures superimposed one above the other, each multi-layer structure of the second beam forming stage comprising Ny first internal sources arranged in front of the internal reflector of the corresponding multi-layer structure and connected to Ny link ports aligned parallel to a V axis and My second sources arranged in the focal plane of the corresponding internal reflector (16) and connected to My input / output ports aligned parallel to an axis U perpendicular to the axis V.
• the Ny multi-layer structures of the first stage comprise Ny * Mx respective connected connection ports Mx * Ny corresponding link ports of the Mx multi-layer structures of the second stage, Nx, Ny, Mx, My being integers greater than 1, the connection ports of the same multi-layer structure of the first stage of beam formation being respectively connected to different multi-layer structures of the second beam-forming stage.
• each link port of the N-th multilayer structure of the first beam-forming stage is connected to the N-th connection port of one of the corresponding multi-layer structures of the second beam-forming stage, Nk being a whole number. between 1 and Ny included.
• each multi-layer structure comprises an upper metal plane, a lower metal plane and a single substrate layer interposed between the upper metal plane and the lower metal plane, the internal reflector extends transversely in the substrate layer from the lower metal plane to the upper metal plane and the first and second internal sources of each multi-layer structure are disposed in the substrate and respectively connected to a first and a second input / output port, the first and second input / output ports being arranged in two orthogonal directions of the plane of the substrate layer.
• the first internal sources of each multi-layer structure are arranged in a first substrate layer sandwiched between an upper metal plane and an intermediate metal plane, the second sources are disposed in a second substrate layer interposed between the intermediate metal plane and a lower metal plane; the first and second substrate layers are coupled by the inner reflector extending from the lower metal plane to the upper metal plane and through an opening or coupling slots extending along the inner reflector and formed in the intermediate metal plane separating the two substrate layers; each multi-layer structure further comprises first waveguides disposed in the second substrate layer, each first waveguide having a first guide portion extending along a longitudinal axis of the multi-layer structure and connected to the second internal sources and a second angled guide portion extending perpendicular to the longitudinal axis and connected to a second input / output port.
• the second beam forming stage comprises Mx first multi-layer structures and at least Mx second multi-layer structures and each connecting port of the Nth multi-layer structure the first beam-forming stage is connected to the N-th connecting port of one of the corresponding first multi-layer structures of the second beam forming stage and the N-th connecting port of one of the second multi-layer structures of the second beam forming stage, Nk being an integer between 1 and Ny inclusive.
• the M ⁇ second multi-layer structures of the second beam-forming stage comprise first internal sources linearly offset with respect to the first internal sources of the first M ⁇ multi-layer structures. the second beam forming stage, the linear offset corresponding to a translation of all the first internal sources of the same distance T less than a distance between centers of two first consecutive internal sources.
• the Mx second multi-layer structures of the second beam-forming stage comprise an internal reflector having an orientation offset from the inner reflector of the first Mx multi-layer structures of the second beam-forming stage.
• the first beam-forming stage comprises Ny first and Ny second multi-layer structures and the first internal sources of the Ny second multi-layer structures are connected to the first sources. internally of the first Ny multilayer structures, the Ny second multilayer structures of the first beam forming stage comprising first internal sources linearly offset with respect to the first internal sources of the first Ny first multilayer structures of the first beam forming stage .
• the first stage of beam formation comprises Ny first and Ny second multi-layer structures and the first internal sources of Ny second multi-layer structures are connected to the first internal sources of the Ny first multi-layer structures, the Ny second multi structures first-stage beam-forming layers having an internal reflector having an offset orientation relative to the inner reflector of the first multilayer structures of the first beam forming stage.
• the single substrate layer or the first and second substrate layers of each multi-layer structure comprise a dielectric material.
• the dielectric material is a dielectric lens placed between the internal reflector and the first and second internal sources, the dielectric lens having a convex periphery surface and having inclusions of air holes, the inclusions of air holes having a density gradually increasing from the inner reflector to the first and the second internal sources.
• the single substrate layer or the first and second substrate layers of each multi-layer structure further comprise a first dielectric material having a first dielectric permittivity, the first dielectric material having inclusions of a second dielectric material having a second dielectric permittivity lower than the first dielectric permittivity, the inclusions having a density increasing from the internal reflector towards the first and the second internal sources.
