EP2787388B1 - Raman scattering photoenhancement device, method for manufacturing raman scattering photoenhancement device, and raman laser light source using raman scattering photoenhancement device - Google Patents

Raman scattering photoenhancement device, method for manufacturing raman scattering photoenhancement device, and raman laser light source using raman scattering photoenhancement device Download PDF

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EP2787388B1
EP2787388B1 EP13831618.7A EP13831618A EP2787388B1 EP 2787388 B1 EP2787388 B1 EP 2787388B1 EP 13831618 A EP13831618 A EP 13831618A EP 2787388 B1 EP2787388 B1 EP 2787388B1
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raman
waveguide
light
light source
semiconductor substrate
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EP2787388A4 (en
EP2787388A1 (en
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Yasushi Takahashi
Yoshitaka Inui
Takashi Asano
Susumu Noda
Masahiro CHIHARA
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Japan Science and Technology Agency
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
    • G02F1/025—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/365—Non-linear optics in an optical waveguide structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/30—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range using scattering effects, e.g. stimulated Brillouin or Raman effects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/10—Materials and properties semiconductor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/32—Photonic crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/15—Function characteristic involving resonance effects, e.g. resonantly enhanced interaction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/0632—Thin film lasers in which light propagates in the plane of the thin film
    • H01S3/0635—Thin film lasers in which light propagates in the plane of the thin film provided with a periodic structure, e.g. using distributed feed-back, grating couplers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/0632—Thin film lasers in which light propagates in the plane of the thin film
    • H01S3/0637—Integrated lateral waveguide, e.g. the active waveguide is integrated on a substrate made by Si on insulator technology (Si/SiO2)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping

Definitions

  • the present invention relates to a Raman scattered light enhancement device, and particularly to a Raman scattered light enhancement device applicable to an optical waveguide or an optical resonator using a photonic crystal made up of a semiconductor substrate in which holes are formed, and a method for manufacturing the Raman scattered light enhancement device.
  • the present invention also relates to a Raman laser light source using the Raman scattered light enhancement device.
  • Patent Literature 1 discloses a Raman scattered light enhancement device formed such that stimulated Raman scattering can be generated in a slab-type two-dimensional photonic crystal where a number of holes are formed in a slab made of silicon so as to have a two-dimensional periodic structure.
  • the Raman scattered light enhancement device of Patent Literature 1 has an in-plane heterostructure formed by combining two-dimensional photonic crystals each having different structural parameters, and realizes optical confinement using a difference in mode gaps due to the difference of the structural parameters.
  • an optical resonator configured of a waveguide made up of a linear defect formed in the photonic crystal, and there are provided two reflection parts so as to realize resonant modes for each of a wavelength of incident light and a wavelength of Raman scattered light of an object medium.
  • Raman scattered light enhancement device disclosed in Patent Literature 1, Raman light that occurs due to stimulated Raman scattering can be strongly confined within a predetermined region by the optical resonator, and Raman scattered light can thus be obtained with high efficiency.
  • a Raman scattered light enhancement technique is attracting attention as one which leads to a Raman laser using a photonic crystal to be realized in the future.
  • the Raman laser using a photonic crystal has been expected to be put into practice as a technique capable of obtaining laser light in a wavelength region which cannot be dealt with by a conventional semiconductor laser, or as a technique capable of creating laser light even by indirect transition-type semiconductor such as silicon.
  • An object of the present invention is to provide a Raman scattered light enhancement device capable of obtaining stronger Raman scattered light by optimizing a waveguide forming direction, and a method for manufacturing the Raman scattered light enhancement device.
  • a Raman scattered light enhancement device is provided as set forth in the appended claims.
  • a method for manufacturing a Raman scattered light enhancement device is a manufacturing method of a Raman scattered light enhancement device is provided as set forth in the appended claims.
  • a forming direction of a waveguide is optimized. It makes possible to obtain stronger Raman scattered light, and can lead to a continuous oscillation of a Raman laser, size minimization, electric power saving, and low cost mass-production.
  • Fig. 1 is a diagram illustrating a schematic configuration of an optical resonator 100 using a two-dimensional photonic crystal 20.
  • the two-dimensional photonic crystal 20 has a structure where a large number of holes 20a are arrayed in silicon.