• the first layer and the second substrate layer of each multi-layer structure comprises deformation means of the internal reflector.
• the invention also relates to a multi-beam antenna, comprising at least one such two-dimensional multi-beam formatter and a phased array consisting of a plurality of elementary radiating elements, each elementary radiating element being connected to an input port corresponding output of the first beam forming stage via a transmission chain and a microwave signal receiving chain.
• the antenna further comprises at least one main reflector, the phased array connected to the two-dimensional multi-beam formatter being placed in front of the main reflector in a defocused plane.
• the antenna further comprises at least one main reflector and one auxiliary reflector, the main reflector and the auxiliary reflector, having different sizes and having the same focal length F and in that the phased array connected to the Multi-beam two-dimensional formatter is placed in front of the auxiliary reflector.
• each microwave signal transmission and reception chain comprises a dynamic phase shifter.
• the invention also relates to a satellite telecommunication system comprising such an antenna.
• Other features and advantages of the invention will become clear in the following description given by way of purely illustrative and non-limiting example, with reference to the attached schematic drawings which represent:
• FIG. 1a a perspective diagram of an example of a two-dimensional BFN multi-beam formatter according to the invention
• FIG. 1b a diagram of an example of connections between the multi-beam formatter of FIG. 1a and a phased array, according to the invention
• FIG. 2a an exploded diagram, in perspective, of a first example of a multi-layer structure of a BFN wafer, according to the invention
• FIG. 2b an exploded schematic, in perspective, of a second example of multi-layer structure of a BFN wafer, according to the invention
• FIG. 2c an exploded diagram, in perspective, of an alternative embodiment of the first example of multi-layer structure of a BFN wafer, according to the invention
• FIG. 2d an exploded schematic, in perspective, of an alternative embodiment of the second exemplary multi-layer structure of a BFN wafer, according to the invention.
• FIG. 2e a schematic view from above of an example of a dielectric comprising inclusions of air holes, according to an alternative embodiment of the invention
• FIG. 3 a schematic cross-sectional example of a reflector comprising deformation means on its rear face
• FIGS. 4a and 4b two diagrams illustrating the connections between the BFN wafers of the two beam forming stages;
• FIGS. 5a, 5b, 5c three diagrams illustrating a second example of multi-beam former with two dimensions making it possible to improve the overlap between the spots in the first direction of space, according to the invention
• FIG. 6 is a diagram of a third example of a multi-beam former with two dimensions making it possible to improve the overlap between the spots in the second direction of space, according to the invention.
• FIG. 7a a diagram of a fourth example of a multi-beam former with two dimensions making it possible to improve the overlap between the spots in the first and in the second direction of the space, according to the invention
• Figure 7b an example illustrating the recovery of spots in the case of a hexagonal mesh
• FIG. 8a a diagram illustrating the operation of a first exemplary imaging array antenna comprising a multi-beam formatter, according to the invention
• FIGS. 8b and 8c two diagrams illustrating the operation of a second example of an imaging array antenna comprising a multi-beam formatter, according to the invention
• FIG. 8d a diagram illustrating an example of transmission and reception chains connected to a multibeam format and including dynamic phase shifters, according to the invention
• FIG. 9 is a diagram of a second exemplary embodiment of an imaging array antenna comprising a two-dimensional multibeam format according to the invention.
• the two-dimensional multi-beam formatter (Beam Forming Netwok) comprises a first beamforming stage capable, on transmission to form focused signal beams in a first dimension of the space, for example parallel to an X axis and a second beam forming stage connected to the first beam forming stage, the second beam forming stage being capable of at the emission, to focus the beams formed by the first beam forming stage, in a second dimension of the space, for example parallel to a Y axis.
• Beam Forming Netwok comprises a first beamforming stage capable, on transmission to form focused signal beams in a first dimension of the space, for example parallel to an X axis and a second beam forming stage connected to the first beam forming stage, the second beam forming stage being capable of at the emission, to focus the beams formed by the first beam forming stage, in a second dimension of the space, for example parallel to a Y axis.
• the X and Y axes are related to the radiating elements 30 of a phased array 41 to which the multi-beamformer is intended to be connected and may not be orthogonal.
• the orientation of these axes X and Y depends on the connections, partially shown in FIG. 1b, between the radiating elements of the phased array and the input / output ports 27 of the multi-beamformer to which these radiating elements 30 are intended to to be connected.