  • the optical resonator 100 has a configuration where, when laser light (wavelength: 1435 nm) emitted from a laser diode (LD) 10 via a lens fiber 11 is incident on an input waveguide 13 from a light inputting device 12, laser light with a new wavelength (wavelength: about 1550 nm) is collected at a light outputting device 30 via an output waveguide 15, and guided to a lens fiber 31.
  • LD laser diode
  • the two-dimensional photonic crystal 20 has a structure where the holes 20a are periodically provided on a slab-type silicon substrate.
  • the wavelength is converted by the stimulated Raman scattering in a micro-resonator 14 being centered at the figure, and laser light with a new wavelength is emitted along a B-direction via the output waveguide 15.
  • An interval between the holes 20a in the two-dimensional photonic crystal 20 is about 400 nm except for a region in the vicinity of the micro-resonator 14, whereas in the region in the vicinity of the micro-resonator 14, positions of the holes are finely adjusted so as to realize optical confinement using a mode gap difference.
  • optical resonance is realized by a waveguide made of a linear defect formed in the photonic crystal.
  • the optical resonance is realized by providing a pair of light reflecting interfaces around which structure of the photonic crystal is altered so that a propagation wavelength band is shifted in the middle of the waveguide.
  • a size of the holes of the photonic crystal in the region of the light reflecting interface or slightly changing positions and an interval of the holes e.g. getting the hole closer to or more distant from the waveguide
  • Fig. 3 shows enlarged structure of a photonic crystal in the vicinity of the micro-resonator 14 of the two-dimensional photonic crystal 20, in which states of the resonant modes are depicted. Since a frequency of the resonant mode depends on an effective refractive index, as shown in Fig. 3 , in the two-dimensional photonic crystal 20, positions of holes around the micro-resonator 14 are modulated so that a hetero structure is formed where intervals between the holes are altered for respective regions as 410 nm, 420 nm, and 410 nm.
  • Optical confinement occurs due to this well-type potential.
  • the energy levels mentioned above have the "pumping mode” (first excitation waveguide mode), which shows an odd parity of a magnetic field component in a vertical direction with respect to the central axis of the waveguide, and the "Raman mode” (ground waveguide mode), which shows an even parity of a magnetic field component in the vertical direction with respect to the central axis of the waveguide.
  • the two-dimensional photonic crystal 20 is designed to be used for resonation between pumping light and Raman scattered light by finely adjusting the position and diameter of each hole 20a around the waveguide so that respective frequencies of the ground waveguide mode and the first excitation waveguide mode are adjusted. For example, positions of respective holes 20a around the waveguide are made slightly close to or distant from the waveguide, intervals between the holes 20a are altered, or diameters of the holes 20a are altered. It is to be noted that, in actually performing such fine adjustment, a relatively easier approach is: producing a large number of samples by gradually changing diameters of holes and selecting a sample where the frequency difference between the ground waveguide mode and the first excitation waveguide mode agrees with the Raman shift frequency.
  • Figs. 4A to 4F are ones showing states of an electromagnetic field in each of the two waveguide modes (levels) formed in the two-dimensional photonic crystal 20, where dark colored portions indicate that the electromagnetic field is strong.
  • Figs. 4A to 4C are diagrams showing states of the electromagnetic field of the first excitation waveguide mode that confines the pumping light, which represent an electric field component Ex ( Fig. 4A ), an electric field component Ey ( Fig. 4B ) and a magnetic field component Hz ( Fig. 4C ), respectively.
  • Figs. 4D to 4F are diagrams showing states of the electromagnetic field of the ground waveguide mode that confines the Raman scattered light having lower energy than that of the pumping light, which represent an electric field component Ex ( Fig.
  • the spatial symmetry properties are different between the first excitation waveguide mode and the ground waveguide mode.
  • the parity of the magnetic field component in the vertical direction is odd with respect to the central axis of the waveguide in the first excitation waveguide mode, and the parity of the magnetic field component in the vertical direction is even with respect to the central axis of the waveguide in the ground waveguide mode.
  • the two-dimensional photonic crystal 20 is produced such that a waveguide forming direction be a direction of a crystal plane orientation of silicon [100] and the first excitation waveguide mode and the ground waveguide mode can be utilized therein.