• the phased array comprises a mesh of rectangular shape, but the invention is not limited to this form of mesh and can also be applied to a phased array having, for example a mesh of hexagonal or square shape.
• the two beam forming stages comprise corresponding ports 25, 26 connected in pairs, called connection ports in the following description.
• Each beamforming stage has at least two plane beam forming structures, referred to as slices of BFN, P1 1 to P1 NY and P21 to P2Mx, where Ny and Mx are integers greater than one, the slices of BFN being stacked parallel to each other along an axis perpendicular to the plane U, V, respectively LT, V, of the planar structure.
• Each BFN P1 Nk slice of the first beamforming stage where Nk is an integer between 1 and Ny inclusive, has Nx input / output ports 27, where Nx is an integer greater than one, intended to be connected to Nx radiating elements 30 of a phased array 41 of a multi-beam antenna through transmission and reception chains for the transmission of signal beams synthesized by the multi-beam trainer to different zones of ground coverage and for receiving signal beams from different ground coverage areas.
• Each BFN P2Mi slice of the second beamforming stage, where Mi is an integer between 1 and Mx inclusive has My input / output ports 28, where My is an integer greater than one, destined for transmission, to be connected to a microwave signal supply and on reception, to receive the signals separated by the multi-beam trainer.
• the two-dimensional multi-beam formatter therefore has Nx * Ny input / output ports 27 intended to be connected to Nx * Ny radiating elements of an antenna and Mx * My input / output ports 28 intended to be connected to a supply of microwave signals and to form Mx * My spots on the ground.
• the input / output ports 27, 28 are waveguide accesses whereas in the case of an embodiment in integrated circuit technology, the input / output ports 27, 28 are connectors.
• the Ny slices of BFN of the first stage P1 1 to P1 NY and the Mx slices of BFN of the second stage P21 to P2Mx of the multibeam trainer have an identical structure and function in the same way but may have a number of input ports / output 27, 28 different and therefore a number of different transmit / receive channels.
• the two beam forming stages are arranged in two UV, LTV planes perpendicular to each other, but it is not essential.
• the beams of synthesized signals In order for the beams of synthesized signals to be transmitted by the beamformer to be focused according to the two dimensions X, Y of the space, it is however necessary to connect each connection port 25 of the same Nth BFN slice P1 Nk the first beam forming stage at an Nth corresponding link port 26 of one of the different BFN P21 to P2Mx slots of the second beam forming stage.
• FIG. 2a represents an exploded schematic, in perspective, of an exemplary BFN slice, according to a first embodiment of the invention.
• the BFN wafer comprises a multi-layer planar structure comprising two parallel metallic planes, respectively lower 14 and upper 10, and a substrate layer 9 interposed between the two lower and upper metal planes 14, 10.
• the two planes Metals and the substrate layer of the BFN wafer are parallel to a UV plane.
• the multi-layer structure thus formed forms a propagation medium in the so-called triplate configuration.
• the height of the slice of BFN is disposed along an axis W orthogonal to the UV plane.
• the substrate layer 9 comprises two networks of input / output ports 27, 25, depending on whether the BFN slot is used on transmission or on reception, arranged orthogonally along the V and U axes.
• the two networks of input / output ports respectively comprise four input / output ports 27 aligned in the direction V and two input / output ports 25 aligned in the direction U.
• the input ports / 25, 27 are coupled through an inner reflector 16 disposed transversely in the substrate layer 9, the inner reflector 16 extending from the lower metal plane 14 to the upper metal plane 10.
• Each input / output port 27, 25 is connected to a waveguide 20, 19 connected to an internal source 15, respectively 18.
• FIG. 2b represents an exploded schematic, in perspective, of an example of a slice of BFN, according to a second embodiment of the invention.
• the slice of BFN has a flat multi-layer structure of Pill-box type. It comprises three parallel metallic planes, respectively lower 14, intermediate 12 and upper 10, a first substrate layer 11 and a second substrate layer 13, each substrate layer 11, 13 being respectively interposed between two successive parallel metallic planes, the intermediate metal plane 12 separating the two substrate layers 1 1,
• the planes of the different layers of the BFN slice are parallel to a UV plane.
• the multi-layer structure thus formed forms two propagation media in the so-called tri-plate configuration, each tri-plate propagation medium comprising a substrate layer disposed between two metal planes.
• the height of the slice of BFN is disposed along an axis W orthogonal to the UV plane.
• the two substrate layers 1 1, 13 are coupled by an internal reflector 16 disposed transversely in the two substrate layers 1 1, 13 of the BFN wafer, the internal reflector 16 extending from the lower metal plane 14 to the upper metal plane 10, and via an opening or several coupling slots 17 extending along the inner reflector 16 and made in the intermediate metal plane 12 separating the two substrate layers 1 1, 13.
• the multi-layer structure comprises two networks of input / output ports, depending on whether the BFN slot is used at transmission or reception, arranged orthogonally along the axes U and V.
• the two networks of input / output ports respectively comprise four input / output ports 27 aligned in the direction V and two input / output ports 25 aligned in the direction
• Each input / output port 27, 25 is connected to a waveguide 20, 19 connected to an internal source 15, 18.
• the waveguides 19 of the second substrate layer 13 are preferably bent at 90.degree. °, so as to connect input / output sources 18 and input / output ports 25 arranged along orthogonal axes.
• Each slice of BFN can operate in transmission or reception.
• the input / output ports 27 are intended to receive an incident microwave signal and to retransmit it into the first tri-plate propagation medium of the BFN slot which combines the signals re-transmitted by all the first internal sources 15.
• the internal reflector 16 reflects the combined signal and focuses it in its focal plane on one of the second internal sources 18 of the BFN slot as a function of the arrival direction of the incident signal.
• an excitation signal is applied to one of the second internal sources 18 of the BFN wafer, then reflected on the internal reflector 16.
• the energy of the signal reflected by the internal reflector 16 is propagated in the tri-plate propagation medium then is distributed on all the first internal sources 15 of the BFN slice.
• the first internal sources 15 transmit this energy in the form of signal beams to the first input / output ports 27 to which they are respectively connected.
• the input / output ports 27 connected to the first internal sources 15 being arranged on the same line parallel to the direction V, the signal beams transmitted on each first input / output port 27 of the BFN wafer are focused according to a only dimension of the space, for example parallel to the Y direction, and form a line of ground cover areas called spots.
• the number of spots formed on the ground is equal to the number of input / output ports 25 placed in the focal plane of the internal reflector 16 of the BFN wafer.
• FIG. 2b four input / output ports 27 in the first substrate layer 11 and two input / output ports 25 in the second substrate layer 13 are shown, which makes it possible to develop two different beams corresponding to two different pointing directions and the formation of two ground spots.
• the substrate layer 9 or the first and second substrate layers 11, 13 of the BFN wafer may comprise a dielectric.
• the BFN slice can be made using PCB printed circuit board technology.
• the internal reflector 16 the transverse walls of the first internal sources 15, and if appropriate of the second internal sources 18, and the transverse walls of the waveguides 19, 20 are made by regular arrangements of metallized holes passing through the substrate layer or layers 9, 11, 13 and connecting the upper and lower metal plates 14, respectively the upper and intermediate plates 12 and / or the intermediate plates 12 and lower 14.
• SIW Substrate Integrated Waveguide
• laminate laminated
• the use of tri-plate dielectric propagation media provides a multi-beam trainer very compact and compact.
• the excitations of the input / output ports of the internal microwave sources are then realized by transitions.
• this technology induces propagation losses which must be compensated by amplifiers arranged upstream of the first internal sources of the BFN wafer.
• the substrate layer 9 or the first and second substrate layers 11, 13 of the BFN wafer may comprise a dielectric medium having a dielectric permittivity gradient, the dielectric permittivity decreasing progressively from the internal reflector 16 to the first and second internal sources 15, 18.
• the dielectric permittivity gradient can be obtained by using a dielectric material having a first dielectric permittivity ⁇ and having inclusions 22 of a different dielectric material having a second dielectric permittivity ⁇ 2 smaller than the first dielectric permittivity ⁇ - ⁇ .
• the inclusions 22 must have dimensions b less than the wavelength of said signals and the distances d separating two consecutive inclusions must be less than the wavelength of said signals.
• the density of the inclusions increases from the reflector 16 towards the first and second internal sources 15, 18 of the BFN wafer so that the dielectric permittivity decreases more and more as it gets closer to the first and second internal sources 15, 18.
• the dielectric permittivity gradient can be obtained for example by inclusions 22 of air holes formed in the dielectric medium.
• the air holes are not metallized and can be made by holes opening through the upper metal plate 10, the density of air holes increasing from the reflector 16 to the first and second internal sources 15 , 18 of the BFN slice to decrease dielectric permittivity near internal sources.
• the metal deposition of the upper metal plate 10 having been destroyed locally by the drilling of the air holes, it is necessary to make an additional deposit of a dielectric layer above the upper metal plate 10 and depositing an additional metal layer above the additional dielectric layer to restore the sealing of the propagation medium.
• the dielectric permittivity gradient can be obtained by using a dielectric medium consisting for example of a dielectric lens 21 with a convex periphery, having a dielectric permittivity ⁇ greater than the dielectric permittivity of the air, and including inclusions 22, such as represented for example in Figures 2d and 2e.