  • a laminated substrate made up of a Si layer 51, a SiO 2 layer 52 and Si layer 53 are cleansed.
  • a resist layer 54 is applied onto the laminated substrate, and electron beam lithography is performed as shown in 5C.
  • ICP etching is performed to transfer a hole pattern of the resist layer 54 to the Si layer 53 as shown in Fig. 5E .
  • substrate polishing is performed on the Si layer 51 according to the need as shown in Fig. 5G .
  • the SiO 2 layer 52 is etched by hydrofluoric acid, to complete the two-dimensional photonic crystal 20.
  • Fig. 6 is a diagram explaining a plane orientation on the silicon (SOI) substrate. There is a difference in angle of 45 degrees between a [110] orientation and a [010] orientation. An orientation flat is provided in the [110] orientation. Conventionally, when producing a waveguide structure or an optical resonance structure, the structure has been generally provided in the [110] orientation where a waveguide end surface is easily produced by cleavage.
  • Enhancement of Raman scattered light in the present embodiment is realized by that: on the assumption that the frequency difference between the resonant frequency for the pumping mode and the resonant frequency for the Raman mode should be made agree with the Raman shift frequency (15.6 THz) of silicon, an electromagnetic field distribution of Raman scattering, which occurs due to interaction of the pumping mode and the phonons of silicon, is made well agree with electromagnetic field distribution of the resonant mode by considering the spatial symmetry of these two resonant modes and the Raman tensor of silicon.
  • the frequency difference between one resonant mode and the other resonant mode is made equal to the Raman shift frequency of silicon.
  • the waveguide forming direction with respect to the crystal plane orientation of silicon is set so as to maximize a Raman transition probability g which is represented by the electromagnetic field distribution of the two resonant modes and the Raman tensor of silicon.
  • This Raman transition probability g is proportional to an integral expression of following Equation (1): [Math. 1] g ⁇ ⁇ E raman ⁇ R ij ⁇ E pump dV
  • Equation (1) E raman represents electromagnetic field distribution of the Raman mode, and E pump represents electromagnetic field distribution of the pumping mode.
  • R ij denotes the Raman tensor.
  • E raman and E pump do not vary with respect to the orientation of crystal along which the waveguide is fabricated, but the Raman tensor varies.
  • Equation (1) In order to obtain strong Raman scattered light, it is required to make the value of Equation (1) large. For this, it is helpful that the spatial symmetry (even or odd) of electromagnetic field of the Raman scattered light agrees with the spatial symmetry of electromagnetic field of the Raman mode at least. Therefore, in selecting combination of the resonant modes, an algorithmic selectional rule can be considered in accordance with the Raman tensor. In the present embodiment, the resonant modes that exhibit strong intensity of the Raman scattered light are extracted in accordance with such the selectional rule.
  • resonant modes are classified into four types: a type that shows even symmetry with respect to the x direction and even symmetry with respect to the y direction (type A); a type that shows odd symmetry with respect to the x direction and odd symmetry with respect to the y direction (type B); a type that shows even symmetry with respect to the x direction and odd symmetry with respect to the y direction (type C); and a type that shows odd symmetry with respect to the x direction and even symmetry with respect to the y direction (type D).
  • Equation (1) In silicon, there is a difference of 45 degrees in rotational angle between the [100] direction and the [110] direction. Then, in a direction forming an angle which is between the [100] direction and the [110] direction, a magnitude of the integral expression of Equation (1) is obtained through superimposition of the [100] direction and the [110] direction, and, hence, Equation (1) surely takes a local maximum value in either at the [100] direction or the [110] direction.
  • Equation (1) namely, the intensity of the Raman scattered light
  • a comparison may be made between the Raman transition probability g in the case of the waveguide forming direction being the [100] direction and the Raman transition probability g in the case of the waveguide forming direction being in the [110] direction, and the direction which shows the larger Raman transition probability g may be adopted.
  • the Raman tensor of silicon in the case of the waveguide forming direction being the [100] direction is expressed as in Fig. 7 .
  • the integral expression of Equation (1) is re-written as follows: [Math. 2] g ⁇ ⁇ E raman x E pump y + E raman y E pump x dV
  • the spatial symmetry of electromagnetic field distribution of the Raman mode is to be the symmetry that has inverted parity of the symmetry with respect to x direction and y direction of the pumping mode.