• the inclusions 22 may for example be inclusions of air holes, the diameter and / or the density of the inclusions 22 progressively increasing from the internal reflector to the internal sources 15, 18.
• the use of a dielectric medium having a permittivity gradient in the first and second substrate layers 9, 11, 13 of the BFN slice has the advantage of curving the direction of propagation of the signals and thus to be able to use first and second internal sources 15, 18 less directive. It then becomes possible to tighten the synthesized beams. The first and second internal sources 15, 18 are then reduced in size, the multi-beam formatter is more compact and the recovery of the synthesized beams is better.
• each slice of BFN may comprise deformation means making it possible to modify the shape of the reflector 16 internal to the multi-layer structure of said slice of BFN, as represented for example in FIG. 3.
• deformation means may for example comprise a set 23 of pistons associated with actuators, the pistons being regularly distributed on the rear face of the reflector 16, the rear face being the face of the reflector opposite to the reflecting face of the microwave waves.
• the deformation means of the reflector 16 thus make it possible to optimize the shape of the internal reflector 16 and to effectively focus the signals on the second sources 18 of each BFN wafer, according to their direction of arrival on the first internal sources 15.
• the deformation means of the reflector 16 also make it possible to produce contoured beams of any previously chosen shape.
• the deformations of the internal reflector may, for example, be different from one slice of BFN to another slice of BFN to produce contour beams of different shapes.
• the first stage of the beamformer comprises Nx * Ny input / output ports of signal beams for connection to Nx * Ny radiating elements 30 of a multi-beam antenna.
• the second stage of the beamformer includes Mx * My signal input / output ports, allowing emission, to form Mx * My focused beams in the two directions X and Y of the space corresponding to Mx * My ground spots .
• Nx, Ny, Mx, My are integers greater than 1.
• the first beam forming stage comprises Ny slices of BFN, P1 1,..., P1 Ny, superimposed one above the other. other, each first stage BFN P1 Nk slot having Nx input / output ports, 271 to 27Nx, signal beams and Mx link ports, 251 to 25Mx, respectively connected to Mx BFN slots, P21 to P2Mx, from the second floor.
• the second beam forming stage comprises Mx slices of BFN, P21 to P2Mx superimposed on each other, each slice of BFN P2Mi of the second beam forming stage comprising Ny binding ports, 261 to 26Ny respectively connected respectively to the Ny slices of BFN, P1 1 to P1 Ny, of the first stage and My input / output ports 281 to 28My intended, on transmission, to be supplied by excitation signals, and on reception, to receive signals focused in the two dimensions of the X and Y space by the two stages of the multi-beam formatter.
• Nx, Ny, Mx and My are equal to two and make it possible to form two lines of two beams corresponding to four ground spots, 1 to 4.
• the Ny slices of BFN, P1 1 to P1 Ny, of the first stage comprise Ny * Mx connection ports respectively connected to Mx * Ny corresponding link ports of the Mx slices of BFN, P21 to P2Mx, of the second stage.
• the first BFN slot P1 1 of the first stage has Mx link ports 251 to 25Mx connected to the first link ports 261 of each of the Mx BFN slots P21 to P2Mx of the second slot.
• each Nth Nth stage of the first stage BFN P1 Nk includes Mx link ports connected to the Nth 26Nk link port (not shown) of each of the Mx BFN slices, P21 to P2Mx, of the second stage, up to the last slice of BFN, P1 Ny, of the first stage which comprises Mx link ports connected to the last link ports, 26Ny, of each of the Mx slices of BFN, P21 to P2Mx, of the second stage.
• the first beam forming stage comprises three slots of BFN, each BFN slot comprising five input / output ports and five connection ports.
• the second beamforming stage has five BFN slots, each BFN slot having three input / output ports and three link ports, the five ports of BFN. connecting each BFN slice of the first beam forming stage being respectively connected to one of the three corresponding link ports of the five different BFN slices of the second stage.
• the two-dimensional multi-beam formatter can operate in transmission and / or reception. It is possible to use a single beamformer operating on transmission and reception or alternatively to use two different beamformers, one operating on transmission and the other on reception. In the case where a single beamformer is used for the transmission and reception of signals, switching between transmission and reception can be carried out for example, either from the frequencies of the signals, the transmission frequencies and the reception frequencies being located in different frequency bands, either by a predetermined time sequencing, or by any other known method.
• the first internal sources receive a signal transmitted by the radiating elements of a phased array and re-transmit the energy of the received signal in each BFN slot of the first beam-forming stage.
• the energy is first focused, in a first dimension of space, on one of the second sources 18 of the first stage via the internal reflector.
• the second source 18 which collects the focused energy depends on the direction of arrival of the signal.
• the focused signal in the first dimension of the space is then transmitted to one of the first internal sources of each BFN slice of the second beam forming stage.
• each BFN slice of the second stage the beam is focused a second time, in the same way as in the first stage, in a second dimension of the space perpendicular to the first dimension of space, on one of the second sources 18 of one of the second stage BFN slices and transmitted to the input / output port 28 at which she is connected.
• the second stage BFN slices having a structure identical to that of the first stage BFN slices, the beam focusing is carried out according to the same principle in both stages.
• an excitation signal is applied to one of the input / output ports 28 of the second beam forming stage and transmitted, via the second source 18 to which it is connected, to the inside the corresponding BFN slice.
• the signal is guided in the waveguide 19 connected to the second source 18 and then reflected on the internal reflector 16.
• the energy reflected by the internal reflector 16 is then distributed over all the first sources 15 the second stage BFN slot then transmitted to one of the second sources 18 of each first stage BFN slot to which the first sources of the second stage BFN slot are respectively connected.
• the energies of the signal beams transmitted to the second sources 18 of the first stage BFN slices are then reflected by the internal reflector 16 of the first stage BFN slices and then distributed over all the first sources of the first stage BFN slices. beams.
• the signal beams synthesized by the beamformer are then transmitted to all the phased array radiators 30 to which the first sources of the first beamforming stage are connected and then the signal beams are emitted to ground coverage areas. constituting the spots.
• the invention consists in adding additional BFN slices to obtain additional spots between two initial consecutive spots of the same line. and / or to realize additional spot lines interspersed between two lines of initial spots.
• the exemplary embodiment illustrated schematically in FIG. 5a represents two BFN slices of the first beam forming stage connected to the same radiating elements.
• This embodiment having only one beam forming stage, the beams 1 and 3 corresponding are focused in a single direction Y and correspond to two lines of spots L1 and L2 widened in the direction X where there is no focus of the beams.
• additional spot lines L'1, L'2, parallel to the Y direction are added to two lines of spots L1, L2, using twice as many slices BFN of the first beam forming stage than radiating elements of the defocused network and connecting two slices of BFN, P1 1, ⁇ 1, different from the first beam forming stage to each of the radiating elements 30 of the defocused network 41.
• the addition of additional BFN slices restee 1 requires placing a signal splitter at the output of the radiating elements 30 of the phased array, which induces losses which must be compensated by an amplifier.
• the second slice of BFN ⁇ 1 In order to obtain additional spot lines 1 and 2, it is also necessary for the second slice of BFN ⁇ 1 to have a linear offset, for example of a half-stitch, a mesh corresponding to the spacing between two first internal sources 15 ', with respect to the first portion of BFN P1 1 with respect to the respective position of the first internal sources 15' relative to the corresponding inner reflector 16 '.
• the linear offset can be obtained either by applying a translation to the first internal sources 15 'of the second BFN slice as shown schematically in FIG. 5c, or by applying a rotation to the internal reflector 16' of the second slice of BFN to change it. the orientation, the position of the first internal sources 15 'then not being modified.
• a linear offset for example of a half-stitch
• the second stage of BFN, ⁇ 1, of the first stage comprises first internal sources 15 'linearly offset along the axis V perpendicular to the longitudinal direction U of the BFN slice with respect to the first internal sources 15 of the first slice of BFN, P1 1, of the first stage connected to the same radiating element 30.
• the linear offset corresponds to a translation of all the first internal sources 15 'of a same distance T less than the distance between the centers of two first consecutive sources 15.
• the linear offset T may for example be equal to half the distance between the centers of two first consecutive sources, that is to say half a mesh.
• the second beam-forming stage not shown in FIG. 5a, also has twice as many BFN slices, each second-stage BFN slice being connected to the together the first stage BFN slices via the link ports, as indicated above in conjunction with Figures 4a and 4b.
• the number of spot lines is unchanged but additional spots 5, 6, 7, 8 are added on each line of spots, L1, L2, each additional spot being inserted between two initial consecutive spots 1, 2, 3, 4, so as to fill ground cover holes on each spot line.
• additional spots 5, 6, 7, 8 are added on each line of spots, L1, L2, each additional spot being inserted between two initial consecutive spots 1, 2, 3, 4, so as to fill ground cover holes on each spot line.
• Each link port, 251 to 25Mx, BFN slices, P1 1 to P1 Ny, of the first stage is then connected to a link port, 261 to 26Ny, of a first slice of BFN, P21 to P2Mx, of the second beam forming stage and at a connecting port, 26 ⁇ to 26'Ny, a second BFN slice, P'21 to P'2Mx, second stage.