  • the combination of the pumping mode and the Raman mode which can enhance the Raman scattered light includes only four kinds: the type A - the type B; the type B - the type A; the type C- the type D; and the type D - the type C. This is because, in a combination other than those, the integrated value of Equation (2) is 0.
  • the Raman tensor of silicon in the case of the waveguide forming direction being the [110] direction is expressed as in Fig. 8 .
  • the integral expression of Equation (1) is re-written as follows: [Math. 3] g ⁇ ⁇ E raman x E pump x ⁇ E raman y E pump y dV
  • Equation (3) when the waveguide forming direction is directed to the crystal orientation [110] direction of silicon, the combination of the pumping mode and the Raman mode which can enhance the Raman scattered light includes only four kinds: the type A - the type A; the type B - the type B; the type C- the type C; and the type D - the type D. This is because, in a combination other than those, the integrated value of Equation (3) is 0.
  • two resonant modes which are used for amplifying the Raman scattering with the use of the two-dimensional photonic crystal 20, firstly should have an appropriate frequency difference (15.6 THz in the case of silicon) agreeing with the phonon frequency (Raman shift frequency). Further, the electromagnetic fields thereof should have appropriate spatial symmetry, and they should be produced in an appropriate crystal orientation. Furthermore, a combination that has a large integrated value of Equation (1) should be selected. In addition, in order to obtain strong Raman scattered light or to realize laser oscillation with a low threshold value in an oscillator structure, it is beneficial that a mode having a high Q value can be realized.
  • the first excitation waveguide mode is selected as the pumping mode
  • the ground waveguide mode is selected as the Raman mode
  • a forming direction of the waveguide is set to the crystal orientation [100] of silicon.
  • the electric field component Ex of the first excitation waveguide mode has even symmetry with respect to the x-direction and the y-direction (the type A)
  • the electric field component Ex of the ground waveguide mode has odd symmetry with respect to the x-direction and the y-direction (the type B).
  • the combination corresponds to a combination that increases the integral expression of Equation (1) (Raman transition probability g), when the waveguide is formed in the crystal orientation [100] direction.
  • the resonant modes where the waveguide is formed in the crystal orientation [110] direction of silicon is disadvantageous.
  • the intensity of Raman scattered light is not increased unless the combination of the resonant modes is any of the four kinds: the type A - the type A; the type B - the type B; the type C- the type C; and the type D - the type D, as described above.
  • the frequency difference of 15.6 THz is difficult to realize between two odd modes since the odd mode of the type A has a flat dispersion curve.
  • the Raman frequency (frequency difference) of silicon being 15.6 THz and the overlapping of wavenumbers
  • Fig. 9 is a graph showing the relation between a reciprocal number of the Raman transition probability g (V SRS ) and a waveguide forming angle for the above combination.
  • V SRS reciprocal number of the Raman transition probability g
  • the reciprocal number (V SRS ) of the Raman transition probability g becomes smaller (i.e., the Raman transition probability g becomes larger) when the waveguide forming angle is in the crystal orientation [100] direction of silicon or an equivalent direction thereto
  • V SRS reciprocal number of the Raman transition probability g becomes larger (i.e., the Raman transition probability g becomes smaller) when the waveguide forming angle is in the crystal orientation [110] direction of silicon or an equivalent direction thereto.
  • Fig. 10 is a schematic diagram of a two-dimensional photonic crystal 30, which is produced by providing respective waveguides for the first excitation waveguide mode and for the ground waveguide mode in the crystal orientation [100] of silicon.
  • a lattice constant a is set to 410 nm
  • a hole diameter r is set to 130 nm
  • a thickness d of the silicon substrate is set to 220 nm.
  • Calculated ideal Q values of the first excitation waveguide mode and the ground waveguide mode in the two-dimensional photonic crystal 30 are considered to be on the order of 1.5 million with respect to the first excitation waveguide mode and on the order of 15 million with respect to the ground waveguide mode. These selected modes are considered to be a combination that maximizes the Q value among the modes capable of realizing the Raman shift of silicon of the difference of 15.6 THz.
  • the inventors have obtained a value of 0.2 million with respect to the first excitation waveguide mode and 3 million with respect to the ground waveguide mode. Values beyond these have not been reported ever.
  • the integrated value (Raman transition probability g) of Equation (1) concerning the two-dimensional photonic crystal 30 is on the order of 60% with the holes taken into consideration, and this Raman transition probability g is considered as the highest among those for the possible combinations of the resonant modes. It has actually been confirmed that the two-dimensional photonic crystal in which waveguides are formed in the crystal orientation [100] direction of silicon exhibits stronger intensity of Raman scattered light than the two-dimensional photonic crystal in which waveguides are formed in the crystal orientation [110] direction of silicon.
  • Fig. 11 shows a result of spectral investigation, in which the pumping light is made incident into the two-dimensional photonic crystal 30 (exposure time: 120 seconds). As shown in Fig. 11 , as compared with past cases, a very strong peak of Raman scattered light is obtained. A wavelength of the incident light (pumping mode) is 1415 nm, whereas a wavelength of the Raman scattered light (Raman mode) is 1525 nm, which has been subjected to the Raman shift of 15.6 THz.
  • the Raman scattered light enhancement device of the present embodiment since Raman light generated from pumping light can be effectively enhanced, Raman scattered light stronger than hitherto can be obtained. Being able to obtain strong Raman scattered light thus leads to realization of a power saving Raman laser. Further, differently from the conventional technique, the possibility increases for realizing continuous oscillation of the Raman laser. Moreover, the Raman scattered light enhancement device of the present embodiment is excellent in integration, easy to fabricate, and can be realized at low cost. Additionally, a carrier lifetime of each of free carriers generated due to the pumping light can be expected to be reduced.
  • an optical resonator 200 may have an integrated configuration where a semiconductor laser is provided on the same substrate as the photonic crystal as shown in Fig. 12 .
  • two-dimensional photonic crystal 40 has a configuration where, when laser light emitted from a laser diode (LD) 110 produced on the same substrate as itself is directly incident on an input waveguide 111, laser light with a new wavelength is collected by a light outputting device 120 via an output waveguide 112 and guided to a lens fiber 121.
  • LD laser diode
  • the laser diode 110 has a configuration where a P-junction 113 and an N-junction 114 are connected to each other via a power source 115.
  • a compound semiconductor laser can be pasted onto silicon, to integrate the laser diode with the photonic crystal.
  • Fig. 13 shows an optical amplifier 300 as another embodiment of the Raman scattered light enhancement device.
  • the optical amplifier 300 has a waveguide structure in a direction of the crystal orientation [100] of silicon, which does not involve the resonator having a band structure as shown in the left region of Fig. 3 .
  • the amplifier 300 employs a two-dimensional photonic crystal 50. To introduce pumping light into the waveguide, a waveguide for pumping is formed in the two-dimensional photonic crystal 50. It is possible to make the foregoing integrated value (Raman transition probability g) of Equation (1) large and obtain optical amplification due to strong stimulated Raman scattering.
  • silicon has been cited as an example of semiconductor for fabricating the photonic crystal in the foregoing embodiments
  • the example of semiconductor is not limited thereto, but germanium, diamond or the like which has the same crystal structure as that of silicon can also be used. Further, appropriate doping may be performed on silicon or germanium.
  • Fig. 14 is a graph showing the relation between power (horizontal axis) of pumping light (pump light) that is inputted into the optical resonator 100 from the LD 10, and power of stimulated Raman scattered light (hereinafter referred to as "Raman laser light") that is outputted from the optical resonator 100.
  • the pumping light used at this time is laser light (cw) having a spectral peak at a wavelength of 1425 nm.
  • the power of the Raman laser light (wavelength: 1540 nm) abruptly increases as the power of the pumping light inputted into the optical resonator 100 exceeds about 1 ⁇ W. That is, in the configuration shown in Fig. 1 , continuous oscillation of Raman laser light is realized with an extremely low threshold of about 1 ⁇ W.
  • the threshold (about 1 ⁇ W in Fig. 14 ) for pumping light required for realizing continuous oscillation varies depending on magnitudes of Q values of the pumping light and the Raman scattered light in the optical resonator 100
  • the threshold for the continuous oscillation of Raman laser light in the optical resonator 100 is about 1 ⁇ W in terms of the power of the pumping light.