• a link port, 261 to 26Ny of a first slice of BFN, P21 to P2Mx, of the second beam forming stage and at a connecting port, 26 ⁇ to 26'Ny, a second BFN slice, P'21 to P'2Mx, second stage.
• the second slice of BFN, P'21 to P'2Mx, of the second stage comprises first internal sources 15 'linearly offset along the axis V perpendicular to the longitudinal direction U of the second slice of BFN with respect to the first internal sources 15 of the first slice of BFN, P21 to P2Mx, of the second stage connected to the same link port of the first beam forming stage.
• the positions of the first internal sources are identical for the first portion P21 to P2Mx and the second slice P'21 to P'2Mx of BFN of the second stage but the inner reflector 16 'of the second slice P'21 to P'2Mx of BFN of the second stage is angularly offset relative to the reflector 16 of the first slice P21 to P2Mx of the second floor.
• additional spots and additional lines are added.
• the number of BFN slices of the first beamforming stage and the number of BFN slices of the second beamforming stage are doubled as indicated in connection with FIG. FIG. 5a and in addition, for the addition of the additional spots on each spot line L1, L2, L'1, L'2, the number of BFN slices of the second beam-forming stage is doubled again as indicated in connection with FIG. 6.
• the number of BFN slices of the first stage P1 1 to P1 Ny, ⁇ 1 to ⁇ Ny is doubled and the number of slices of BFN from the second stage P21 to P2Mx, P'21 to P'2Mx, P "21 to P" 2Mx, P '"21 to P"' 2Mx is quadrupled.
• a hexagonal mesh as shown for example in Figure 7b, can also be realized with the same configuration of the two beam forming stages as that shown in the embodiment of Figure 7a. For this, it is necessary either to shift, by half a mesh, the first internal sources of the additional BFN slices P "21 to P" 2Mx and P "" 21 to P "'2Mx, or to offset the second sources additional BFN slices P "21 to P" 2Mx and P "" 21 to P "'2Mx, ie to modify the orientation of the internal reflector 16 of these additional BFN slices P" 21 to P "2Mx and P' "21 to P” '2Mx.
• FIGS. 8a, 8b and 8c represent three diagrams illustrating the operation of a first example (FIG. 8a) and a second example (FIGS. 8b and 8c) of an imaging array antenna comprising a main reflector 40, a defocused phased array 41 placed in front of the main reflector 40 and a multi-beam trainer according to the invention.
• the radiating network 41 considered is a linear network and a single slice of BFN is considered for the formation of a beam.
• the internal reflector 16 at the BFN wafer is disposed in an offset configuration corresponding to the first embodiment of the BFN wafer described with reference to FIG. 2a.
• the internal reflector 16 at the BFN wafer reflects the signals in the same direction as the incident beam, which corresponds to the second embodiment of the BFN wafer described with reference to FIG. 2b.
• the direction of the incident beam 33a is normal to the main reflector 40 of the antenna while in FIG. 8c the direction of the incident beam 33b is detuned relative to the normal direction.
• the phased array 41 consists of a plurality of elementary radiating elements 30, each elementary radiating element 30 being intended to transmit and / or receive beams of microwave signals.
• Each elementary radiating element 30 is connected to an input / output port 27 of the BFN wafer by a transmission chain and a microwave signal reception chain and via connecting guides 42.
• each receive chain may comprise an amplifier 31 for masking the energy losses in the BFN slices of the beamformer.
• the amplifier 31 is a power amplifier and on reception the amplifier 31 is a low noise amplifier.
• each transmission and reception system may also comprise a dynamic phase shifter 32, as represented for example in FIG. 8d, making it possible in particular to compensate for the deformations of the main reflector 40 of the imaging array antenna and the static errors of manufacture and integration of the antenna.
• the deformations of the main reflector may for example be due to temperature variations or instabilities of a satellite to which the imaging array antenna is fixed.
• the input / output ports 25 connected to the second internal sources 18 of the BFN slot are intended to be connected to receiving received signal processing means and remission means from excitation means.
• an incident signal beam 33a, 33b is reflected by the main reflector 40 on the phased array 41.
• the energy of the reflected beam 34a, 34b is picked up by almost all the radiating elements 30 of the phased array 41 and then transmitted by each reception chain to the input / output ports 27, and guided by the linking guides 42 to all the first internal sources 15 of the BFN slices.
• the first internal sources re-transmit the energy of the signal received in the BFN slot, where the energy is focused on one of the second sources 18 via the internal reflector 16 and transmitted to one of the ports of Inlet / outlet 25.
• the input / output port 25 which collects the focused energy depends on the direction of arrival of the signal. As shown in Figures 8b and 8c, for two different directions of arrival, the energy is focused on two different ports 25a, 25b.
• an excitation signal is applied to one of the input / output ports 25 and transmitted, via the second source 18 to which it is connected, inside the BFN slot. .
• the signal energy is reflected on the inner reflector 16 and distributed over all the first sources of the BFN slice.