  • laser oscillation of the stimulated Raman scattered light occurs when the power of the inputted pumping light (cw, central wavelength: 1425 nm) exceeds about 1 ⁇ W. Then, Raman laser light having a central wavelength of 1540 nm is outputted from the optical resonator 100.
  • laser oscillation can be realized with an extremely low threshold of 1 ⁇ W in the optical resonator 100. This is extremely advantageous to a selection of a pumping light source, since the extremely low threshold provides with degrees of freedom higher than hitherto in the selection of a pumping light source if a Raman laser light source is configured with the optical resonator 100 as a resonator.
  • a light-emitting diode has a broad spectral property as compared with a laser light source
  • such an LED can even be used as a pump light source (pumping light source) in the Raman laser light source in which the optical resonator 100 works as a resonator.
  • the Raman laser light source can be realized with an LED as a pumping light source and the optical resonator 100.
  • the Q value of the pumping light is about 0.1 million (or larger) and the Q value of the Raman scattered light (ground waveguide mode) is about 1 million (or larger) in the optical resonator 100
  • laser oscillation occurs due to the stimulated Raman scattered light in the optical resonator 100 and the Raman laser light is outputted when the power of light in a range of a line width of plus/minus about 5 pm (1424.995 nm - 1425.005 nm) centered at the wavelength (1425nm) included in the pumping light, which has a relatively broad band and is inputted into the optical resonator from the LED, exceeds 1 ⁇ W.
  • the optical resonator 100 can be used as a resonator of a Raman laser light source.
  • the pumping light source may only be a light source that inputs light having a wavelength corresponding to the pumping mode (first excitation waveguide mode) of the optical resonator 100 as the pumping light into the optical resonator 100.
  • a light-emitting diode LED
  • the pumping light source is not limited thereto.
  • the Raman laser light source may be provided with the optical resonator 200 ( Fig. 12 ) in place of the optical resonator 100.
  • the pumping light source of the Raman laser light source may be integrally configured on the same substrate as the photonic crystal where the optical resonator 200 is formed.
  • This integrally configured pumping light source may be a light-emitting diode as well as the foregoing laser diode (LD) 110 or a compound semiconductor laser.
  • the light-emitting diode may be a silicon LED, a compound semiconductor LED, or the like.
  • the Raman laser light source having the optical resonator 200 is the current injection-type silicon Raman laser light source provided with the pumping light source on the same substrate as the photonic crystal.
  • the Raman scattered light enhancement device and the method for fabricating the Raman scattered light enhancement device according to the present invention uses a photonic crystal on a semiconductor substrate, in which holes are formed. For this, minimization, electric power saving, and continuous oscillation is made possible. In addition, easy fabrication and cost reduction may also be possible. Accordingly, this device is preferably applicable as a high-performance LSI not only to IT devices in an electrical and electronics field but also to a variety of fields of technology.

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  • Microelectronics & Electronic Packaging (AREA)
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  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
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EP13831618.7A 2012-08-24 2013-03-08 Raman scattering photoenhancement device, method for manufacturing raman scattering photoenhancement device, and raman laser light source using raman scattering photoenhancement device Active EP2787388B1 (en)

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JP6478220B2 (ja) * 2014-03-12 2019-03-06 国立大学法人大阪大学 テラヘルツ波デバイス、およびテラヘルツ波集積回路
CN104795721B (zh) * 2015-04-28 2018-01-30 杭州电子科技大学 一种增强型可调谐拉曼激光装置
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TWI657166B (zh) * 2017-12-20 2019-04-21 國立成功大學 攜帶式拉曼光學檢測試紙及其製法與使用方法
CN115291324B (zh) * 2022-07-08 2023-05-26 中国地质大学（武汉） 一种硅基全光二极管

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KR101458484B1 (ko) 2014-11-07
SG11201403759TA (en) 2014-10-30
KR20140093758A (ko) 2014-07-28
CN104040419B (zh) 2016-05-18
US20140355630A1 (en) 2014-12-04
EP2787388A4 (en) 2014-11-26
EP2787388A1 (en) 2014-10-08
US9097847B2 (en) 2015-08-04

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