• the signal beams synthesized by the BFN wafer are then transmitted to all the radiating elements 30 of the defocused phased array 41 to which the first sources 15 are connected and then transmitted to the main reflector 40 of the antenna which reflects the beams to zones of ground cover constituting the spots.
• the second embodiment of a BFN wafer corresponding to FIGS. 2b, 8b and 8c makes it possible to obtain a more efficient imaging array antenna than using a multi-beam formatter according to the first embodiment corresponding to FIGS. 2a and 8a.
• the slices of BFN have an internal reflector placed in an offset configuration.
• the second internal sources 18 associated with the input / output ports 25 are centered with respect to the internal reflector 16, which improves the misalignment performance of the imaging array antenna because the antenna will have fewer phase aberrations.
• this optical configuration is only possible thanks to the separation, on different layers of substrates, incident signals and reflected on the inner reflector 16.
• any other type of known multi-beam trainer it would be impossible to make an antenna with equivalent configuration operating in a free space because the phased array would then block the signal reflected by the auxiliary reflector.
• the invention presents the advantage of being able to realize, in the imaging array antenna associated with the multibeam format, important optical paths similar to those which are established in a Cassegrain-type dual reflector antenna configuration while minimizing the space requirement of the 'antenna.
• the inner reflector of the multi-beam formatter is elliptical in shape.
• the imaging array antenna associated with the multi-beam trainer according to the invention compared with the configuration of an equivalent Cassegrain-type antenna, relates to its radiation performance.
• the imaging network antenna made from a reflector and a defocused phased array and associated with the multi-beam trainer according to the invention has several parameters making it possible to optimize its operation, such as the shape of the main reflector 40, the arrangement of the radiating elements 30 of the phased array 41, the length of the connecting guides 42, the arrangement of the first internal sources 15, the shape of the internal reflector 16, and the arrangement of the second internal sources 15. These different degrees of freedom can be optimized to minimize phase aberrations in multiple directions of arrival, and thus significantly extend the antenna's angular coverage.
• the Cassegrain antenna configuration can be optimized only with regard to the shape of the main and auxiliary reflectors and thus form only two foci.
• a reflector antenna which has two contiguous sources arranged in the antenna focal plane generates two beams overlapping at a low level, typically -4 to -5 dB.
• the same problems of overlap between beams appear for an imaging array antenna with a quasi-optical multi-beam trainer according to the invention, but as described with reference to FIGS. 5a, 6 and 7, the invention makes it possible to solve this problem by adding additional BFN slices in the two stages of the quasi-optical multi-beam trainer whereas in known antennas this problem can only be solved by multiplying the number of antennas used.
• the two-dimensional multi-beam formatter can also be used in other types of antenna, such as, for example, a direct-radiation phased array or an imaging array antenna comprising two external parabolic reflectors of different sizes having the same focal length, such as as shown for example in Figure 9.
• a direct radiation network the antenna has no external reflector, the beams synthesized by the multi-beam trainer are directly emitted by the radiating elements of the phased array and form the spots on the ground.
• the phased array 41 associated with the two-dimensional multi-beam formatter according to the invention is placed in front of the auxiliary reflector 44.
• a signal beam incident on the main reflector 40 is reflected towards the auxiliary reflector 44 through the focal plane F located between the main reflector and the auxiliary reflector.
• the signal reflected a first time by the main reflector 40 and imaged by the focal plane F is reflected a second time by the auxiliary reflector 44 on the phased array 41 and focused by the multi-beam trainer.
• the beams synthesized by the multi-beam trainer are emitted by the phased array and then follow the propagation path opposite to that followed on reception.
• a single multi-beam trainer is connected to the phased array.
• the multi-beam trainer can only operate in a single polarization whereas the phased array can extract signals in two orthogonal polarizations.

Landscapes

• Aerials With Secondary Devices (AREA)
• Variable-Direction Aerials And Aerial Arrays (AREA)

Applications Claiming Priority (2)

Publications (2)

Family

ID=47603787

Family Applications (1)

Country Status (7)

Families Citing this family (15)

Family Cites Families (11)

• 2012
  • 2012-01-27 FR FR1200244A patent/FR2986377B1/fr active Active
• 2013
  • 2013-01-25 ES ES13701118.5T patent/ES2628633T3/es active Active
  • 2013-01-25 US US14/374,855 patent/US9627779B2/en active Active
  • 2013-01-25 CA CA2862729A patent/CA2862729C/fr active Active
  • 2013-01-25 JP JP2014553741A patent/JP6127067B2/ja active Active
  • 2013-01-25 WO PCT/EP2013/051509 patent/WO2013110793A1/fr active Application Filing
  • 2013-01-25 EP EP13701118.5A patent/EP2807702B1/de active Active

Non-Patent Citations (2)

Also Published As

Similar Documents

Legal Events